CN1147865A - 用于照像和复制的光敏材料 - Google Patents

用于照像和复制的光敏材料 Download PDF

Info

Publication number
CN1147865A
CN1147865A CN95192976A CN95192976A CN1147865A CN 1147865 A CN1147865 A CN 1147865A CN 95192976 A CN95192976 A CN 95192976A CN 95192976 A CN95192976 A CN 95192976A CN 1147865 A CN1147865 A CN 1147865A
Authority
CN
China
Prior art keywords
light
diazo compound
film
photosensitive
action
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN95192976A
Other languages
English (en)
Chinese (zh)
Inventor
H·斯特尼格
P·海尔曼
R·阿特利
A·格利恩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Emtec Magnetics GmbH
Original Assignee
BASF Magnetics GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF Magnetics GmbH filed Critical BASF Magnetics GmbH
Publication of CN1147865A publication Critical patent/CN1147865A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
CN95192976A 1994-03-08 1995-02-25 用于照像和复制的光敏材料 Pending CN1147865A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4407622A DE4407622A1 (de) 1994-03-08 1994-03-08 Lichtempfindliches Material für reprographische Anwendungen
DEP4407622.3 1994-03-08

Publications (1)

Publication Number Publication Date
CN1147865A true CN1147865A (zh) 1997-04-16

Family

ID=6512120

Family Applications (1)

Application Number Title Priority Date Filing Date
CN95192976A Pending CN1147865A (zh) 1994-03-08 1995-02-25 用于照像和复制的光敏材料

Country Status (7)

Country Link
EP (1) EP0749593B1 (fr)
JP (1) JPH09512921A (fr)
CN (1) CN1147865A (fr)
AU (1) AU1891895A (fr)
DE (2) DE4407622A1 (fr)
ES (1) ES2110836T3 (fr)
WO (1) WO1995024672A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102707565A (zh) * 2012-03-26 2012-10-03 京东方科技集团股份有限公司 一种黑矩阵的制作方法、彩色滤光片及显示装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201117530D0 (en) * 2011-10-11 2011-11-23 Rue De Int Ltd Security devices
GB201117523D0 (en) * 2011-10-11 2011-11-23 Rue De Int Ltd Security devices and methods of manufacture thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3215529A (en) * 1960-07-18 1965-11-02 Kalvar Corp Color photographic material
US4152156A (en) * 1974-10-15 1979-05-01 Xidex Corporation Duplication-proof photographic film
JPS5437724A (en) * 1977-08-30 1979-03-20 Mitsubishi Chem Ind Foam photographyysensitive member
CH683386A5 (de) * 1991-09-13 1994-02-28 Alrane Inventing Ag Diapositiv.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102707565A (zh) * 2012-03-26 2012-10-03 京东方科技集团股份有限公司 一种黑矩阵的制作方法、彩色滤光片及显示装置
CN102707565B (zh) * 2012-03-26 2013-12-25 京东方科技集团股份有限公司 一种黑矩阵的制作方法、彩色滤光片及显示装置

Also Published As

Publication number Publication date
AU1891895A (en) 1995-09-25
EP0749593B1 (fr) 1997-12-29
DE59501171D1 (de) 1998-02-05
ES2110836T3 (es) 1998-02-16
WO1995024672A1 (fr) 1995-09-14
JPH09512921A (ja) 1997-12-22
EP0749593A1 (fr) 1996-12-27
DE4407622A1 (de) 1995-09-14

Similar Documents

Publication Publication Date Title
US4920039A (en) Multiple imaging
US3671236A (en) Presensitized color-proofing sheet
CN1147865A (zh) 用于照像和复制的光敏材料
US4427757A (en) Tannable imaging element
US4152156A (en) Duplication-proof photographic film
US5057394A (en) Method of forming an image
US4388399A (en) Light-sensitive image-forming material
US3622336A (en) Vesicular light-sensitive materials comprising a copolymer of chloroacrylonitrile and methacrylonitrile
US4343876A (en) Dot-enlargement process for photopolymer litho masks
JPS6067937A (ja) ネガチブ作用フオトレジスト組成物
EP0130581B1 (fr) Agrandissement des images photopolymères dans les originaux à base de photopolymères
GB2205843A (en) Photosensitive composition
US4042391A (en) Process for forming vesicular photographic images by employing simultaneous actinic light and infra-red reflex exposure
GB2095854A (en) Image forming material
JPH0527451A (ja) 画像形成方法
EP0048160B1 (fr) Matériau enregistreur photosensible et procédé de mordançage en demi-ton
CA1146751A (fr) Procede de reproduction reflex sur support photosensible
US3547630A (en) Photographic reproduction
JPS5811943A (ja) スクリ−ンレス平版印刷原版
JPH06348022A (ja) スクリーン印刷創作フィルム
US5348846A (en) Silver halide photographic photosensitive material
EP0117013A2 (fr) Film additif et procédé
US4973543A (en) System for the production of dot-etched lithographic films
SU640241A1 (ru) Способ изготовлени пленочного растра
EP0404507A2 (fr) Système pour l'épreuve en couleurs à effet négatif ou positif par superposition avec couche photoréserve

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication