EP0270968A2 - Microscope à rayons X - Google Patents
Microscope à rayons X Download PDFInfo
- Publication number
- EP0270968A2 EP0270968A2 EP87117658A EP87117658A EP0270968A2 EP 0270968 A2 EP0270968 A2 EP 0270968A2 EP 87117658 A EP87117658 A EP 87117658A EP 87117658 A EP87117658 A EP 87117658A EP 0270968 A2 EP0270968 A2 EP 0270968A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- ray
- radiation
- phase shift
- order
- microscope according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K7/00—Gamma- or X-ray microscopes
Definitions
- the present invention relates to an X-ray microscope in which the object is illuminated coherently or partially coherently with quasi monochromatic X-ray radiation via a condenser and is magnified in the image plane by means of a high-resolution X-ray objective.
- each imaging element ie condenser and X-ray lens
- a zone plate consists of a large number of very thin rings, for example made of gold, which are applied to a thin carrier film (for example made of polyimide). These rings form a circular grid with a radially increasing line density.
- the zone plates diffract the incident monochromatic X-ray radiation of the wavelength and thus cause an image.
- the contrast in the image is mediated by photoelectric absorption in the object, i.e. structures are imaged which effect an amplitude modulation of the X-rays passing through.
- the wavelength range of the X-rays which is between 2.4 nm and 4.5 nm, ie between the oxygen K edge and the carbon K edge, is particularly suitable.
- This area is also known as the water window, since water has a transmission that is about ten times higher than that of organic materials. It can be used in this wavelength range examine organic materials and thus cells and cell organelles in living condition.
- the resolution achieved so far in X-ray microscopy is about a factor of 10 better than in light microscopy, with a further increase in X-ray microscope resolution by about an order of magnitude being still possible.
- the limit resolution in X-ray microscopy of amplitude structures will be given by the radiation exposure of the objects to be examined.
- This object is achieved, starting from an X-ray microscope according to the invention, in that an element is arranged in the Fourier plane of the X-ray objective, which element extends over the area affected by the zero or a preselectable other order of the radiation deflected by the object, and gives the radiation passing through a phase shift.
- phase-shifting properties of object structures are used to form contrast.
- the phase-shifting element arranged in the beam path gives the preselected order of the X-ray radiation coming from the object a phase shift with respect to the other radiation coming from the object that does not pass through the element.
- the phase-shifted and the unaffected radiation components interfere in the image plane and create a high-contrast, enlarged picture of the object.
- the quantity ⁇ describes the absorption, which becomes smaller as the wavelength ⁇ of the X-ray radiation becomes shorter.
- the size ⁇ is decisive for the phase shift which is given to the continuous X-ray radiation.
- the size ⁇ generally varies very slowly with the wavelength. For this reason, if the phase shift is used by the object, a significant improvement in the contrast in the image can be achieved.
- images can also be generated with a lower radiation exposure to the object, the contrast of which is no worse than when the amplitude contrast is used with a higher radiation exposure.
- phase-shifting element is designed according to claim 5.
- phase-shifting element used in the X-ray microscope according to the invention. It may therefore be necessary to adjust the intensities of the interfering orders in the image plane of the radiation coming from the object.
- the phase-shifting and the absorbing effect of the phase-shifting element is advantageously distributed over different corresponding surfaces in the Fourier plane of the X-ray objective. The radiation passing through these corresponding surfaces is influenced independently of one another in phase and amplitude, specifically in such a way that the intensities of the radiation interferences in the image plane are matched to one another.
- the radiation coming from an X-ray source is designated by (1).
- a synchrotron or another source described in Part 1 of the book “X-Ray Microscopy” by Schmahl and Rudolph, Springer-Verlag 1984 can be used as the X-ray source.
- the x-ray radiation passes through an x-ray condenser (2) and is guided by this to the object (3) to be observed, which is arranged on a central diaphragm (4).
- the X-ray radiation deflected by the object (3) passes through a high-resolution X-ray lens (5) and is imaged by the latter into the image plane (6).
- the Fourier plane of the lens (5) is designated, in which the decomposition of the radiation passing through the object (3) is found in harmonic Fourier components. This distribution is represented again in the image plane (6) by a Fourier inverse transformation as a real image.
- Zone plates such as are shown, for example, in FIG. 2 are advantageously used as imaging elements (2) and (5).
- This zone plate consists of a large number of rings which are placed on a very thin carrier foil, e.g. are applied from polyimide.
- the rings are usually made of gold or chrome and have a low layer thickness of approx. 0.1 ⁇ m.
- the rings form a circular grid with a radially increasing line density.
- a phase-shifting and / or absorbing element (8) is arranged in the Fourier plane (7) of the objective (5).
- This consists, as shown in FIG. 3, of a thin carrier film (9) which is contained in a ring (10) and on which a thin layer of phase-shifting material, for example chrome in the form a central circular disc (11) is applied.
- the zero-order X-ray radiation (1) coming from the object (3) penetrates the central circular disk (11).
- This radiation is given a phase shift of 90 ° with respect to the orders diffracted by the object structures.
- the image plane (6) there is interference between the phase-shifted radiation and the uninfluenced radiation and thus a high-contrast, enlarged image of the object (3) is created, which can be captured directly on a photosensitive layer, for example.
- Fig. 4 shows an embodiment of an element (8) serving for phase shift and / or absorption, in which a ring (12) made of the appropriate material, for example chrome, is attached to the carrier film (9).
- This ring gives higher orders of the radiation deflected by the object a phase shift. Which order is to be influenced is determined by the diameter and the width of the ring (12).
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Microscoopes, Condenser (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Liquid Crystal Substances (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3642457 | 1986-12-12 | ||
| DE19863642457 DE3642457A1 (de) | 1986-12-12 | 1986-12-12 | Roentgen-mikroskop |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP0270968A2 true EP0270968A2 (fr) | 1988-06-15 |
| EP0270968A3 EP0270968A3 (en) | 1989-08-02 |
| EP0270968B1 EP0270968B1 (fr) | 1993-12-15 |
Family
ID=6316038
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP87117658A Expired - Lifetime EP0270968B1 (fr) | 1986-12-12 | 1987-11-28 | Microscope à rayons X |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4870674A (fr) |
| EP (1) | EP0270968B1 (fr) |
| JP (1) | JPH0814640B2 (fr) |
| DE (2) | DE3642457A1 (fr) |
| DK (1) | DK174016B1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995008174A1 (fr) * | 1993-09-15 | 1995-03-23 | Carl-Zeiss-Stiftung Handelnd Als Carl Zeiss | Microscope a rayons x a contraste de phase |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH678663A5 (fr) * | 1988-06-09 | 1991-10-15 | Zeiss Carl Fa | |
| US5199057A (en) * | 1989-08-09 | 1993-03-30 | Nikon Corporation | Image formation-type soft X-ray microscopic apparatus |
| JP2775949B2 (ja) * | 1990-01-10 | 1998-07-16 | 株式会社ニコン | X線光学素子保持枠 |
| US5022061A (en) * | 1990-04-30 | 1991-06-04 | The United States Of America As Represented By The United States Department Of Energy | An image focusing means by using an opaque object to diffract x-rays |
| US5204887A (en) * | 1990-06-01 | 1993-04-20 | Canon Kabushiki Kaisha | X-ray microscope |
| DE4027285A1 (de) * | 1990-08-29 | 1992-03-05 | Zeiss Carl Fa | Roentgenmikroskop |
| US5432607A (en) * | 1993-02-22 | 1995-07-11 | International Business Machines Corporation | Method and apparatus for inspecting patterned thin films using diffracted beam ellipsometry |
| US5432349A (en) * | 1993-03-15 | 1995-07-11 | The United State Of America As Represented By The Secretary Of The Navy | Fourier transform microscope for x-ray and/or gamma-ray imaging |
| JP3741411B2 (ja) * | 1999-10-01 | 2006-02-01 | 株式会社リガク | X線集光装置及びx線装置 |
| EP1482520A4 (fr) * | 2002-03-05 | 2007-11-07 | Muradin Abubekirovich Kumakhov | Microscope a rayons x |
| US7245696B2 (en) * | 2002-05-29 | 2007-07-17 | Xradia, Inc. | Element-specific X-ray fluorescence microscope and method of operation |
| US7365909B2 (en) * | 2002-10-17 | 2008-04-29 | Xradia, Inc. | Fabrication methods for micro compounds optics |
| US7119953B2 (en) * | 2002-12-27 | 2006-10-10 | Xradia, Inc. | Phase contrast microscope for short wavelength radiation and imaging method |
| DE10352741B4 (de) | 2003-11-12 | 2012-08-16 | Austriamicrosystems Ag | Strahlungsdetektierendes optoelektronisches Bauelement, Verfahren zu dessen Herstellung und Verwendung |
| US20050211910A1 (en) * | 2004-03-29 | 2005-09-29 | Jmar Research, Inc. | Morphology and Spectroscopy of Nanoscale Regions using X-Rays Generated by Laser Produced Plasma |
| GB0409572D0 (en) * | 2004-04-29 | 2004-06-02 | Univ Sheffield | High resolution imaging |
| US7302043B2 (en) * | 2004-07-27 | 2007-11-27 | Gatan, Inc. | Rotating shutter for laser-produced plasma debris mitigation |
| US7452820B2 (en) * | 2004-08-05 | 2008-11-18 | Gatan, Inc. | Radiation-resistant zone plates and method of manufacturing thereof |
| US7466796B2 (en) * | 2004-08-05 | 2008-12-16 | Gatan, Inc. | Condenser zone plate illumination for point X-ray sources |
| US8001862B2 (en) * | 2007-11-20 | 2011-08-23 | Harley-Davidson Motor Company Group, Inc. | Reverse drive assembly for a motorcycle |
| CN102365052B (zh) * | 2009-03-27 | 2015-05-13 | 皇家飞利浦电子股份有限公司 | 利用圆形光栅进行差分相衬成像 |
| US9291578B2 (en) | 2012-08-03 | 2016-03-22 | David L. Adler | X-ray photoemission microscope for integrated devices |
| US9129715B2 (en) | 2012-09-05 | 2015-09-08 | SVXR, Inc. | High speed x-ray inspection microscope |
| JP7572033B2 (ja) * | 2020-10-23 | 2024-10-23 | 株式会社リガク | 結像型x線顕微鏡 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49300A (fr) * | 1972-03-15 | 1974-01-05 | ||
| US4105289A (en) * | 1976-04-29 | 1978-08-08 | University Patents, Inc. | Apparatus and method for image sampling |
| JPS6049300A (ja) * | 1983-08-29 | 1985-03-18 | 日本電子株式会社 | X線顕微鏡 |
-
1986
- 1986-12-12 DE DE19863642457 patent/DE3642457A1/de not_active Withdrawn
-
1987
- 1987-11-28 DE DE87117658T patent/DE3788508D1/de not_active Expired - Fee Related
- 1987-11-28 EP EP87117658A patent/EP0270968B1/fr not_active Expired - Lifetime
- 1987-12-08 JP JP62308806A patent/JPH0814640B2/ja not_active Expired - Fee Related
- 1987-12-09 US US07/130,755 patent/US4870674A/en not_active Expired - Lifetime
- 1987-12-11 DK DK198706522A patent/DK174016B1/da not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995008174A1 (fr) * | 1993-09-15 | 1995-03-23 | Carl-Zeiss-Stiftung Handelnd Als Carl Zeiss | Microscope a rayons x a contraste de phase |
| US5550887A (en) * | 1993-09-15 | 1996-08-27 | Carl-Zeiss-Stiftung | Phase contrast X-ray microscope |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0814640B2 (ja) | 1996-02-14 |
| DK174016B1 (da) | 2002-04-15 |
| DK652287D0 (da) | 1987-12-11 |
| EP0270968A3 (en) | 1989-08-02 |
| DK652287A (da) | 1988-06-13 |
| JPS63163300A (ja) | 1988-07-06 |
| DE3642457A1 (de) | 1988-06-30 |
| DE3788508D1 (de) | 1994-01-27 |
| US4870674A (en) | 1989-09-26 |
| EP0270968B1 (fr) | 1993-12-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0270968B1 (fr) | Microscope à rayons X | |
| DE3888395T2 (de) | Prüfungssystem für eine Mikrokreisanordnung mit Redundanzkreisanlagen. | |
| EP1288652B1 (fr) | Diffractomètre à rayons X avec dispositifs optiques de rayons X pour la génération de plusieurs trajéctoires de rayons X | |
| DE4432811A1 (de) | Phasenkontrast-Röntgenmikroskop | |
| DE102015105018A1 (de) | Verfahren und Rasterfluoreszenzlichtmikroskop zum mehrdimensional hochauflösenden Abbilden einer Struktur oder eines Wegs eines Partikels in einer Probe | |
| DE2116713B2 (de) | Belichtungsverfahren zum Abbilden sehr fein strukturierter Lichtmuster auf Photolackschichten und dazu geeignete Belichtungsvorrichtung | |
| DE102015209758A1 (de) | Anordnung und Verfahren zur Strahlformung und zur Lichtblattmikroskopie | |
| DE3432252A1 (de) | Messmikroskop | |
| DE102013204466A1 (de) | Messung einer optischen Symmetrieeigenschaft an einer Projektionsbelichtungsanlage | |
| EP0040704B1 (fr) | Procédé pour contrôler des systèmes optiques utilisant des franges de moiré | |
| DE2047316A1 (de) | Verfahren und Einrichtung zum Er zeugen einer Anordnung diskreter Be reiche mit einer Photolackschicht | |
| DE4420409B4 (de) | Photomaske mit Mustern zur Verringerung der erforderlichen Lichtleistung eines Steppers | |
| DE2328069A1 (de) | Optische ablenkvorrichtung und deren anwendung bei holographischen speichern | |
| DE2306764A1 (de) | Mikroschwaerzungsmessverfahren und mikroschwaerzungsmesser bzw. mikrodensitometer | |
| EP1476890B1 (fr) | Lame de phase pour la microscopie electronique et imagerie par microscopie electronique | |
| DE2013101A1 (de) | Anordnung zur periodischen Scharf einstellung | |
| DE2345351C2 (de) | Holographisches Aufzeichnungs- und Auslesesystem | |
| DE102020101994B4 (de) | Verfahren und Vorrichtung zur linsenlosen Bildgebung mittels Fourier-Transformations-Holographie | |
| DE102018132875A1 (de) | Fluoreszenzlichtmikroskopie mit erhöhter axialer Auflösung | |
| DE1797473C3 (de) | Verfahren zur Herstellung einer Hologranunkopie | |
| DE69519143T2 (de) | Mustererzeugungsverfahren und Verfahren und Apparat zur Herstellung einer Halbleitervorrichtung unter Verwendung von diesem Verfahren | |
| DE102005023137B4 (de) | Anordnung zur hochauflösenden digitalen Inline-Holographie | |
| DE102015215559B4 (de) | Verfahren zur hochauflösenden Abbildung eines Oberflächenbereiches bei streifendem Einfall der Messstrahlung | |
| DE1564075C (de) | Verfahren zur kontrastreichen Abbildung von Phasen- oder Amplitudenobjekten in einem Korpuskularstrahlgerät, insbesondere einem Elektronenmikroskop | |
| DE2712837A1 (de) | Mikroskop mit grosser schaerfentiefe |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): BE CH DE FR GB IT LI NL SE |
|
| PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
| AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): BE CH DE FR GB IT LI NL SE |
|
| 17P | Request for examination filed |
Effective date: 19900201 |
|
| 17Q | First examination report despatched |
Effective date: 19911106 |
|
| ITF | It: translation for a ep patent filed | ||
| GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
| AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): BE CH DE FR GB IT LI NL SE |
|
| REF | Corresponds to: |
Ref document number: 3788508 Country of ref document: DE Date of ref document: 19940127 |
|
| GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 19940124 |
|
| ET | Fr: translation filed | ||
| PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
| 26N | No opposition filed | ||
| EAL | Se: european patent in force in sweden |
Ref document number: 87117658.2 |
|
| REG | Reference to a national code |
Ref country code: GB Ref legal event code: IF02 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: CH Payment date: 20021017 Year of fee payment: 16 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: SE Payment date: 20021028 Year of fee payment: 16 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20021030 Year of fee payment: 16 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20021104 Year of fee payment: 16 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20021111 Year of fee payment: 16 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20021114 Year of fee payment: 16 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20031128 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20031129 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20031130 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20031130 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: BE Payment date: 20031209 Year of fee payment: 17 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20040601 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20040602 |
|
| EUG | Se: european patent has lapsed | ||
| REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
| GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20031128 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20040730 |
|
| NLV4 | Nl: lapsed or anulled due to non-payment of the annual fee |
Effective date: 20040601 |
|
| REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20041130 |
|
| BERE | Be: lapsed |
Owner name: FIRMA CARL *ZEISS Effective date: 20041130 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED. Effective date: 20051128 |
|
| BERE | Be: lapsed |
Owner name: FIRMA CARL *ZEISS Effective date: 20041130 |