CN110609455A - 聚四氟乙烯颗粒、组合物、层状材料、电子照相感光体、处理盒和图像形成装置 - Google Patents
聚四氟乙烯颗粒、组合物、层状材料、电子照相感光体、处理盒和图像形成装置 Download PDFInfo
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- CN110609455A CN110609455A CN201811274599.2A CN201811274599A CN110609455A CN 110609455 A CN110609455 A CN 110609455A CN 201811274599 A CN201811274599 A CN 201811274599A CN 110609455 A CN110609455 A CN 110609455A
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- Prior art keywords
- dispersant
- particles
- layer
- electrophotographic photoreceptor
- polytetrafluoroethylene particles
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0503—Inert supplements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
- G03G21/16—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements
- G03G21/18—Mechanical means for facilitating the maintenance of the apparatus, e.g. modular arrangements using a processing cartridge, whereby the process cartridge comprises at least two image processing means in a single unit
- G03G21/1839—Means for handling the process cartridge in the apparatus body
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/043—Photoconductive layers characterised by having two or more layers or characterised by their composite structure
- G03G5/047—Photoconductive layers characterised by having two or more layers or characterised by their composite structure characterised by the charge-generation layers or charge transport layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0532—Macromolecular bonding materials obtained by reactions only involving carbon-to-carbon unsatured bonds
- G03G5/0535—Polyolefins; Polystyrenes; Waxes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0532—Macromolecular bonding materials obtained by reactions only involving carbon-to-carbon unsatured bonds
- G03G5/0539—Halogenated polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0557—Macromolecular bonding materials obtained otherwise than by reactions only involving carbon-to-carbon unsatured bonds
- G03G5/0564—Polycarbonates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0596—Macromolecular compounds characterised by their physical properties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14708—Cover layers comprising organic material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14708—Cover layers comprising organic material
- G03G5/14713—Macromolecular material
- G03G5/14717—Macromolecular material obtained by reactions only involving carbon-to-carbon unsaturated bonds
- G03G5/14721—Polyolefins; Polystyrenes; Waxes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14708—Cover layers comprising organic material
- G03G5/14713—Macromolecular material
- G03G5/14717—Macromolecular material obtained by reactions only involving carbon-to-carbon unsaturated bonds
- G03G5/14726—Halogenated polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14708—Cover layers comprising organic material
- G03G5/14713—Macromolecular material
- G03G5/14791—Macromolecular compounds characterised by their structure, e.g. block polymers, reticulated polymers, or by their chemical properties, e.g. by molecular weight or acidity
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Photoreceptors In Electrophotography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018-114576 | 2018-06-15 | ||
| JP2018114576 | 2018-06-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110609455A true CN110609455A (zh) | 2019-12-24 |
Family
ID=64267425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811274599.2A Pending CN110609455A (zh) | 2018-06-15 | 2018-10-30 | 聚四氟乙烯颗粒、组合物、层状材料、电子照相感光体、处理盒和图像形成装置 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP3582012A1 (fr) |
| JP (1) | JP7392299B2 (fr) |
| CN (1) | CN110609455A (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN121372027A (zh) * | 2025-12-23 | 2026-01-23 | 自然资源部天津海水淡化与综合利用研究所 | 一种聚四氟乙烯微孔分离膜亲水改性方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7236004B2 (ja) * | 2019-04-26 | 2023-03-09 | ダイキン工業株式会社 | フルオロポリマー水性分散液の製造方法及びフルオロポリマー水性分散液 |
| JP2024047413A (ja) | 2022-09-26 | 2024-04-05 | 富士フイルムビジネスイノベーション株式会社 | 画像形成装置、及びプロセスカートリッジ |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1816570A (zh) * | 2003-07-03 | 2006-08-09 | 大金工业株式会社 | 处理对象物的精制方法及凝聚体的制造方法 |
| JP2009001894A (ja) * | 2007-06-22 | 2009-01-08 | Okuma Engineering:Kk | 樹脂表面上への透明dlc膜の形成方法 |
| CN103365126A (zh) * | 2012-03-26 | 2013-10-23 | 富士施乐株式会社 | 电子照相感光体、图像形成装置和处理盒 |
| CN103365130A (zh) * | 2012-03-26 | 2013-10-23 | 富士施乐株式会社 | 电子照相感光体、图像形成设备和处理盒 |
| CN105367692A (zh) * | 2015-12-07 | 2016-03-02 | 上海三爱富新材料股份有限公司 | 低分子量聚四氟乙烯树脂的制备方法 |
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| JP3123185B2 (ja) | 1991-04-22 | 2001-01-09 | 富士ゼロックス株式会社 | クロロガリウムフタロシアニンの新規な結晶、その新規な結晶よりなる光導電材料及びそれを用いた電子写真感光体 |
| JPH04189873A (ja) | 1990-11-22 | 1992-07-08 | Fuji Xerox Co Ltd | オキシチタニウムフタロシアニン水和物結晶及びそれを用いた電子写真感光体 |
| JP3166293B2 (ja) | 1991-04-26 | 2001-05-14 | 富士ゼロックス株式会社 | ヒドロキシガリウムフタロシアニンの新規な結晶、その新規な結晶よりなる光導電材料およびそれを用いた電子写真感光体 |
| JP3092270B2 (ja) | 1991-11-15 | 2000-09-25 | 富士ゼロックス株式会社 | 新規なジクロロスズフタロシアニン結晶の製造方法及びその結晶を用いた電子写真感光体 |
| JP3123184B2 (ja) | 1991-09-27 | 2001-01-09 | 富士ゼロックス株式会社 | ジクロロスズフタロシアニンの新規な結晶とその製造方法、およびそれを用いた電子写真感光体 |
| JP3166283B2 (ja) | 1992-03-31 | 2001-05-14 | 富士ゼロックス株式会社 | ヒドロキシガリウムフタロシアニンの新規な結晶の製造方法 |
| SG67293A1 (en) | 1992-11-13 | 1999-09-21 | Daikin Ind Ltd | Nonaqueous emulsified surface treatment composition |
| JP2894257B2 (ja) | 1994-10-24 | 1999-05-24 | 富士ゼロックス株式会社 | 新規電荷輸送性ポリマー、その製造法およびそれを用いた有機電子デバイス |
| JP2865029B2 (ja) | 1994-10-24 | 1999-03-08 | 富士ゼロックス株式会社 | 電荷輸送性ポリエステルを用いた有機電子デバイス |
| US6337166B1 (en) * | 2000-11-15 | 2002-01-08 | Xerox Corporation | Wear resistant charge transport layer with enhanced toner transfer efficiency, containing polytetrafluoroethylene particles |
| JP4172286B2 (ja) | 2002-06-19 | 2008-10-29 | 三菱化学株式会社 | 電子写真感光体及びそれを用いた画像形成方法 |
| US7276318B2 (en) | 2003-11-26 | 2007-10-02 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member, and electrophotographic apparatus and process cartridge which make use of the same |
| ITMI20051397A1 (it) * | 2005-07-21 | 2007-01-22 | Solvay Solexis Spa | Polveri fini di fluoropolimeri |
| US20070292794A1 (en) * | 2006-06-16 | 2007-12-20 | Xerox Corporation | Imaging members and method for stabilizing a charge transport layer of an imaging member |
| KR101189027B1 (ko) | 2006-10-31 | 2012-10-08 | 캐논 가부시끼가이샤 | 전자 사진 감광체, 전자 사진 감광체의 제조 방법, 공정 카트리지 및 전자 사진 장치 |
| WO2009001894A1 (fr) * | 2007-06-28 | 2008-12-31 | Daikin Industries, Ltd. | Solution aqueuse de dispersion de polytétrafluoroéthylène et procédé pour la production de celle-ci |
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| JP5509987B2 (ja) * | 2010-03-26 | 2014-06-04 | 富士ゼロックス株式会社 | 電子写真感光体、プロセスカートリッジ及び画像形成装置 |
| JP5672027B2 (ja) | 2011-01-28 | 2015-02-18 | 富士ゼロックス株式会社 | 電子写真感光体、画像形成装置およびプロセスカートリッジ |
| JP5732928B2 (ja) * | 2011-03-09 | 2015-06-10 | 富士ゼロックス株式会社 | 含フッ素樹脂粒子分散液、含フッ素樹脂粒子分散液の製造方法、含フッ素樹脂粒子含有塗布液、含フッ素樹脂粒子含有被覆膜の製造方法、含フッ素樹脂粒子含有被覆膜および成形体 |
| JP5861520B2 (ja) * | 2012-03-19 | 2016-02-16 | 富士ゼロックス株式会社 | 電子写真感光体、画像形成装置、及びプロセスカートリッジ |
| JP6303562B2 (ja) * | 2014-02-10 | 2018-04-04 | 富士ゼロックス株式会社 | 画像形成装置及びプロセスカートリッジ |
| JP6491947B2 (ja) * | 2015-05-08 | 2019-03-27 | 三菱鉛筆株式会社 | フッ素系樹脂含有ポリイミド前駆体溶液組成物、それを用いたポリイミド、ポリイミドフィルム、およびそれらの製造方法 |
| JP6436058B2 (ja) | 2015-11-05 | 2018-12-12 | 京セラドキュメントソリューションズ株式会社 | 電子写真感光体、プロセスカートリッジ及び画像形成装置 |
| EP3388472B1 (fr) * | 2016-08-04 | 2020-06-24 | Daikin Industries, Ltd. | Procédé de fabrication de polytétrafluoroéthylène de faible masse moléculaire |
| CN113563613A (zh) * | 2016-08-04 | 2021-10-29 | 大金工业株式会社 | 低分子量聚四氟乙烯的制造方法 |
-
2018
- 2018-10-19 EP EP18201417.5A patent/EP3582012A1/fr active Pending
- 2018-10-30 CN CN201811274599.2A patent/CN110609455A/zh active Pending
-
2019
- 2019-06-14 JP JP2019111335A patent/JP7392299B2/ja active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1816570A (zh) * | 2003-07-03 | 2006-08-09 | 大金工业株式会社 | 处理对象物的精制方法及凝聚体的制造方法 |
| JP2009001894A (ja) * | 2007-06-22 | 2009-01-08 | Okuma Engineering:Kk | 樹脂表面上への透明dlc膜の形成方法 |
| CN103365126A (zh) * | 2012-03-26 | 2013-10-23 | 富士施乐株式会社 | 电子照相感光体、图像形成装置和处理盒 |
| CN103365130A (zh) * | 2012-03-26 | 2013-10-23 | 富士施乐株式会社 | 电子照相感光体、图像形成设备和处理盒 |
| CN105367692A (zh) * | 2015-12-07 | 2016-03-02 | 上海三爱富新材料股份有限公司 | 低分子量聚四氟乙烯树脂的制备方法 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN121372027A (zh) * | 2025-12-23 | 2026-01-23 | 自然资源部天津海水淡化与综合利用研究所 | 一种聚四氟乙烯微孔分离膜亲水改性方法 |
| CN121372027B (zh) * | 2025-12-23 | 2026-03-10 | 自然资源部天津海水淡化与综合利用研究所 | 一种聚四氟乙烯微孔分离膜亲水改性方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7392299B2 (ja) | 2023-12-06 |
| JP2019218539A (ja) | 2019-12-26 |
| EP3582012A1 (fr) | 2019-12-18 |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| CB02 | Change of applicant information |
Address after: Tokyo, Japan Applicant after: Fuji film business innovation Co.,Ltd. Address before: Tokyo, Japan Applicant before: Fuji Xerox Co.,Ltd. |
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Application publication date: 20191224 |
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| RJ01 | Rejection of invention patent application after publication |