DE69431908D1 - Fotoempfindliche, mit wasser entwickelbare druckplatten für den flexodruck - Google Patents

Fotoempfindliche, mit wasser entwickelbare druckplatten für den flexodruck

Info

Publication number
DE69431908D1
DE69431908D1 DE69431908T DE69431908T DE69431908D1 DE 69431908 D1 DE69431908 D1 DE 69431908D1 DE 69431908 T DE69431908 T DE 69431908T DE 69431908 T DE69431908 T DE 69431908T DE 69431908 D1 DE69431908 D1 DE 69431908D1
Authority
DE
Germany
Prior art keywords
printing
photo
sensitive
water
developable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69431908T
Other languages
English (en)
Other versions
DE69431908T2 (de
Inventor
W Kelsall
R Maurer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Napp Systems Inc
Original Assignee
Napp Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Napp Systems Inc filed Critical Napp Systems Inc
Application granted granted Critical
Publication of DE69431908D1 publication Critical patent/DE69431908D1/de
Publication of DE69431908T2 publication Critical patent/DE69431908T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69431908T 1993-03-25 1994-03-21 Fotoempfindliche, mit wasser entwickelbare druckplatten für den flexodruck Expired - Fee Related DE69431908T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/036,984 US5350661A (en) 1993-03-25 1993-03-25 Water-developable photosensitive plates especially suited for commercial flexographic printing
PCT/US1994/003024 WO1994022057A1 (en) 1993-03-25 1994-03-21 Water-developable photosensitive plates especially suited for commercial flexographic printing

Publications (2)

Publication Number Publication Date
DE69431908D1 true DE69431908D1 (de) 2003-01-30
DE69431908T2 DE69431908T2 (de) 2003-09-04

Family

ID=21891808

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69431908T Expired - Fee Related DE69431908T2 (de) 1993-03-25 1994-03-21 Fotoempfindliche, mit wasser entwickelbare druckplatten für den flexodruck

Country Status (4)

Country Link
US (1) US5350661A (de)
EP (1) EP0691001B1 (de)
DE (1) DE69431908T2 (de)
WO (1) WO1994022057A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5851731A (en) * 1996-09-09 1998-12-22 M. A. Hanna Company Composition for the manufacture of flexographic printing plates
WO1997026586A1 (en) * 1996-01-12 1997-07-24 M.A. Hanna Company Composition for the manufacture of flexographic printing plates
US6197479B1 (en) 1998-06-26 2001-03-06 Toray Industries, Inc. Photosensitive resin composition, method for producing photosensitive resin composition, and printing plate material
US6579664B2 (en) * 2001-03-30 2003-06-17 Napp Systems, Inc. High performance, photoimageable resin compositions and printing plates prepared therefrom
JP6810905B2 (ja) * 2016-10-26 2021-01-13 東洋紡株式会社 凸版印刷原版用感光性樹脂組成物、及びそれから得られる凸版印刷原版

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4996134A (en) * 1984-04-13 1991-02-26 Japan Synthetic Rubber Co., Ltd. Conjugated diene copolymer, a process for producing the copolymer, and a photosensitive composition comprising the copolymer
PT85756A (pt) * 1986-09-22 1988-10-14 Napp Systems Inc Processo para a preparacao de chapas fotossensiveis e revelaveis com agua
JPH085927B2 (ja) * 1986-12-26 1996-01-24 日本合成ゴム株式会社 感光性樹脂組成物
JPH02230152A (ja) * 1987-06-18 1990-09-12 Napp Syst Usa Inc 感光性樹脂組成物
DE3837324A1 (de) * 1988-11-03 1990-05-10 Basf Ag Lichtempfindliches aufzeichnungsmaterial
US5143819A (en) * 1991-01-25 1992-09-01 W. R. Grace & Co.-Conn. Aqueous developing, photocurable composition, photosensitive articles having layers made therefrom and method of improving those articles

Also Published As

Publication number Publication date
DE69431908T2 (de) 2003-09-04
EP0691001B1 (de) 2002-12-18
EP0691001A1 (de) 1996-01-10
US5350661A (en) 1994-09-27
WO1994022057A1 (en) 1994-09-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee