DK0442162T3 - Film af titanhydrid - Google Patents

Film af titanhydrid

Info

Publication number: DK0442162T3
Authority: DK; Denmark
Prior art keywords: titanium hydride; metal; hydride film; film; deposited
Prior art date: 1990-02-16

Application number

DK90203447.9T

Other languages

English (en)

Inventor

Gianfranco Boccalon

Giovanni Grillo

Vittorio Vittori

Original Assignee

Eniricerche Spa

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1990-02-16

Filing date

1990-12-20

Publication date

1993-10-11

1990-12-20 Application filed by Eniricerche Spa filed Critical Eniricerche Spa

1993-10-11 Application granted granted Critical

1993-10-11 Publication of DK0442162T3 publication Critical patent/DK0442162T3/da

Links

-1 Titanium hydride Chemical compound 0.000 title abstract 2
229910000048 titanium hydride Inorganic materials 0.000 title abstract 2
229910052751 metal Inorganic materials 0.000 abstract 3
239000002184 metal Substances 0.000 abstract 3
238000000034 method Methods 0.000 abstract 2
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
239000011521 glass Substances 0.000 abstract 1
150000004678 hydrides Chemical class 0.000 abstract 1
229910052739 hydrogen Inorganic materials 0.000 abstract 1
239000001257 hydrogen Substances 0.000 abstract 1
239000000463 material Substances 0.000 abstract 1
229910052987 metal hydride Inorganic materials 0.000 abstract 1
150000004681 metal hydrides Chemical class 0.000 abstract 1
150000002739 metals Chemical class 0.000 abstract 1
239000004033 plastic Substances 0.000 abstract 1
238000004544 sputter deposition Methods 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Treatment with charged particles
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)
Magnetic Heads (AREA)
Materials For Medical Uses (AREA)
Chemically Coating (AREA)
Compositions Of Oxide Ceramics (AREA)
Surface Treatment Of Glass (AREA)
Chemical Vapour Deposition (AREA)
Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
Solid-Sorbent Or Filter-Aiding Compositions (AREA)

DK90203447.9T 1990-02-16 1990-12-20 Film af titanhydrid DK0442162T3 (da)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
IT19390A IT1238695B (it)	1990-02-16	1990-02-16	Film di idruro di titanio

Publications (1)

Publication Number	Publication Date
DK0442162T3 true DK0442162T3 (da)	1993-10-11

Family

ID=11157289

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DK90203447.9T DK0442162T3 (da)	1990-02-16	1990-12-20	Film af titanhydrid

Country Status (9)

Country	Link
EP (1)	EP0442162B1 (da)
JP (1)	JPH04218673A (da)
AT (1)	ATE90737T1 (da)
CA (1)	CA2036403A1 (da)
DE (1)	DE69002000T2 (da)
DK (1)	DK0442162T3 (da)
ES (1)	ES2042203T3 (da)
IT (1)	IT1238695B (da)
RU (1)	RU1836487C (da)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE10235154B4 (de) *	2002-08-01	2005-01-05	Saint-Gobain Glass Deutschland Gmbh	Vorspannbares Schichtsystem für Glasscheiben
CN102310038B (zh) *	2011-09-29	2014-06-11	华东交通大学	一种增强金属薄膜表面疏水性的方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4055686A (en) *	1976-02-20	1977-10-25	The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration	Method of forming metal hydride films
FR2585730B1 (fr) *	1985-08-01	1987-10-09	Centre Nat Rech Scient	Procede de depot de metaux en couche mince sur un substrat non metallique, avec depot intermediaire d'hydrures par pulverisation cathodique reactive
FR2630133B1 (fr) *	1988-04-18	1993-09-24	Siderurgie Fse Inst Rech	Procede pour l'amelioration de la resistance a la corrosion de materiaux metalliques

1990
- 1990-02-16 IT IT19390A patent/IT1238695B/it active IP Right Grant
- 1990-12-20 AT AT90203447T patent/ATE90737T1/de not_active IP Right Cessation
- 1990-12-20 DK DK90203447.9T patent/DK0442162T3/da active
- 1990-12-20 DE DE90203447T patent/DE69002000T2/de not_active Expired - Fee Related
- 1990-12-20 ES ES199090203447T patent/ES2042203T3/es not_active Expired - Lifetime
- 1990-12-20 EP EP90203447A patent/EP0442162B1/en not_active Expired - Lifetime
1991
- 1991-02-15 JP JP3042266A patent/JPH04218673A/ja not_active Withdrawn
- 1991-02-15 CA CA002036403A patent/CA2036403A1/en not_active Abandoned
- 1991-02-15 RU SU914894693A patent/RU1836487C/ru active

Also Published As

Publication number	Publication date
DE69002000T2 (de)	1994-01-27
RU1836487C (ru)	1993-08-23
IT9019390A1 (it)	1991-08-17
ES2042203T3 (es)	1993-12-01
EP0442162B1 (en)	1993-06-16
IT1238695B (it)	1993-09-01
ATE90737T1 (de)	1993-07-15
CA2036403A1 (en)	1991-08-17
DE69002000D1 (de)	1993-07-22
EP0442162A1 (en)	1991-08-21
JPH04218673A (ja)	1992-08-10

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