CN1101822C - 作为光引发剂的分子复合体化合物 - Google Patents

作为光引发剂的分子复合体化合物 Download PDF

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Publication number
CN1101822C
CN1101822C CN97117698A CN97117698A CN1101822C CN 1101822 C CN1101822 C CN 1101822C CN 97117698 A CN97117698 A CN 97117698A CN 97117698 A CN97117698 A CN 97117698A CN 1101822 C CN1101822 C CN 1101822C
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CN
China
Prior art keywords
phenyl
alkyl
complex compounds
molecular complex
methyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN97117698A
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English (en)
Chinese (zh)
Other versions
CN1175583A (zh
Inventor
D·G·莱帕德
T·L·詹姆斯
N·霍克
M·科勒
R·萨拉希
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Novartis AG
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Ciba Geigy AG
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Publication of CN1175583A publication Critical patent/CN1175583A/zh
Application granted granted Critical
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Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Molecular Biology (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Laminated Bodies (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Printing Methods (AREA)
  • Paper (AREA)
CN97117698A 1996-08-28 1997-08-27 作为光引发剂的分子复合体化合物 Expired - Lifetime CN1101822C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH2115/1996 1996-08-28
CH2115/96 1996-08-28
CH211596 1996-08-28

Publications (2)

Publication Number Publication Date
CN1175583A CN1175583A (zh) 1998-03-11
CN1101822C true CN1101822C (zh) 2003-02-19

Family

ID=4226232

Family Applications (1)

Application Number Title Priority Date Filing Date
CN97117698A Expired - Lifetime CN1101822C (zh) 1996-08-28 1997-08-27 作为光引发剂的分子复合体化合物

Country Status (15)

Country Link
US (1) US5942290A (2)
EP (1) EP0826692B1 (2)
JP (1) JP4200392B2 (2)
KR (1) KR100530088B1 (2)
CN (1) CN1101822C (2)
AT (1) ATE233777T1 (2)
AU (1) AU720186B2 (2)
BR (1) BR9704552A (2)
CA (1) CA2213886C (2)
DE (1) DE59709426D1 (2)
NO (1) NO309145B1 (2)
RU (1) RU2181726C2 (2)
SG (1) SG53043A1 (2)
TW (1) TW401439B (2)
ZA (1) ZA977692B (2)

Families Citing this family (104)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19650562A1 (de) * 1996-12-05 1998-06-10 Basf Ag Photoinitiatorgemische, enthaltend Acylphosphinoxide und Benzophenonderivate
KR20000071215A (ko) * 1997-02-19 2000-11-25 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러 광중합화에 의한 (공)중합체
DE19810745C2 (de) 1998-03-12 2000-05-04 Bayer Ag Flüssige Katalysatorformulierung aus Tetraphenylphosphoniumphenolat und Phenol und deren Verwendung
KR100685153B1 (ko) * 1998-12-03 2007-02-22 시바 스페셜티 케미칼스 홀딩 인크. 광개시제 혼합물, 이를 포함하는 광중합성 조성물 및 이의 용도
SE9904080D0 (sv) * 1998-12-03 1999-11-11 Ciba Sc Holding Ag Fotoinitiatorberedning
US6048375A (en) * 1998-12-16 2000-04-11 Norton Company Coated abrasive
SK286855B6 (sk) * 1999-10-20 2009-06-05 Ciba Specialty Chemicals Holding Inc. Fotoiniciačné prostriedky, spôsob ich prípravy a ich použitie
DE60006210T2 (de) * 1999-12-08 2004-07-15 Ciba Specialty Chemicals Holding Inc. Neues Photoinitiatorsystem aus Phosphinoxidverbindungen und wenig gefärbte härtbare Zusammensetzungen
GB2365430B (en) * 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
JP4597323B2 (ja) * 2000-07-07 2010-12-15 リンテック株式会社 紫外線硬化型粘着剤組成物および紫外線硬化性粘着シート
US6737216B2 (en) * 2000-12-08 2004-05-18 E.I. Du Pont De Nemours And Company Laser engravable flexographic printing element and a method for forming a printing plate from the element
US7300690B2 (en) * 2001-03-29 2007-11-27 General Electric Company Radial tilt reduced media
EP1253155A1 (en) * 2001-04-27 2002-10-30 Ucb S.A. Photo-initiator compositions
EP1397393A1 (en) * 2001-04-27 2004-03-17 Ucb, S.A. Photo-initiator compositions
US6780546B2 (en) 2001-08-30 2004-08-24 Inphase Technologies, Inc. Blue-sensitized holographic media
US6716505B2 (en) * 2001-08-31 2004-04-06 General Electric Company Storage medium for data with improved dimensional stability
TWI312786B (en) * 2001-11-08 2009-08-01 Ciba Sc Holding Ag Novel difunctional photoinitiators
DE10315671A1 (de) * 2003-04-04 2004-10-14 Basf Ag Verfahren zur Herstellung von Acylphosphinoxid-Feststoffen
EP1620500B1 (en) * 2003-05-06 2012-07-11 Basf Se Photo-cured and stabilized coatings
MXPA05012091A (es) * 2003-05-23 2006-02-08 Ciba Sc Holding Ag Recubrimientos superficiales fuertemente adherentes.
ES2660319T3 (es) * 2003-08-29 2018-03-21 Igm Group B.V. Recubrimientos de fibra óptica
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
EP1765878B1 (en) * 2004-04-15 2010-12-08 Basf Se Process for photocuring with light emitting diodes
WO2007018287A1 (ja) * 2005-08-11 2007-02-15 Kyowa Hakko Chemical Co., Ltd. 樹脂組成物
ES2383085T3 (es) * 2006-06-09 2012-06-18 Dentsply International Inc. Composiciones fotopolimerizables caracterizadas por un nuevo acelerador amina para mejorar la estabilidad del color y reducir de este modo el estrés de polimerización
KR100917175B1 (ko) 2006-07-05 2009-09-15 주식회사 엘지화학 신규한 아실포스핀 화합물 및 그의 제조방법
CN101600749B (zh) * 2006-12-11 2012-09-26 陶氏环球技术有限责任公司 源自种子油的醛组合物和醇组合物
EP1944173B1 (en) 2007-01-15 2010-04-21 FUJIFILM Corporation Ink composition and inkjet recording method using the same
EP2108663A4 (en) * 2007-01-17 2012-04-25 Kuraray Medical Inc POLYMERIZABLE POLYMER, POLYMERIZABLE COMPOSITION AND DENTAL MATERIAL
EP1958994B1 (en) 2007-01-31 2010-12-08 FUJIFILM Corporation Ink set for inkjet recording and inkjet recording method
US20080233307A1 (en) * 2007-02-09 2008-09-25 Chisso Corporation Photocurable inkjet ink
CN101663336B (zh) * 2007-03-20 2012-10-10 可乐丽则武齿科株式会社 聚合性单体、聚合性组合物及牙科用材料
JP4601009B2 (ja) 2007-03-30 2010-12-22 富士フイルム株式会社 インクジェット記録用インクセット及びインクジェット記録方法
JP5255369B2 (ja) 2007-09-25 2013-08-07 富士フイルム株式会社 光硬化性コーティング組成物、オーバープリント及びその製造方法
US8076393B2 (en) 2007-09-26 2011-12-13 Fujifilm Corporation Ink composition, inkjet recording method, and printed material
JP5236238B2 (ja) 2007-09-28 2013-07-17 富士フイルム株式会社 インクジェット記録用ホワイトインク組成物
JP5148235B2 (ja) 2007-09-28 2013-02-20 富士フイルム株式会社 インク組成物
US8129447B2 (en) 2007-09-28 2012-03-06 Fujifilm Corporation Ink composition and inkjet recording method using the same
WO2009050116A2 (en) * 2007-10-17 2009-04-23 Basf Se Adhesion promoting photoinitiators for uv cured coatings over metal surfaces
JP5457636B2 (ja) 2008-01-22 2014-04-02 富士フイルム株式会社 光硬化性組成物、光硬化性インク組成物、光硬化物の製造方法、及び、インクジェット記録方法
JP5414367B2 (ja) 2008-06-02 2014-02-12 富士フイルム株式会社 顔料分散物及びそれを用いたインク組成物
JP5465934B2 (ja) * 2008-07-10 2014-04-09 株式会社松風 硬化性の改善された人工爪組成物
US8378002B2 (en) 2008-07-16 2013-02-19 Fujifilm Corporation Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method
JP5344892B2 (ja) 2008-11-27 2013-11-20 富士フイルム株式会社 インクジェット用インク組成物、及びインクジェット記録方法
JP5350827B2 (ja) 2009-02-09 2013-11-27 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP2010229284A (ja) 2009-03-27 2010-10-14 Fujifilm Corp 光硬化性組成物
JP5405174B2 (ja) 2009-03-30 2014-02-05 富士フイルム株式会社 インク組成物
JP5424764B2 (ja) 2009-07-28 2014-02-26 富士フイルム株式会社 顔料分散物、インク組成物、及び、インクジェット記録方法
EP2558427B1 (en) 2010-06-30 2017-05-31 DSM IP Assets B.V. D1492 liquid bapo photoinitiator and its use in radiation curable compositions
JP5750069B2 (ja) 2011-03-24 2015-07-15 富士フイルム株式会社 液晶配向促進剤、液晶組成物、高分子材料およびフィルム
JP5774518B2 (ja) 2011-07-27 2015-09-09 富士フイルム株式会社 化合物、ヘイズ低下剤、液晶組成物、高分子材料およびフィルム
RU2586743C2 (ru) * 2011-08-23 2016-06-10 Зм Инновейтив Пропертиз Компани Стоматологические композиции, содержащие агенты присоединения-фрагментации
CN103073658A (zh) * 2011-10-26 2013-05-01 深圳市有为化学技术有限公司 新型芳香羟基酮和膦酰氧化物的光引发剂混合物及其与光吸收剂的复合体系
EP2854754B1 (en) 2012-06-04 2019-04-24 L'oreal Fast curing cosmetic compositions for tack free surface photocuring of radically polymerizable resins with uv-led
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
CN108383874B (zh) 2012-10-01 2021-10-08 瑞士联邦苏黎世技术大学 用于制备酰基磷烷的方法
JP6494646B2 (ja) * 2013-11-05 2019-04-03 コンストラクション リサーチ アンド テクノロジー ゲーエムベーハーConstruction Research & Technology GmbH 新規の結合剤系
JP6169545B2 (ja) 2014-09-09 2017-07-26 富士フイルム株式会社 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
JP6169548B2 (ja) 2014-09-26 2017-07-26 富士フイルム株式会社 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
JP6086888B2 (ja) 2014-09-26 2017-03-01 富士フイルム株式会社 インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
US9649272B2 (en) 2014-10-13 2017-05-16 L'oréal Latex nail compositions having low amounts of photo-initiator
US9820931B2 (en) 2014-10-13 2017-11-21 L'oreal Latex nail compositions having low amounts of photo-initiator
US9636293B2 (en) 2014-10-13 2017-05-02 L'oréal Latex nail compositions having low amounts of photo-initiator
CN104592298B (zh) * 2014-12-31 2016-07-06 湖北固润科技股份有限公司 一种酰基膦高效光引发剂及其制备方法
KR102698770B1 (ko) 2015-06-08 2024-08-23 스트래터시스,인코포레이티드 부가적 제조용 액체 하이브리드 자외선/가시광선 복사선-경화성 수지 조성물
US9458334B1 (en) * 2015-07-01 2016-10-04 Electronics For Imaging, Inc. Aqueous radiation curable ink composition
WO2017059222A1 (en) 2015-10-01 2017-04-06 Dsm Ip Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
CN106349285B (zh) * 2016-08-29 2018-05-15 天津久日新材料股份有限公司 含羟基酰基膦氧化合物及其制备和应用
WO2018084076A1 (ja) 2016-11-04 2018-05-11 富士フイルム株式会社 ウインドシールドガラス、ヘッドアップディスプレイシステム、およびハーフミラーフィルム
CN110121668B (zh) 2017-02-09 2022-03-04 富士胶片株式会社 半反射镜、半反射镜的制造方法及带图像显示功能的反射镜
RU2684387C2 (ru) * 2017-05-03 2019-04-08 Федеральное государственное бюджетное учреждение науки Байкальский институт природопользования Сибирского отделения Российской академии наук (БИП СО РАН) Фотополимерная композиция для изготовления термостойких объектов методом лазерной стереолитографии
KR102588712B1 (ko) 2017-06-02 2023-10-17 코베스트로 (네덜란드) 비.브이. 광섬유용의 내열성 방사선 경화성 코팅
WO2019050019A1 (ja) 2017-09-07 2019-03-14 富士フイルム株式会社 投映像表示用ハーフミラーフィルム、投映像表示用の合わせガラス、および、画像表示システム
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JP6934101B2 (ja) 2018-02-23 2021-09-08 富士フイルム株式会社 画像表示用合わせガラスの製造方法、画像表示用合わせガラス、および、画像表示システム
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US11964906B2 (en) 2018-08-30 2024-04-23 Covestro (Netherlands) B.V. Radiation curable compositions for coating optical fiber
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US12528889B2 (en) 2019-10-10 2026-01-20 Igm Resins Italia S.R.L. Combination of photoinitiators and uses thereof
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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4710523A (en) * 1979-03-14 1987-12-01 Basf Aktiengesellschaft Photocurable compositions with acylphosphine oxide photoinitiator

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2722264C2 (de) * 1977-05-17 1984-06-28 Merck Patent Gmbh, 6100 Darmstadt Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren
EP0003002B1 (de) * 1977-12-22 1984-06-13 Ciba-Geigy Ag Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone
EP0007508B1 (de) * 1978-07-14 1983-06-01 BASF Aktiengesellschaft Acylphosphinoxidverbindungen, ihre Herstellung und ihre Verwendung
IT1176018B (it) * 1984-04-12 1987-08-12 Lamberti Flli Spa Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione
DE3443221A1 (de) * 1984-11-27 1986-06-05 ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld Bisacylphosphinoxide, ihre herstellung und verwendung
EP0736540A3 (de) * 1989-08-04 1997-06-18 Ciba Geigy Mono- und Diacylphosphinoxide
US5218009A (en) * 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
EP0446175A3 (en) * 1990-03-09 1991-11-21 Ciba-Geigy Ag Mixture of photoinitiators
RU2091385C1 (ru) * 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
TW303379B (2) * 1994-03-02 1997-04-21 Ciba Sc Holding Ag
TW381106B (en) * 1994-09-02 2000-02-01 Ciba Sc Holding Ag Alkoxyphenyl-substituted bisacylphosphine oxides
AU682793B2 (en) * 1994-09-08 1997-10-16 Ciba Specialty Chemicals Holding Inc. Novel acylphosphine oxides
DE19618720A1 (de) * 1995-05-12 1996-11-14 Ciba Geigy Ag Bisacyl-bisphosphine, -oxide und -sulfide
SE520727C2 (sv) * 1996-03-04 2003-08-19 Ciba Sc Holding Ag Alkylfenylbisacylfosfinoxid och fotoinitiatorblandningar

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4710523A (en) * 1979-03-14 1987-12-01 Basf Aktiengesellschaft Photocurable compositions with acylphosphine oxide photoinitiator

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DE59709426D1 (de) 2003-04-10
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SG53043A1 (en) 1998-09-28
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EP0826692A2 (de) 1998-03-04
CN1175583A (zh) 1998-03-11
NO973945D0 (no) 1997-08-27
EP0826692A3 (de) 1999-03-03
EP0826692B1 (de) 2003-03-05
AU3522697A (en) 1998-03-05
TW401439B (en) 2000-08-11
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RU2181726C2 (ru) 2002-04-27
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KR19980019052A (ko) 1998-06-05
ZA977692B (en) 1998-03-02
ATE233777T1 (de) 2003-03-15
US5942290A (en) 1999-08-24

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