WO2020004164A1 - Dispositif d'exposition et procédé d'ajustement de hauteur - Google Patents

Dispositif d'exposition et procédé d'ajustement de hauteur Download PDF

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Publication number
WO2020004164A1
WO2020004164A1 PCT/JP2019/024230 JP2019024230W WO2020004164A1 WO 2020004164 A1 WO2020004164 A1 WO 2020004164A1 JP 2019024230 W JP2019024230 W JP 2019024230W WO 2020004164 A1 WO2020004164 A1 WO 2020004164A1
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WIPO (PCT)
Prior art keywords
unit
support portion
support
sliding surface
column
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2019/024230
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English (en)
Japanese (ja)
Inventor
米澤　良
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
V Technology Co Ltd
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Priority to CN201980041745.3A priority Critical patent/CN112334836B/zh
Priority to KR1020207033454A priority patent/KR102716702B1/ko
Publication of WO2020004164A1 publication Critical patent/WO2020004164A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Definitions

  • the present invention relates to an exposure apparatus and a height adjusting method.
  • Patent Literature 1 discloses a drawing apparatus in which a ball screw is engaged with one end of a holding plate, and a drawing head moves vertically within a predetermined range by a servomotor connected to the ball screw. .
  • Patent Literature 1 a ball screw is used for moving the drawing head, so that a random walking error (uneven speed of the female screw member with respect to one rotation of the lead screw) occurs, and the drawing head is accurately moved. There is a problem that you can not do.
  • the present invention has been made in view of such circumstances, and an object of the present invention is to provide an exposure apparatus and a height adjustment method capable of accurately adjusting the height of an optical device that emits light.
  • an exposure apparatus includes, for example, a substrate holding unit on which a substrate is placed, and a substantially bar-shaped support unit formed of a magnetic material, the longitudinal direction of which is substantially horizontal.
  • a frame provided with a support portion provided so as to be provided, and a rod-shaped column provided such that a longitudinal direction thereof is substantially vertical at both ends of the support portion.
  • a moving mechanism having a rack provided on the support portion, a pinion rotatably provided on the column, meshing with the rack, and a rotation drive portion for rotating the pinion; and a moving mechanism provided on the support portion.
  • a permanent electromagnet having a permanent magnet and an electromagnet, and driving the rotation drive unit to move the support unit, and applying a current to the coil of the electromagnet to cause the permanent magnet to attract the support unit.
  • a control unit wherein the permanent electromagnet attracts the support portion to bring the support portion side sliding surface into close contact with the column side sliding surface, and the support portion side sliding surface and the column side sliding surface.
  • the support is fixed to the pillar by frictional force between the support and the surface.
  • the rotation drive section is driven to rotate the pinion, and the support section provided with the rack meshing with the pinion is moved in the height direction.
  • a current is applied to the electromagnet coil of the permanent electromagnet having the permanent magnet and the electromagnet, and the permanent electromagnet attracts the support portion, thereby bringing the support portion side sliding surface and the column side sliding surface into close contact with each other, thereby supporting the electromagnet.
  • the support portion is fixed by a frictional force between the part side sliding surface and the column side sliding surface.
  • the permanent electromagnet is used for attracting the support portion, the energization time is short and the support portion is not deformed or expanded due to heat, so that the height of the optical device can be accurately adjusted.
  • a measuring unit provided on the support unit, a measuring unit having a scale provided substantially along the vertical direction, and a head that reads a value of the scale and outputs position information
  • the permanent electromagnet attracts the support unit with a second attraction force that is weaker than a first attraction force that is an attraction force when the moving mechanism does not move the support unit.
  • the second suction force may be approximately 20% to approximately 30% of the first suction force.
  • the support portion includes a substantially thin plate-shaped guide member provided between the support portion and the optical device, and a drive portion provided on the frame body for vertically moving the optical device.
  • a plate-like portion arranged substantially horizontally, a circular hole penetrating in a substantially vertical direction is formed in the plate-like portion, and the guide member has a substantially disk shape in plan view, and the circular hole
  • the guide member is provided with a mounting hole substantially at the center thereof, the mounting hole is disposed substantially concentrically with the round hole, and the optical device has an optical axis. May be inserted into the mounting hole so as to substantially coincide with the center of the mounting hole and fixed to the guide member. Thereby, the fluctuation of the optical axis when the drive unit moves the optical device in the height direction can be reduced to several nm or less.
  • a moving unit that moves the substrate holding unit in a scanning direction, and a measuring unit that is provided on the support unit and measures a distance to the substrate includes: the control unit, via the moving unit The distance to the substrate is measured via the measurement unit while moving the substrate holding unit in the scanning direction, and a median value is obtained from a maximum value and a minimum value of the distance to the substrate, based on the median value.
  • the driving amount of the driving unit may be obtained by the above. Thereby, even if the height of the substrate changes, the optical device can always be focused on the substrate.
  • the optical device has an AF processing unit having an AF light source that emits downward light and an AF sensor that receives reflected light, and the control unit operates the AF processing unit while operating the AF processing unit.
  • the support unit may be moved, and when the optical device is located at a position where it is determined that the focus is achieved, the support unit side sliding surface and the column side sliding surface may be brought into close contact with each other. Thereby, even if the height of the substrate changes, the optical device can always be focused on the substrate.
  • a height adjusting method includes, for example, a substrate holding portion on which a substrate is placed, and a substantially rod-shaped support portion formed of a magnetic material, the longitudinal direction of which is substantially A frame having a support portion provided so as to be in a horizontal direction, and a rod-shaped pillar provided such that a longitudinal direction is substantially vertical at both ends of the support portion, and the support portion has Is a frame having a supporting part side sliding surface formed thereon, and a column body having a pillar side sliding surface facing the supporting part side sliding surface formed on the column, and a movement for vertically moving the supporting part.
  • a mechanism comprising: a rack provided substantially along the vertical direction on the support portion, a pinion rotatably provided on the column, meshing with the rack, and a rotation driving portion for rotating the pinion.
  • a mechanism, a measurement unit provided on the support unit, and the support unit A height adjusting method for adjusting the height of the supporting portion using an apparatus provided and irradiating the substrate with light, and a device provided on the column and having a permanent magnet and an electromagnet.
  • the height adjustment of the light irradiation unit can be accurately performed.
  • FIG. 1 is a perspective view schematically showing an exposure apparatus 1 according to a first embodiment.
  • FIG. 4 is a schematic diagram illustrating a state where a measurement unit and a laser interferometer measure the position of a mask holding unit. It is the perspective view which shows the outline of the support part 15a of the frame 15, and was seen from the back side (+ x side). It is the perspective view which shows the outline of the support part 15a of the frame 15, and is the figure seen from the front side (-x side). It is a figure which shows the outline when the frame 15 is cut
  • FIG. 7 is a view showing a positional relationship between the guide member 70A and the guide member 70A.
  • FIG. 9 is an exploded perspective view of an attachment structure for attaching the light irradiation unit 30a to a support plate 153.
  • FIG. 4 is a diagram showing a state in which a light irradiation unit 30a is attached to a frame 15;
  • A is a diagram showing a state in which the light irradiation unit 30a has not moved (the center of the stroke), and
  • B is a diagram showing a state in which the light irradiation unit 30a has moved downward (the lower end of the stroke).
  • C is a diagram showing a state in which the light irradiation unit 30a has moved upward (upper stroke).
  • FIG. 2 is a block diagram illustrating an electrical configuration of the exposure apparatus 1.
  • 4 is a flowchart illustrating a flow of a height adjustment process of the exposure apparatus 1. It is an example of the measurement result in step S20.
  • the photosensitive substrate for example, quartz glass having a very low coefficient of thermal expansion (for example, about 5.5 ⁇ 10 ⁇ 7 / K) is used.
  • the photomask generated by the exposure device is, for example, an exposure mask used for manufacturing a substrate for a liquid crystal display device.
  • the photomask is formed by forming one or a plurality of transfer patterns for an image device on a large, substantially rectangular substrate having a side of, for example, more than 1 m (for example, 1400 mm ⁇ 1220 mm).
  • the term “mask M” is used as a concept including the photosensitive substrate before, during, and after processing.
  • the exposure apparatus of the present invention is not limited to a mask manufacturing apparatus.
  • the exposure apparatus of the present invention is a concept including various devices that irradiate light (including laser, UV, polarized light, and the like) while moving a substrate held in a substantially horizontal direction in a scanning direction.
  • the optical device of the present invention is not limited to the light irradiation unit that irradiates light to the photosensitive substrate.
  • FIG. 1 is a perspective view schematically showing an exposure apparatus 1 according to the first embodiment.
  • the exposure apparatus 1 mainly includes a surface plate 11, a plate portion 12, rails 13, 14, a frame 15, a mask holding portion 20, a light irradiation portion 30, a measurement portion 40 (see FIG. 2). , A laser interferometer 50 (see FIG. 2) and a measuring unit 61 (61a, 61d, 61g).
  • FIG. 1 illustration of a part of the configuration is omitted.
  • the exposure apparatus 1 is maintained at a constant temperature by a temperature adjustment unit (not shown) that covers the entire apparatus.
  • the surface plate 11 is a member having a substantially rectangular parallelepiped shape (thick plate shape), and is formed of, for example, a stone (for example, granite) or a low expansion coefficient casting (for example, a nickel-based alloy).
  • the platen 11 has an upper surface 11a that is substantially horizontal (substantially parallel to the xy plane) on the upper side (+ z side).
  • the surface plate 11 is placed on a plurality of vibration isolation tables (not shown) placed on an installation surface (for example, a floor). Thereby, the surface plate 11 is placed on the installation surface via the vibration isolation table. Since the anti-vibration table is already known, a detailed description will be omitted. Note that the vibration isolation table is not essential. On the + x side of the surface plate 11, a loader (not shown) for installing the mask M on the mask holding unit 20 is provided.
  • the rail 13 is an elongated plate-shaped member made of ceramic, and is fixed to the upper surface 11 a of the surface plate 11 so that the longitudinal direction is along the scanning direction (x direction).
  • the three rails 13 have substantially the same height (position in the z direction), and the upper surface is formed with high precision and high flatness.
  • the rail 13 on the loader side (+ x side) has an end disposed at the end of the upper surface 11a, and the rail 13 on the opposite loader side ( ⁇ x side) is disposed inside the end of the upper surface 11a.
  • the plate-shaped part 12 is placed on the rail 13.
  • the plate-shaped portion 12 is a substantially plate-shaped member made of ceramic, and has a substantially rectangular shape as a whole.
  • a guide portion (not shown) is provided on the lower surface (the surface on the ⁇ z side) of the plate portion 12 so that the longitudinal direction is along the x direction. Thereby, the moving direction of the plate-shaped portion 12 is regulated so that the plate-shaped portion 12 does not move in directions other than the x direction.
  • a rail 14 is provided on the upper surface 12a of the plate-shaped portion 12.
  • the rail 14 is fixed so that the longitudinal direction is along the y direction.
  • the rails 14 have substantially the same height, and the upper surface is formed with high precision and high flatness.
  • the mask holding section 20 has a substantially plate shape having a substantially rectangular shape in a plan view, and is formed using a low expansion ceramic having a thermal expansion coefficient of about 0.5 to 1 ⁇ 10 ⁇ 7 / K. Thereby, the deformation of the mask holding unit 20 can be prevented.
  • the mask holding section 20 can also be formed using an ultra-low-expansion glass ceramic having a coefficient of thermal expansion of about 5 ⁇ 10 ⁇ 8 / K. In this case, even if an uncontrollable temperature change occurs, deformation of the mask holding unit 20 can be reliably prevented.
  • the mask holding portion 20 may be formed of a material that expands and contracts in the same manner as the mask M.
  • the mask holder 20 is mounted on the rail 14.
  • the mask holding unit 20 is provided on the upper surface 11a via the plate-like portion 12 and the rails 13 and 14.
  • a guide portion (not shown) is provided on the lower surface of the mask holding portion 20 so that the longitudinal direction is along the y direction. Thereby, the moving direction of the mask holding unit 20, that is, the plate-like unit 12 is restricted so as not to move in directions other than the y direction.
  • the mask holding section 20 (the plate-shaped section 12) is provided so as to be movable in the x direction along the rail 13, and the mask holding section 20 is provided so as to be movable in the y direction along the rail 14.
  • the mask holder 20 has a substantially horizontal upper surface 20a.
  • a mask M (not shown) is placed on the upper surface 20a.
  • bar mirrors 21, 22, and 23 are provided on the upper surface 20a (see FIG. 2).
  • the exposure apparatus 1 has driving units 81 and 82 (not shown) (see FIG. 13).
  • the driving units 81 and 82 are, for example, linear motors.
  • the driving unit 81 moves the mask holding unit 20 (plate-like portion 12) in the x direction along the rail 13, and the driving unit 82 moves the mask holding unit 20 in the y direction along the rail 14.
  • Various known methods can be used as a method in which the driving units 81 and 82 move the plate-shaped unit 12 and the mask holding unit 20.
  • a frame 15 is provided on the surface plate 11.
  • the frame 15 is formed of a magnetic material, for example, a casting having a low expansion coefficient (for example, a nickel-based alloy).
  • the frame 15 has a support portion 15a and two columns 15c that support the support portion 15a at both ends.
  • the frame body 15 holds the light irradiation unit 30 above the mask holding unit 20 (in the + z direction).
  • the light irradiation unit 30 is attached to the support 15a.
  • the frame 15 will be described later in detail.
  • the light irradiation unit 30 irradiates the mask M with light (in this embodiment, laser light).
  • the light irradiation units 30 are provided at regular intervals (for example, approximately every 200 mm) along the y direction. In the present embodiment, there are seven light irradiation units 30a, light, light irradiation unit 30b, light irradiation unit 30c, light irradiation unit 30d, light irradiation unit 30e, light irradiation unit 30f, and light irradiation unit 30g.
  • the moving mechanism 161 moves the entire light irradiation units 30a to 30g in the vertical direction (z direction) within a range of about 10 mm so that the focal positions of the light irradiation units 30a to 30g are aligned with the upper surface of the mask M. Let it.
  • the drive unit 39 (39a (see FIG. 6) to 39g, detailed later) adjusts the light irradiation units 30a to 30g to about 30 ⁇ m (micrometer) for fine adjustment of the focal position of the light irradiation units 30a to 30g. Fine movement in the z direction within the range.
  • the light irradiation unit 30 will be described later in detail.
  • a reading unit (not shown) is provided in each of the light irradiation units 30a to 30g.
  • the reading unit reads a pattern formed on the mask M.
  • the measurement unit 40 (see FIG. 2) is, for example, a linear encoder, and the laser interferometer 50 that measures the position of the mask holding unit 20 has laser interferometers 51 and 52 (not shown in FIG. 1, see FIG. 2). .
  • a laser interferometer 51 is provided on a column provided on the ⁇ y side of the frame 15.
  • a laser interferometer 52 (not shown in FIG. 1) is provided on the + x side surface of the surface plate 11.
  • FIG. 2 is a schematic diagram showing how the measuring unit 40 and the laser interferometer 50 measure the position of the mask holding unit 20.
  • FIG. 2 only a part of the rails 13 and 14 is shown.
  • FIG. 2 only the light irradiation units 30a and 30g are shown, and the light and light irradiation units 30b to 30f are not shown.
  • the measuring section 40 has position measuring sections 41 and 42.
  • the position measuring units 41 and 42 have scales 41a and 42a and detection heads 41b and 42b, respectively.
  • the scale 41a is provided on the + y side end face of the + y side rail 13 and the ⁇ y side end face of the ⁇ y side rail 13.
  • the detection head 41b is provided on the + y-side and -y-side end surfaces of the plate portion 12 (not shown in FIG. 2). In FIG. 2, the illustration of the scale 41a and the detection head 41b on the + y side is omitted.
  • the scale 42a is provided on the + x side end face of the + x side rail 14 and the ⁇ x side end face of the ⁇ x side rail 13.
  • the detection head 42b is provided on the + x side and ⁇ x side end surfaces of the mask holding unit 20. In FIG. 2, illustration of the scale 42a and the detection head 42b on the ⁇ x side is omitted.
  • the scales 41 a and 42 a are, for example, laser hologram scales, and memories are formed at a pitch of 0.512 ⁇ m (nanometer).
  • the detection heads 41b and 42b irradiate light (for example, laser light), acquire the light reflected by the scales 41a and 42a, divide a signal generated thereby by 512 equally to obtain 1 nm, and generate the signal. Divide the signal by 1024 to obtain 0.5 nm. Since the position measuring units 41 and 42 are already known, detailed description will be omitted.
  • the mirror 55a having a reflection surface substantially parallel to the xz plane is provided in the light irradiation unit 30a.
  • the light irradiating unit 30g is provided with mirrors 55b and 55c having reflecting surfaces substantially parallel to the xz plane.
  • the mirrors 55a, 55b, and 55c are provided so that the positions in the x direction do not overlap.
  • a mirror 56a having a reflecting surface substantially parallel to the yz plane is provided in the light irradiation unit 30a.
  • the light irradiation unit 30g is provided with a mirror 56g having a reflection surface substantially parallel to the yz plane.
  • the laser interferometers 51 and 52 emit four laser beams.
  • the laser interferometer 51 has laser interferometers 51a, 51b, and 51c.
  • the laser interferometer 52 has laser interferometers 52a and 52g.
  • the path of the laser beam is indicated by a two-dot chain line.
  • Two of the lights emitted from the laser interferometers 51a, 51b, and 51c are reflected by the bar mirror 23, and the reflected lights are received by the laser interferometers 51a, 51b, and 51c.
  • the remaining two of the lights emitted from the laser interferometer 51a are reflected by the mirror 55a, and the reflected light is received by the laser interferometer 51a.
  • the remaining two of the lights emitted from the laser interferometer 51b are reflected by the mirror 55b, and the reflected light is received by the laser interferometer 51b.
  • the remaining two of the lights emitted from the laser interferometer 51c are reflected by the mirror 55c, and the reflected light is received by the laser interferometer 51c.
  • the laser interferometers 51a to 51c measure the position of the bar mirror 23 with reference to the positions of the mirrors 55a to 55c, respectively, to measure the positional relationship between the light irradiation units 30a and 30g and the mask holding unit 20 in the y direction.
  • Two of the lights emitted from the laser interferometer 52a are reflected by the bar mirror 22, and the reflected light is received by the laser interferometer 52a.
  • Two of the lights emitted from the laser interferometer 52g are reflected by the bar mirror 21, and the reflected light is received by the laser interferometer 52g.
  • the remaining two of the lights emitted from the laser interferometer 52a are reflected by the mirror 56a, and the reflected light is received by the laser interferometer 52a.
  • the remaining two of the lights emitted from the laser interferometer 52g are reflected by the mirror 56g, and the reflected light is received by the laser interferometer 52g.
  • the laser interferometers 52a and 52g measure the positions of the bar mirrors 21 and 22 with reference to the positions of the mirrors 56a and 56g, respectively, to measure the positional relationship between the light irradiation units 30a to 30g and the mask holding unit 20 in the x direction. I do.
  • no mirror is provided in the light irradiation units 30b to 30f, and no laser interferometer for measuring the position of the mirror is provided.
  • the deflection of the optical axis is as small as several nanometers or less (to be described in detail later). This is because it is obtained by interpolation based on the positions of 30a and 30g. As a result, the size of the device can be reduced, and the cost can be reduced.
  • FIGS. 3 and 4 are perspective views schematically showing the support 15 a of the frame 15.
  • FIG. 3 is a view from the back side ( ⁇ x side)
  • FIG. 4 is a view from the front side (+ x side).
  • the support portion 15a and the column 15c are illustrated with a slight distance therebetween for the sake of explanation, but the support portion 15a and the column 15c are actually adjacent to each other.
  • the support portion 15a is substantially rod-shaped with a substantially rectangular cross section, and has a hollow inside.
  • the support portion 15a is arranged so that its longitudinal direction is substantially horizontal (here, the y direction).
  • the pillars 15c are provided at both ends of the support portion 15a.
  • the support portion 15a mainly includes a bottom plate 151, a support plate 153, side plates 152 and 154 provided on both sides of the bottom plate 151 and the support plate 153, and a partition wall 159.
  • the bottom plate 151 and the support plate 153 are disposed substantially horizontally, and the side plates 152 and 154 are disposed substantially vertically.
  • the thickness of the bottom plate 151, the support plate 153, and the side plates 152, 154 is approximately 15 mm to 20 mm, and the length of the bottom plate 151, the support plate 153, and the side plates 152, 154 in the y direction (W1 in FIG. 9). ) Is approximately 2.2 m.
  • Round holes 155a to 155g and 156a to 156g are formed in the bottom plate 151 and the support plate 153 along the y direction, respectively.
  • the circular holes 155a to 155g and 156a to 156g are holes that penetrate the bottom plate 151 and the support plate 153 in a substantially vertical direction, and have a substantially circular shape in plan view. In a plan view, the positions of the centers of the round holes 155a to 155g substantially coincide with the positions of the centers of the round holes 156a to 156g.
  • Guide members 70 and 70A are provided in the round holes 155a to 155g and 156a to 156g so as to cover the round holes 155a to 155g and 156a to 156g, respectively.
  • 30a to 30g are attached.
  • the light irradiation units 30a to 30g are provided on the frame 15 via the guide members 70 and 70A.
  • the attachment structure for attaching the light irradiation units 30a to 30g to the frame 15 will be described later in detail.
  • round holes 157a to 157g are formed adjacent to the round holes 155a to 155g.
  • a lens barrel of a reading unit (not shown) is inserted into the round holes 157a to 157g.
  • the holes 152a to 152i and 154a to 154i are formed in the side plates 152 and 154, respectively.
  • the holes 152a to 152g and 154a to 154g are provided such that the positions in the y direction overlap the round holes 155a to 155g and 156a to 156g, respectively.
  • the holes 152a to 152g and 154a to 154g are used for attaching the reading unit 60 to the round holes 157a to 157g.
  • the holes 152h and 152i are provided on both sides of the holes 152a to 152g, respectively, and the holes 154h and 154i are provided on both sides of the round holes 154a to 154g, respectively.
  • the frame 15 is a casting, and the holes 152a to 152i and 154a to 154i are used as cast holes for discharging casting sand and forming an internal space during casting.
  • a partition wall 159 is provided inside the support portion 15a for reinforcement.
  • the partition wall 159 is a plate-shaped member, and its end surface is in contact with the bottom plate 151, the support plate 153, and the side plates 152 and 154. Accordingly, at the position where the partition wall 159 is provided, the cavity inside the support portion 15a is eliminated, and the vibration and deformation (bending, twisting, etc.) of the support portion 15a are prevented.
  • the frame 15 has a moving mechanism 161 that moves the support 15a in the z direction along the column 15c.
  • the moving mechanism 161 moves the support portion 15a in the range of about 10 mm in the z direction.
  • the moving mechanism 161 of the present embodiment includes a rack 161a provided along the z direction on an end surface substantially orthogonal to the longitudinal direction of the support portion 15a, a pinion 161b rotatably provided on the column 15c, and a pinion 161b. And a rotation drive unit 161f (see FIG. 13) for rotating.
  • the rack 161a is provided substantially at the center of an end surface substantially perpendicular to the longitudinal direction of the support portion 15a, and is fixed to a convex portion 158 projecting outward from a side surface of the support portion 15a using a screw or the like (not shown). .
  • the pinion 161b is rotatably provided on the column 15c, and meshes with the rack 161a.
  • the column 15c is provided with two permanent magnets 163.
  • the two permanent magnets 163 are provided on the column 15c, and are arranged near both ends in the longitudinal direction of the support 15a.
  • the permanent magnet 163 is provided along the side plate 154 adjacent to the end face on which the rack 161a is provided.
  • the permanent electromagnet 163 is a permanent electromagnetic type having a permanent magnet 163a (see FIG. 13) and an electromagnet 163b (see FIG. 13), and supplies a current to the coil of the electromagnet 163b only during magnetization and demagnetization, and is built in.
  • the permanent magnet 163a is turned on and off. Since the low expansion alloy used for the frame 15 is a magnetic material, it can be moved by the permanent magnet 163. Since the permanent electromagnet 163 only needs to be energized for a short time (for example, about 0.2 seconds) during ON-OFF, there is almost no heat generation. Further, the permanent magnet 163 does not change its magnetic force after the permanent magnet is turned on.
  • the permanent magnet 163 has an adjustment dial 163c (see FIG. 13).
  • the adjustment dial 163c adjusts the current flowing through the coil of the electromagnet 163b, and is configured to be able to adjust the current in, for example, 10 steps from 1 to 10.
  • the value of the adjustment dial 163c is "10"
  • the attraction force of the permanent electromagnet 163 to attract the support portion 15a becomes the first attraction force (described in detail later), and the value of the adjustment dial 163c is "2".
  • the attraction force by which the permanent magnet 163 attracts the support portion 15a is the second attraction force ( The details will be described later). Since the current value is proportional to the magnetic flux density and the attractive force, adjusting the adjustment dial 163c changes the magnetic flux density and the attractive force of the permanent magnet 163.
  • the measuring unit 164 is provided on the supporting unit 15a.
  • the measurement unit 164 has a scale 164a (see FIG. 5) provided substantially along the vertical direction, and a detection head 164b (see FIG. 5) that reads the value of the scale 164a and outputs position information.
  • the scale 164a is, for example, a laser hologram scale like the scales 41a and 42a. Like the detection heads 41b and 42b, the detection head 164b irradiates light (for example, laser light), acquires light reflected by the scale 164a, and obtains position information based on a signal generated thereby.
  • the scale 164a is provided on the side plate 152 opposite to the side plate 154.
  • the side plate 152 is provided with a measuring unit 61 (61a, 61d, 61g) for measuring the distance to the mask M.
  • the measurement units 61a, 61d, and 61g are, for example, displacement sensors that detect the height of an object (here, a mask M) based on laser light emitted from the sensors.
  • the measurement section 61a is provided adjacent to the light irradiation section 30a
  • the measurement section 61d is provided adjacent to the light irradiation section 30d
  • the measurement section 61g is provided adjacent to the light irradiation section 30g.
  • FIG. 5 is a view schematically showing the frame 15 cut along the plane C in FIG.
  • the pillar 15c has a convex portion 161c formed thereon.
  • the surface on the + x side of the convex portion 161c is a sliding surface 161d, and is subjected to scraping, which is polishing to reduce frictional resistance.
  • the ⁇ x side surface of the support portion 15a is a sliding surface 161e.
  • the sliding surface 161e is provided at a position facing the sliding surface 161d.
  • the sliding surface 161e is subjected to scraping similarly to the sliding surface 161d.
  • an oil film of about several ⁇ m is formed by lubricating oil accumulated on minute irregularities of the sliding surfaces 161d and 161e.
  • a mineral oil having a low viscosity at room temperature is used as the lubricating oil.
  • the support 15a to which the rack 161a is fixed moves up and down.
  • the moving mechanism 161 moves the support portion 15a up and down, the sliding surface 161d and the sliding surface 161e slide smoothly due to the oil film formed between the sliding surface 161d and the sliding surface 161e.
  • the teeth of the rack 161a are located on the center line c of the support portion 15a in the x direction.
  • the teeth of the rack 161a are located on a line that passes through the center of gravity of the support 15a and is substantially parallel to the z direction. Therefore, no moment is generated when the pinion 161b rotates to move the rack 161a (the support portion 15a) up and down.
  • a sliding surface 161d subjected to scraping is also formed on the column 15c on the side where the rack 161a and the pinion 161b are not provided.
  • a sliding surface 161e (see FIG. 5) on which a scraping process has been performed is formed on the support portion 15a so as to be in contact with the sliding surface.
  • An elastic member 160 is provided at an end of the support portion 15a along the column 15c. 3 and 4, only the elastic member 160 provided at the end on the ⁇ y side is shown, and illustration of the elastic member 160 provided at the end on the + y side is omitted. As shown in FIG. 5, the elastic member 160 is provided below the support portion 15a. A positioning member 162 is provided between the elastic member 160 and the support portion 15a. By inserting the elastic member 160 into the concave portion 162a formed on the bottom surface of the positioning member 162, the position of the elastic member 160 in the xy direction is determined, and the elastic member 160 can expand and contract with the vertical movement of the support portion 15a. Become. Thus, the elastic members 160 provided at both ends of the support 15a support the weight of the support 15a. The supporting portion 15a weighs approximately 660 kg to 700 kg, and the elastic member 160 can support a weight of approximately 600 kg.
  • the weight of the supporting portion 15a that cannot be supported by the elastic member 160 is supported by the frictional force between the sliding surface 161d and the sliding surface 161e.
  • the permanent electromagnet 163 is provided on the column 15c, and attracts the support portion 15a by passing a current through the coil of the electromagnet 163b (see FIG. 13).
  • the support portion 15a that is, the rack 161a and the sliding surface 161e are drawn by the permanent magnet 163 attracting the support portion 15a with the first suction force. 5 and move to the left (see the arrow in FIG. 5), and the sliding surface 161d and the sliding surface 161e come into close contact with each other.
  • the first attractive force is approximately 12000 N
  • the magnetic flux density of the permanent electromagnet 163 when the permanent electromagnet 163 attracts the support 15 a with the first attractive force is approximately 0.3 T (tesla).
  • the surface pressure generated between the sliding surface 161d and the sliding surface 161e when the permanent electromagnet 163 attracts the support portion 15a with the first attractive force is approximately 0.8 MPa.
  • the surface pressure generated between the sliding surface 161d and the sliding surface 161e is increased, and the sliding surface 161d and the sliding surface 161e are brought into close contact with each other (compressed strongly).
  • the oil film formed between the surface 161e and the surface 161e is eliminated. As a result, friction occurs between the sliding surface 161d and the sliding surface 161e.
  • the sliding surface 161d and the sliding surface 161e It supports a weight of 150 kg by the friction between it and. Since there are two sliding surfaces on both sides of the support portion 15a, the weight ta (approximately 60 to 100 kg) of the support portion 15a that cannot be supported by the elastic member 160 can be supported by frictional force. As described above, when the moving mechanism 161 does not move the support 15a up and down, the support 15a is supported so that the position of the support 15a in the height direction (z direction) does not change.
  • the permanent magnet 163 attracts the support portion 15a with a weak force (second attraction force).
  • the attraction force (second attraction force) when the support portion 15a is moved up and down is weaker than the attraction force (first attraction force) when the support portion 15a is not moved up and down.
  • the second suction force is approximately 20% to approximately 30% of the first suction force.
  • the second attractive force is approximately 2400 to approximately 3600 N, and the magnetic flux density of the permanent electromagnet 163 when the permanent electromagnet 163 attracts the support 15 a with the first attractive force is approximately 0.06 to approximately 0.09 T.
  • the surface pressure generated between the sliding surface 161d and the sliding surface 161e when the permanent magnet 163 attracts the support portion 15a with the second attraction force is approximately 0.16 to approximately 0.24 MPa.
  • the supporting portion 15a does not tilt with respect to the column 15c when the supporting portion 15a moves up and down. Due to restrictions on the arrangement position, the permanent magnet 163 and the measuring unit 164 are arranged on the opposite side with the moving mechanism 161 interposed therebetween. However, in the present embodiment, since the supporting unit 15a does not tilt, the measuring unit 164 is moved from the permanent magnet 163. Even if it is at a distant position, the measurement result of the measurement unit 164 is stable, and the support unit 15a can be moved up and down accurately.
  • Tables 1 and 2 are tables showing the torque of the rotation drive unit 161f (here, a motor) when the magnetizing force of the permanent magnet 163 is changed. Tables 1 and 2 show the results of experiments using different motors. Tables 1 and 2 are obtained by driving the rotation driving unit 161f to rotate the pinion 161b to move the support unit 15a in the height direction, and measuring the torque of the rotation driving unit 161f at that time. The value of each cell is torque (N ⁇ m).
  • the attraction force is proportional to the magnetic flux density of the permanent magnet 163, that is, the voltage applied to the permanent magnet 163.
  • the attraction force in Tables 1 and 2 is determined based on the ratio between the voltage applied to the permanent magnet 163 and the voltage applied to the permanent magnet 163 when the magnetic flux density of the permanent magnet 163 is maximized. It should be noted that the adsorption force of 0% indicates a demagnetized state.
  • the torque of the rotary drive unit 161f when the attraction force is 18.5% and 24% is almost the same as the torque of the rotary drive unit 161f in the demagnetized state. That is, if the second suction force is approximately 24% or less of the first suction force, the oil film formed between the sliding surface 161d and the sliding surface 161e is not eliminated, and the sliding surface 161d and the sliding surface are not removed. No friction occurs with the 161e.
  • the torque of the rotary drive 161f when the attraction force is 39% is about twice the torque of the rotary drive 161f in the demagnetized state, and the torque of the rotary drive 161f in the demagnetized state. Is very different.
  • the suction force is 39%, the oil film formed between the sliding surface 161d and the sliding surface 161e is eliminated, and friction occurs between the sliding surface 161d and the sliding surface 161e. You can see that.
  • the second attraction force is not appropriate to set the second attraction force to approximately 39% of the first attraction force from the viewpoint that no friction occurs between the sliding surface 161d and the sliding surface 161e. Is desirably about 30% or less of the first suction force.
  • the second suction force is smaller than approximately 20% of the first suction force
  • the state is changed from the state in which the support portion 15a is sucked by the second suction force to the state in which the support portion 15a is sucked by the first suction force.
  • the measurement result in the measurement unit 164 changes. Accordingly, when the second attraction force is smaller than approximately 20% of the first attraction force, the sliding surface 161d and the sliding surface 161e are not in contact with each other, and when the support portion 15a moves up and down, the column 15c is moved. It can be seen that the support portion 15a is inclined with respect to. From the above, it is desirable that the second attraction force be approximately 20% to approximately 30% of the first attraction force.
  • FIG. 6 is a perspective view of a main part schematically showing the light irradiation unit 30a.
  • the light irradiation section 30a mainly includes a DMD 31a, an objective lens 32a, a light source section 33a, an AF processing section 34a, a cylindrical section 35a, a flange 36a, mounting sections 37a and 38a, and a driving section 39a.
  • the light irradiating units 30b to 30g include DMDs 31b to 31g, objective lenses 32b to 32g, light source units 33b to 33g, AF processing units 34b to 34g, cylindrical units 35b to 35g, and flanges 36b to 30g, respectively.
  • the light irradiating units 30b to 30g have the same configuration as the light irradiating unit 30a, and thus description thereof is omitted.
  • the DMD 31a is a digital mirror device (Digital Mirror Device, DMD), and can emit a planar laser beam.
  • the DMD 31a has a number of movable micromirrors (not shown), and one micromirror irradiates light of one pixel.
  • the micromirrors are approximately 10 ⁇ m in size and are arranged two-dimensionally.
  • the DMD 31a is irradiated with light from a light source unit 33a (described in detail later), and the light is reflected by each micro mirror.
  • the micromirror is rotatable about an axis substantially parallel to its diagonal, and can be switched between ON (reflects light toward the mask M) and OFF (does not reflect light toward the mask M). is there. Since the DMD 31a is already known, a detailed description will be omitted.
  • the objective lens 32a forms an image of the laser beam reflected by each micro mirror of the DMD 31a on the surface of the mask M.
  • light is irradiated from each of the light irradiation units 30a to 30g, and the light forms an image on the mask M, whereby a pattern is drawn on the mask M.
  • the light source unit 33a mainly includes a light source 331, a lens 332, a fly-eye lens 333, lenses 334 and 335, and a mirror 336.
  • the light source 331 is, for example, a laser diode, and light emitted from the light source 331 is guided to the lens 332 via an optical fiber or the like.
  • the light is guided from the lens 332 to the fly-eye lens 333.
  • the fly-eye lens 333 is a two-dimensional arrangement of a plurality of lenses (not shown), and the fly-eye lens 333 forms a large number of point light sources.
  • the light that has passed through the fly-eye lens 333 becomes parallel light through lenses 334 and 335 (for example, condenser lenses), and is reflected by the mirror 336 toward the DMD 31a.
  • the AF processing unit 34a focuses light irradiated on the mask M to the mask M, and mainly includes an AF light source 341, a collimator lens 342, an AF cylindrical lens 343, pentaprisms 344 and 345, It has a lens 346 and AF sensors 347 and 348.
  • the light emitted from the AF light source 341 becomes parallel light by the collimator lens 342, becomes linear light by the AF cylindrical lens 343, is reflected by the pentaprism 344, and forms an image on the surface of the mask M.
  • the light reflected by the mask M is reflected by the pentaprism 345, collected by the lens 346, and made incident on the AF sensors 347 and 348.
  • the pentaprisms 344 and 345 bend light at a bending angle of about 97 degrees.
  • a mirror may be used instead of the pentaprisms 344 and 345, but it is preferable to use a pentaprism because defocusing occurs due to a misalignment of the mirror.
  • the AF processing unit 34a performs an autofocus process for obtaining a focus position based on the results received by the AF sensors 347 and 348. It should be noted that such an auto-focusing process using an optical lever is already known, and a detailed description thereof will be omitted.
  • the light irradiation unit 30a has a substantially cylindrical tubular portion 35a in which an optical system (including the objective lens 32a) is provided.
  • a flange 36a is provided at an upper end of the cylindrical portion 35a.
  • the flange 36a holds the lens 332, the fly-eye lens 333, and the lenses 334, 335 on the upper side. Therefore, the center of gravity of the light irradiation unit 30a is shifted leftward in FIG. 6 from the optical axis ax.
  • Mounting portions 37a and 38a are provided on the cylindrical portion 35a.
  • the attachment portions 37a and 38a are used for attachment to the frame body 15.
  • the mounting portion 37a is provided near the flange 36a, and the mounting portion 38a is provided near the lower end of the tubular portion 35a.
  • a hollow portion 372 having a diameter larger than the outer diameter of the mounting portion 38a is formed in the mounting portion 37a. Thereby, the cylindrical portion 35a can be pulled out upward.
  • screw holes 371 and 381 (described later in detail) formed in the mounting portions 37a and 38a are omitted.
  • FIG. 7 is a side view schematically showing the driving section 39a.
  • the driving section 39a mainly includes a piezoelectric element 391 and a connecting section 392.
  • the piezoelectric element 391 is a solid actuator (piezo element) that is displaced by applying a voltage.
  • a portion of the piezoelectric element 391 that is not displaced is provided on the support portion 15a of the frame 15 via the attachment portion 395 (see FIG. 11).
  • the piezoelectric element 391 When a voltage is applied to the piezoelectric element 391, the piezoelectric element 391 expands, and the upper end of the piezoelectric element 391 moves upward.
  • the dotted line in FIG. 7 shows a state where the piezoelectric element 391 is contracted, and the solid line in FIG. 7 shows a state where the piezoelectric element 391 is extended.
  • the connecting portion 392 is a substantially columnar member whose lower end is screwed to the piezoelectric element 391.
  • the connecting portion 392 moves up and down as the piezoelectric element 391 expands and contracts.
  • a convex portion 393 having an arc-shaped tip is provided at the upper end of the connecting portion 392.
  • the tip of the convex portion 393 contacts the lower side of the mounting portion 37a (see FIG. 6). Therefore, when the piezoelectric element 391 expands, the light irradiation unit 30a moves in the + z direction, and when the piezoelectric element 391 contracts, the light irradiation unit 30a moves in the -z direction.
  • a plurality of grooves 394 are formed on the side surface of the connecting portion 392.
  • the groove 394 is formed so as to cut obliquely downward as it approaches the central axis. Therefore, even if the piezoelectric element 391 is bent and expanded (see the two-dot chain line in FIG. 7), the connecting portion 392 is deformed at the groove 394, and the convex portion 393 is moved only in the vertical direction without moving in the horizontal direction. Can be.
  • the guide members 70 are attached to the bottom plate 151, the guide members 70A are attached to the support plates 153, and the light irradiation units 30a to 30g are attached to the guide members 70, 70A.
  • 30 g is attached to the frame 15. That is, the guide members 70 and 70A are provided between the light irradiation unit 30a and the frame 15 (here, the support plate 153).
  • the guide members 70 and 70A are substantially thin plate-shaped members provided between the support 15a (the bottom plate 151 and the support plate 153) and the light irradiation unit 30.
  • FIG. 8A is a diagram schematically illustrating the guide member 70
  • FIG. 8B is a diagram schematically illustrating the guide member 70A.
  • the guide member 70 and the guide member 70A have different diameters.
  • the guide members 70 and 70A have a substantially thin plate shape and a substantially disc shape in plan view.
  • the guide members 70 and 70A are formed of a metal having a thickness of about 0.5 to 1 mm.
  • the guide member 70 is approximately 0.5 mm
  • the guide member 70A is approximately 1 mm.
  • the metal stainless steel, phosphor bronze, or the like can be used, and it is preferable to use more homogeneous phosphor bronze.
  • approximately 0.5 to 1 mm includes an error of approximately 0.5 mm or less with respect to approximately 0.5 to 1 mm.
  • ⁇ ⁇ Attachment holes 74, 74A are formed substantially at the center of the guide members 70, 70A.
  • a plurality of holes 77 are formed along the outer circumference of the guide members 70 and 70A, and a plurality of holes 78 are formed along the mounting holes 74 and 74A.
  • a plurality of cutout holes 79A and 79B each having a substantially arc shape are formed in the guide member 70 so that the guide member 70 is easily deformed.
  • the cutout holes 79A and 79B are respectively arranged at equal intervals along the circumferential direction.
  • the radius of the cutout hole 79A is smaller than the radius of the cutout hole 79B, and the cutout hole 79B is arranged outside the cutout hole 79A.
  • the end region 79Aa including the end of the cutout hole 79A and the end region 79Ba including the end of the cutout hole 79B have substantially the same circumferential position.
  • the end regions 79Aa and 79Ba exist at both ends of the cutout holes 79A and 79B, respectively.
  • a plurality of substantially arc-shaped cutout holes 79C and 79D are formed in the guide member 70A so that the guide member 70A is easily deformed.
  • the cutout holes 79C and 79D are respectively arranged at equal intervals along the circumferential direction.
  • the radius of the cutout hole 79C is smaller than the radius of the cutout hole 79D, and the cutout hole 79D is arranged outside the cutout hole 79C.
  • the end region 79Ca including the end of the cutout hole 79C and the end region 79Da including the end of the cutout hole 79D substantially coincide with each other in the circumferential direction.
  • the end regions 79Ca and 79Da are located at both ends of the cutout holes 79C and 79D, respectively.
  • the number of the cutout holes 79A, 79B, 79C, and 79D is four, but the positions and the number of the cutout holes 79A, 79B, 79C, and 79D are not limited to this.
  • Circumferential positions of the end region 79Aa and the end region 79Ba substantially coincide with each other, and the overlapping positions are arranged uniformly (for example, approximately every 45 degrees) in the circumferential direction.
  • the circumferential positions of the end region 79Ca and the end region 79Da substantially coincide with each other, and the overlapping positions are arranged evenly in the circumferential direction (for example, approximately every 45 degrees). Therefore, when a line extending radially from the center point of the guide members 70, 70A is drawn, the line always passes through at least one of the cutout holes 79A to 79D. Therefore, the amount of deformation of the guide members 70, 70A is substantially constant irrespective of the location in the circumferential direction.
  • the guide members 70, 70A can be adjusted in accordance with the vertical movement of the cylindrical portion 35a of approximately 30 ⁇ m.
  • the members 70 and 70A expand and contract.
  • FIG. 9A shows a positional relationship between the bottom plate 151 and the guide member 70 when the guide member 70 is attached to the bottom plate 151
  • FIG. 9B shows a support plate when the guide member 70A is attached to the support plate 153
  • 15 shows a positional relationship between the motor 153 and the guide member 70A.
  • Seven guide members 70 are provided on the bottom plate 151 so as to cover the round holes 155a to 155g.
  • Seven guide members 70A are provided on the support plate 153 so as to cover the round holes 156a to 156g.
  • the mounting holes 74 and 74A are arranged substantially concentrically with the round holes 155a to 155g and 156a to 156g.
  • the guide member 70 and the round holes 155a to 155g are evenly arranged in the center of the bottom plate 151, and the guide member 70A and the round holes 156a to 156g are evenly arranged in the center of the support plate 153.
  • the interval between the adjacent round holes 155a to 155g (ie, the guide member 70) and the interval W2 between the adjacent round holes 156a to 156g (ie, the guide member 70A) are substantially the same as the interval between the light irradiation units 30a to 30g.
  • the cylindrical members 35 of the light irradiation unit 30a are provided on the guide members 70 and 70A provided in the round holes 155a and 156a.
  • the guide members 70 and 70A provided in the round holes 155b and 156b are provided with light and a light irradiation unit 30b.
  • light irradiation sections 30c to 30g are provided in the guide members 70 and 70A provided in the round holes 155c to 155g and 156c to 156g, respectively.
  • the round hole 155a and the round hole 156a are formed such that their positions in plan view overlap.
  • the round holes 155b to 155g and the round holes 156b to 156g are formed such that their positions in plan view overlap.
  • FIG. 10 is an exploded perspective view of an attachment structure for attaching the light irradiation unit 30a to the support plate 153.
  • the mounting structure for mounting the light irradiation units 30b to 30g to the bottom plate 151 and the mounting structure for mounting the light irradiation units 30b to 30g to the support plate 153 are the same as the mounting structure for mounting the light irradiation unit 30a to the bottom plate 151. The description is omitted.
  • the guide member 70A is provided on the support plate 153 so as to cover the round hole 156a.
  • the guide member 70A is fixed to the support plate 153 by inserting the screw 85 into the hole 77 and screwing the screw 85 into the screw hole 156h formed in the support plate 153.
  • the light irradiation section 30a (that is, the cylindrical section 35a) is provided on the guide member 70A via the mounting section 37a.
  • the guide member 70A is fixed to the mounting portion 37a by inserting the screw 86 into the hole 78 and screwing the screw 86 into the screw hole 371.
  • the light irradiation section 30a is inserted into the mounting hole 74A so that the optical axis substantially coincides with the center of the mounting hole 74A, and is fixed to the guide member 70A.
  • FIG. 11 is a diagram schematically showing a state in which the light irradiation unit 30a is attached to the frame 15 (here, the support unit 15a).
  • FIG. 11 shows a state of cutting along a plane passing through the center of the mounting hole 74 and the holes 75 and 76.
  • FIG. 11 some of the constituent elements are shown in cross section.
  • illustration of fastening members such as screws 85 and 86 and holes in which these are provided are omitted.
  • the cylindrical portion 35a is inserted into the mounting holes 74, 74A of the guide members 70, 70A.
  • the mounting portion 38a is located above the guide member 70, and the guide member 70 and the mounting portion 38a are fixed in a state where the portion of the cylindrical portion 35a below the mounting portion 38a is positioned below the guide member 70. I have.
  • the mounting portion 37a is located above the guide member 70A, and the guide member 70A and the mounting portion 37a are fixed in a state where the portion of the tubular portion 35a below the mounting portion 37a is located below the guide member 70A. Have been.
  • a holding ring may be used. By using the holding ring, deformation of the guide members 70 and 70A can be prevented.
  • the light irradiation unit 30a is attached to the support unit 15a such that the optical axis ax is substantially vertical.
  • the hole 79A has a horizontal position coincident with the AF light source 341 and the AF sensors 347 and 348 so that the light emitted downward from the AF light source 341 and the reflected light from the mask M can pass through.
  • the position of the hole 79A overlaps with the positions of the AF light source 341 and the AF sensors 347 and 348 in plan view.
  • the drive unit 39a is provided on the support unit 15a via the attachment unit 395, and pushes up the attachment unit 37a to move the attachment unit 37a in the vertical direction.
  • the center of gravity G of the light irradiation unit 30a is located near the position where the driving unit 39a pushes up the mounting unit 37a. Therefore, the drive unit 39a pushes up the light irradiation unit 30a near the center of gravity G. Thereby, the vertical movement of the light irradiation unit 30a is stabilized.
  • FIG. 12A shows a state in which the light irradiation unit 30a has not moved (the center of the stroke)
  • FIG. 12B shows a state in which the light irradiation unit 30a has moved downward (the lower end of the stroke)
  • the amount of movement of the cylindrical portion 35a by the drive portion 39a is approximately 40 ⁇ m ( ⁇ approximately 20 ⁇ m). Since the guide members 70 and 70A are made of thin metal, the guide members 70 and 70A expand and contract (elastically deform) in accordance with the vertical movement of the cylindrical portion 35a of approximately 40 ⁇ m. Since the guide members 70 and 70A have a substantially circular shape in plan view, the amount of deformation of the guide members 70 and 70A is substantially constant irrespective of the location, and the cylindrical portion 35a does not move in the xy directions.
  • FIG. 13 is a block diagram showing an electrical configuration of the exposure apparatus 1.
  • the exposure apparatus 1 includes a CPU (Central Processing Unit) 201, a RAM (Random Access Memory) 202, a ROM (Read Only Memory) 203, an input / output interface (I / F) 204, and a communication interface (I / F). 205, a media interface (I / F) 206, and these are the light irradiation unit 30, the position measurement units 41 and 42, the laser interferometers 51 and 52, the measurement unit 61, the drive units 81 and 82, and the rotation drive unit. 161f, the permanent magnet 163, the measuring unit 164, the piezoelectric element 391, and the like are connected to each other.
  • the CPU 201 operates based on the programs stored in the RAM 202 and the ROM 203, and controls each unit. Signals are input to the CPU 201 from the position measuring units 41 and 42, the laser interferometers 51 and 52, the measuring unit 61, the measuring unit 164, and the like. The signal output from the CPU 201 is output to the light irradiation unit 30, the driving units 81 and 82, the rotation driving unit 161f, the permanent magnet 163, the piezoelectric element 391, and the like.
  • the RAM 202 is a volatile memory.
  • the ROM 203 is a nonvolatile memory in which various control programs and the like are stored.
  • the CPU 201 operates based on programs stored in the RAM 202 and the ROM 203, and controls each unit.
  • the ROM 203 stores a boot program executed by the CPU 201 when the exposure apparatus 1 is started, a program depending on hardware of the exposure apparatus 1, drawing data on the mask M, and the like. Further, the RAM 202 stores a program executed by the CPU 201, data used by the CPU 201, and the like.
  • the CPU 201 controls the input / output device 211 such as a keyboard and a mouse via the input / output interface 204.
  • the communication interface 205 receives data from another device via the network 212 and transmits the data to the CPU 201, and transmits the data generated by the CPU 201 to the other device via the network 212.
  • the media interface 206 reads a program or data stored in the storage medium 213 and stores the program or data in the RAM 202.
  • the storage medium 213 is, for example, an IC card, an SD card, a DVD, or the like.
  • the program for realizing each function is read, for example, from the storage medium 213, installed in the exposure apparatus 1 via the RAM 202, and executed by the CPU 201.
  • the CPU 201 has a function of a control unit 201a that controls each unit of the exposure apparatus 1 based on an input signal.
  • the control unit 201a is constructed by executing a predetermined program read by the CPU 201.
  • the control unit 201a drives the rotation drive unit 161f to move the support unit 15a in the z direction.
  • the control unit 201a applies a current to the coil of the electromagnet 163b, and attracts the support unit 15a with the first attraction force or the second attraction force.
  • the processing performed by the control unit 201a will be described later in detail.
  • the configuration of the exposure apparatus 1 shown in FIG. 13 describes the main configuration in describing the features of the present embodiment, and does not exclude, for example, the configuration of a general information processing apparatus.
  • the components of the exposure apparatus 1 may be classified into more components according to the processing content, or one component may execute the processing of a plurality of components.
  • FIG. 14 is a flowchart showing the flow of the height adjustment processing of the exposure apparatus 1.
  • the control unit 201a installs the mask M on the mask holding unit 20 using a loader (not shown) (Step S10). Thereafter, the control unit 201a moves the mask holding unit 20 via the driving units 81 and 82 to adjust the position of the mask M (Step S12). Note that the processes of steps S10 and S12 are already known, and thus description thereof will be omitted.
  • the control unit 201a moves the support unit 15a in the height direction, and moves the position of the support unit 15a in the height direction to the origin position (step S14).
  • the origin position is determined by the height (previously stored) of the mask holding unit 20 and the standard of the installed mask M. When these components are at standard values, the focus of the light irradiation unit 30 is determined. Are positions tied on the mask M. Note that the position of the support portion 15a in the x direction in step S14 is the center position (x center).
  • the control unit 201a supplies a current to the coil of the electromagnet 163b. Since the current is adjusted by the adjustment dial 163c, the permanent magnet 163 attracts the support portion 15a with the second attractive force. Thereafter, the control unit 201a drives the rotation drive unit 161f to rotate the pinion 161b, thereby moving the rack 161a, that is, the support unit 15a in the height direction. At this time, the control unit 201a continuously acquires the measurement result of the measurement unit 164, and drives the rotation driving unit 161f until the measurement result of the measurement unit 164 reaches a target value.
  • the sliding surface 161d and the sliding surface 161e are in contact with each other because the permanent magnet 163 is attracting the supporting portion 15a with the second attractive force, but the sliding surface 161d is formed between the sliding surface 161d and the sliding surface 161e. Spilled oil slicks are not excluded. Therefore, when the support portion 15a moves in the z direction, the sliding surface 161e slides along the sliding surface 161d. As described above, since the support portion 15a does not tilt with respect to the column 15c when the support portion 15a moves in the z direction, the measurement result of the measurement unit 164 is stabilized.
  • step S10 to S14 are the preparation stages for adjusting the height of the light irradiation unit 30.
  • the control unit 201a measures the height of the mask M by the measuring units 61a and 61g while moving the mask holding unit 20 in the x direction via the driving units 81 and 82 (step S20). Then, the control unit 201a calculates the amount of movement of the light irradiation unit 30 in the height direction (the amount of drive of the drive unit 39a and the amount of movement of the support unit 15a) based on the measurement result in step S20 (step S22). .
  • the processing in step S22 will be described in detail.
  • FIG. 15 is an example of the measurement result in step S20.
  • the measurement result in the measurement unit 61a is illustrated, and the obtained value is a value for the light irradiation unit 30a.
  • the control unit 201a calculates the center position (thickness center) of the minimum value (BOTTOM) and the maximum value (PEAK) of the measurement result using Expression (1).
  • the control unit 201a calculates the difference between the measurement result at the center position (x center) in the x direction and the thickness center as PZT-OFS.
  • the PZT-OFS is such that when the position of the support portion 15a in the x direction is located at the x center and the piezoelectric element 391 is located at the stroke center, the focus position of the light irradiation unit 30 is at the thickness center. Is the driving amount of the piezoelectric element 391 when the height of the supporting portion 15a is adjusted.
  • PZT-OFS is a positive value when the measurement result is larger than the thickness center, and is a negative value when the measurement result is smaller than the thickness center.
  • the support 15a is moved to the x center in step S14, and the PZT-OFS is obtained based on the measurement result in the x center in step S22.
  • the support 15a is moved to -x in step S14.
  • the PZT-OFS may be obtained based on the measurement result at the ⁇ x end in step S22. That is, the x center in steps S14 and S22 is an example, and the position in the x direction is not limited to the x center.
  • the control unit 201a calculates a value obtained by adding a value (here, 20 ⁇ m) for arranging the piezoelectric element 391 at the stroke center to PZT-OFS as a vertical movement amount of the light irradiation unit 30. Note that the value of 20 ⁇ m changes depending on the type of the piezoelectric element 391.
  • step S20 since the measurement is performed using the measurement units 61a and 61g, the movement amount of the light irradiation units 30a and 30g in the height direction is obtained from the measurement result.
  • the control unit 201a determines the amount of movement of the light irradiation units 30b to 30f in the height direction (thickness center and PZT) based on the amount of movement of the light irradiation units 30a and 30g in the height direction directly obtained from the measurement results. -OFS) is calculated by interpolation.
  • the control unit 201a drives the piezoelectric element 391 from the lower end position by the value calculated in step S22 (PZT-OFS plus 20 ⁇ m) for each of the piezoelectric elements 391 provided in the light irradiation units 30a to 30g. (Step S24).
  • control unit 201a rotates each of the light irradiation units 30a to 30g while checking whether or not the light irradiated to the mask M via the AF processing unit 34 is in focus on the mask M.
  • the driving unit 161f is driven to move the support unit 15a in the height direction (Step S26).
  • step S14 Since the support portion 15a is attracted by the second attractive force in step S14, the permanent magnet 163 continuously attracts the support portion 15a by the second attractive force. Therefore, also in step S26, the sliding surface 161d is in contact with the sliding surface 161e, and the sliding surface 161e slides along the sliding surface 161d.
  • the AF processing unit 34 continuously determines how much it needs to be moved to the in-focus position, and the control unit 201a continuously obtains the result.
  • the control unit 201a drives the rotation drive unit 161f while continuously acquiring the measurement result of the measurement unit 164, and moves the support unit 15a in the height direction by the movement distance obtained by the AF processing unit 34.
  • step S24 since the piezoelectric element 391 is driven by the value obtained by adding 20 ⁇ m to PZT-OFS from the lower end position, the light is output when the piezoelectric element 391 is at the stroke center as a result of the movement of the support 15a in step S26. Light emitted from the irradiation unit 30 is focused on the thickness center. Thus, even if the height of the mask M changes, the focus of the light irradiation unit 30 can be always adjusted to the mask M by the movement of the piezoelectric element 391.
  • the control unit 201a determines whether the light irradiated from the light irradiation unit 30 via the AF processing unit 34 is focused on the mask M (Step S28). Since the light irradiation unit 30 has been moved in steps S24 and S26, the light irradiated from the light irradiation unit 30 is usually focused on the mask M in step S28. If the light irradiation unit 30 is not located at the position where it is determined that the camera is in focus (NO in step S28), the control unit 201a returns the process to step S26.
  • the control unit 201a supplies a current to the coil of the electromagnet 163b to cause The sliding portion 161d and the sliding surface 161e are brought into close contact with each other by adsorbing the support portion 15a with one suction force (step S30). As a result, friction occurs between the sliding surface 161d and the sliding surface 161e, and the support portion 15a is fixed to the column 15c by the frictional force.
  • step S14 Since the permanent magnet 163 attracts the support 15a with the second attractive force in step S14, the permanent magnet 163 continues to attract the support 15a with the second attractive force before step S30.
  • the value of the adjustment dial 163c is moved to "10" in this state, the value of the current flowing through the coil of the electromagnet 163b increases, and the attraction force of the permanent magnet 163 changes from the second attraction force to the first attraction force. Due to the nature of the permanent magnet 163, the attraction force can be increased from the second attraction force to the first attraction force (the attraction force cannot be reduced from the first attraction force to the second attraction force).
  • the sliding surface 161d and the sliding surface 161e come into contact with each other when the supporting portion 15a moves, and the sliding surface 161d slides along the sliding surface 161e. Even if the sliding surface 161d and the sliding surface 161e are brought into close contact, the sliding surface 161d, that is, the support portion 15a does not tilt. Therefore, the measurement result of the measurement unit 164 does not change regardless of whether the support unit 15a is moving or not.
  • the support portion 15a is large.
  • the measurement unit 164 since the measurement unit 164 must be provided on the surface opposite to the surface on which the permanent magnet 163 is provided, a non-negligible error occurs in the measurement result of the measurement unit 164. On the other hand, as shown in FIG.
  • the control unit 201a moves the mask holding unit 20 in the x direction and the y direction via the driving units 81 and 82, and controls the AF processing units 34a to 34g.
  • control unit 201a moves the support unit 15a in the direction in which the driving amount of the piezoelectric element 391 exceeds ⁇ 20 ⁇ m.
  • processing shown in FIG. 14 ends.
  • the processing illustrated in FIG. 14 is an example, and the order of processing and processing contents are not limited thereto.
  • the control unit 201a moves the mask holding unit 20 in the x direction and the y direction based on the measurement results of the position measurement units 41 and 42.
  • the control unit 201a irradiates light from the light irradiating unit 30 when the mask M passes below the light irradiating unit 30 while moving the mask holding unit 20, and performs a drawing process. Since the drawing process is performed several hours after the mask M is placed on the mask holding unit 20, there is enough room for the control unit 201a to perform the process of step S32.
  • the support unit 15a provided with the light irradiation unit 30 is moved up and down by using the moving mechanism 161 including the rack 161a and the pinion 161b, a random walking error does not occur unlike the case where a ball screw is used. . Therefore, the height of the light irradiation unit can be accurately adjusted.
  • the supporting portion 15a is attracted by the first attracting force using the permanent magnet 163, and the sliding surface 161d and the sliding surface 161e are brought into close contact with each other, so that the sliding surface 161d and the sliding surface By removing the oil film between the sliding surface 161e and the sliding surface 161e, the supporting portion 15a can be held by the frictional force generated between the sliding surface 161d and the sliding surface 161e. Further, the supporting portion 15a is attracted by the second attracting force (second attracting force ⁇ first attracting force) using the permanent magnet 163, and the supporting portion 15a is brought into contact with the sliding surface 161d and the sliding surface 161e. By moving the support 15a up and down, the measurement result of the measurement unit 164 does not change whether the support 15a is moving or not, and errors caused by the inclination of the support 15a can be eliminated.
  • the energization time is short, and the deformation and expansion of the support portion 15a due to heat do not occur. Therefore, the height of the support portion 15a, that is, the height of the light irradiation portion can be accurately adjusted.
  • “substantially” is a concept including not only the case of exactly the same but also an error or a deformation that does not lose the identity.
  • “substantially horizontal” is not limited to a strictly horizontal case, and is a concept that includes, for example, an error of about several degrees.
  • the expression “parallel, orthogonal, etc.” includes not only the case of strictly parallel, orthogonal, etc., but also the case of approximately parallel, approximately orthogonal, etc.
  • “near” means that a region in a certain range (can be arbitrarily determined) near a reference position is included. For example, when the term “near A” is used, it is a concept indicating that it is a region in a certain range near “A” and may or may not include “A”.
  • Exposure device 11 Surface plate 11a: Upper surface 12: Plate portion 12a: Upper surface 13, 14: Rail 15: Frame 15a: Support portion 15c: Column 20: Mask holding portion 20a: Upper surface 21, 22, 23: Bar mirror 30 (30a-30g): Light irradiator 31 (31a-31g): DMD 32 (32a to 32g): Objective lens 33 (33a to 33g): Light source section 34 (34a to 34g): AF processing section 35 (35a to 35g): Cylindrical section 36 (36a to 36g): Flange 37 (37a to 37g) 37g), 38 (38a to 38g): mounting part 39 (39a to 39g): driving part 40: measuring part 41, 42: position measuring part 41a, 42a: scale 41b, 42b: detecting head 50, 51 (51a, 51b) , 51c), 52 (52a, 52g): laser interferometers 55a, 55b, 55c, 56a, 56g: mirror 60: reading unit 61 (61a,

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microwave Amplifiers (AREA)
  • Exposure Control For Cameras (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

La présente invention permet d'ajuster avec précision la hauteur d'une partie d'émission de lumière. Selon la présente invention, une partie d'entraînement en rotation est entraînée de façon à faire tourner un pignon (161b), et une partie de support (15a) dotée d'une crémaillère (161a) et venant en prise avec le pignon (161b) se déplace dans la direction de la hauteur. Le courant traverse une bobine d'un électroaimant d'un électroaimant permanent (163) qui comprend l'électroaimant et un aimant permanent, l'électroaimant permanent (163) attire la partie de support (15a) et fait ainsi entrer en contact une surface coulissante côté partie de support (161e) avec une surface coulissante côté colonne (161d), et la partie de support (15a) est maintenue en place par le frottement entre la surface coulissante côté partie de support (161e) et la surface coulissante côté colonne (161d).
PCT/JP2019/024230 2018-06-25 2019-06-19 Dispositif d'exposition et procédé d'ajustement de hauteur Ceased WO2020004164A1 (fr)

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CN201980041745.3A CN112334836B (zh) 2018-06-25 2019-06-19 曝光装置以及高度调整方法
KR1020207033454A KR102716702B1 (ko) 2018-06-25 2019-06-19 노광 장치 및 높이 조정 방법

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JP2018120227A JP7017239B2 (ja) 2018-06-25 2018-06-25 露光装置および高さ調整方法

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JP7648893B2 (ja) * 2021-05-31 2025-03-19 株式会社ジャノメ 経路教示データ作成装置及びその方法並びにプログラム
WO2023145085A1 (fr) * 2022-01-31 2023-08-03 ファナック株式会社 Structure de support
JP2025037489A (ja) * 2023-09-06 2025-03-18 株式会社Ｓｃｒｅｅｎホールディングス 露光装置

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TWI809111B (zh) 2023-07-21
JP2020003533A (ja) 2020-01-09
KR20210023820A (ko) 2021-03-04
JP7017239B2 (ja) 2022-02-08
KR102716702B1 (ko) 2024-10-11
CN112334836B (zh) 2024-03-08
TW202001323A (zh) 2020-01-01

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