CN100392155C - 用于电沉积金和金合金的镀液及其应用 - Google Patents

用于电沉积金和金合金的镀液及其应用 Download PDF

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Publication number
CN100392155C
CN100392155C CNB028056736A CN02805673A CN100392155C CN 100392155 C CN100392155 C CN 100392155C CN B028056736 A CNB028056736 A CN B028056736A CN 02805673 A CN02805673 A CN 02805673A CN 100392155 C CN100392155 C CN 100392155C
Authority
CN
China
Prior art keywords
plating bath
gold
compound
bath
bismuth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNB028056736A
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English (en)
Chinese (zh)
Other versions
CN1494606A (zh
Inventor
S·吕贝尔
M·施蒂姆克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Haffner C & Co KG GmbH
Original Assignee
Wieland Dental and Technik GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE2001110743 external-priority patent/DE10110743A1/de
Application filed by Wieland Dental and Technik GmbH and Co KG filed Critical Wieland Dental and Technik GmbH and Co KG
Publication of CN1494606A publication Critical patent/CN1494606A/zh
Application granted granted Critical
Publication of CN100392155C publication Critical patent/CN100392155C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/48—Electroplating: Baths therefor from solutions of gold
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Dental Preparations (AREA)
  • Electroplating Methods And Accessories (AREA)
CNB028056736A 2001-02-28 2002-02-28 用于电沉积金和金合金的镀液及其应用 Expired - Lifetime CN100392155C (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE10110743.9 2001-02-28
DE2001110743 DE10110743A1 (de) 2001-02-28 2001-02-28 Bad zur galvanischen Abscheidung von Gold und Goldlegierungen sowie dessen Verwendung
EP01108448A EP1236814A1 (de) 2001-02-28 2001-04-04 Bad zur galvanischen Abscheidung von Gold und Goldlegierungen sowie dessen Verwendung
EP01108448.0 2001-04-04

Publications (2)

Publication Number Publication Date
CN1494606A CN1494606A (zh) 2004-05-05
CN100392155C true CN100392155C (zh) 2008-06-04

Family

ID=26008695

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB028056736A Expired - Lifetime CN100392155C (zh) 2001-02-28 2002-02-28 用于电沉积金和金合金的镀液及其应用

Country Status (8)

Country Link
US (1) US20040065225A1 (pt)
EP (1) EP1366219B1 (pt)
JP (1) JP4183240B2 (pt)
CN (1) CN100392155C (pt)
AU (1) AU2002308221A1 (pt)
BR (1) BR0207724A (pt)
CA (1) CA2438207A1 (pt)
WO (1) WO2002068728A1 (pt)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1378590A1 (fr) * 2002-07-04 2004-01-07 Metalor Technologies International S.A. Bain pour dépôts electrolytiques d'or
CN1942162A (zh) * 2004-02-18 2007-04-04 玛丽安娜·库利 抗微生物制剂及其使用方法
CN1308493C (zh) * 2004-07-27 2007-04-04 滕先弟 硫代硫酸金铵络合物及其制备方法
JP5442400B2 (ja) * 2009-11-13 2014-03-12 ルネサスエレクトロニクス株式会社 半導体集積回路装置の製造方法
CN101781758B (zh) * 2010-04-09 2011-12-07 厦门华弘昌科技有限公司 化学镀镍稳定剂、化学镀镍溶液及化学镀镍工艺
US10889908B2 (en) * 2012-09-17 2021-01-12 Government Of The United States Of America, As Represented By The Secretary Of Commerce Superconformal filling composition and superconformally filling a recessed feature of an article
US11579344B2 (en) 2012-09-17 2023-02-14 Government Of The United States Of America, As Represented By The Secretary Of Commerce Metallic grating
ITFI20120208A1 (it) * 2012-10-12 2014-04-13 Bluclad S R L Soluzione per l'elettrodeposizione di una lega di oro e la lega da essa derivante.
ITFI20130057A1 (it) * 2013-03-18 2014-09-19 Bluclad S R L Soluzione per l¿elettrodeposizione di una lega di oro e la lega da essa derivante.
CN103938232B (zh) * 2014-03-04 2015-04-01 深圳市联合蓝海新技术有限公司 一种无氰电镀液及其应用
CN103938231B (zh) * 2014-03-04 2015-04-01 深圳市联合蓝海科技开发有限公司 一种电镀黄金的方法和硬质黄金的制备方法
CN104047037B (zh) * 2014-06-16 2015-06-03 深圳市联合蓝海科技开发有限公司 一种硬化剂
CN104862752B (zh) * 2015-06-12 2016-02-17 深圳市联合蓝海投资控股集团有限公司 改性无氰镀金液及其应用和硬质黄金的制备方法
WO2023041972A1 (en) * 2021-09-16 2023-03-23 Galvasols P & S High-speed pure gold electroforming/electroplating bath
JP7219847B1 (ja) 2022-09-26 2023-02-08 Ｅｅｊａ株式会社 金電気めっき液および金電気めっき方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1325352A (en) * 1969-08-08 1973-08-01 Sel Rex Corp Electrodeposition of gold and gold alloys
US4820387A (en) * 1987-04-10 1989-04-11 G-C Dental Industrial Corp. Method and apparatus for making the inner crowns of composite-layered crowns for restoring crowns
DE3805627A1 (de) * 1988-02-24 1989-09-07 Wieland Edelmetalle Goldbad
US5277790A (en) * 1992-07-10 1994-01-11 Technic Incorporated Non-cyanide electroplating solution for gold or alloys thereof
WO2000019936A1 (de) * 1998-10-02 2000-04-13 Wieland Edelmetalle Gmbh & Co. Verfahren zur herstellung von prothetischen formteilen für den dentalbereich und prothetisches formteil

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH622829A5 (pt) * 1977-08-29 1981-04-30 Systemes Traitements Surfaces
DE19629658C2 (de) * 1996-07-23 1999-01-14 Degussa Cyanidfreies galvanisches Bad zur Abscheidung von Gold und Goldlegierungen

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1325352A (en) * 1969-08-08 1973-08-01 Sel Rex Corp Electrodeposition of gold and gold alloys
US4820387A (en) * 1987-04-10 1989-04-11 G-C Dental Industrial Corp. Method and apparatus for making the inner crowns of composite-layered crowns for restoring crowns
DE3805627A1 (de) * 1988-02-24 1989-09-07 Wieland Edelmetalle Goldbad
US5277790A (en) * 1992-07-10 1994-01-11 Technic Incorporated Non-cyanide electroplating solution for gold or alloys thereof
WO2000019936A1 (de) * 1998-10-02 2000-04-13 Wieland Edelmetalle Gmbh & Co. Verfahren zur herstellung von prothetischen formteilen für den dentalbereich und prothetisches formteil

Also Published As

Publication number Publication date
CA2438207A1 (en) 2002-09-06
EP1366219B1 (de) 2014-09-03
EP1366219A2 (de) 2003-12-03
AU2002308221A1 (en) 2002-09-12
WO2002068728A8 (de) 2003-09-18
US20040065225A1 (en) 2004-04-08
JP4183240B2 (ja) 2008-11-19
BR0207724A (pt) 2004-03-23
CN1494606A (zh) 2004-05-05
WO2002068728A1 (de) 2002-09-06
JP2004527653A (ja) 2004-09-09

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: IVOKRALVARDENT CO., LTD.

Free format text: FORMER OWNER: WIELAND DENTAL + TECHNIK GMBH

Effective date: 20131122

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20131122

Address after: Liechtenstein Shane

Patentee after: Ivo Weiwadengte carat Co. Ltd.

Address before: German F Faure F Haim

Patentee before: Wieland Dental & Technik GmbH

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20200120

Address after: Wemsheim, Germany

Patentee after: Haffner C. GmbH & Co. kg

Address before: Liechtenstein Shane

Patentee before: Ivo Weiwadengte carat Co. Ltd.

CX01 Expiry of patent term

Granted publication date: 20080604

CX01 Expiry of patent term