EP0142765A2 - Méthode pour la fabrication d'un dispositif d'affichage et dispositif d'affichage fabriqué selon cette méthode - Google Patents
Méthode pour la fabrication d'un dispositif d'affichage et dispositif d'affichage fabriqué selon cette méthode Download PDFInfo
- Publication number
- EP0142765A2 EP0142765A2 EP84113299A EP84113299A EP0142765A2 EP 0142765 A2 EP0142765 A2 EP 0142765A2 EP 84113299 A EP84113299 A EP 84113299A EP 84113299 A EP84113299 A EP 84113299A EP 0142765 A2 EP0142765 A2 EP 0142765A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- mask
- area
- layer
- plates
- frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J17/00—Gas-filled discharge tubes with solid cathode
- H01J17/38—Cold-cathode tubes
- H01J17/48—Cold-cathode tubes with more than one cathode or anode, e.g. sequence-discharge tube, counting tube, dekatron
- H01J17/49—Display panels, e.g. with crossed electrodes, e.g. making use of direct current
- H01J17/498—Display panels, e.g. with crossed electrodes, e.g. making use of direct current with a gas discharge space and a post acceleration space for electrons
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
- H01J9/26—Sealing together parts of vessels
- H01J9/261—Sealing together parts of vessels the vessel being for a flat panel display
Definitions
- the invention relates to a manufacturing method according to the preamble of claim 1.
- Such a manufacturing technology can be found in DE-OS 29 31 077.
- the cited laid-open specification describes a flat screen in which a gas discharge supplies electrons which are drawn through selected holes in a control matrix into a plasma-free space, where they absorb energies of a few kV and finally hit a luminescent screen.
- the control metric is formed by individually controllable row and column conductors, which are located on both sides of an insulator pole plate and are preferably produced as follows: First, the plate is vapor-coated with an adhesion-promoting, 20 nm thick aluminum oxide layer and then with a 300 nm thick copper conductive layer. This metallization then receives a photoresist mask that only leaves the desired electrode pattern exposed. The bare copper areas are galvanically reinforced, first with 3um copper to improve the conductivity and then with 1um nickel as corrosion and sputter protection. Then remove the varnish and etch away the exposed titanium / copper surfaces.
- the invention has for its object to modify a method of the type mentioned so that a perfect glass solder seal is achieved in a relatively simple manner without annoying heat stresses. This problem is solved by a production technology with the features of claim 1.
- the proposed solution is based on the observation that the shortcomings described can also be attributed to the fact that the final layer is under-etched during (wet-chemical) removal of the layers underneath and thus spaces are created which cannot be completely filled by the printed glass solder paste. If, as provided in accordance with the invention, the conductors remain unreinforced in the glass soldering zone, all causes of leakage and crack formation are eliminated.
- the unreinforced electrode sections also have a very exact structure, because they are produced photolithographically - with a photoresist as an etching reserve. It means that every conductor also has a defined resistance in its critical implementation section.
- This series resistance is not particularly high - the vacuum-applied, ie vapor-deposited or sputtered-on layers contribute to the conductivity of the electrode relatively more than the less dense and more contaminated galvanic layers - and does not significantly burden the control circuit. If necessary, the feedthrough resistance could also be reduced further without additional effort, for example by broadening the adhesive and conductive layer in its unreinforced section.
- the galvanic amplification should only be interrupted for a short distance within the frame - about a third of the frame width.
- Such a geometry is sufficient for break-free sealing soldering and also ensures that the oxidation-sensitive electrode parts are covered by the frame and thus the already low series resistances cannot deteriorate in an uncontrolled manner.
- a vapor-deposited adhesive layer between 20nm and 40nm thick and preferably made of Ti
- a vapor-deposited Cu conductive layer with a thickness between 400nm and 900nm
- an electroplated Cu layer between 1um and 2um thick
- a Ni final layer between 3um and 5 ⁇ m as well as soft glass plates with a thermal expansion coefficient between 80 x 10 -7 ° k -1 and 100 x 10 -7o K -1 can be used.
- a vacuum envelope with a trough-like back part 1 and a front plate 2.
- the interior of the envelope is divided into a rear gas discharge space 5 and a front post-acceleration space 6 by a control structure consisting of a control disk 3 and a support plate 4.
- the distance between the carrier plate and the front plate is defined by a spacer frame 7.
- the trough-like back part 1 is provided with a series of strip-shaped, mutually parallel cathodes 8, which are each guided through the trough bottom.
- the control disk 3 carries on the back cathode-parallel row conductors 9 and at the front column conductors 10. These conductors form a control matrix with individually controllable elements in which the matrix conductors and the plate are broken (openings 11).
- the carrier plate 4 is coated on its rear side with strip conductors 12 parallel to the line conductors and on its front side with a continuous electrode 13. This electrode plate is also perforated (channels 14) in a pattern that is congruent with the hole pattern on the control disk.
- the front plate 2 is coated on the back with a full-area post-acceleration anode 15 and phosphor points 16, which are each located in front of one of the channels 15. All plates and the back are over glass solder frame 17 hermetically sealed together.
- the carrier plate which consists of a 0.7 mm thick, photo-etchable glass, is processed using a modified process. The main difference is that the plate first gets its openings and is coated in it. How to proceed most rationally is described in DE-OS 31 18335.
- solder paste When all plates are finished, they are printed with a glass solder paste at the designated places.
- the solder mass covers all unreinforced conductor sections and is designed so that the final glass Solder a width of 9mm. Then dry the solder, put the cell parts together in the correct position and carry out the soldering at around 425 ° C.
- the invention is not limited to the illustrated embodiment. So it does not matter how the electrons are generated; accordingly, the longitudinal plasma could also be replaced by a transverse discharge or a hot cathode.
- Other (active and passive) display types can also be considered, provided that Ni-reinforced MB electrodes and a glass soldering technique make sense.
- the electrodes could also be patterned differently than in a line matrix, form more or less levels and / or be differently designed under their final layer. For example, adhesive layers made of Cr or glass, conductive layers made of Ag and exclusively galvanic coatings made of Ni are possible.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3341397 | 1983-11-15 | ||
| DE19833341397 DE3341397A1 (de) | 1983-11-15 | 1983-11-15 | Verfahren zur herstellung einer anzeigevorrichtung und danach hergestellte anzeigevorrichtung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0142765A2 true EP0142765A2 (fr) | 1985-05-29 |
| EP0142765A3 EP0142765A3 (fr) | 1986-02-12 |
Family
ID=6214442
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP84113299A Withdrawn EP0142765A3 (fr) | 1983-11-15 | 1984-11-05 | Méthode pour la fabrication d'un dispositif d'affichage et dispositif d'affichage fabriqué selon cette méthode |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4613399A (fr) |
| EP (1) | EP0142765A3 (fr) |
| JP (1) | JPS60119056A (fr) |
| DE (1) | DE3341397A1 (fr) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0199077A1 (fr) * | 1985-03-25 | 1986-10-29 | Siemens Aktiengesellschaft | Procédé de fabrication d'une plaque de commande pour installation dans un dispositif indicateur imperméable aux gaz |
| DE3535185A1 (de) * | 1985-10-02 | 1987-04-09 | Siemens Ag | Lochplatten zur elektronensteuerung, insbesondere fuer plasma-kathoden-display |
| DE3710190A1 (de) * | 1987-03-27 | 1988-10-13 | Licentia Gmbh | Verfahren zum aufbringen eines loetfaehigen leiterbahnenmusters |
| DE3710189C2 (de) * | 1987-03-27 | 1995-08-31 | Licentia Gmbh | Verfahren zum Aufbringen einer lötfähigen Leitschicht und deren Verwendung zum Herstellen einer Lötverbindung zwischen dieser Leitschicht und einem metallischen Leiterbändchen |
| US5238435A (en) * | 1987-06-10 | 1993-08-24 | U.S. Philips Corporation | Liquid crystal display device and method of manufacturing such a display device |
| JPH03127435A (ja) * | 1989-10-12 | 1991-05-30 | Nec Corp | 薄膜トランジスタ制御型蛍光表示パネル |
| DE69125650T2 (de) * | 1990-06-05 | 1997-09-04 | Matsushita Electric Ind Co Ltd | Flache Anzeigevorrichtung und Verfahren zur Herstellung derselben |
| JPH0521007A (ja) * | 1991-07-15 | 1993-01-29 | Nissha Printing Co Ltd | 蛍光表示管の製造方法 |
| GB2258756A (en) * | 1991-08-02 | 1993-02-17 | Eric James Sjoberg | Sealing and making connection to electron tube devices. |
| US5428263A (en) * | 1992-01-07 | 1995-06-27 | Mitsubishi Denki Kabushiki Kaisha | Discharge cathode device with stress relieving layer and method for manufacturing the same |
| US5686790A (en) * | 1993-06-22 | 1997-11-11 | Candescent Technologies Corporation | Flat panel device with ceramic backplate |
| EP0716438A1 (fr) * | 1994-12-06 | 1996-06-12 | International Business Machines Corporation | Dispositif d'emission de champ et procédé pour sa fabrication |
| WO1997029506A1 (fr) * | 1996-02-09 | 1997-08-14 | Philips Electronics N.V. | Dispositif d'affichage du type en couche mince |
| KR100219273B1 (ko) * | 1996-11-30 | 1999-09-01 | 구자홍 | 플라즈마 디스플레이 제조방법 |
| RU2169409C2 (ru) * | 1999-08-02 | 2001-06-20 | Научно-исследовательский институт "Волга" | Многоцветный катодолюминесцентный экран матричного типа и способ его изготовления |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4100456A (en) * | 1976-02-06 | 1978-07-11 | Nippon Electric Kagoshima, Ltd. | Luminescent display panel comprising a sealing mass for eliminating slow leaks along leads |
| DE2615721C2 (de) * | 1976-04-09 | 1982-10-21 | Siemens AG, 1000 Berlin und 8000 München | Anzeigevorrichtung mit einem Gasentladungsraum als Quelle für Elektronen und einem Nachbeschleunigungsraum zur Nachbeschleunigung dieser Elektronen |
| DE2802976C2 (de) * | 1978-01-24 | 1980-02-07 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren und Vorrichtung zur Herstellung von Durchbrüchen (Löchern) in Glasplatten, vorzugsweise mit feinsten Strukturen |
| DE2931077A1 (de) * | 1979-07-31 | 1981-02-05 | Siemens Ag | Steuerplatte fuer eine gasentladungsanzeigevorrichtung |
| US4339482A (en) * | 1980-08-29 | 1982-07-13 | Lucitron, Inc. | Flat-panel display and method of manufacture |
| US4404060A (en) * | 1981-05-08 | 1983-09-13 | Siemens Aktiengesellschaft | Method for producing insulating ring zones by galvanic and etch technologies at orifice areas of through-holes in a plate |
-
1983
- 1983-11-15 DE DE19833341397 patent/DE3341397A1/de not_active Withdrawn
-
1984
- 1984-11-05 EP EP84113299A patent/EP0142765A3/fr not_active Withdrawn
- 1984-11-09 US US06/670,374 patent/US4613399A/en not_active Expired - Fee Related
- 1984-11-13 JP JP59239299A patent/JPS60119056A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE3341397A1 (de) | 1985-05-23 |
| JPS60119056A (ja) | 1985-06-26 |
| EP0142765A3 (fr) | 1986-02-12 |
| US4613399A (en) | 1986-09-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| AK | Designated contracting states |
Designated state(s): AT CH DE FR GB IT LI NL SE |
|
| PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
| AK | Designated contracting states |
Designated state(s): AT CH DE FR GB IT LI NL SE |
|
| 17P | Request for examination filed |
Effective date: 19860707 |
|
| 17Q | First examination report despatched |
Effective date: 19870814 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
| 18D | Application deemed to be withdrawn |
Effective date: 19871229 |
|
| RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: WENGERT, ROLF, DR. Inventor name: TRAUSCH, GUENTER, DIPL.-ING. Inventor name: KOBALE, MANFRED, DR. |