CN112334836B - 曝光装置以及高度调整方法 - Google Patents

曝光装置以及高度调整方法 Download PDF

Info

Publication number
CN112334836B
CN112334836B CN201980041745.3A CN201980041745A CN112334836B CN 112334836 B CN112334836 B CN 112334836B CN 201980041745 A CN201980041745 A CN 201980041745A CN 112334836 B CN112334836 B CN 112334836B
Authority
CN
China
Prior art keywords
support portion
sliding surface
unit
side sliding
column
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201980041745.3A
Other languages
English (en)
Chinese (zh)
Other versions
CN112334836A (zh
Inventor
米泽良
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
V Technology Co Ltd
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Publication of CN112334836A publication Critical patent/CN112334836A/zh
Application granted granted Critical
Publication of CN112334836B publication Critical patent/CN112334836B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microwave Amplifiers (AREA)
  • Exposure Control For Cameras (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CN201980041745.3A 2018-06-25 2019-06-19 曝光装置以及高度调整方法 Active CN112334836B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018-120227 2018-06-25
JP2018120227A JP7017239B2 (ja) 2018-06-25 2018-06-25 露光装置および高さ調整方法
PCT/JP2019/024230 WO2020004164A1 (fr) 2018-06-25 2019-06-19 Dispositif d'exposition et procédé d'ajustement de hauteur

Publications (2)

Publication Number Publication Date
CN112334836A CN112334836A (zh) 2021-02-05
CN112334836B true CN112334836B (zh) 2024-03-08

Family

ID=68985411

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201980041745.3A Active CN112334836B (zh) 2018-06-25 2019-06-19 曝光装置以及高度调整方法

Country Status (5)

Country Link
JP (1) JP7017239B2 (fr)
KR (1) KR102716702B1 (fr)
CN (1) CN112334836B (fr)
TW (1) TWI809111B (fr)
WO (1) WO2020004164A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7586731B2 (ja) * 2021-02-25 2024-11-19 株式会社Ｓｃｒｅｅｎホールディングス 描画装置、描画方法およびプログラム
JP7648893B2 (ja) * 2021-05-31 2025-03-19 株式会社ジャノメ 経路教示データ作成装置及びその方法並びにプログラム
WO2023145085A1 (fr) * 2022-01-31 2023-08-03 ファナック株式会社 Structure de support
JP2025037489A (ja) * 2023-09-06 2025-03-18 株式会社Ｓｃｒｅｅｎホールディングス 露光装置

Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006286131A (ja) * 2005-04-04 2006-10-19 Ricoh Co Ltd ワーク回転駆動装置及び光ディスク原盤露光装置
DE102005030304A1 (de) * 2005-06-27 2006-12-28 Xtreme Technologies Gmbh Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung
CN101658976A (zh) * 2008-08-25 2010-03-03 株式会社迪思科 激光加工装置
CN101681008A (zh) * 2007-05-11 2010-03-24 株式会社尼康 光学元件驱动装置、镜筒、曝光装置及器件的制造方法
NL2004527A (en) * 2009-08-25 2011-02-28 Asml Netherlands Bv Optical apparatus, and method of orienting a reflective element.
JP2011119551A (ja) * 2009-12-04 2011-06-16 Nikon Corp 光学部材変形装置、光学系、露光装置、デバイスの製造方法
CN103048851A (zh) * 2011-10-12 2013-04-17 奥林巴斯映像株式会社 操作装置
DE102012201410A1 (de) * 2012-02-01 2013-08-01 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit einer Messvorrichtung zum Vermessen eines optischen Elements
WO2013150790A1 (fr) * 2012-04-04 2013-10-10 株式会社ニコン Dispositif d'exposition, procédé de fabrication d'un écran plat, et procédé pour le dispositif de fabrication
JP2014168030A (ja) * 2012-03-29 2014-09-11 Nsk Technology Co Ltd 露光装置及び露光方法
JP2015070014A (ja) * 2013-09-27 2015-04-13 株式会社ニコン 基板保持方法及び装置、並びに露光方法及び装置
CN106687866A (zh) * 2014-04-17 2017-05-17 株式会社V技术 曝光装置用反射镜单元及曝光装置
WO2017154659A1 (fr) * 2016-03-07 2017-09-14 株式会社ブイ・テクノロジー Dispositif de fabrication de masque
JP2017181579A (ja) * 2016-03-28 2017-10-05 株式会社ブイ・テクノロジー マスク製造装置及びマスク製造装置の制御方法
JP2018031824A (ja) * 2016-08-22 2018-03-01 株式会社ブイ・テクノロジー 露光装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4748335A (en) * 1985-04-19 1988-05-31 Siscan Systems, Inc. Method and aparatus for determining surface profiles
JPH03112123A (ja) * 1989-09-27 1991-05-13 Canon Inc 露光装置
JPH09320943A (ja) 1996-05-31 1997-12-12 Dainippon Screen Mfg Co Ltd 描画装置および自動焦点制御方法
JP4496711B2 (ja) * 2003-03-31 2010-07-07 株式会社ニコン 露光装置及び露光方法
JP4688525B2 (ja) * 2004-09-27 2011-05-25 株式会社 日立ディスプレイズ パターン修正装置および表示装置の製造方法
DE102006008080A1 (de) * 2006-02-22 2007-08-30 Kleo Maschinenbau Ag Belichtungsanlage
US7679849B2 (en) * 2007-06-01 2010-03-16 Stmicroelectronics (Grenoble) Sas Mobile lens unit with detection device
KR101021810B1 (ko) * 2009-01-30 2011-03-18 주식회사 다이아벨 슬라이딩장치 및 이를 갖춘 휴대기기
CN102124390B (zh) 2009-07-31 2013-03-27 香港应用科技研究院有限公司 小型成像装置及其制作方法
US20110053092A1 (en) * 2009-08-20 2011-03-03 Nikon Corporation Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
JP2011242563A (ja) * 2010-05-18 2011-12-01 Hitachi High-Technologies Corp 露光装置、露光装置のランプ位置調整方法、及び表示用パネル基板の製造方法
US8988655B2 (en) * 2010-09-07 2015-03-24 Nikon Corporation Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
NL2010628A (en) * 2012-04-27 2013-10-29 Asml Netherlands Bv Lithographic apparatus comprising an actuator, and method for protecting such actuator.
US9360757B2 (en) * 2013-08-14 2016-06-07 Carbon3D, Inc. Continuous liquid interphase printing
JP2019095662A (ja) * 2017-11-24 2019-06-20 株式会社ブイ・テクノロジー 光学装置の取付構造及び露光装置

Patent Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006286131A (ja) * 2005-04-04 2006-10-19 Ricoh Co Ltd ワーク回転駆動装置及び光ディスク原盤露光装置
DE102005030304A1 (de) * 2005-06-27 2006-12-28 Xtreme Technologies Gmbh Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung
CN101681008A (zh) * 2007-05-11 2010-03-24 株式会社尼康 光学元件驱动装置、镜筒、曝光装置及器件的制造方法
CN101658976A (zh) * 2008-08-25 2010-03-03 株式会社迪思科 激光加工装置
NL2004527A (en) * 2009-08-25 2011-02-28 Asml Netherlands Bv Optical apparatus, and method of orienting a reflective element.
JP2011119551A (ja) * 2009-12-04 2011-06-16 Nikon Corp 光学部材変形装置、光学系、露光装置、デバイスの製造方法
CN103048851A (zh) * 2011-10-12 2013-04-17 奥林巴斯映像株式会社 操作装置
DE102012201410A1 (de) * 2012-02-01 2013-08-01 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit einer Messvorrichtung zum Vermessen eines optischen Elements
JP2014168030A (ja) * 2012-03-29 2014-09-11 Nsk Technology Co Ltd 露光装置及び露光方法
WO2013150790A1 (fr) * 2012-04-04 2013-10-10 株式会社ニコン Dispositif d'exposition, procédé de fabrication d'un écran plat, et procédé pour le dispositif de fabrication
JP2015070014A (ja) * 2013-09-27 2015-04-13 株式会社ニコン 基板保持方法及び装置、並びに露光方法及び装置
CN106687866A (zh) * 2014-04-17 2017-05-17 株式会社V技术 曝光装置用反射镜单元及曝光装置
WO2017154659A1 (fr) * 2016-03-07 2017-09-14 株式会社ブイ・テクノロジー Dispositif de fabrication de masque
JP2017181579A (ja) * 2016-03-28 2017-10-05 株式会社ブイ・テクノロジー マスク製造装置及びマスク製造装置の制御方法
JP2018031824A (ja) * 2016-08-22 2018-03-01 株式会社ブイ・テクノロジー 露光装置

Also Published As

Publication number Publication date
CN112334836A (zh) 2021-02-05
TWI809111B (zh) 2023-07-21
JP2020003533A (ja) 2020-01-09
KR20210023820A (ko) 2021-03-04
JP7017239B2 (ja) 2022-02-08
KR102716702B1 (ko) 2024-10-11
WO2020004164A1 (fr) 2020-01-02
TW202001323A (zh) 2020-01-01

Similar Documents

Publication Publication Date Title
CN112334836B (zh) 曝光装置以及高度调整方法
KR100233614B1 (ko) 경사가능 대물 테이블을 구비한 지지 장치와 그 지지 장치를 구비한 광학 석판 인쇄 장치
TWI610148B (zh) 曝光裝置、曝光方法、以及元件製造方法
KR101108016B1 (ko) 이동가능한 지지체, 위치 제어 시스템, 리소그래피 장치 및교환가능한 대상물의 위치를 제어하는 방법
JP5582165B2 (ja) 測定装置、測定方法及びステージ装置
US20140307246A1 (en) Determining position and curvature information directly from a surface of a patterning device
KR102598555B1 (ko) 광학 장치의 부착 구조 및 노광 장치
NL2010679A (en) Lithographic apparatus and device manufacturing method.
JPH11251409A (ja) 位置決め装置、及び露光装置
JP3919719B2 (ja) アライメントツール、リソグラフィ装置、アライメント方法、デバイス製造方法、およびそれにより製造されたデバイス
JP2006066836A (ja) 光学部材の支持構造、及び露光装置
KR100658572B1 (ko) 위치결정장치 및 그것을 포함하는 노광장치
CN113841089B (zh) 曝光装置及曝光方法
JP2012069656A (ja) 空間光変調器、照明装置及び露光装置、並びにデバイス製造方法
JP2009188012A (ja) 露光装置
JP2006147989A (ja) 計測装置、及び露光装置
JP2011138995A (ja) 面位置検出装置、露光方法及び装置、並びにデバイス製造方法
JP2004311774A (ja) 光学装置、位置検出装置および露光装置
JP2000339705A (ja) 情報記録再生装置

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant