CN102421933B - 薄膜沉积装置及其系统 - Google Patents

薄膜沉积装置及其系统 Download PDF

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Publication number
CN102421933B
CN102421933B CN201080020337.9A CN201080020337A CN102421933B CN 102421933 B CN102421933 B CN 102421933B CN 201080020337 A CN201080020337 A CN 201080020337A CN 102421933 B CN102421933 B CN 102421933B
Authority
CN
China
Prior art keywords
substrate
chamber
deposition
fixer
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201080020337.9A
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English (en)
Chinese (zh)
Other versions
CN102421933A (zh
Inventor
裵勍彬
尹亨硕
姜敞晧
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SNU Precision Co Ltd
Original Assignee
SNU Precision Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SNU Precision Co Ltd filed Critical SNU Precision Co Ltd
Publication of CN102421933A publication Critical patent/CN102421933A/zh
Application granted granted Critical
Publication of CN102421933B publication Critical patent/CN102421933B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
CN201080020337.9A 2009-05-07 2010-05-06 薄膜沉积装置及其系统 Expired - Fee Related CN102421933B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2009-0039826 2009-05-07
KR1020090039826A KR101119853B1 (ko) 2009-05-07 2009-05-07 박막 증착 장치 및 이를 구비하는 박막 증착 시스템
PCT/KR2010/002887 WO2010128811A2 (fr) 2009-05-07 2010-05-06 Appareil de dépôt de films minces et système de dépôt de films minces le comprenant

Publications (2)

Publication Number Publication Date
CN102421933A CN102421933A (zh) 2012-04-18
CN102421933B true CN102421933B (zh) 2014-07-23

Family

ID=43050634

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201080020337.9A Expired - Fee Related CN102421933B (zh) 2009-05-07 2010-05-06 薄膜沉积装置及其系统

Country Status (5)

Country Link
JP (1) JP5506917B2 (fr)
KR (1) KR101119853B1 (fr)
CN (1) CN102421933B (fr)
TW (1) TWI386500B (fr)
WO (1) WO2010128811A2 (fr)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101151234B1 (ko) * 2010-03-30 2012-06-14 주식회사 케이씨텍 직립방식 증착장치 및 기판 이송 방법
KR101700608B1 (ko) * 2011-04-15 2017-02-01 이찬용 기판처리장치
JP5846780B2 (ja) * 2011-06-30 2016-01-20 株式会社アルバック 真空処理装置及び真空処理方法、リチウムイオン二次電池の製造方法
KR101467195B1 (ko) * 2013-05-14 2014-12-01 주식회사 아바코 가스 분사기 및 이를 포함하는 박막 증착 장치
KR102426712B1 (ko) * 2015-02-16 2022-07-29 삼성디스플레이 주식회사 표시 장치 제조 장치 및 표시 장치 제조 방법
WO2018166634A1 (fr) * 2017-03-17 2018-09-20 Applied Materials,Inc. Procédés de manipulation d'un dispositif de masquage dans un système sous vide, appareil de manipulation de masque et système sous vide
CN110998869B (zh) * 2017-08-09 2022-12-27 株式会社钟化 光电转换元件的制造方法
KR20190087992A (ko) * 2017-08-17 2019-07-25 어플라이드 머티어리얼스, 인코포레이티드 여러 개의 마스크들을 핸들링하기 위한 방법, 기판들을 프로세싱하기 위한 방법, 및 기판들을 코팅하기 위한 장치
KR101921648B1 (ko) * 2017-12-28 2018-11-26 주식회사 올레드온 수직형 면증발원을 이용한 고해상도 ａｍｏｌｅｄ 소자의 클러스터형 양산장비
KR20210081597A (ko) * 2019-12-24 2021-07-02 캐논 톡키 가부시키가이샤 성막 시스템　및 전자 디바이스 제조방법
KR102407505B1 (ko) * 2020-04-29 2022-06-13 주식회사 선익시스템 증착 장치 및 인라인 증착 시스템
CN111663104A (zh) * 2020-06-24 2020-09-15 武汉华星光电半导体显示技术有限公司 蒸镀系统及蒸镀方法
KR102879506B1 (ko) 2021-03-03 2025-11-03 삼성디스플레이 주식회사 진공 처리 장치 및 이를 이용한 진공 처리 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1932072A (zh) * 2005-09-15 2007-03-21 应用薄膜有限责任与两合公司 喷涂机和操作喷涂机的方法
JP2007239071A (ja) * 2006-03-10 2007-09-20 Fujifilm Corp 真空蒸着装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0299959U (fr) * 1989-01-24 1990-08-09
JPH051378A (ja) * 1991-03-25 1993-01-08 Shin Meiwa Ind Co Ltd インライン成膜装置における基板ホルダの搬送装置
JPH0941142A (ja) * 1995-07-26 1997-02-10 Balzers & Leybold Deutsche Holding Ag 真空中で被覆したい基板を交互に位置決めする装置
JP2000277585A (ja) * 1999-03-23 2000-10-06 Hitachi Ltd 基板搬送装置および真空処理装置
KR101006938B1 (ko) * 2002-09-20 2011-01-10 가부시키가이샤 한도오따이 에네루기 켄큐쇼 제조 시스템 및 발광장치 제작방법
JP2004146369A (ja) * 2002-09-20 2004-05-20 Semiconductor Energy Lab Co Ltd 製造装置および発光装置の作製方法
KR20040088238A (ko) * 2003-04-09 2004-10-16 (주)네스디스플레이 진공증착 시스템과 방법
JP4397655B2 (ja) * 2003-08-28 2010-01-13 キヤノンアネルバ株式会社 スパッタリング装置、電子部品製造装置及び電子部品製造方法
JP2008019477A (ja) * 2006-07-13 2008-01-31 Canon Inc 真空蒸着装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1932072A (zh) * 2005-09-15 2007-03-21 应用薄膜有限责任与两合公司 喷涂机和操作喷涂机的方法
JP2007239071A (ja) * 2006-03-10 2007-09-20 Fujifilm Corp 真空蒸着装置

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP特开2007-239071A 2007.09.20
JP特开平5-1378A 1993.01.08

Also Published As

Publication number Publication date
JP2012526199A (ja) 2012-10-25
KR101119853B1 (ko) 2012-02-28
TW201107507A (en) 2011-03-01
CN102421933A (zh) 2012-04-18
KR20100120941A (ko) 2010-11-17
WO2010128811A2 (fr) 2010-11-11
TWI386500B (zh) 2013-02-21
JP5506917B2 (ja) 2014-05-28
WO2010128811A3 (fr) 2011-03-17

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