EP0749593B1 - Materiau photosensible pour applications en photographie et en reprographie - Google Patents

Materiau photosensible pour applications en photographie et en reprographie Download PDF

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Publication number
EP0749593B1
EP0749593B1 EP95911268A EP95911268A EP0749593B1 EP 0749593 B1 EP0749593 B1 EP 0749593B1 EP 95911268 A EP95911268 A EP 95911268A EP 95911268 A EP95911268 A EP 95911268A EP 0749593 B1 EP0749593 B1 EP 0749593B1
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EP
European Patent Office
Prior art keywords
light
diazo
exposure
sensitive
film
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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EP95911268A
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German (de)
English (en)
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EP0749593A1 (fr
Inventor
Helmut Steininger
Peter Heilmann
Richard Artley
Alan Green
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Emtec Magnetics GmbH
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Emtec Magnetics GmbH
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Publication of EP0749593A1 publication Critical patent/EP0749593A1/fr
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances

Definitions

  • the invention relates to a light-sensitive material for photographic and reprographic applications, consisting of a film of transparent material and a layer applied thereon, containing a light-sensitive first diazo compound which is activated by exposure (negative diazo) and by subsequent development treatment, the absorption on the Material impacting light-influencing dye forms.
  • the invention also relates to photographic and reprographic applications themselves.
  • the invention also relates to a light-sensitive material for photographic and reprographic applications, consisting of a film of transparent material and a layer applied thereon, containing a light-sensitive first diazo compound which is covered by a mask and deactivated in a partial area by first exposure in the uncovered area ( Positive diazo) and is then only partially deactivated by subsequent post-exposure of the previously covered area and whose still active part after development treatment forms a dye which influences the absorption of light on the material.
  • a light-sensitive material for photographic and reprographic applications consisting of a film of transparent material and a layer applied thereon, containing a light-sensitive first diazo compound which is covered by a mask and deactivated in a partial area by first exposure in the uncovered area ( Positive diazo) and is then only partially deactivated by subsequent post-exposure of the previously covered area and whose still active part after development treatment forms a dye which influences the absorption of light on the material.
  • the absorption of light by a dye is used, which arises during the development of the exposed film with ammonia vapor or sodium hydroxide as the product of the coupling of a diazo compound with a dye component.
  • vesicular film in which the imaging structure is formed by the scattering of the light on microscopic bubbles.
  • the bubbles develop during the development of the film due to the rapid expansion of the nitrogen, which is released during the radiation-induced decay reaction of special diazo compounds.
  • the low contrast of conventional diazo films with a light shade and of vesicular films requires high film thicknesses in applications that require optically high-density structures.
  • the cause lies in the low absorption of the available dyes or the limited scattering efficiency of the bubble structure, which in particular provides only low projection densities with a large projection aperture.
  • the task to be solved was to improve light-sensitive material for photographic and reprographic applications, to indicate uses for photographic and reprographic purposes, and to provide training for photo films, anti-copying films, projection films and 3-dimensional images.
  • the layer additionally contains a second diazo compound which, according to claim 1, forms nitrogen by the exposure, and wherein nitrogen bubbles causing light scattering follow immediately afterwards are formed, and according to claim 2, forms nitrogen by the post-exposure, and wherein nitrogen bubbles causing light scattering are formed by immediately following heat treatment.
  • These light-sensitive materials according to the invention have the advantages that they can be produced with technically manageable and economically sensible layer thicknesses, and a high contrast when viewed in remission and / or transmission offer, show a high resolution and at the same time allow a bright, friendly color.
  • a light-sensitive material according to the positive diazo principle is characterized in that the light-sensitive first diazo compound is a form deactivated by the action of light and, in the case of the second diazo compound which forms nitrogen, the light-scattering bubbles are formed in the areas which were initially unexposed by a mask by post-exposure and heat treatment , and that the deactivation wavelength ranges for the first and second diazo compounds are different.
  • a light-sensitive material according to the negative diazo principle is characterized in that the light-sensitive first diazo compound is a form activated by the action of light for dye formation, and in the case of the nitrogen-forming second diazo compound, the light-scattering vesicles are formed in the areas first exposed by a mask and then heat-treated , and that the activation wavelength ranges for the first and second diazo compounds are different.
  • the thickness of the light-sensitive layer is between approximately 1 ⁇ m and approximately 30 ⁇ m.
  • the light-sensitive material can be used to produce a projection film as a photo mask, a photo film, a copy protection film against normal light copying or as a storage medium for 3-dimensional images, as will be explained below.
  • a photo film in particular a microfilm, containing at least one layer of light-sensitive material, consists of a light-sensitive first diazo compound which is activated by exposure (negative diazo) and forms a dye by subsequent development treatment, which influences the absorption of light incident on the material, and the layer additionally contains a second diazo compound, which forms nitrogen through the exposure, and wherein nitrogen bubbles causing light scattering are formed by immediately following heat treatment.
  • Another photo film, in particular microfilm, containing at least one layer of light-sensitive material consists of a light-sensitive first diazo compound, which is masked in a partial area by means of a mask, deactivated by first exposure in the uncovered area (positive diazo), and which is subsequently exposed by subsequent exposure the previously covered area is only partially deactivated and its still active part forms a dye by development treatment, which influences the absorption of light incident on the material, and the layer additionally contains second diazo compounds which form nitrogen through the post-exposure, and whereby by immediately following heat treatment nitrogen bubbles causing light scattering are formed.
  • This provides photo films with high contrast, high resolution and bright colors.
  • an anti-copying film against normal light copying consisting of a film made of transparent material with a multiplicity of spaced-apart, at least partially non-transparent and transparent regions, the planes of which are approximately in the same predetermined position relative to the surfaces of the Film are arranged so that from a predetermined angle of view on the surfaces of the anti-copying film is substantially transparent, in that the non-transparent and transparent areas are at least partially made of an exposed and developed photosensitive material formed from a photosensitive first diazo compound, which is activated by exposure (negative diazo) and, through subsequent development treatment, forms a dye which influences the absorption of light incident on the material, and the layer additionally contains a second diazo compound t, which forms nitrogen by the exposure, and wherein nitrogen bubbles causing light scattering are formed by immediately following heat treatment.
  • an anti-copying film against normal light copying consisting of a film made of transparent material with a plurality of spaced-apart, at least partially non-transparent and transparent areas, the planes of which are approximately in the same predetermined position relative to the Surfaces of the film are arranged so that from a predetermined viewing angle on the surfaces of the anti-copying film it is substantially transparent, which is produced by the fact that the non-transparent and transparent Areas at least partially consist of an exposed and developed light-sensitive material, formed from a light-sensitive first diazo compound, which is covered in a partial area by means of a mask, deactivated by first exposure in the uncovered area (positive diazo) and then subsequently exposed to the previously covered area is only partially deactivated and the still active part after development treatment forms a dye which influences the absorption of light incident on the material, and the layer additionally contains a second diazo compound which forms nitrogen through the post-exposure, and which causes light scattering by immediately subsequent heat treatment Nitrogen bubbles are formed.
  • a projection film in particular a photomask, which consists of a film of transparent material and an applied, exposed and developed layer with a light-sensitive first diazo compound which is activated by exposure (negative diazo) and by subsequent development treatment forms a dye which influences the absorption of the light impinging on the material, and the layer additionally contains a second diazo compound which forms nitrogen by the exposure, and wherein nitrogen bubbles causing light scattering are formed by immediately following heat treatment.
  • a projection film in particular a photomask, which consists of a film of transparent material and an applied, exposed and developed layer with a light-sensitive first diazo compound, which, covered by a mask in a partial area, is not covered by first exposure in the covered area is deactivated (positive diazo) and is then only partially deactivated by subsequent exposure of the previously covered area and whose still active part after development treatment forms a dye which influences the absorption of light onto the material, and the layer additionally contains second diazo compounds which forms nitrogen by the post-exposure, and nitrogen bubbles causing light scattering are formed by immediately following heat treatment.
  • a photomask which consists of a film of transparent material and an applied, exposed and developed layer with a light-sensitive first diazo compound, which, covered by a mask in a partial area, is not covered by first exposure in the covered area is deactivated (positive diazo) and is then only partially deactivated by subsequent exposure of the previously covered area and whose still active part after development treatment forms a dye which influences the absorption of light onto
  • a 3-dimensional image which consists of several layers of exposed and developed light-sensitive material arranged one above the other, from a light-sensitive first diazo compound, which forms a dye by subsequent development treatment, which influences the absorption of light incident on the material , wherein the layer additionally contains a second diazo compound, which forms nitrogen through the exposure, and wherein nitrogen bubbles causing light scattering are formed by immediately following heat treatment.
  • Another 3-dimensional image version can be produced from several layers of exposed and developed light-sensitive material arranged one above the other, consisting of a light-sensitive first diazo compound, which is covered in a partial area by means of a mask, and deactivated by first exposure in the uncovered part (positive Diazo) and is then only partially deactivated by subsequent post-exposure of the previously covered area and whose still active part after development treatment forms a dye which influences the absorption of light onto the material, and the layer additionally contains a second diazo compound which forms nitrogen through the post-exposure, and wherein nitrogen bubbles causing light scattering are formed by immediately following heat treatment.
  • a light-sensitive first diazo compound which is covered in a partial area by means of a mask, and deactivated by first exposure in the uncovered part (positive Diazo) and is then only partially deactivated by subsequent post-exposure of the previously covered area and whose still active part after development treatment forms a dye which influences the absorption of light onto the material
  • the layer additionally contains a second diazo compound which forms nitrogen
  • the photosensitive material is shown in the drawing in longitudinal section and consists of a film 1 of transparent material and a layer 2 applied thereon, which contains a photosensitive first diazo compound 3 and a dye component to form a dye and an additional photosensitive second diazo compound 4 to form nitrogen contains bubbles.
  • the former diazo compound can be a form activated by the action of light for dye formation (negative diazo) or a form which decomposes through the action of light (positive diazo). be so that the development treatment with ammonia vapor or sodium hydroxide instead of a colored area creates a transparent area.
  • first diazo compound or “first diazo compounds” is mentioned in this patent application, several, e.g. the diazo compounds forming the color components are to be understood as such.
  • the nitrogen released during the exposure of these compounds forms microscopic bubbles through a subsequent heat treatment with steam or warm water, which remain in layer 2 in the exposed area.
  • the bubbles cause a strong scattering and internal reflection of the light, which creates milky, cloudy image structures.
  • the developing agent ammonia vapor or sodium hydroxide
  • the thin partitions wall thickness approx. 0.1 ⁇ m
  • the individual bubbles bubble diameter approx. 1 ⁇ m.
  • the film layer thickness to be developed is effectively reduced to approximately 10% of the developed vesicular layer thickness.
  • the diazo film layer to be effectively developed is consequently only approximately 2 ⁇ m.
  • the layer exposed, for example, via a mask is developed in stages because of the two differently reacting layer components.
  • the nitrogen released in the exposed areas is bound by a heat pulse in the form of the bubbles.
  • the activated color component can then be developed in these areas in the negative film (negative diazo) using the agent mentioned so that the film material becomes opaque there. This is followed by a full-surface post-exposure, the nitrogen released in the previously unexposed areas evaporates over time or is accelerated by moderate heating. The color component is not developed there, so these areas remain transparent.
  • the selective decomposition of one of the diazofilm materials is induced by irradiation of a certain wavelength range.
  • the originally unexposed areas thus contain both coupling-capable diazofilmaterials, which couple to a diazo dye in a subsequent development process, and also the nitrogen bubbles.
  • Areas of application for the light-sensitive material according to the invention are, for example, microfilms, projection films, photomasks and anti-copying films.
  • the film according to the invention is suitable for storing three-dimensional structures, the height of which corresponds at most to the film layer thickness 2.
  • a projection film or a photomask 5 is shown in section, for example. While the larger part is transparent, a plurality of equally spaced, non-transparent regions 6, that is to say formed by light-absorbing or light-reflecting substances, is provided on one side. These fabrics have been made from light sensitive materials as described above by exposure to light and development.
  • the non-transparent areas 8A, 8B of an anti-copy film 7 are arranged at an angle y, specifically on both surfaces (8A, 8B).
  • the areas 8A and 8B are arranged horizontally offset from one another. Information arranged under this film 7 is hidden in the vertical exposure direction (arrow a)) and only partially exposed in the oblique direction (arrows b)) and is therefore also copy-protected.
  • the areas 8A and 8B are produced in succession as described above.
  • the film 5 designated as anti-copying film in FIG. 2 can also be a projection film or a photomask.
  • the film 7 could also be a 3-D image when arrow b) is viewed.
  • the first diazo compound of the photosensitive layer to be activated by exposure to dye formation is supplemented by an additional second diazo compound, in which after exposure to light and immediately following heat treatment, nitrogen bubbles remain in the exposed areas and nitrogen scattering causes light scattering.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

Pour l'amélioration du contraste dans des films diazo, les composés diazoïques de la couche photosensible, activés par exposition à la lumière pour la formation de colorants, sont complétés par des composés diazoïques pour lesquels il se forme, après action de la lumière immédiatement suivie d'un traitement thermique, de l'azote demeurant aux emplacements exposés et de petites soufflures occasionnant une dispersion de la lumière.

Claims (17)

  1. Matériau photosensible pour applications photographiques et reprographiques, constitué d'une pellicule (1) de substance transparente recouverte d'une couche (2) contenant un premier composé diazoïque photosensible (3) activé par l'exposition à la lumière (diazo négative). Par l'opération de développement qui suit, ce premier composé diazoïque photosensible produit un colorant influant sur l'absorption de la lumière qui parvient au matériau. Soulignons ici que la couche (2) contient en plus un second composé diazoïque (4) produisant de l'azote sous l'effet de l'exposition à la lumière. En le soumettant ensuite immédiatement à un traitement thermique, on obtient la formation de petites bulles d'azote qui diffusent la lumière.
  2. Matériau photosensible pour applications photographiques et reprographiques, constitué d'une pellicule (1) de substance transparente recouverte d'une couche (2) contenant un premier composé diazoïque photosensible (3). Recouvert partiellement d'un masque, celui-ci est désactivé par une première exposition à la lumière de la zone non recouverte (diazo positive). Par la postexposition à la lumière de la zone préalablement masquée qui suit, ce premier composé diazoïque photosensible n'est que partiellement désactivé. Après développement, sa zone encore active produit un colorant influant sur l'absorption de la lumière qui parvient au matériau. Soulignons ici que la couche (2) contient en plus un second composé diazoïque (4) dont l'exposition à la lumière produit de l'azote. En le soumettant ensuite immédiatement à un traitement thermique, on obtient la formation de petites bulles d'azote qui diffusent la lumière.
  3. Matériau photosensible comme décrit au point 2. Il est caractérisé, d'une part, par un premier composé diazoïque photosensible (3) désactivé sous l'action de la lumière et, d'autre part, par un second composé diazoïque (4) qui produit de l'azote, dont les bulles diffusant la lumière se forment après postexposition et traitement thermique dans les zones tout d'abord non exposées puisque recouvertes d'un masque. Sa troisième caractéristique réside dans le fait que la désactivation du premier et du second composé diazoïque est provoquée par différentes gammes d'ondes.
  4. Matériau photosensible comme décrit au point 1. Il est caractérisé, d'une part, par un premier composé diazoïque photosensible (3) produisant un colorant sous l'action de la lumière et, d'autre part, par un second composé diazoïque (4) qui produit de l'azote, dont les bulles diffusant la lumière se forment dans les zones tout d'abord exposées à la lumière à travers un masque puis soumises à un traitement thermique. Sa troisième caractéristique réside dans le fait que l'activation du premier et du second composé diazoïque est provoquée par différentes gammes d'ondes.
  5. Matériau photosensible conforme à l'un des points 1 à 4, caractérisé par une épaisseur de couche photosensible (2) comprise entre 1 µm et 30 µm.
  6. Utilisation du matériau photosensible selon le point 1 ou 2 pour la fabrication d'une pellicule de projection.
  7. Utilisation du matériau photosensible selon le point 1 ou 2 pour la fabrication d'un support d'archivage.
  8. Utilisation du matériau photosensible selon le point 1 ou 2 pour la fabrication d'une feuille de protection contre les copies à la lumière normale.
  9. Utilisation du matériau photosensible selon le point 1 ou 2 pour la fabrication d'un support de mémorisation de structures tridimensionnelles.
  10. Film photographique, en particulier microfilm, caractérisé par au moins une couche de matériau photosensible, constituée d'un premier composé diazoïque photosensible (3), activé par l'exposition à la lumière (diazo négative). Par l'opération de développement qui suit, ce premier composé diazoïque photosensible produit un colorant influant sur l'absorption de la lumière qui parvient au matériau. Soulignons ici que la couche (2) contient en plus un second composé diazoïque (4) produisant de l'azote sous l'effet de l'exposition à la lumière. En le soumettant ensuite immédiatement à un traitement thermique, on obtient la formation de petites bulles d'azote qui diffusent la lumière.
  11. Film photographique, en particulier microfilm, caractérisé par au moins une couche de matériau photosensible constituée d'un premier composé diazoïque photosensible (3). Recouvert partiellement d'un masque, celui-ci est désactivé par une première exposition à la lumière de la zone non recouverte (diazo positive). Par la postexposition à la lumière de la zone préalablement masquée qui suit, ce premier composé diazoïque photosensible n'est que partiellement désactivé. Après développement, sa zone encore active produit un colorant influant sur l'absorption de la lumière qui parvient au matériau. Soulignons ici que la couche (2) contient en plus un second composé diazoïque (4) dont la postexposition à la lumière produit de l'azote. En le soumettant ensuite immédiatement à un traitement thermique, on obtient la formation de petites bulles d'azote qui diffusent la lumière.
  12. Film interdisant la copie réalisée à la lumière normale, constitué d'une pellicule de matériau transparent comportant une multitude de zones espacées les unes par rapport aux autres et au moins partiellement non transparentes et transparentes. Leurs plans sont agencés selon une position environ similaire par rapport aux surfaces du film, de sorte que sous un angle de vision prédéterminé sur les surfaces du film interdisant la copie, celui-ci est en grande partie transparent et caractérisé par le fait que les zones non transparentes et transparentes sont au moins partiellement constituées d'un matériau photosensible exposé et développé, formé d'un premier composé diazoïque photosensible (3) activé par l'exposition à la lumière (diazo négative). Par l'opération de développement qui suit, ce premier composé diazoïque photosensible produit un colorant influant sur l'absorption de la lumière qui parvient au matériau. Soulignons ici que la couche (2) contient en plus un second composé diazoïque (4) produisant de l'azote sous l'effet de l'exposition à la lumière. En le soumettant ensuite immédiatement à un traitement thermique, on obtient la formation de petites bulles d'azote qui diffusent la lumière.
  13. Film interdisant la copie réalisée à la lumière normale, constitué d'une pellicule de matériau transparent comportant une multitude de zones espacées les unes par rapport aux autres et au moins partiellement non transparentes et transparentes. Leurs plans sont agencés selon une position environ similaire par rapport aux surfaces du film, de sorte que sous un angle de vision prédéterminé sur les surfaces du film interdisant la copie, celui-ci est en grande partie transparent et caractérisé par le fait que les zones non transparentes et transparentes sont au moins partiellement constituées d'un matériau photosensible exposé et développé, formé d'un premier composé diazoïque photosensible (3) qui, partiellement recouvert d'un masque, est désactivé par une première exposition de la zone non masquée (diazo positive). Par la postexposition à la lumière de la zone préalablement masquée qui suit, ce premier composé diazoïque photosensible n'est que partiellement désactivé. Après développement, sa zone encore active produit un colorant influant sur l'absorption de la lumière qui parvient au matériau. Soulignons ici que la couche (2) contient en plus un second composé diazoïque (4) dont la postexposition à la lumière produit de l'azote. En le soumettant ensuite immédiatement à un traitement thermique, on obtient la formation de petites bulles d'azote qui diffusent la lumière.
  14. Pellicule de projection, en particulier masque photo, caractérisé par une pellicule (1) de substance transparente recouverte d'une couche (2) exposée et développée contenant un premier composé diazoïque photosensible (3) activé par l'exposition à la lumière (diazo négative). Par l'opération de développement qui suit, ce premier composé diazoïque photosensible produit un colorant influant sur l'absorption de la lumière qui parvient au matériau. Soulignons ici que la couche (2) contient en plus un second composé diazoïque (4) ) produisant de l'azote sous l'effet de l'exposition à la lumière. En le soumettant ensuite immédiatement à un traitement thermique, on obtient la formation de petites bulles d'azote qui diffusent la lumière.
  15. Pellicule de projection, en particulier masque photo, caractérisé par une pellicule (1) de substance transparente recouverte d'une couche (2) exposée et développée contenant un premier composé diazoïque photosensible (3) qui, partiellement recouvert d'un masque, est désactivé par une première exposition de la zone non masquée (diazo positive). Par la postexposition à la lumière de la zone préalablement masquée qui suit, ce premier composé diazoïque photosensible n'est que partiellement désactivé. Après développement, sa zone encore active produit un colorant influant sur l'absorption de la lumière qui parvient au matériau. Soulignons ici que la couche (2) contient en plus un second composé diazoïque (4) dont la postexposition à la lumière produit de l'azote. En le soumettant ensuite immédiatement à un traitement thermique, on obtient la formation de petites bulles d'azote qui diffusent la lumière.
  16. Image tridimensionnelle caractérisée par plusieurs couches superposées de matériau exposé et développé, constitué d'un premier composé diazoïque photosensible (3) activé par l'exposition à la lumière (diazo négative). Par l'opération de développement qui suit, ce premier composé diazoïque photosensible produit un colorant influant sur l'absorption de la lumière qui parvient au matériau. Soulignons ici que la couche (2) contient en plus un second composé diazoïque (4) ) produisant de l'azote sous l'effet de l'exposition à la lumière. En le soumettant ensuite immédiatement à un traitement thermique, on obtient la formation de petites bulles d'azote qui diffusent la lumière.
  17. Image tridimensionnelle caractérisée par plusieurs couches superposées de matériau exposé et développé, constitué d'un premier composé diazoïque photosensible (3) ) qui, partiellement recouvert par un masque, est désactivé par une première exposition de la zone non masquée (diazo positive). Par la postexposition à la lumière de la zone préalablement masquée qui suit, ce premier composé diazoïque photosensible n'est que partiellement désactivé. Après développement, sa zone encore active produit un colorant influant sur l'absorption de la lumière qui parvient au matériau. Soulignons ici que la couche (2) contient en plus un second composé diazoïque (4) dont la postexposition à la lumière produit de l'azote. En le soumettant ensuite immédiatement à un traitement thermique, on obtient la formation de petites bulles d'azote qui diffusent la lumière.
EP95911268A 1994-03-08 1995-02-25 Materiau photosensible pour applications en photographie et en reprographie Expired - Lifetime EP0749593B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE4407622 1994-03-08
DE4407622A DE4407622A1 (de) 1994-03-08 1994-03-08 Lichtempfindliches Material für reprographische Anwendungen
PCT/EP1995/000686 WO1995024672A1 (fr) 1994-03-08 1995-02-25 Materiau photosensible pour applications en photographie et en reprographie

Publications (2)

Publication Number Publication Date
EP0749593A1 EP0749593A1 (fr) 1996-12-27
EP0749593B1 true EP0749593B1 (fr) 1997-12-29

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EP95911268A Expired - Lifetime EP0749593B1 (fr) 1994-03-08 1995-02-25 Materiau photosensible pour applications en photographie et en reprographie

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EP (1) EP0749593B1 (fr)
JP (1) JPH09512921A (fr)
CN (1) CN1147865A (fr)
AU (1) AU1891895A (fr)
DE (2) DE4407622A1 (fr)
ES (1) ES2110836T3 (fr)
WO (1) WO1995024672A1 (fr)

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GB201117530D0 (en) * 2011-10-11 2011-11-23 Rue De Int Ltd Security devices
GB201117523D0 (en) * 2011-10-11 2011-11-23 Rue De Int Ltd Security devices and methods of manufacture thereof
CN102707565B (zh) * 2012-03-26 2013-12-25 京东方科技集团股份有限公司 一种黑矩阵的制作方法、彩色滤光片及显示装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3215529A (en) * 1960-07-18 1965-11-02 Kalvar Corp Color photographic material
US4152156A (en) * 1974-10-15 1979-05-01 Xidex Corporation Duplication-proof photographic film
JPS5437724A (en) * 1977-08-30 1979-03-20 Mitsubishi Chem Ind Foam photographyysensitive member
CH683386A5 (de) * 1991-09-13 1994-02-28 Alrane Inventing Ag Diapositiv.

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AU1891895A (en) 1995-09-25
DE59501171D1 (de) 1998-02-05
ES2110836T3 (es) 1998-02-16
WO1995024672A1 (fr) 1995-09-14
CN1147865A (zh) 1997-04-16
JPH09512921A (ja) 1997-12-22
EP0749593A1 (fr) 1996-12-27
DE4407622A1 (de) 1995-09-14

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