DE69534788D1 - Verfahren zur herstellung von photoempfindlichem harz und flüssige photoempfindliche harzzusammensetzung - Google Patents

Verfahren zur herstellung von photoempfindlichem harz und flüssige photoempfindliche harzzusammensetzung

Info

Publication number
DE69534788D1
DE69534788D1 DE69534788T DE69534788T DE69534788D1 DE 69534788 D1 DE69534788 D1 DE 69534788D1 DE 69534788 T DE69534788 T DE 69534788T DE 69534788 T DE69534788 T DE 69534788T DE 69534788 D1 DE69534788 D1 DE 69534788D1
Authority
DE
Germany
Prior art keywords
sensitive resin
photo sensitive
preparing
resin composition
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69534788T
Other languages
English (en)
Other versions
DE69534788T2 (de
Inventor
Toshio Awaji
Nobuaki Ohtsuki
Motohiro Arakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Shokubai Co Ltd
Original Assignee
Nippon Shokubai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Shokubai Co Ltd filed Critical Nippon Shokubai Co Ltd
Publication of DE69534788D1 publication Critical patent/DE69534788D1/de
Application granted granted Critical
Publication of DE69534788T2 publication Critical patent/DE69534788T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1494—Polycondensates modified by chemical after-treatment followed by a further chemical treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4292—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof together with monocarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C08L63/10—Epoxy resins modified by unsaturated compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistors
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
    • H05K3/34—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3452—Solder masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676—Single layer compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
DE69534788T 1994-09-14 1995-09-13 Verfahren zur herstellung von photoempfindlichem harz und flüssige photoempfindliche harzzusammensetzung Expired - Fee Related DE69534788T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP22042994 1994-09-14
JP22042994 1994-09-14
JP18306195 1995-07-19
JP18306195 1995-07-19
PCT/JP1995/001828 WO1996008525A1 (en) 1994-09-14 1995-09-13 Process for producing photosensitive resin and liquid photosensitive resin composition

Publications (2)

Publication Number Publication Date
DE69534788D1 true DE69534788D1 (de) 2006-04-20
DE69534788T2 DE69534788T2 (de) 2006-11-02

Family

ID=26501632

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69534788T Expired - Fee Related DE69534788T2 (de) 1994-09-14 1995-09-13 Verfahren zur herstellung von photoempfindlichem harz und flüssige photoempfindliche harzzusammensetzung

Country Status (5)

Country Link
US (1) US5849857A (de)
EP (1) EP0728788B1 (de)
KR (1) KR100192934B1 (de)
DE (1) DE69534788T2 (de)
WO (1) WO1996008525A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3720478B2 (ja) * 1996-07-23 2005-11-30 富士写真フイルム株式会社 感光性樹脂組成物
US6458509B1 (en) * 1999-04-30 2002-10-01 Toagosei Co., Ltd. Resist compositions
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
WO2001058977A1 (en) * 2000-02-14 2001-08-16 Taiyo Ink Manufacturing Co., Ltd. Photocurable/thermosetting composition for forming matte film
WO2002096969A1 (en) * 2001-05-25 2002-12-05 Taiyo Ink Manufacturing Co., Ltd. Light- and heat-curing resin composition
EP1494073A3 (de) * 2001-09-21 2005-04-06 Tamura Kaken Corporation Lichtempfindliche Harzzusammensetzung und Leiterplatte
JP3943883B2 (ja) * 2001-10-02 2007-07-11 新日鐵化学株式会社 絶縁用樹脂組成物及びこれを用いた積層体
JP4363029B2 (ja) * 2002-11-06 2009-11-11 ソニー株式会社 分割波長板フィルターの製造方法
KR100995942B1 (ko) * 2003-04-30 2010-11-22 디아이씨 가부시끼가이샤 경화성 수지 조성물
TW200702932A (en) * 2005-05-11 2007-01-16 Toppan Printing Co Ltd Alkali development-type photosensitive resin composition, substrate with protrusions for liquid crystal split orientational control and color filter formed using the same, and liquid crystal display device
JP4641861B2 (ja) * 2005-05-11 2011-03-02 株式会社Adeka アルカリ現像性樹脂組成物
KR100935148B1 (ko) * 2005-06-30 2010-01-06 디아이씨 가부시끼가이샤 감광성 수지 조성물

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4119640A (en) * 1975-07-10 1978-10-10 Union Carbide Corporation Polymerizable epoxide-modified compositions
US4187257A (en) * 1978-04-18 1980-02-05 The Dow Chemical Company Radiation curable vinyl ester resin
DE3447357A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Trockenfilmresist und verfahren zur herstellung von resistmustern
DE3447355A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Vernetzbares harz, lichtempfindliches aufzeichnungsmaterial auf basis dieses vernetzbaren harzes sowie verfahren zur herstellung einer flachdruckplatte mittels dieses lichtempfindlichen aufzeichnungsmaterials
JPS61243869A (ja) * 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
JPS63258975A (ja) * 1986-12-26 1988-10-26 Toshiba Corp ソルダーレジストインキ組成物
JPH01188517A (ja) * 1988-01-25 1989-07-27 Toagosei Chem Ind Co Ltd 硬化用組成物の製造方法および光硬化用組成物
ATE134686T1 (de) * 1988-04-04 1996-03-15 Hitachi Chemical Co Ltd Electrischer schichtstoff hergestellt durch den verwendung von spezieler wärmhärtbaren harzzusammensetzungen
GB2235925B (en) * 1989-09-12 1992-09-30 Sericol Group Ltd Photocurable compositions
JPH05202332A (ja) * 1992-01-27 1993-08-10 Taiyo Ink Seizo Kk 液状フォトソルダーレジストインキ組成物
JPH0693082A (ja) * 1992-09-10 1994-04-05 Nippon Shokubai Co Ltd カラーフィルター用光硬化性着色樹脂組成物
JP2684948B2 (ja) * 1993-02-03 1997-12-03 株式会社日本触媒 液状感光性樹脂組成物
JP3274545B2 (ja) * 1993-07-16 2002-04-15 株式会社日本触媒 液状感光性樹脂組成物

Also Published As

Publication number Publication date
KR100192934B1 (ko) 1999-06-15
KR960705865A (ko) 1996-11-08
US5849857A (en) 1998-12-15
EP0728788A4 (de) 1998-12-23
EP0728788B1 (de) 2006-02-15
WO1996008525A1 (en) 1996-03-21
EP0728788A1 (de) 1996-08-28
DE69534788T2 (de) 2006-11-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee