DK553786A - Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale - Google Patents

Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale

Info

Publication number
DK553786A
DK553786A DK553786A DK553786A DK553786A DK 553786 A DK553786 A DK 553786A DK 553786 A DK553786 A DK 553786A DK 553786 A DK553786 A DK 553786A DK 553786 A DK553786 A DK 553786A
Authority
DK
Denmark
Prior art keywords
photo
hardware
sensitive material
sensitive
including photo
Prior art date
Application number
DK553786A
Other languages
English (en)
Other versions
DK553786D0 (da
Inventor
Peter Gottschalk
Douglas Carlyle Neckers
Gary Benjamin Schuster
Original Assignee
Mead Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/917,873 external-priority patent/US4772541A/en
Application filed by Mead Corp filed Critical Mead Corp
Publication of DK553786D0 publication Critical patent/DK553786D0/da
Publication of DK553786A publication Critical patent/DK553786A/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/02—Dyestuff salts, e.g. salts of acid dyes with basic dyes
    • C09B69/06—Dyestuff salts, e.g. salts of acid dyes with basic dyes of cationic dyes with organic acids or with inorganic complex acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16H—GEARING
    • F16H53/00—Cams or cam-followers, e.g. rollers for gearing mechanisms
    • F16H53/02—Single-track cams for single-revolution cycles; Camshafts with such cams
    • F16H53/025—Single-track cams for single-revolution cycles; Camshafts with such cams characterised by their construction, e.g. assembling or manufacturing features
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61C—DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C13/00—Dental prostheses; Making same
    • A61C13/0003—Making bridge-work, inlays, implants or the like
    • A61C13/0006—Production methods
    • A61C13/0013—Production methods using stereolithographic techniques
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61C—DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C19/00—Dental auxiliary appliances
    • A61C19/003—Apparatus for curing resins by radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DK553786A 1985-11-20 1986-11-19 Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale DK553786A (da)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US80001485A 1985-11-20 1985-11-20
US86036786A 1986-05-06 1986-05-06
US06/917,873 US4772541A (en) 1985-11-20 1986-10-10 Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same

Publications (2)

Publication Number Publication Date
DK553786D0 DK553786D0 (da) 1986-11-19
DK553786A true DK553786A (da) 1987-05-21

Family

ID=27419957

Family Applications (1)

Application Number Title Priority Date Filing Date
DK553786A DK553786A (da) 1985-11-20 1986-11-19 Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale

Country Status (6)

Country Link
EP (2) EP0223587B1 (da)
KR (1) KR940002538B1 (da)
CN (1) CN86108826A (da)
BR (1) BR8605710A (da)
DE (2) DE3650107T2 (da)
DK (1) DK553786A (da)

Families Citing this family (197)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4977511A (en) * 1985-11-20 1990-12-11 The Mead Corporation Photosensitive materials containing ionic dye compound as initiators
JPS62232638A (ja) * 1986-04-02 1987-10-13 Brother Ind Ltd 感光感圧記録シ−ト
US4895880A (en) * 1986-05-06 1990-01-23 The Mead Corporation Photocurable compositions containing photobleachable ionic dye complexes
JPH07120036B2 (ja) * 1987-07-06 1995-12-20 富士写真フイルム株式会社 光重合性組成物
US4950581A (en) * 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US4751102A (en) * 1987-07-27 1988-06-14 The Mead Corporation Radiation-curable ink and coating compositions containing ionic dye compounds as initiators
JPH0820732B2 (ja) * 1987-10-13 1996-03-04 富士写真フイルム株式会社 光重合性組成物
US4874685A (en) * 1987-11-27 1989-10-17 The Mead Corporation Photocurable composition containing a photoreducible dye a thiol and an N,N'-dialkylaniline
US4840866A (en) * 1988-03-24 1989-06-20 The Mead Corporation Microcapsule imaging system having improved dynamic range
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
CN1043995A (zh) * 1988-10-11 1990-07-18 米德公司 通过控制粘度防止短时间倒易律失效
US4954414A (en) * 1988-11-08 1990-09-04 The Mead Corporation Photosensitive composition containing a transition metal coordination complex cation and a borate anion and photosensitive materials employing the same
CA2005933A1 (en) * 1989-01-09 1990-07-09 Jesse Hipps, Sr. Photohardenable composition containing five member aromatic group with imine moiety
JP2571115B2 (ja) * 1989-01-17 1997-01-16 富士写真フイルム株式会社 感光性組成物の増感方法及び増感された感光性組成物
US4954415A (en) * 1989-03-09 1990-09-04 The Mead Corporation Photoinitiator compositions containing O-acylthiohydroxamate or an N-alkoxypyridinethione and photohardenable compositions containing the same
CA2009652A1 (en) * 1989-03-09 1990-09-09 Paul Davis Photoinitiator compositions containing disulfides and photohardenable compositions containing the same
EP0390439A1 (en) * 1989-03-27 1990-10-03 The Mead Corporation Complexes useful as photoinitiators and photohardenable compositions containing the same
EP0422686B1 (en) * 1989-10-13 1997-04-16 Fuji Photo Film Co., Ltd. Image-forming material containing an aluminate complex
KR910012820A (ko) * 1989-12-20 1991-08-08 로레인 제이. 프란시스 황산화제 배합물을 함유하는 유리 라디칼 중합성 조성물
EP0438123B1 (en) * 1990-01-16 1995-09-13 Showa Denko Kabushiki Kaisha Near infrared polymerization initiator
EP0450254A1 (en) * 1990-04-03 1991-10-09 Ciba-Geigy Ag Photocurable compositions
JPH043064A (ja) * 1990-04-20 1992-01-08 Oriental Photo Ind Co Ltd 感光体
JP3244288B2 (ja) * 1990-07-23 2002-01-07 昭和電工株式会社 近赤外光消色型記録材料
TW207021B (da) * 1990-07-23 1993-06-01 Showa Denko Kk
TW363999B (en) * 1991-06-04 1999-07-11 Vantico Ag Photosensitive compositions
GB9121789D0 (en) * 1991-10-14 1991-11-27 Minnesota Mining & Mfg Positive-acting photothermographic materials
CA2120838A1 (en) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
ATE175034T1 (de) * 1993-08-26 1999-01-15 Ciba Geigy Ag Flüssige strahlungshärtbare zusammensetzung, insbesondere für die stereolithographie
ATE193532T1 (de) * 1993-09-16 2000-06-15 Ciba Sc Holding Ag Vinyletherverbindungen mit zusätzlichen von vinylethergruppen verschiedenen funktionellen gruppen und deren verwendung zur formulierung härtbarer zusammensetzungen
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US5685754A (en) 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
TW418215B (en) * 1995-03-13 2001-01-11 Ciba Sc Holding Ag A process for the production of three-dimensional articles in a stereolithography bath comprising the step of sequentially irradiating a plurality of layers of a liquid radiation-curable composition
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
BR9608367A (pt) 1995-06-05 1998-08-18 Kimberly Clark Co Pré-corantes novos
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
JP2000506550A (ja) 1995-06-28 2000-05-30 キンバリー クラーク ワールドワイド インコーポレイテッド 新規な着色剤および着色剤用改質剤
DK0854783T3 (da) * 1995-09-09 2003-02-24 Vantico Ltd Fremgangsmåde til fremstilling af polymerlag med selektivt farvede arealer
TW466256B (en) * 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
TW467933B (en) * 1995-11-24 2001-12-11 Ciba Sc Holding Ag Photopolymerizable compositions comprising borate photoinitiators from monoboranes and the use thereof
ES2175168T3 (es) 1995-11-28 2002-11-16 Kimberly Clark Co Compuestos de colorantes estabilizados por la luz.
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
KR100491736B1 (ko) * 1996-07-29 2005-09-09 반티코 아게 입체리토그래피용방사선-경화성액체조성물
EP0825201B2 (en) † 1996-08-23 2006-11-29 Showa Denko Kabushiki Kaisha Photocurable composition and curing process therefor
JPH10319584A (ja) * 1997-05-21 1998-12-04 Brother Ind Ltd マイクロカプセルを用いた感光性記録材料
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
EP0915136B1 (en) * 1997-11-05 2004-01-21 Showa Denko Kabushiki Kaisha Photocurable paint composition for road markings
JP2002505447A (ja) * 1998-02-25 2002-02-19 サイカラー インコーポレイテッド カプセルに封入した放射線感光性組成物を使用した画像形成システム
JPH11249304A (ja) * 1998-03-02 1999-09-17 Oriental Photo Ind Co Ltd 乾式画像形成材料及び乾式画像形成方法
US6100007A (en) 1998-04-06 2000-08-08 Ciba Specialty Chemicals Corp. Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures
SK1542000A3 (en) 1998-06-03 2001-11-06 Kimberly Clark Co Neonanoplasts produced by microemulsion technology and inks for ink jet printing
SK1552000A3 (en) 1998-06-03 2000-08-14 Kimberly Clark Co Novel photoinitiators and applications therefor
JP2002520470A (ja) 1998-07-20 2002-07-09 キンバリー クラーク ワールドワイド インコーポレイテッド 改良されたインクジェットインク組成物
JP2002523393A (ja) 1998-08-21 2002-07-30 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 光活性化が可能な窒素含有塩基
US6398981B1 (en) 1998-09-18 2002-06-04 Universite Laval Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum
BR9914123B1 (pt) 1998-09-28 2010-11-30 fotoiniciadores e aplicações para os mesmos.
ATE265481T1 (de) 1998-11-17 2004-05-15 Showa Denko Kk Photohärtbare zusammensetzung
EP1144512B1 (en) 1999-01-19 2003-04-23 Kimberly-Clark Worldwide, Inc. Novel colorants, colorant stabilizers, ink compositions, and improved methods of making the same
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6174642B1 (en) 1999-02-25 2001-01-16 Cycolor, Inc. Imaging system employing encapsulated radiation sensitive composition
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
AU2001269905A1 (en) 2000-06-19 2002-01-08 Kimberly-Clark Worldwide, Inc. Novel photoinitiators and applications therefor
US6841589B2 (en) 2001-10-03 2005-01-11 3D Systems, Inc. Ultra-violet light curable hot melt composition
WO2003029365A1 (en) 2001-10-03 2003-04-10 3D Systems, Inc. Phase change support material composition
KR100811393B1 (ko) * 2001-12-04 2008-03-07 주식회사 하이닉스반도체 패턴 붕괴 개선용 포토레지스트 첨가제 및 이를 함유하는포토레지스트 조성물
JP2005529200A (ja) 2002-05-03 2005-09-29 ディーエスエム アイピー アセッツ ビー．ブイ． 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法
US6989225B2 (en) 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
US7635727B2 (en) 2003-06-24 2009-12-22 Ppg Industries Ohio, Inc. Composite transparencies
EP1622178A1 (en) * 2004-07-29 2006-02-01 Ecole Polytechnique Federale De Lausanne (Epfl) 2,2 -Bipyridine ligand, sensitizing dye and dye sensitized solar cell
DE102004058584A1 (de) 2004-12-03 2006-06-08 Basf Ag Strahlungshärtbare Beschichtungsmassen
US8287611B2 (en) 2005-01-28 2012-10-16 Saint-Gobain Abrasives, Inc. Abrasive articles and methods for making same
US7591865B2 (en) 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
US8435098B2 (en) 2006-01-27 2013-05-07 Saint-Gobain Abrasives, Inc. Abrasive article with cured backsize layer
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
CA2672243C (en) 2006-12-21 2012-04-03 Saint-Gobain Abrasives, Inc. Low corrosion abrasive articles and methods for forming same
IL200995A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Polyether-based polyurethane formulations for the production of holographic media
IL200722A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer compositions for optical elements and visual displays
IL200997A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Special polyether-based polyurethane formulations for the production of holographic media
IL200996A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer formulations having a low crosslinking density
KR101720807B1 (ko) 2008-10-01 2017-03-28 코베스트로 도이칠란드 아게 홀로그래피 매체의 제조를 위한 예비중합체-기재 폴리우레탄 제제
EP2218743A1 (de) 2009-02-12 2010-08-18 Bayer MaterialScience AG Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme
EP2218742A1 (de) 2009-02-12 2010-08-18 Bayer MaterialScience AG Photopolymerzusammensetzungen als verdruckbare Formulierungen
EP2219073B1 (de) 2009-02-17 2020-06-03 Covestro Deutschland AG Holografische Medien und Photopolymerzusammensetzungen
US8501033B2 (en) 2009-03-13 2013-08-06 Dsm Ip Assets B.V. Radiation curable resin composition and rapid three-dimensional imaging process using the same
JP5638085B2 (ja) 2009-11-03 2014-12-10 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ 異なった書込コモノマーを含有する感光性ポリマー組成物
TW201133264A (en) 2009-11-03 2011-10-01 Bayer Materialscience Ag Method for selecting additives in photopolymers
EP2496549B1 (de) 2009-11-03 2014-10-08 Bayer Intellectual Property GmbH Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung
ES2453267T3 (es) 2009-11-03 2014-04-07 Bayer Intellectual Property Gmbh Procedimiento de fabricación de una película holográfica
US8808946B2 (en) 2009-11-03 2014-08-19 Bayer Materialscience Ag Urethane acrylate having a high refractive index and reduced double bond density
EP2496617B1 (de) 2009-11-03 2015-02-25 Bayer Intellectual Property GmbH Urethane als additive in einer photopolymer-formulierung
PL2317511T3 (pl) 2009-11-03 2012-08-31 Bayer Materialscience Ag Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv
WO2011054795A1 (de) 2009-11-03 2011-05-12 Bayer Materialscience Ag Fluorurethane als additive in einer photopolymer-formulierung
EP2354845B1 (de) 2010-02-02 2015-12-23 Covestro Deutschland AG Photopolymer-Formulierung zur Herstellung holographischer Medien
KR20120125270A (ko) 2010-02-02 2012-11-14 바이엘 인텔렉쳐 프로퍼티 게엠베하 트리아진-기재 기록 단량체를 갖는 광중합체 배합물
WO2011095442A1 (de) 2010-02-02 2011-08-11 Bayer Materialscience Ag Photopolymer-formulierung mit ester-basierten schreibmonomeren
EP2330461A1 (de) 2010-03-26 2011-06-08 Bayer MaterialScience AG Projektionseinrichtung für einen Picoprojektor und holographischer Projektionsschirm
RU2013110226A (ru) 2010-08-11 2014-09-20 Байер Интеллектуэль Проперти Гмбх Дифункциональные (мет)-акрилатные пишущие мономеры
EP2450893A1 (de) 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren
EP2450387A1 (de) 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung für die Herstellung holographischer Medien
US8460451B2 (en) 2011-02-23 2013-06-11 3D Systems, Inc. Support material and applications thereof
US9394441B2 (en) 2011-03-09 2016-07-19 3D Systems, Inc. Build material and applications thereof
US9157007B2 (en) 2011-03-09 2015-10-13 3D Systems, Incorporated Build material and applications thereof
US20120295999A1 (en) * 2011-05-16 2012-11-22 Deepak Shukla Photoinitiator and photocurable compositions and uses
US9475889B2 (en) 2011-05-16 2016-10-25 Eastman Kodak Company Photoinitiator and photocurable compositions and uses
EP2766902A1 (de) 2011-10-12 2014-08-20 Bayer Intellectual Property GmbH Schwefelhaltige kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen
KR20140082692A (ko) 2011-10-12 2014-07-02 바이엘 인텔렉쳐 프로퍼티 게엠베하 폴리우레탄-기재 광중합체 제제에서의 사슬 전달 시약
EP2613318B1 (de) 2012-01-05 2014-07-30 Bayer Intellectual Property GmbH Schichtaufbau mit einer Schutzschicht und einer belichteten Photopolymerschicht
TWI557187B (zh) 2012-05-03 2016-11-11 拜耳材料科學股份有限公司 用於光聚合物之新穎光起始劑
CN104540685B (zh) 2012-08-23 2017-09-26 科思创德国股份有限公司 含有具有全息图的视觉可变窗口的安全文件和/或有价文件
EP2700510B1 (de) 2012-08-23 2015-09-16 Bayer MaterialScience AG Polycarbonatbasierte Sicherheits- und/oder Wertdokumente mit Hologramm im Kartenkörper
US8980406B2 (en) 2012-08-28 2015-03-17 3D Systems, Inc. Color stable inks and applications thereof
US9657186B2 (en) 2012-09-13 2017-05-23 3D Systems, Inc. Opaque inks and applications thereof
EP2948427A2 (de) 2013-01-25 2015-12-02 Covestro Deutschland AG Sicherheitselement mit volumenhologramm und druckmerkmal
TWI640428B (zh) 2013-02-27 2018-11-11 拜耳材料科學股份有限公司 以丙烯酸酯為基底之保護塗層與黏著劑
EP2772917A1 (de) 2013-02-27 2014-09-03 Bayer MaterialScience AG Schutzlacke auf Basis von strahlenvernetzbaren Polyurethandispersionen
EP2969482B1 (en) 2013-03-15 2018-05-09 3D Systems, Inc. Three dimensional printing material system
JP6497850B2 (ja) 2013-05-08 2019-04-10 コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ ハロー防止層を有するホログラフィック記録媒体およびその製造
PL3058423T3 (pl) 2013-10-17 2018-09-28 Covestro Deutschland Ag Formulacja fotopolimerowa do wytwarzania mediów holograficznych z boranami o niskiej TG
KR20160079828A (ko) 2013-10-30 2016-07-06 코베스트로 도이칠란트 아게 기재 및 광중합체 필름을 포함하는 복합체
US9804490B2 (en) 2013-12-20 2017-10-31 Covestro Deutschland Ag Holographic media with improved light sensitivity
US11602892B2 (en) 2013-12-23 2023-03-14 3D Systems, Inc. Three dimensional printing materials, systems, and methods
WO2015138567A1 (en) 2014-03-11 2015-09-17 3D Systems, Incorporated 3d printing colorization
CN106232651B (zh) 2014-04-25 2019-08-13 科思创德国股份有限公司 作为全息光聚合物组合物中的书写单体的芳族二醇醚
US20150344694A1 (en) 2014-05-30 2015-12-03 3D Systems, Incorporated Water dispersible support materials for 3d printing
EP3540017B1 (en) 2014-06-04 2021-10-27 3D Systems, Inc. Inks comprising gellants for 3d printing
WO2015191539A1 (en) 2014-06-09 2015-12-17 3D Systems, Incorporated Methods of printing grayscale and full-color 3d articles
US9650526B2 (en) 2014-09-09 2017-05-16 3D Systems, Inc. Method of printing a three-dimensional article
US20160145452A1 (en) 2014-11-24 2016-05-26 3D Systems, Incorporated Inks comprising liquid rubber for 3d printing
US10241402B2 (en) 2014-12-12 2019-03-26 Covestro Deutschland Ag Naphthyl acrylates as writing monomers for photopolymers
JP6722672B2 (ja) 2014-12-19 2020-07-15 コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ 水分に安定なホログラフィック媒体
TWI698326B (zh) 2015-01-14 2020-07-11 德商科思創德意志股份有限公司 以全相光學元件製備光學鑄件之方法及光學鑄件
KR20180019200A (ko) 2015-06-23 2018-02-23 코베스트로 도이칠란트 아게 치환된 트리아진 및 그의 제조 방법
CN108473803B (zh) 2015-11-03 2021-11-12 3D系统公司 用于3d打印的生物相容性油墨
EP3166109A1 (de) 2015-11-09 2017-05-10 Covestro Deutschland AG Kit-of-parts enthaltend versiegellungsschicht und photopolymer
US10316214B2 (en) 2016-03-08 2019-06-11 3D Systems, Incorporated Non-isocyanate polyurethane inks for 3D printing
CN116285487B (zh) 2016-04-07 2026-03-27 3D系统公司 用于3d印刷的硫醇-烯油墨
KR102489809B1 (ko) 2016-11-09 2023-01-20 코베스트로 도이칠란트 아게 트리아릴 유기보레이트의 제조 방법
US11242360B2 (en) 2016-11-09 2022-02-08 Covestro Deutschland Ag Process for the manufacturing of triaryl-organo borates
KR102489807B1 (ko) 2016-11-09 2023-01-18 코베스트로 도이칠란트 아게 트리아릴 유기보레이트의 제조 방법
CN114921128B (zh) 2017-02-01 2023-12-15 3D系统公司 含有可环化聚合单体的3d印刷油墨
JP2020519943A (ja) 2017-05-09 2020-07-02 コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ ホログラフィック露光用のフォトポリマー層と高耐性コーティング層を含むホログラフィック媒体
TW201906730A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 用於保護光聚合物膜複合物中之全像圖之含ｕｖ硬化性黏著層的塑膠膜
TW201906882A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構
EP3622352B1 (de) 2017-05-09 2025-07-23 Covestro Deutschland AG System aus zwei trocken übertragbaren uv-härtenden lackschichten für den schutz eines hologramms in einem photopolymer-folienverbund
EP3401909A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Folienaufbau enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
EP3401910A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
EP3435156A1 (de) 2017-07-26 2019-01-30 Covestro Deutschland AG Schutzschicht für photopolymer
US11098209B2 (en) 2017-10-05 2021-08-24 3D Systems, Inc. Cyclopolymerizable compounds for 3D printing
EP3707214B1 (en) 2017-11-07 2024-06-12 3D Systems, Inc. Inks for 3d printing having low print through depth
EP3495886A1 (de) 2017-12-06 2019-06-12 Covestro Deutschland AG Klebstofffreier photopolymerschichtaufbau
WO2019245847A1 (en) 2018-06-22 2019-12-26 3D Systems, Inc. Method of verifying integrity of a post-process removal of support material
WO2019245845A1 (en) 2018-06-22 2019-12-26 3D Systems, Inc. 3d printing build materials and support materials comprising a phosphor
WO2020112496A1 (en) 2018-11-30 2020-06-04 3D Systems, Inc. Inks for 3d printing having low polymerization shrinkage
WO2021011357A1 (en) 2019-07-12 2021-01-21 3D Systems, Inc. Build materials for 3d printing
EP3772671A1 (de) 2019-08-06 2021-02-10 Covestro Deutschland AG Schichtaufbau für die belichtung von hologrammen
JP7340098B2 (ja) 2019-10-01 2023-09-06 スリーディー システムズ インコーポレーテッド ３ｄプリントのための長期保存可能な造形材料
US11377538B2 (en) 2019-10-01 2022-07-05 3D Systems, Inc. Optically active build materials for 3D printing
WO2021150854A1 (en) 2020-01-24 2021-07-29 3D Systems, Inc. Water soluble waxy support materials for three-dimensional printing applications
JP7820304B2 (ja) * 2020-04-02 2026-02-25 フジフィルム・マニュファクチュアリング・ヨーロッパ・ベスローテン・フエンノートシャップ バイポーラ膜
WO2022103786A1 (en) 2020-11-16 2022-05-19 3D Systems, Inc. Build materials for printing 3d articles
JP7662790B2 (ja) 2020-12-10 2025-04-15 スリーディー システムズ インコーポレーテッド 難燃性造形材料および関連するプリントされた３ｄ物品
WO2022192317A1 (en) 2021-03-10 2022-09-15 3D Systems, Inc. Additives for build materials and associated printed 3d articles
WO2022192330A1 (en) 2021-03-10 2022-09-15 3D Systems, Inc. Flame resistant build materials and associated printed 3d articles
CN117295797B (zh) 2021-05-07 2026-03-31 3D系统公司 用于构建材料和相关印刷3d制品的添加剂
EP4405407A1 (en) 2021-09-21 2024-07-31 3D Systems, Inc. Curable compounds and formulations for biomedical applications
EP4483365A1 (de) 2022-02-21 2025-01-01 Covestro Deutschland AG Thermostabile photopolymere im sichtbaren spektralbereich und photopolymer-zusammensetzungen damit
CN118742958A (zh) 2022-02-21 2024-10-01 科思创德国股份有限公司 三芳基烷基硼酸盐作为nir光聚合物组合物中的共引发剂
CN118742960A (zh) 2022-02-21 2024-10-01 科思创德国股份有限公司 可见光谱范围内的热稳定光聚合物的光聚合物组合物
EP4555024A1 (en) 2022-07-15 2025-05-21 3D Systems, Inc. Hydrogels for 3d printing having high resolution
WO2024052256A1 (de) 2022-09-07 2024-03-14 Covestro Deutschland Ag Spezielle benzopyryliumsalze als farbstoffe für photopolymerzusammensetzungen
EP4630503A1 (en) 2022-12-09 2025-10-15 3D Systems, Inc. Inks for 3d printing having high modulus and dispersion stability
EP4677036A1 (en) 2023-03-08 2026-01-14 3D Systems, Inc. Additives for build materials and associated printed 3d articles
WO2025096950A1 (en) 2023-11-03 2025-05-08 3D Systems, Inc. Water dispersible build materials for molding applications
US20250229484A1 (en) 2024-01-17 2025-07-17 3D Systems, Inc. Systems, methods, and compositions for additive manufacturing
US20250320363A1 (en) 2024-04-12 2025-10-16 3D Systems, Inc. Methods and compositions for additive manufacturing having high water permeability
US20250340689A1 (en) 2024-05-02 2025-11-06 3D Systems, Inc. Compositions and methods for 3d printing for molding applications
WO2026064498A1 (en) 2024-09-18 2026-03-26 3D Systems, Inc. Compositions for use in 3d printing

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3567453A (en) * 1967-12-26 1971-03-02 Eastman Kodak Co Light sensitive compositions for photoresists and lithography
JPS509178B1 (da) * 1970-12-28 1975-04-10
US4026705A (en) * 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
US4343891A (en) * 1980-05-23 1982-08-10 Minnesota Mining And Manufacturing Company Fixing of tetra (hydrocarbyl) borate salt imaging systems
US4447521A (en) * 1982-10-25 1984-05-08 Minnesota Mining And Manufacturing Company Fixing of tetra(hydrocarbyl)borate salt imaging systems
US4746685A (en) * 1984-08-31 1988-05-24 Nippon Oil And Fats Co., Ltd. Light curable dental composition
JPS61213838A (ja) * 1985-03-20 1986-09-22 Nippon Oil & Fats Co Ltd 感光性平版印刷版
GB8529448D0 (en) * 1985-11-29 1986-01-08 Ward Blenkinsop & Co Ltd Thioxanthone derivatives

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DE3650107D1 (de) 1994-11-24
DE3650107T2 (de) 1995-05-24
BR8605710A (pt) 1987-08-18
EP0223587B1 (en) 1991-02-13
KR940002538B1 (ko) 1994-03-25
DE3677527D1 (de) 1991-03-21
EP0389067A2 (en) 1990-09-26
DK553786D0 (da) 1986-11-19
EP0389067A3 (en) 1990-11-28
CN86108826A (zh) 1987-11-25
EP0389067B1 (en) 1994-10-19
KR870005270A (ko) 1987-06-05

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