CN1301004C - 互补金属氧化物半导体图像传感器 - Google Patents

互补金属氧化物半导体图像传感器 Download PDF

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Publication number
CN1301004C
CN1301004C CNB021570612A CN02157061A CN1301004C CN 1301004 C CN1301004 C CN 1301004C CN B021570612 A CNB021570612 A CN B021570612A CN 02157061 A CN02157061 A CN 02157061A CN 1301004 C CN1301004 C CN 1301004C
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China
Prior art keywords
wiring
fixed potential
image sensor
circuit
circuits
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Expired - Fee Related
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CNB021570612A
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English (en)
Chinese (zh)
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CN1437387A (zh
Inventor
国分政利
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Socionext Inc
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Fujitsu Ltd
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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/60Noise processing, e.g. detecting, correcting, reducing or removing noise
    • H04N25/616Noise processing, e.g. detecting, correcting, reducing or removing noise involving a correlated sampling function, e.g. correlated double sampling [CDS] or triple sampling
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/60Noise processing, e.g. detecting, correcting, reducing or removing noise
    • H04N25/65Noise processing, e.g. detecting, correcting, reducing or removing noise applied to reset noise, e.g. KTC noise related to CMOS structures by techniques other than CDS
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/18Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/802Geometry or disposition of elements in pixels, e.g. address-lines or gate electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/803Pixels having integrated switching, control, storage or amplification elements

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  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
CNB021570612A 2002-02-04 2002-12-24 互补金属氧化物半导体图像传感器 Expired - Fee Related CN1301004C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP027277/2002 2002-02-04
JP2002027277A JP3992504B2 (ja) 2002-02-04 2002-02-04 Cmosイメージセンサ

Publications (2)

Publication Number Publication Date
CN1437387A CN1437387A (zh) 2003-08-20
CN1301004C true CN1301004C (zh) 2007-02-14

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Family Applications (1)

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CNB021570612A Expired - Fee Related CN1301004C (zh) 2002-02-04 2002-12-24 互补金属氧化物半导体图像传感器

Country Status (6)

Country Link
US (1) US7113215B2 (de)
EP (1) EP1333662A3 (de)
JP (1) JP3992504B2 (de)
KR (1) KR100858452B1 (de)
CN (1) CN1301004C (de)
TW (1) TW569441B (de)

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US20050200730A1 (en) * 2004-03-11 2005-09-15 Beck Jeffery S. Active pixel sensor array sampling system and method
US7388608B2 (en) * 2004-03-11 2008-06-17 Micron Technology, Inc. Sample and hold circuit and active pixel sensor array sampling system utilizing same
JP4352964B2 (ja) * 2004-03-29 2009-10-28 株式会社島津製作所 二次元像検出器
JP2006019927A (ja) * 2004-06-30 2006-01-19 Fujitsu Ltd kTC雑音を低減したCMOSイメージセンサ、同イメージセンサの用いるリセットトランジスタ制御回路、および同制御回路に用いる電圧切替回路
JP4969771B2 (ja) * 2004-07-12 2012-07-04 ソニー株式会社 固体撮像装置及びそのキャパシタ調整方法
CN100446547C (zh) * 2005-03-07 2008-12-24 富士胶片株式会社 具有扩大面积的光电管的固态图像传感器
KR100729501B1 (ko) * 2005-08-03 2007-06-15 매그나칩 반도체 유한회사 자동초점조절 기능을 갖는 cmos 이미지센서 및 그를포함하는 카메라 장치
US7919827B2 (en) * 2005-03-11 2011-04-05 Taiwan Semiconductor Manufacturing Co., Ltd. Method and structure for reducing noise in CMOS image sensors
US7573519B2 (en) * 2005-10-26 2009-08-11 Eastman Kodak Company Method for correcting eclipse or darkle
JP4144892B2 (ja) 2006-08-28 2008-09-03 キヤノン株式会社 光電変換装置及び撮像装置
US20080308585A1 (en) * 2006-09-27 2008-12-18 John Foley Nozzle
JP2008108917A (ja) * 2006-10-25 2008-05-08 Sony Corp 固体撮像装置及び電子機器
US7537951B2 (en) 2006-11-15 2009-05-26 International Business Machines Corporation Image sensor including spatially different active and dark pixel interconnect patterns
WO2008060124A2 (en) * 2006-11-17 2008-05-22 Silicon Communications Technology Co., Ltd. Low power image sensor adjusting reference voltage automatically and optical pointing device comprising the same
JP5067011B2 (ja) * 2007-05-18 2012-11-07 ソニー株式会社 固体撮像装置、撮像装置、電子機器
CN101387771B (zh) * 2007-09-14 2010-08-18 群康科技(深圳)有限公司 液晶显示装置
TWI359611B (en) * 2008-02-21 2012-03-01 Novatek Microelectronics Corp Image sensor capable of reducing noises
JP5173503B2 (ja) * 2008-03-14 2013-04-03 キヤノン株式会社 撮像装置及び撮像システム
JP5006281B2 (ja) * 2008-07-24 2012-08-22 パナソニック株式会社 固体撮像装置、カメラ
JP2010225618A (ja) * 2009-03-19 2010-10-07 Seiko Epson Corp センシング装置および電子機器
US8624875B2 (en) * 2009-08-24 2014-01-07 Semiconductor Energy Laboratory Co., Ltd. Method for driving touch panel
WO2011055638A1 (en) 2009-11-06 2011-05-12 Semiconductor Energy Laboratory Co., Ltd. Display device
JP5578008B2 (ja) * 2010-10-12 2014-08-27 ソニー株式会社 固体撮像装置、固体撮像装置の駆動方法および撮像装置
CA2835870A1 (en) 2011-05-12 2012-11-15 Olive Medical Corporation Pixel array area optimization using stacking scheme for hybrid image sensor with minimal vertical interconnects
JP6239820B2 (ja) * 2011-12-19 2017-11-29 キヤノン株式会社 撮像装置及びその制御方法
CN104486987A (zh) 2012-07-26 2015-04-01 橄榄医疗公司 具有最小面积单片式cmos图像传感器的相机系统
WO2014145246A1 (en) 2013-03-15 2014-09-18 Olive Medical Corporation Image sensor synchronization without input clock and data transmission clock
AU2014233192B2 (en) 2013-03-15 2018-11-22 DePuy Synthes Products, Inc. Minimize image sensor I/O and conductor counts in endoscope applications
US10694131B2 (en) 2016-06-15 2020-06-23 Samsung Electronics Co., Ltd. Comparing circuit and an image sensor including a current stabilization circuit
JP7452962B2 (ja) * 2018-11-16 2024-03-19 ソニーセミコンダクタソリューションズ株式会社 撮像装置
FR3102885B1 (fr) * 2019-10-31 2022-03-18 Trixell Capteur photosensible à capteurs élémentaires raboutés
CN111430394A (zh) * 2020-04-26 2020-07-17 上海微阱电子科技有限公司 一种图像传感器结构及制作方法
JP7678676B2 (ja) 2021-02-04 2025-05-16 キヤノン株式会社 光電変換装置
JP7676159B2 (ja) * 2021-02-04 2025-05-14 キヤノン株式会社 光電変換装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5122649A (en) * 1989-12-11 1992-06-16 Fuji Photo Film Co., Ltd. Solid-state imaging device having a predetermined impurity layer embedded between two adjacent sets of switching transistors
US5136358A (en) * 1990-06-06 1992-08-04 Fuji Xerox Co., Ltd. Multi-layered wiring structure
EP1049171A1 (de) * 1998-10-30 2000-11-02 Hamamatsu Photonics K.K. Festkörper-bildaufnahmevorrichtung und festkörperbildmatrix
US6201573B1 (en) * 1995-11-13 2001-03-13 Hamamatsu Photonics K. K. Solid state imaging apparatus for imaging a two dimensional optical image having a number of integration circuits

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JPH0748786B2 (ja) 1989-10-04 1995-05-24 富士ゼロックス株式会社 イメージセンサ
US5151380A (en) * 1991-08-19 1992-09-29 Texas Instruments Incorporated Method of making top buss virtual phase frame interline transfer CCD image sensor
JP3219036B2 (ja) * 1997-11-11 2001-10-15 日本電気株式会社 固体撮像装置
KR100464955B1 (ko) * 1998-06-29 2005-04-06 매그나칩 반도체 유한회사 메모리소자와 함께 집적화된 씨모스 이미지센서
KR20010061308A (ko) * 1999-12-28 2001-07-07 박종섭 박막 이미지센서의 제조 방법
KR100429571B1 (ko) * 1999-12-28 2004-05-03 주식회사 하이닉스반도체 저전력화 및 화질 개선을 위한 단위 화소 회로 및 판독 회로를 갖는 이미지센서
KR100320439B1 (ko) * 1999-12-30 2002-01-12 박종섭 씨모스 이미지 센서
US6452149B1 (en) * 2000-03-07 2002-09-17 Kabushiki Kaisha Toshiba Image input system including solid image sensing section and signal processing section
US7071980B2 (en) * 2000-07-27 2006-07-04 Canon Kabushiki Kaisha Image sensing apparatus
KR20010087810A (ko) * 2001-06-11 2001-09-26 하경호 근접 센싱을 위한 고집적 cmos 이미지 센서
US6927433B2 (en) * 2001-06-28 2005-08-09 Isetec, Inc Active pixel image sensor with two transistor pixel, in-pixel non-uniformity correction, and bootstrapped reset lines

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5122649A (en) * 1989-12-11 1992-06-16 Fuji Photo Film Co., Ltd. Solid-state imaging device having a predetermined impurity layer embedded between two adjacent sets of switching transistors
US5136358A (en) * 1990-06-06 1992-08-04 Fuji Xerox Co., Ltd. Multi-layered wiring structure
US6201573B1 (en) * 1995-11-13 2001-03-13 Hamamatsu Photonics K. K. Solid state imaging apparatus for imaging a two dimensional optical image having a number of integration circuits
EP1049171A1 (de) * 1998-10-30 2000-11-02 Hamamatsu Photonics K.K. Festkörper-bildaufnahmevorrichtung und festkörperbildmatrix

Also Published As

Publication number Publication date
TW569441B (en) 2004-01-01
US20030146994A1 (en) 2003-08-07
EP1333662A3 (de) 2004-01-07
EP1333662A2 (de) 2003-08-06
US7113215B2 (en) 2006-09-26
JP2003229557A (ja) 2003-08-15
TW200303088A (en) 2003-08-16
CN1437387A (zh) 2003-08-20
KR100858452B1 (ko) 2008-09-16
JP3992504B2 (ja) 2007-10-17
KR20030066308A (ko) 2003-08-09

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Effective date of registration: 20081219

Address after: Tokyo, Japan

Patentee after: Fujitsu Microelectronics Ltd.

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CF01 Termination of patent right due to non-payment of annual fee