SG53043A1 - Molecular complex compounds as photoinitiators - Google Patents
Molecular complex compounds as photoinitiatorsInfo
- Publication number
- SG53043A1 SG53043A1 SG1997002936A SG1997002936A SG53043A1 SG 53043 A1 SG53043 A1 SG 53043A1 SG 1997002936 A SG1997002936 A SG 1997002936A SG 1997002936 A SG1997002936 A SG 1997002936A SG 53043 A1 SG53043 A1 SG 53043A1
- Authority
- SG
- Singapore
- Prior art keywords
- complex compounds
- molecular complex
- photoinitiators
- compound
- photopolymerisation
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title abstract 4
- 239000000203 mixture Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
- C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Molecular Biology (AREA)
- General Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Biochemistry (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Laminated Bodies (AREA)
- Printing Methods (AREA)
- Paper (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH211596 | 1996-08-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG53043A1 true SG53043A1 (en) | 1998-09-28 |
Family
ID=4226232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG1997002936A SG53043A1 (en) | 1996-08-28 | 1997-08-14 | Molecular complex compounds as photoinitiators |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US5942290A (2) |
| EP (1) | EP0826692B1 (2) |
| JP (1) | JP4200392B2 (2) |
| KR (1) | KR100530088B1 (2) |
| CN (1) | CN1101822C (2) |
| AT (1) | ATE233777T1 (2) |
| AU (1) | AU720186B2 (2) |
| BR (1) | BR9704552A (2) |
| CA (1) | CA2213886C (2) |
| DE (1) | DE59709426D1 (2) |
| NO (1) | NO309145B1 (2) |
| RU (1) | RU2181726C2 (2) |
| SG (1) | SG53043A1 (2) |
| TW (1) | TW401439B (2) |
| ZA (1) | ZA977692B (2) |
Families Citing this family (105)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19650562A1 (de) * | 1996-12-05 | 1998-06-10 | Basf Ag | Photoinitiatorgemische, enthaltend Acylphosphinoxide und Benzophenonderivate |
| BR9807702A (pt) * | 1997-02-19 | 2000-05-02 | Ciba Sc Holding Ag | (co) polìmeros por fotopolimerização |
| DE19810745C2 (de) | 1998-03-12 | 2000-05-04 | Bayer Ag | Flüssige Katalysatorformulierung aus Tetraphenylphosphoniumphenolat und Phenol und deren Verwendung |
| KR100685153B1 (ko) * | 1998-12-03 | 2007-02-22 | 시바 스페셜티 케미칼스 홀딩 인크. | 광개시제 혼합물, 이를 포함하는 광중합성 조성물 및 이의 용도 |
| SE9904080D0 (sv) * | 1998-12-03 | 1999-11-11 | Ciba Sc Holding Ag | Fotoinitiatorberedning |
| US6048375A (en) * | 1998-12-16 | 2000-04-11 | Norton Company | Coated abrasive |
| DK1230276T3 (da) | 1999-10-20 | 2006-03-20 | Ciba Sc Holding Ag | Fotoinitiatorformuleringer |
| EP1106627B1 (en) * | 1999-12-08 | 2003-10-29 | Ciba SC Holding AG | Novel phosphine oxide photoinitiator systems and curable compositions with low color |
| GB2365430B (en) * | 2000-06-08 | 2002-08-28 | Ciba Sc Holding Ag | Acylphosphine photoinitiators and intermediates |
| JP4597323B2 (ja) * | 2000-07-07 | 2010-12-15 | リンテック株式会社 | 紫外線硬化型粘着剤組成物および紫外線硬化性粘着シート |
| US6737216B2 (en) * | 2000-12-08 | 2004-05-18 | E.I. Du Pont De Nemours And Company | Laser engravable flexographic printing element and a method for forming a printing plate from the element |
| US7300690B2 (en) * | 2001-03-29 | 2007-11-27 | General Electric Company | Radial tilt reduced media |
| CN1511166A (zh) * | 2001-04-27 | 2004-07-07 | Ucb公司 | 光敏引发剂组合物 |
| EP1253155A1 (en) * | 2001-04-27 | 2002-10-30 | Ucb S.A. | Photo-initiator compositions |
| US6780546B2 (en) * | 2001-08-30 | 2004-08-24 | Inphase Technologies, Inc. | Blue-sensitized holographic media |
| US6716505B2 (en) * | 2001-08-31 | 2004-04-06 | General Electric Company | Storage medium for data with improved dimensional stability |
| TWI312786B (en) * | 2001-11-08 | 2009-08-01 | Ciba Sc Holding Ag | Novel difunctional photoinitiators |
| DE10315671A1 (de) * | 2003-04-04 | 2004-10-14 | Basf Ag | Verfahren zur Herstellung von Acylphosphinoxid-Feststoffen |
| MXPA05011847A (es) * | 2003-05-06 | 2006-01-26 | Ciba Sc Holding Ag | Revestimientos fotocurados y estabilizados. |
| JP5008978B2 (ja) * | 2003-05-23 | 2012-08-22 | チバ ホールディング インコーポレーテッド | 強力接着性表面被覆 |
| ES2660319T3 (es) * | 2003-08-29 | 2018-03-21 | Igm Group B.V. | Recubrimientos de fibra óptica |
| US8076386B2 (en) * | 2004-02-23 | 2011-12-13 | Molecular Imprints, Inc. | Materials for imprint lithography |
| BRPI0509896B1 (pt) * | 2004-04-15 | 2016-07-12 | Ciba Sc Holding Ag | "processo para curar compostos polimerizáveis etilenicamente insaturados para produção de revestimentos,coberturas de gel, compósitos ou adesivos tendo cortes espessos". |
| EP1923406A4 (en) * | 2005-08-11 | 2009-06-24 | Kyowa Hakko Chemical Co Ltd | RESIN COMPOSITION |
| ATE547440T1 (de) | 2006-06-09 | 2012-03-15 | Dentsply Int Inc | Fotopolymerisierbare zusammensetzungen mit neuem aminbeschleuniger für erhöhte farbstabilität und reduzierte polymerisationsspannung dadurch |
| KR100917175B1 (ko) | 2006-07-05 | 2009-09-15 | 주식회사 엘지화학 | 신규한 아실포스핀 화합물 및 그의 제조방법 |
| CN101600749B (zh) * | 2006-12-11 | 2012-09-26 | 陶氏环球技术有限责任公司 | 源自种子油的醛组合物和醇组合物 |
| EP1944173B1 (en) | 2007-01-15 | 2010-04-21 | FUJIFILM Corporation | Ink composition and inkjet recording method using the same |
| US20100048762A1 (en) * | 2007-01-17 | 2010-02-25 | Kuraray Medical Inc. | Composition and dental material |
| EP1958994B1 (en) | 2007-01-31 | 2010-12-08 | FUJIFILM Corporation | Ink set for inkjet recording and inkjet recording method |
| US20080233307A1 (en) * | 2007-02-09 | 2008-09-25 | Chisso Corporation | Photocurable inkjet ink |
| CN101663336B (zh) * | 2007-03-20 | 2012-10-10 | 可乐丽则武齿科株式会社 | 聚合性单体、聚合性组合物及牙科用材料 |
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| EP2053095B2 (en) | 2007-09-28 | 2017-02-22 | FUJIFILM Corporation | Ink composition and inkjet recording method using the same |
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| JP5148235B2 (ja) | 2007-09-28 | 2013-02-20 | 富士フイルム株式会社 | インク組成物 |
| WO2009050116A2 (en) * | 2007-10-17 | 2009-04-23 | Basf Se | Adhesion promoting photoinitiators for uv cured coatings over metal surfaces |
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| WO2013028397A2 (en) * | 2011-08-23 | 2013-02-28 | 3M Innovative Properties Company | Dental compositions comprising addition-fragmentation agents |
| CN103073658A (zh) * | 2011-10-26 | 2013-05-01 | 深圳市有为化学技术有限公司 | 新型芳香羟基酮和膦酰氧化物的光引发剂混合物及其与光吸收剂的复合体系 |
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| DE102012212429A1 (de) | 2012-07-16 | 2014-01-16 | Voco Gmbh | Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials |
| JP6445438B2 (ja) | 2012-10-01 | 2018-12-26 | イーティーエイチ・チューリッヒ | アシルホスファン類の製造方法 |
| ES2642377T3 (es) * | 2013-11-05 | 2017-11-16 | Construction Research & Technology Gmbh | Recubrimientos para uso como adhesivos |
| JP6169545B2 (ja) | 2014-09-09 | 2017-07-26 | 富士フイルム株式会社 | 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物 |
| JP6169548B2 (ja) | 2014-09-26 | 2017-07-26 | 富士フイルム株式会社 | 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物 |
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| US9636293B2 (en) | 2014-10-13 | 2017-05-02 | L'oréal | Latex nail compositions having low amounts of photo-initiator |
| US9820931B2 (en) | 2014-10-13 | 2017-11-21 | L'oreal | Latex nail compositions having low amounts of photo-initiator |
| US9649272B2 (en) | 2014-10-13 | 2017-05-16 | L'oréal | Latex nail compositions having low amounts of photo-initiator |
| CN104592298B (zh) * | 2014-12-31 | 2016-07-06 | 湖北固润科技股份有限公司 | 一种酰基膦高效光引发剂及其制备方法 |
| JP2018517034A (ja) | 2015-06-08 | 2018-06-28 | ディーエスエム アイピー アセッツ ビー.ブイ. | 付加造形用液状ハイブリッドUV/vis線硬化性樹脂組成物 |
| US9458334B1 (en) * | 2015-07-01 | 2016-10-04 | Electronics For Imaging, Inc. | Aqueous radiation curable ink composition |
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| CN106349285B (zh) * | 2016-08-29 | 2018-05-15 | 天津久日新材料股份有限公司 | 含羟基酰基膦氧化合物及其制备和应用 |
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| EP3869245A4 (en) | 2018-10-17 | 2021-12-15 | FUJIFILM Corporation | PROJECTION IMAGE DISPLAY ELEMENT, WINDSHIELD GLASS AND HEADUP DISPLAY SYSTEM |
| US20220017773A1 (en) | 2018-12-03 | 2022-01-20 | Ms Holding B.V. | Filled radiation curable compositions for coating optical fiber and the coatings produced therefrom |
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| CN113498487B (zh) | 2019-03-06 | 2023-07-04 | 富士胶片株式会社 | 投影图像显示用层叠膜、投影图像显示用的夹层玻璃及图像显示系统 |
| US20230220239A1 (en) | 2019-03-18 | 2023-07-13 | Basf Se | Uv curable compositions for dirt pick-up resistance |
| WO2020239563A1 (en) | 2019-05-24 | 2020-12-03 | Dsm Ip Assets B.V. | Radiation curable compositions for coating optical fiber with enhanced high-speed processability |
| US11932571B2 (en) | 2019-05-24 | 2024-03-19 | Covestro (Netherland) B.V. | Radiation curable compositions for coating optical fiber with enhanced high-speed processability |
| CN114207063B (zh) | 2019-07-31 | 2023-07-25 | 科思创(荷兰)有限公司 | 具有多功能长臂低聚物的涂覆光纤用辐射固化组合物 |
| US12252561B2 (en) | 2019-08-30 | 2025-03-18 | Stratasys, Inc. | Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication |
| EP4021957A1 (en) | 2019-08-30 | 2022-07-06 | Covestro (Netherlands) B.V. | Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication |
| EP4036644B1 (en) | 2019-09-27 | 2025-04-23 | FUJIFILM Corporation | Projector for head-up display |
| CN114502601B (zh) | 2019-10-10 | 2024-09-13 | 意大利艾坚蒙树脂有限公司 | 光引发剂的组合及其用途 |
| EP4083668B1 (en) | 2019-12-26 | 2025-10-29 | FUJIFILM Corporation | Light absorption anisotropic layer, laminate, optical film, image display device, back light module |
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| CN115698783A (zh) | 2020-06-03 | 2023-02-03 | 富士胶片株式会社 | 反射膜、夹层玻璃的制造方法及夹层玻璃 |
| WO2022002909A1 (en) | 2020-06-30 | 2022-01-06 | Covestro (Netherlands) B.V. | Viscosity index improvers in optical fiber coatings |
| WO2022123946A1 (ja) | 2020-12-09 | 2022-06-16 | 富士フイルム株式会社 | 反射フィルム、ウインドシールドガラスおよびヘッドアップディスプレイシステム |
| EP4294879A1 (en) | 2021-02-22 | 2023-12-27 | Covestro (Netherlands) B.V. | Process for providing low gloss coatings |
| WO2023054324A1 (ja) | 2021-09-30 | 2023-04-06 | 富士フイルム株式会社 | ヘッドアップディスプレイシステム及び輸送機 |
| US12612534B2 (en) | 2021-10-29 | 2026-04-28 | Covestro (Netherlands) B.V. | Radical-curable composition |
| CN118302708A (zh) | 2021-11-05 | 2024-07-05 | 富士胶片株式会社 | 虚像显示装置、平视显示系统及运输机 |
| JPWO2023200018A1 (2) | 2022-04-15 | 2023-10-19 | ||
| JP2025521371A (ja) | 2022-04-21 | 2025-07-09 | コベストロ (ネザーランズ) ビー.ヴィー. | 光ファイバを被覆するための低揮発性放射線硬化性組成物 |
| EP4532576A1 (en) | 2022-05-25 | 2025-04-09 | Covestro (Netherlands) B.V. | Process for providing low gloss coatings |
| EP4577609A1 (en) | 2022-08-24 | 2025-07-02 | Covestro (Netherlands) B.V. | Process for providing low gloss coatings |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2722264C2 (de) * | 1977-05-17 | 1984-06-28 | Merck Patent Gmbh, 6100 Darmstadt | Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren |
| EP0003002B1 (de) * | 1977-12-22 | 1984-06-13 | Ciba-Geigy Ag | Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone |
| DE2909994A1 (de) * | 1979-03-14 | 1980-10-02 | Basf Ag | Acylphosphinoxidverbindungen, ihre herstellung und verwendung |
| EP0007508B1 (de) * | 1978-07-14 | 1983-06-01 | BASF Aktiengesellschaft | Acylphosphinoxidverbindungen, ihre Herstellung und ihre Verwendung |
| IT1176018B (it) * | 1984-04-12 | 1987-08-12 | Lamberti Flli Spa | Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione |
| DE3443221A1 (de) * | 1984-11-27 | 1986-06-05 | ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld | Bisacylphosphinoxide, ihre herstellung und verwendung |
| ES2098260T3 (es) * | 1989-08-04 | 1997-05-01 | Ciba Geigy Ag | Oxidos de mono- y diacilfosfina. |
| US5218009A (en) * | 1989-08-04 | 1993-06-08 | Ciba-Geigy Corporation | Mono- and di-acylphosphine oxides |
| EP0446175A3 (en) * | 1990-03-09 | 1991-11-21 | Ciba-Geigy Ag | Mixture of photoinitiators |
| RU2091385C1 (ru) * | 1991-09-23 | 1997-09-27 | Циба-Гейги АГ | Бисацилфосфиноксиды, состав и способ нанесения покрытий |
| TW303379B (2) * | 1994-03-02 | 1997-04-21 | Ciba Sc Holding Ag | |
| TW381106B (en) * | 1994-09-02 | 2000-02-01 | Ciba Sc Holding Ag | Alkoxyphenyl-substituted bisacylphosphine oxides |
| CA2197787A1 (en) * | 1994-09-08 | 1996-03-14 | David George Leppard | Novel acylphosphine oxides |
| DE19618720A1 (de) * | 1995-05-12 | 1996-11-14 | Ciba Geigy Ag | Bisacyl-bisphosphine, -oxide und -sulfide |
| CH691970A5 (de) * | 1996-03-04 | 2001-12-14 | Ciba Sc Holding Ag | Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen. |
-
1997
- 1997-08-14 SG SG1997002936A patent/SG53043A1/en unknown
- 1997-08-19 DE DE59709426T patent/DE59709426D1/de not_active Expired - Lifetime
- 1997-08-19 AT AT97810582T patent/ATE233777T1/de not_active IP Right Cessation
- 1997-08-19 EP EP97810582A patent/EP0826692B1/de not_active Expired - Lifetime
- 1997-08-21 US US08/915,776 patent/US5942290A/en not_active Expired - Lifetime
- 1997-08-22 AU AU35226/97A patent/AU720186B2/en not_active Ceased
- 1997-08-25 RU RU97114452/04A patent/RU2181726C2/ru not_active IP Right Cessation
- 1997-08-26 TW TW086112227A patent/TW401439B/zh active
- 1997-08-26 JP JP24467497A patent/JP4200392B2/ja not_active Expired - Lifetime
- 1997-08-26 CA CA002213886A patent/CA2213886C/en not_active Expired - Fee Related
- 1997-08-27 KR KR1019970041366A patent/KR100530088B1/ko not_active Expired - Fee Related
- 1997-08-27 NO NO973945A patent/NO309145B1/no not_active IP Right Cessation
- 1997-08-27 CN CN97117698A patent/CN1101822C/zh not_active Expired - Lifetime
- 1997-08-27 ZA ZA9707692A patent/ZA977692B/xx unknown
- 1997-08-28 BR BR9704552A patent/BR9704552A/pt not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CA2213886C (en) | 2005-12-06 |
| US5942290A (en) | 1999-08-24 |
| ZA977692B (en) | 1998-03-02 |
| BR9704552A (pt) | 1998-09-01 |
| CN1101822C (zh) | 2003-02-19 |
| RU2181726C2 (ru) | 2002-04-27 |
| JPH1095788A (ja) | 1998-04-14 |
| EP0826692B1 (de) | 2003-03-05 |
| CA2213886A1 (en) | 1998-02-28 |
| NO973945D0 (no) | 1997-08-27 |
| AU3522697A (en) | 1998-03-05 |
| TW401439B (en) | 2000-08-11 |
| AU720186B2 (en) | 2000-05-25 |
| NO309145B1 (no) | 2000-12-18 |
| JP4200392B2 (ja) | 2008-12-24 |
| EP0826692A2 (de) | 1998-03-04 |
| ATE233777T1 (de) | 2003-03-15 |
| CN1175583A (zh) | 1998-03-11 |
| EP0826692A3 (de) | 1999-03-03 |
| DE59709426D1 (de) | 2003-04-10 |
| KR19980019052A (ko) | 1998-06-05 |
| MX9706542A (es) | 1998-07-31 |
| NO973945L (no) | 1998-03-02 |
| KR100530088B1 (ko) | 2006-04-06 |
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