TWI809111B - 曝光裝置及高度調整方法 - Google Patents

曝光裝置及高度調整方法 Download PDF

Info

Publication number: TWI809111B
Authority: TW; Taiwan
Prior art keywords: mentioned; sliding surface; support; unit; column
Prior art date: 2018-06-25

Application number

TW108118015A

Other languages

English (en)

Chinese (zh)

Other versions

TW202001323A (zh

Inventor

米澤良

Original Assignee

日商Ｖ科技股份有限公司

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2018-06-25

Filing date

2019-05-24

Publication date

2023-07-21

2019-05-24 Application filed by 日商Ｖ科技股份有限公司 filed Critical 日商Ｖ科技股份有限公司

2020-01-01 Publication of TW202001323A publication Critical patent/TW202001323A/zh

2023-07-21 Application granted granted Critical

2023-07-21 Publication of TWI809111B publication Critical patent/TWI809111B/zh

Links

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PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
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KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 2
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Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Microwave Amplifiers (AREA)
Exposure Control For Cameras (AREA)
Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

TW108118015A 2018-06-25 2019-05-24 曝光裝置及高度調整方法 TWI809111B (zh)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JPJP2018-120227		2018-06-25
JP2018120227A JP7017239B2 (ja)	2018-06-25	2018-06-25	露光装置および高さ調整方法

Publications (2)

Publication Number	Publication Date
TW202001323A TW202001323A (zh)	2020-01-01
TWI809111B true TWI809111B (zh)	2023-07-21

Family

ID=68985411

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW108118015A TWI809111B (zh)	2018-06-25	2019-05-24	曝光裝置及高度調整方法

Country Status (5)

Country	Link
JP (1)	JP7017239B2 (fr)
KR (1)	KR102716702B1 (fr)
CN (1)	CN112334836B (fr)
TW (1)	TWI809111B (fr)
WO (1)	WO2020004164A1 (fr)

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JP7586731B2 (ja) *	2021-02-25	2024-11-19	株式会社Ｓｃｒｅｅｎホールディングス	描画装置、描画方法およびプログラム
JP7648893B2 (ja) *	2021-05-31	2025-03-19	株式会社ジャノメ	経路教示データ作成装置及びその方法並びにプログラム
WO2023145085A1 (fr) *	2022-01-31	2023-08-03	ファナック株式会社	Structure de support
JP2025037489A (ja) *	2023-09-06	2025-03-18	株式会社Ｓｃｒｅｅｎホールディングス	露光装置

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JP2019095662A (ja) *	2017-11-24	2019-06-20	株式会社ブイ・テクノロジー	光学装置の取付構造及び露光装置

2018
- 2018-06-25 JP JP2018120227A patent/JP7017239B2/ja active Active
2019
- 2019-05-24 TW TW108118015A patent/TWI809111B/zh active
- 2019-06-19 WO PCT/JP2019/024230 patent/WO2020004164A1/fr not_active Ceased
- 2019-06-19 CN CN201980041745.3A patent/CN112334836B/zh active Active
- 2019-06-19 KR KR1020207033454A patent/KR102716702B1/ko active Active

Patent Citations (4)

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WO2007096094A2 (fr) *	2006-02-22	2007-08-30	Kleo Maschinenbau Ag	Installation d'éclairage
TWI587436B (zh) *	2009-08-20	2017-06-11	尼康股份有限公司	物體處理裝置、曝光裝置及曝光方法、以及元件製造方法
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Also Published As

Publication number	Publication date
CN112334836A (zh)	2021-02-05
JP2020003533A (ja)	2020-01-09
KR20210023820A (ko)	2021-03-04
JP7017239B2 (ja)	2022-02-08
KR102716702B1 (ko)	2024-10-11
WO2020004164A1 (fr)	2020-01-02
CN112334836B (zh)	2024-03-08
TW202001323A (zh)	2020-01-01

Publication	Publication Date	Title
TWI809111B (zh)	2023-07-21	曝光裝置及高度調整方法
KR100233614B1 (ko)	1999-12-01	경사가능 대물 테이블을 구비한 지지 장치와 그 지지 장치를 구비한 광학 석판 인쇄 장치
JP4860557B2 (ja)	2012-01-25	共振走査ミラー
JP4782820B2 (ja)	2011-09-28	リソグラフィ装置及びデバイス製造方法
KR20040065287A (ko)	2004-07-21	투영 노광 장치의 결상 장치
JP4112533B2 (ja)	2008-07-02	リソグラフィ投影装置及びデバイス製造方法
KR102598555B1 (ko)	2023-11-03	광학 장치의 부착 구조 및 노광 장치
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CN113841089B (zh)	2024-08-30	曝光装置及曝光方法
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JP4237727B2 (ja)	2009-03-11	リソグラフィ装置及びデバイス製造方法
JP2010102130A (ja)	2010-05-06	露光装置
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JP2013218017A (ja)	2013-10-24	移動体装置、露光装置、デバイス製造方法及びフラットパネルディスプレイの製造方法、並びに移動体システム
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JP2009186558A (ja)	2009-08-20	露光装置及び露光方法