DK1355359T3 - Selvjusterende serieforbindelse af tynd- og tykfilm og fremgangsmåde til fremstilling - Google Patents

Selvjusterende serieforbindelse af tynd- og tykfilm og fremgangsmåde til fremstilling

Info

Publication number
DK1355359T3
DK1355359T3 DK02006161T DK02006161T DK1355359T3 DK 1355359 T3 DK1355359 T3 DK 1355359T3 DK 02006161 T DK02006161 T DK 02006161T DK 02006161 T DK02006161 T DK 02006161T DK 1355359 T3 DK1355359 T3 DK 1355359T3
Authority
DK
Denmark
Prior art keywords
self
manufacturing process
main layer
thick film
serial connection
Prior art date
Application number
DK02006161T
Other languages
English (en)
Inventor
Volker Geyer
Original Assignee
Scheuten Glasgroep Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Scheuten Glasgroep Bv filed Critical Scheuten Glasgroep Bv
Application granted granted Critical
Publication of DK1355359T3 publication Critical patent/DK1355359T3/da

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • H10F77/206Electrodes for devices having potential barriers
    • H10F77/211Electrodes for devices having potential barriers for photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/162Photovoltaic cells having only PN heterojunction potential barriers comprising only Group II-VI materials, e.g. CdS/CdTe photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/167Photovoltaic cells having only PN heterojunction potential barriers comprising Group I-III-VI materials, e.g. CdS/CuInSe2 [CIS] heterojunction photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F19/00Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
    • H10F19/30Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells
    • H10F19/31Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells having multiple laterally adjacent thin-film photovoltaic cells deposited on the same substrate
    • H10F19/35Structures for the connecting of adjacent photovoltaic cells, e.g. interconnections or insulating spacers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/14Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
    • H10F77/148Shapes of potential barriers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/541CuInSe2 material PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/543Solar cells from Group II-VI materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/942Masking
    • Y10S438/944Shadow

Landscapes

  • Photovoltaic Devices (AREA)
  • Communication Control (AREA)
  • Mechanical Coupling Of Light Guides (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Magnetically Actuated Valves (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Pinball Game Machines (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Magnetic Heads (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Microwave Amplifiers (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Electrical Connectors (AREA)
DK02006161T 2002-03-19 2002-03-19 Selvjusterende serieforbindelse af tynd- og tykfilm og fremgangsmåde til fremstilling DK1355359T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02006161A EP1355359B1 (de) 2002-03-19 2002-03-19 Selbstjustierende Serienverschaltung von Dünn- und Dickschichten und Verfahren zur Herstellung

Publications (1)

Publication Number Publication Date
DK1355359T3 true DK1355359T3 (da) 2007-08-13

Family

ID=27838018

Family Applications (1)

Application Number Title Priority Date Filing Date
DK02006161T DK1355359T3 (da) 2002-03-19 2002-03-19 Selvjusterende serieforbindelse af tynd- og tykfilm og fremgangsmåde til fremstilling

Country Status (11)

Country Link
US (1) US7288426B2 (da)
EP (2) EP1355359B1 (da)
JP (1) JP2005531128A (da)
KR (1) KR20040108670A (da)
AT (1) ATE358893T1 (da)
AU (1) AU2003226662A1 (da)
DE (1) DE50307566D1 (da)
DK (1) DK1355359T3 (da)
ES (1) ES2284738T3 (da)
PT (1) PT1355359E (da)
WO (1) WO2003079432A2 (da)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10339529A1 (de) * 2003-08-21 2005-03-24 Hahn-Meitner-Institut Berlin Gmbh Vertikaler Nano-Transistor, Verfahren zu seiner Herstellung und Speicheranordnung
JP3698160B2 (ja) 2004-01-09 2005-09-21 セイコーエプソン株式会社 半導体装置の製造方法
US7394962B2 (en) * 2006-02-20 2008-07-01 Samsung Electro-Mechanics Co., Ltd. Optical waveguide for transmitting surface plasmon-polariton wave
JP2010010602A (ja) * 2008-06-30 2010-01-14 Sanyo Electric Co Ltd 光起電力装置およびその製造方法
DE102011075092B4 (de) * 2010-12-07 2015-11-12 Von Ardenne Gmbh Verfahren zur Herstellung eines organischen lichtemittierenden Leuchtmittels
CN102222706B (zh) * 2011-06-28 2012-11-14 厦门市三安光电科技有限公司 一种高倍聚光太阳能电池芯片
DE102023201062A1 (de) * 2023-02-09 2024-08-14 Forschungszentrum Jülich GmbH Verfahren zur Herstellung eines elektronischen Bauteils mittels einer Wand sowie Bauteil
DE102024201035A1 (de) 2024-02-06 2025-08-07 Forschungszentrum Jülich GmbH P-i-n - Bauteil und Verfahren zur Herstellung

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6135573A (ja) * 1984-07-27 1986-02-20 Matsushita Electric Ind Co Ltd 光起電力素子の製造法
JPS62142368A (ja) * 1985-12-17 1987-06-25 Fuji Electric Co Ltd 薄膜半導体装置の製造方法
DE3727825A1 (de) 1987-08-20 1989-03-02 Siemens Ag Serienverschaltetes duennschichtsolarmodul aus kristallinem silizium
DE3727826A1 (de) * 1987-08-20 1989-03-02 Siemens Ag Serienverschaltetes duennschicht-solarmodul aus kristallinem silizium
JPH03245527A (ja) * 1990-02-23 1991-11-01 Rohm Co Ltd 微細加工方法
JP3720846B2 (ja) * 1995-03-27 2005-11-30 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 複数の電子多層構成部品の製造方法
DE69727655T2 (de) * 1996-05-28 2004-07-29 Matsushita Battery Industrial Co. Ltd., Moriguchi Verfahren zur herstellung einer cdte-schicht
KR100339186B1 (ko) * 1998-09-28 2002-05-31 포만 제프리 엘 기판상에서 패턴을 규정하는 장치 및 방법
US6805998B2 (en) * 2000-03-24 2004-10-19 Cymbet Corporation Method and apparatus for integrated-battery devices
US6716656B2 (en) * 2001-09-04 2004-04-06 The Trustees Of Princeton University Self-aligned hybrid deposition
FR2831714B1 (fr) * 2001-10-30 2004-06-18 Dgtec Assemblage de cellules photovoltaiques
US6667215B2 (en) * 2002-05-02 2003-12-23 3M Innovative Properties Method of making transistors

Also Published As

Publication number Publication date
KR20040108670A (ko) 2004-12-24
EP1488458B9 (de) 2007-11-28
DE50307566D1 (de) 2007-08-09
AU2003226662A1 (en) 2003-09-29
AU2003226662A8 (en) 2003-09-29
ES2284738T3 (es) 2007-11-16
WO2003079432A2 (de) 2003-09-25
US20050173238A1 (en) 2005-08-11
WO2003079432A3 (de) 2004-03-11
EP1488458B1 (de) 2007-06-27
EP1355359B1 (de) 2007-04-04
EP1355359A1 (de) 2003-10-22
ATE358893T1 (de) 2007-04-15
US7288426B2 (en) 2007-10-30
PT1355359E (pt) 2007-07-13
JP2005531128A (ja) 2005-10-13
EP1488458A2 (de) 2004-12-22

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