EP0261338A2 - Source d'ions fonctionnant par induction - Google Patents

Source d'ions fonctionnant par induction Download PDF

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Publication number
EP0261338A2
EP0261338A2 EP87110646A EP87110646A EP0261338A2 EP 0261338 A2 EP0261338 A2 EP 0261338A2 EP 87110646 A EP87110646 A EP 87110646A EP 87110646 A EP87110646 A EP 87110646A EP 0261338 A2 EP0261338 A2 EP 0261338A2
Authority
EP
European Patent Office
Prior art keywords
ion source
frequency
coil
source according
waveguide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP87110646A
Other languages
German (de)
English (en)
Other versions
EP0261338A3 (en
EP0261338B1 (fr
Inventor
Jürgen Dr. Müller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold AG
Leybold Heraeus GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold AG, Leybold Heraeus GmbH filed Critical Leybold AG
Publication of EP0261338A2 publication Critical patent/EP0261338A2/fr
Publication of EP0261338A3 publication Critical patent/EP0261338A3/de
Application granted granted Critical
Publication of EP0261338B1 publication Critical patent/EP0261338B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation

Definitions

  • the invention relates to an inductively excited ion source with a vessel for receiving substances to be ionized, in particular gases, the substances to be ionized being surrounded by a waveguide which is connected to a high-frequency generator, and the two ends of the waveguide being on the same Potential.
  • ion sources With the help of ion sources, a beam of ions, i. H. of electrically charged atoms or molecules.
  • the different types of ion sources adapted to the respective requirements mostly use a form of gas discharge for the ionization of neutral atoms or molecules.
  • the oldest, very simple ion source is the channel beam ion source or channel beam tube.
  • a gas discharge "burns" between two electrodes, which carry a voltage of a few 1000 volts, at a pressure of 10 ⁇ 1 to 1 Pa, in which the ionization takes place by electron or ion impact.
  • This ion source in which the electrodes are immersed in the plasma, is also called an ion source with capacitive excitation.
  • the ions are generated by a high-frequency discharge in the MHz range at about 10 ⁇ 2 Pa, which is between two specially shaped electrodes burns or is generated by an outer coil.
  • the ions are extracted from the plasma and focused using a special extraction method (H. Oechsner: Electron cyclotron wave resonances and power absorption effects in electrodeless low pressure HF plasmas with superimposed static magnetic field, Plasma Physics, 1974, Volume 16, pp. 835 bis 841; J Freisinger, S.
  • a disadvantage of many known ion sources with inductive excitation is, however, that they have a considerable RF power loss.
  • This RF power loss occurs because the RF coil, which is wrapped around the vessel in which the plasma is located, must be adapted to the RF generator.
  • a matching network is provided between the HF generator and the HF coil, which matches the generator power to the consumer power, ie. H. adapts to the coil power (see, for example, DE-OS 25 31 812, reference number 40 in the figures).
  • This adaptation consists in that the wave resistance of the coil loaded by the plasma is transformed into the wave resistance of the transmitter line.
  • a loss of power of 20% to 50% of the total power output by the HF generator occurs in the matching circuit.
  • Another disadvantage of the known ion source with inductive excitation is that the attachment of additional magnets in the vicinity of the vessel in which the plasma is located is difficult because the RF coil takes up a relatively large amount of space and because the magnets are in the magnetic field Heat up the RF coil. Such additional magnets are required to keep the plasma away from certain points on the vessel wall or to compress the plasma (cf. EP-A-0169744).
  • the cooling of the coils is problematic due to the fact that these coils are flushed hollow and with cooling water on the one hand and on the other hand on HF Potential lie, which requires space-consuming potential degradation routes to bring the potential from a high value to a low value. Since the potential is usually reduced by extending the coil, there is an increased power loss.
  • induction coils in a converter system it is also known to design induction coils in a converter system as a waveguide and to cool them with a liquid (DE-OS 25 44 275). Such liquid-cooled induction coils are also used in high-frequency induction plasma torches (DE-AS 21 12 888).
  • a device for carrying out a reaction between a gas and a material in an electromagnetic field which has a reaction chamber for receiving the gas and the material, a composite coil with two interconnected coil sections, the turns of which are wound in opposite directions, has a high-frequency source and a device for connecting the high-frequency source to the coil (DE-OS 22 45 753).
  • the two ends of the coil are interconnected so that they are at the same potential.
  • one connection of the high-frequency source is connected to a point on the coil which is located between the two ends of the coil.
  • the grounded connection of the radio frequency source is at a different potential than the ends of the coil.
  • a disadvantage of this device is that an adaptation network is required.
  • the invention is therefore based on the object of providing an arrangement in an inductively excited ion source according to the preamble of patent claim 1, which dispenses with a special matching network.
  • the advantage achieved by the invention is, in particular, that the power losses of an inductively excited ion source can be considerably reduced. It is also possible to easily supply and remove the cooling water to earth potential.
  • an evacuated vessel 1 is shown, which is surrounded by an electrically conductive high-frequency coil 2 and is closed with an upper annular end plate 4.
  • the ends 5, 6 of the high-frequency coil 2 are guided through corresponding openings in the lower end plate 4 to a cooling system, not shown.
  • This cooling system has the effect that a cooling liquid is introduced through the end 5 of the high-frequency coil 2 designed as a hollow tube and is led out again through the end 6 of this coil 2.
  • the high-frequency coil 2 consists, for example, of copper tube, which here is arranged outside the vessel, but can also be integrated into it or arranged inside the vessel.
  • the inflow and outflow of the Coolant is indicated by the arrows 7 and 8. Water is preferably used as the cooling liquid.
  • the high-frequency coil 2 has nine turns, a diameter of approximately 120 mm and a height of approximately 130 mm. Their length is ⁇ / 2, where ⁇ is related to the frequency of a high-frequency generator.
  • the coil length is understood to mean the length of the drawn-out coil wire and not, for example, the coil length. It goes without saying that the high-frequency coil 2 can also have dimensions other than those specified here. In addition, it does not have to be wrapped around the vessel 1, but can also be located, for example, on the inner wall of the vessel 1 or integrated into the vessel wall.
  • a nozzle 9 is provided through which the gas to be ionized enters the vessel 1.
  • the electrical coupling of the HF power takes place via a cable 10 which is connected to a high-frequency generator and which is connected to the coil 2 with a clamp 11.
  • the HF generator 12, the lower end plate 4 and the capacitor 15 are connected to earth or ground via the lines 21, 22, 23. Grounding is preferably carried out using a short, wide and well-conducting cable, which, for. B. consists of silver.
  • the coil has not only an inductance, but also an inherent capacitance. Inductance and capacitance together form the resonance frequency of the coil 2, the inductance and the capacitance being determined via the so-called induction coating and the capacitance coating.
  • the coil 2 is consequently to be regarded as a waveguide on which waves of the Lecher type propagate (see K. Simonyi: Theoretical Electrical Engineering, Berlin 1956, pp. 313 to 363, or H.-G. Unger: Electromagnetic waves on lines , Heidelberg, 1980).
  • the winding of the coil 2 is to be regarded as a subordinate influencing variable in relation to its wire length.
  • the output frequency of the HF generator 12 is placed on the resonance frequency of the high-frequency coil 2, which can be influenced by the ions in the vessel 1.
  • the actual resonance circuit is understood here to mean the combination of the excitation coil and plasma, that is to say the excitation coil loaded by the plasma.
  • This actual resonant circuit may also include a high-frequency shielding housing. Such a shielding housing was not shown in the illustration in FIG. 2 because the appearance of these housings and their influence on the overall resonant circuit is known.
  • connection point 13 of the line 10 is selected so that the quotient of voltage and current at point 13 is equal to the characteristic impedance of line 10. If one continuously measures this quotient and compares it with the known wave resistance, an electric drive can be controlled with the help of a control circuit so that it always brings point 13 into a position in which the above-mentioned condition applies. In this way it is possible to automate the performance adjustment.
  • the high-frequency generator 12 is by no means short-circuited, as it might appear from a low-frequency view. Rather, the straight piece of the coil 2, which extends from the connection point 13 to the plate 4, has an inductance and a capacitance coating which prevents a high-frequency short circuit.
  • the capacitor 15 is provided, which is connected to the coil 2.
  • the resonance frequency of the system coil 2 / capacitor 15 is changed.
  • the coil 2 or the system coil 2 / capacitor 15 is acted upon by an alternating voltage, the frequency of which is equal to the resonance frequency of the coil 2 or the system coil 2 / capacitor 15 or a harmonic thereof, the instantaneous currents and voltages are on the Coil 2 distributed as integer multiples of half the wavelength. Current bellies and voltage always appear on the coil ends 5, 6 knot to lie; ie the coil ends 5,6 are at ground potential. The cooling water can therefore be easily fed in and out to earth potential.
  • there is resonance there are always at least two points on the coil at which the ratio of voltage and current is equal to the characteristic impedance of line 10. If the line 10 is connected to such a point 13, the power of the high-frequency generator 12 is coupled in without loss. By shifting this coupling point 13, it is possible to compensate for changes in the natural frequency of the coil 2 which result from different plasma densities, ie different loads on the coil 2.
  • the entire magnetic field energy occurring is concentrated in the coil 2, so that its magnetic field holds the plasma together very effectively and compresses it.
  • the coil can also be different, e.g. meandering, designed to accommodate other field configurations, e.g. generate a "cusp" field or multipolar field as shown in Fig. 2 of EP-A-0169744.
  • FIG 3 the arrangement according to the invention is shown again in section.
  • the inlet connector 9 is provided with its gas supply channel 18. If a pressure between about 2 x 10 ⁇ 2 Pa and 50 Pa is set in the discharge space 19 of the vessel 1, a discharge can be ignited by connecting the high-frequency generator 12.
  • the ions formed here are sucked off by the extraction grid system 16 when a suitable voltage of the extraction power supply 17 is present at this grid system 16.
  • the extraction grid system 16 is - in contrast to the annular end plates 3, 4 which are grounded via the lines 20, 21 or in contrast to the high-frequency generator 12 which is grounded via the line 22 - not at ground potential.
  • FIG. 4 shows a variant of the ion source shown in FIG. 3.
  • the basic resonance frequency of the coil 2 is reduced from originally approximately 50 MHz by doubling its length to approximately half of its original value to approximately 25 MHz.
  • the doubling of the coil length is achieved here by a second coil layer, which is designated by 25.
  • the winding direction of the two coil layers 25, 26 can be in opposite directions, whereby particularly advantageous effects are achieved.
  • the efficiency of the ion source is improved by a small distance between the resonance and excitation frequency.
  • the inductance increases with the number of turns of the coil, which leads to an improvement in the resonant circuit quality.
  • FIG. 5 shows a variant of the connection of a capacitor 27 to the coil shown in FIG. 2.
  • the capacitor 27 is connected to the coil 2 at two points 28, 29, while the oscillator 12 is at the "50-ohm point" 30 of the coil 2.
  • This connection enables the HF ion source to be tuned to a low voltage level.
  • the influence of the capacitor 27 on the tuning is less, and there is also a certain distortion of the current and Voltage distribution on, but the capacitor line 31 can be made longer because of the lower voltage.
  • the advantage achieved in this way is, in particular, that the capacitor no longer has to sit directly on the ion source, but can be arranged at a certain distance therefrom without significant loss of power occurring due to stray capacitances at high voltage.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
EP87110646A 1986-09-24 1987-07-23 Source d'ions fonctionnant par induction Expired - Lifetime EP0261338B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3632340A DE3632340C2 (de) 1986-09-24 1986-09-24 Induktiv angeregte Ionenquelle
DE3632340 1986-09-24

Publications (3)

Publication Number Publication Date
EP0261338A2 true EP0261338A2 (fr) 1988-03-30
EP0261338A3 EP0261338A3 (en) 1989-07-26
EP0261338B1 EP0261338B1 (fr) 1994-03-30

Family

ID=6310179

Family Applications (1)

Application Number Title Priority Date Filing Date
EP87110646A Expired - Lifetime EP0261338B1 (fr) 1986-09-24 1987-07-23 Source d'ions fonctionnant par induction

Country Status (4)

Country Link
US (1) US4849675A (fr)
EP (1) EP0261338B1 (fr)
JP (1) JPS63184233A (fr)
DE (2) DE3632340C2 (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0462377A3 (en) * 1990-06-21 1992-05-13 Leybold Aktiengesellschaft Ion source
EP0468742A3 (en) * 1990-07-24 1992-05-27 Varian Australia Pty. Ltd. Inductively coupled plasma spectroscopy
WO1993014513A1 (fr) * 1992-01-14 1993-07-22 Honeywell, Inc. Source d'ions a frequence radioelectrique
EP1662848A3 (fr) * 2004-11-29 2010-01-20 Samsung Electronics Co., Ltd. Accélérateur à induction électromagnétique basé sur une modulation par bobines
EP1812959A4 (fr) * 2004-10-15 2010-12-29 Advanced Energy Ind Inc Gestion thermique de composants dielectriques dans un dispositif de decharge plasma
EP3145275A1 (fr) * 2015-09-18 2017-03-22 Technische Hochschule Mittelhessen Bobine de chauffage a induction

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DE3942560C2 (de) * 1989-12-22 1996-05-02 Dressler Hochfrequenztechnik G Hochfrequenz-Generator für einen Plasma erzeugenden Verbraucher
US5383019A (en) * 1990-03-23 1995-01-17 Fisons Plc Inductively coupled plasma spectrometers and radio-frequency power supply therefor
US5017751A (en) * 1990-06-21 1991-05-21 Gte Laboratories Incorporated Inductively-coupled RF plasma torch
US6545420B1 (en) * 1990-07-31 2003-04-08 Applied Materials, Inc. Plasma reactor using inductive RF coupling, and processes
US6251792B1 (en) 1990-07-31 2001-06-26 Applied Materials, Inc. Plasma etch processes
US20020004309A1 (en) * 1990-07-31 2002-01-10 Kenneth S. Collins Processes used in an inductively coupled plasma reactor
US5707486A (en) * 1990-07-31 1998-01-13 Applied Materials, Inc. Plasma reactor using UHF/VHF and RF triode source, and process
US6165311A (en) 1991-06-27 2000-12-26 Applied Materials, Inc. Inductively coupled RF plasma reactor having an overhead solenoidal antenna
US6077384A (en) 1994-08-11 2000-06-20 Applied Materials, Inc. Plasma reactor having an inductive antenna coupling power through a parallel plate electrode
US6063233A (en) 1991-06-27 2000-05-16 Applied Materials, Inc. Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna
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US5207760A (en) * 1991-07-23 1993-05-04 Trw Inc. Multi-megawatt pulsed inductive thruster
US5288969A (en) * 1991-08-16 1994-02-22 Regents Of The University Of California Electrodeless plasma torch apparatus and methods for the dissociation of hazardous waste
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DE4242894A1 (de) * 1992-12-18 1994-06-23 Leybold Ag Vorrichtung zur Mehrfacheinspeisung von HF-Leistung in Kathodenkörpern
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DE10058326C1 (de) * 2000-11-24 2002-06-13 Astrium Gmbh Induktiv gekoppelte Hochfrequenz-Elektronenquelle mit reduziertem Leistungsbedarf durch elektrostatischen Einschluss von Elektronen
JP2002210330A (ja) * 2001-01-19 2002-07-30 Pearl Kogyo Kk 半導体プロセス用排ガス処理装置
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EP2707598A4 (fr) * 2011-05-12 2015-04-29 Roderick William Boswell Micro-propulseur à plasma
CN105340059B (zh) * 2013-06-17 2019-03-22 应用材料公司 用于等离子体反应器的增强等离子体源
JP6476020B2 (ja) * 2015-03-10 2019-02-27 株式会社日立ハイテクサイエンス 誘導結合プラズマ発生装置及び誘導結合プラズマ分析装置
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0462377A3 (en) * 1990-06-21 1992-05-13 Leybold Aktiengesellschaft Ion source
EP0468742A3 (en) * 1990-07-24 1992-05-27 Varian Australia Pty. Ltd. Inductively coupled plasma spectroscopy
US5194731A (en) * 1990-07-24 1993-03-16 Varian Associates, Inc. Inductively coupled plasma spectroscopy
WO1993014513A1 (fr) * 1992-01-14 1993-07-22 Honeywell, Inc. Source d'ions a frequence radioelectrique
EP1812959A4 (fr) * 2004-10-15 2010-12-29 Advanced Energy Ind Inc Gestion thermique de composants dielectriques dans un dispositif de decharge plasma
EP1662848A3 (fr) * 2004-11-29 2010-01-20 Samsung Electronics Co., Ltd. Accélérateur à induction électromagnétique basé sur une modulation par bobines
EP3145275A1 (fr) * 2015-09-18 2017-03-22 Technische Hochschule Mittelhessen Bobine de chauffage a induction

Also Published As

Publication number Publication date
DE3632340A1 (de) 1988-03-31
US4849675A (en) 1989-07-18
EP0261338A3 (en) 1989-07-26
DE3632340C2 (de) 1998-01-15
DE3789478D1 (de) 1994-05-05
EP0261338B1 (fr) 1994-03-30
JPS63184233A (ja) 1988-07-29

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