EP0270968A2 - Microscope à rayons X - Google Patents

Microscope à rayons X Download PDF

Info

Publication number
EP0270968A2
EP0270968A2 EP87117658A EP87117658A EP0270968A2 EP 0270968 A2 EP0270968 A2 EP 0270968A2 EP 87117658 A EP87117658 A EP 87117658A EP 87117658 A EP87117658 A EP 87117658A EP 0270968 A2 EP0270968 A2 EP 0270968A2
Authority
EP
European Patent Office
Prior art keywords
ray
radiation
phase shift
order
microscope according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP87117658A
Other languages
German (de)
English (en)
Other versions
EP0270968A3 (en
EP0270968B1 (fr
Inventor
Günter Prof. Dr. Schmahl
Dietbert Dr. Rudolph
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Carl Zeiss AG
Original Assignee
Carl Zeiss SMT GmbH
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, Carl Zeiss AG filed Critical Carl Zeiss SMT GmbH
Publication of EP0270968A2 publication Critical patent/EP0270968A2/fr
Publication of EP0270968A3 publication Critical patent/EP0270968A3/de
Application granted granted Critical
Publication of EP0270968B1 publication Critical patent/EP0270968B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KHANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00Gamma- or X-ray microscopes

Definitions

  • the present invention relates to an X-ray microscope in which the object is illuminated coherently or partially coherently with quasi monochromatic X-ray radiation via a condenser and is magnified in the image plane by means of a high-resolution X-ray objective.
  • each imaging element ie condenser and X-ray lens
  • a zone plate consists of a large number of very thin rings, for example made of gold, which are applied to a thin carrier film (for example made of polyimide). These rings form a circular grid with a radially increasing line density.
  • the zone plates diffract the incident monochromatic X-ray radiation of the wavelength and thus cause an image.
  • the contrast in the image is mediated by photoelectric absorption in the object, i.e. structures are imaged which effect an amplitude modulation of the X-rays passing through.
  • the wavelength range of the X-rays which is between 2.4 nm and 4.5 nm, ie between the oxygen K edge and the carbon K edge, is particularly suitable.
  • This area is also known as the water window, since water has a transmission that is about ten times higher than that of organic materials. It can be used in this wavelength range examine organic materials and thus cells and cell organelles in living condition.
  • the resolution achieved so far in X-ray microscopy is about a factor of 10 better than in light microscopy, with a further increase in X-ray microscope resolution by about an order of magnitude being still possible.
  • the limit resolution in X-ray microscopy of amplitude structures will be given by the radiation exposure of the objects to be examined.
  • This object is achieved, starting from an X-ray microscope according to the invention, in that an element is arranged in the Fourier plane of the X-ray objective, which element extends over the area affected by the zero or a preselectable other order of the radiation deflected by the object, and gives the radiation passing through a phase shift.
  • phase-shifting properties of object structures are used to form contrast.
  • the phase-shifting element arranged in the beam path gives the preselected order of the X-ray radiation coming from the object a phase shift with respect to the other radiation coming from the object that does not pass through the element.
  • the phase-shifted and the unaffected radiation components interfere in the image plane and create a high-contrast, enlarged picture of the object.
  • the quantity ⁇ describes the absorption, which becomes smaller as the wavelength ⁇ of the X-ray radiation becomes shorter.
  • the size ⁇ is decisive for the phase shift which is given to the continuous X-ray radiation.
  • the size ⁇ generally varies very slowly with the wavelength. For this reason, if the phase shift is used by the object, a significant improvement in the contrast in the image can be achieved.
  • images can also be generated with a lower radiation exposure to the object, the contrast of which is no worse than when the amplitude contrast is used with a higher radiation exposure.
  • phase-shifting element is designed according to claim 5.
  • phase-shifting element used in the X-ray microscope according to the invention. It may therefore be necessary to adjust the intensities of the interfering orders in the image plane of the radiation coming from the object.
  • the phase-shifting and the absorbing effect of the phase-shifting element is advantageously distributed over different corresponding surfaces in the Fourier plane of the X-ray objective. The radiation passing through these corresponding surfaces is influenced independently of one another in phase and amplitude, specifically in such a way that the intensities of the radiation interferences in the image plane are matched to one another.
  • the radiation coming from an X-ray source is designated by (1).
  • a synchrotron or another source described in Part 1 of the book “X-Ray Microscopy” by Schmahl and Rudolph, Springer-Verlag 1984 can be used as the X-ray source.
  • the x-ray radiation passes through an x-ray condenser (2) and is guided by this to the object (3) to be observed, which is arranged on a central diaphragm (4).
  • the X-ray radiation deflected by the object (3) passes through a high-resolution X-ray lens (5) and is imaged by the latter into the image plane (6).
  • the Fourier plane of the lens (5) is designated, in which the decomposition of the radiation passing through the object (3) is found in harmonic Fourier components. This distribution is represented again in the image plane (6) by a Fourier inverse transformation as a real image.
  • Zone plates such as are shown, for example, in FIG. 2 are advantageously used as imaging elements (2) and (5).
  • This zone plate consists of a large number of rings which are placed on a very thin carrier foil, e.g. are applied from polyimide.
  • the rings are usually made of gold or chrome and have a low layer thickness of approx. 0.1 ⁇ m.
  • the rings form a circular grid with a radially increasing line density.
  • a phase-shifting and / or absorbing element (8) is arranged in the Fourier plane (7) of the objective (5).
  • This consists, as shown in FIG. 3, of a thin carrier film (9) which is contained in a ring (10) and on which a thin layer of phase-shifting material, for example chrome in the form a central circular disc (11) is applied.
  • the zero-order X-ray radiation (1) coming from the object (3) penetrates the central circular disk (11).
  • This radiation is given a phase shift of 90 ° with respect to the orders diffracted by the object structures.
  • the image plane (6) there is interference between the phase-shifted radiation and the uninfluenced radiation and thus a high-contrast, enlarged image of the object (3) is created, which can be captured directly on a photosensitive layer, for example.
  • Fig. 4 shows an embodiment of an element (8) serving for phase shift and / or absorption, in which a ring (12) made of the appropriate material, for example chrome, is attached to the carrier film (9).
  • This ring gives higher orders of the radiation deflected by the object a phase shift. Which order is to be influenced is determined by the diameter and the width of the ring (12).

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Microscoopes, Condenser (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Liquid Crystal Substances (AREA)
EP87117658A 1986-12-12 1987-11-28 Microscope à rayons X Expired - Lifetime EP0270968B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3642457 1986-12-12
DE19863642457 DE3642457A1 (de) 1986-12-12 1986-12-12 Roentgen-mikroskop

Publications (3)

Publication Number Publication Date
EP0270968A2 true EP0270968A2 (fr) 1988-06-15
EP0270968A3 EP0270968A3 (en) 1989-08-02
EP0270968B1 EP0270968B1 (fr) 1993-12-15

Family

ID=6316038

Family Applications (1)

Application Number Title Priority Date Filing Date
EP87117658A Expired - Lifetime EP0270968B1 (fr) 1986-12-12 1987-11-28 Microscope à rayons X

Country Status (5)

Country Link
US (1) US4870674A (fr)
EP (1) EP0270968B1 (fr)
JP (1) JPH0814640B2 (fr)
DE (2) DE3642457A1 (fr)
DK (1) DK174016B1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995008174A1 (fr) * 1993-09-15 1995-03-23 Carl-Zeiss-Stiftung Handelnd Als Carl Zeiss Microscope a rayons x a contraste de phase

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH678663A5 (fr) * 1988-06-09 1991-10-15 Zeiss Carl Fa
US5199057A (en) * 1989-08-09 1993-03-30 Nikon Corporation Image formation-type soft X-ray microscopic apparatus
JP2775949B2 (ja) * 1990-01-10 1998-07-16 株式会社ニコン X線光学素子保持枠
US5022061A (en) * 1990-04-30 1991-06-04 The United States Of America As Represented By The United States Department Of Energy An image focusing means by using an opaque object to diffract x-rays
US5204887A (en) * 1990-06-01 1993-04-20 Canon Kabushiki Kaisha X-ray microscope
DE4027285A1 (de) * 1990-08-29 1992-03-05 Zeiss Carl Fa Roentgenmikroskop
US5432607A (en) * 1993-02-22 1995-07-11 International Business Machines Corporation Method and apparatus for inspecting patterned thin films using diffracted beam ellipsometry
US5432349A (en) * 1993-03-15 1995-07-11 The United State Of America As Represented By The Secretary Of The Navy Fourier transform microscope for x-ray and/or gamma-ray imaging
JP3741411B2 (ja) * 1999-10-01 2006-02-01 株式会社リガク X線集光装置及びx線装置
EP1482520A4 (fr) * 2002-03-05 2007-11-07 Muradin Abubekirovich Kumakhov Microscope a rayons x
US7245696B2 (en) * 2002-05-29 2007-07-17 Xradia, Inc. Element-specific X-ray fluorescence microscope and method of operation
US7365909B2 (en) * 2002-10-17 2008-04-29 Xradia, Inc. Fabrication methods for micro compounds optics
US7119953B2 (en) * 2002-12-27 2006-10-10 Xradia, Inc. Phase contrast microscope for short wavelength radiation and imaging method
DE10352741B4 (de) 2003-11-12 2012-08-16 Austriamicrosystems Ag Strahlungsdetektierendes optoelektronisches Bauelement, Verfahren zu dessen Herstellung und Verwendung
US20050211910A1 (en) * 2004-03-29 2005-09-29 Jmar Research, Inc. Morphology and Spectroscopy of Nanoscale Regions using X-Rays Generated by Laser Produced Plasma
GB0409572D0 (en) * 2004-04-29 2004-06-02 Univ Sheffield High resolution imaging
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
US7452820B2 (en) * 2004-08-05 2008-11-18 Gatan, Inc. Radiation-resistant zone plates and method of manufacturing thereof
US7466796B2 (en) * 2004-08-05 2008-12-16 Gatan, Inc. Condenser zone plate illumination for point X-ray sources
US8001862B2 (en) * 2007-11-20 2011-08-23 Harley-Davidson Motor Company Group, Inc. Reverse drive assembly for a motorcycle
CN102365052B (zh) * 2009-03-27 2015-05-13 皇家飞利浦电子股份有限公司 利用圆形光栅进行差分相衬成像
US9291578B2 (en) 2012-08-03 2016-03-22 David L. Adler X-ray photoemission microscope for integrated devices
US9129715B2 (en) 2012-09-05 2015-09-08 SVXR, Inc. High speed x-ray inspection microscope
JP7572033B2 (ja) * 2020-10-23 2024-10-23 株式会社リガク 結像型x線顕微鏡

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49300A (fr) * 1972-03-15 1974-01-05
US4105289A (en) * 1976-04-29 1978-08-08 University Patents, Inc. Apparatus and method for image sampling
JPS6049300A (ja) * 1983-08-29 1985-03-18 日本電子株式会社 X線顕微鏡

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995008174A1 (fr) * 1993-09-15 1995-03-23 Carl-Zeiss-Stiftung Handelnd Als Carl Zeiss Microscope a rayons x a contraste de phase
US5550887A (en) * 1993-09-15 1996-08-27 Carl-Zeiss-Stiftung Phase contrast X-ray microscope

Also Published As

Publication number Publication date
JPH0814640B2 (ja) 1996-02-14
DK174016B1 (da) 2002-04-15
DK652287D0 (da) 1987-12-11
EP0270968A3 (en) 1989-08-02
DK652287A (da) 1988-06-13
JPS63163300A (ja) 1988-07-06
DE3642457A1 (de) 1988-06-30
DE3788508D1 (de) 1994-01-27
US4870674A (en) 1989-09-26
EP0270968B1 (fr) 1993-12-15

Similar Documents

Publication Publication Date Title
EP0270968B1 (fr) Microscope à rayons X
DE3888395T2 (de) Prüfungssystem für eine Mikrokreisanordnung mit Redundanzkreisanlagen.
EP1288652B1 (fr) Diffractomètre à rayons X avec dispositifs optiques de rayons X pour la génération de plusieurs trajéctoires de rayons X
DE4432811A1 (de) Phasenkontrast-Röntgenmikroskop
DE102015105018A1 (de) Verfahren und Rasterfluoreszenzlichtmikroskop zum mehrdimensional hochauflösenden Abbilden einer Struktur oder eines Wegs eines Partikels in einer Probe
DE2116713B2 (de) Belichtungsverfahren zum Abbilden sehr fein strukturierter Lichtmuster auf Photolackschichten und dazu geeignete Belichtungsvorrichtung
DE102015209758A1 (de) Anordnung und Verfahren zur Strahlformung und zur Lichtblattmikroskopie
DE3432252A1 (de) Messmikroskop
DE102013204466A1 (de) Messung einer optischen Symmetrieeigenschaft an einer Projektionsbelichtungsanlage
EP0040704B1 (fr) Procédé pour contrôler des systèmes optiques utilisant des franges de moiré
DE2047316A1 (de) Verfahren und Einrichtung zum Er zeugen einer Anordnung diskreter Be reiche mit einer Photolackschicht
DE4420409B4 (de) Photomaske mit Mustern zur Verringerung der erforderlichen Lichtleistung eines Steppers
DE2328069A1 (de) Optische ablenkvorrichtung und deren anwendung bei holographischen speichern
DE2306764A1 (de) Mikroschwaerzungsmessverfahren und mikroschwaerzungsmesser bzw. mikrodensitometer
EP1476890B1 (fr) Lame de phase pour la microscopie electronique et imagerie par microscopie electronique
DE2013101A1 (de) Anordnung zur periodischen Scharf einstellung
DE2345351C2 (de) Holographisches Aufzeichnungs- und Auslesesystem
DE102020101994B4 (de) Verfahren und Vorrichtung zur linsenlosen Bildgebung mittels Fourier-Transformations-Holographie
DE102018132875A1 (de) Fluoreszenzlichtmikroskopie mit erhöhter axialer Auflösung
DE1797473C3 (de) Verfahren zur Herstellung einer Hologranunkopie
DE69519143T2 (de) Mustererzeugungsverfahren und Verfahren und Apparat zur Herstellung einer Halbleitervorrichtung unter Verwendung von diesem Verfahren
DE102005023137B4 (de) Anordnung zur hochauflösenden digitalen Inline-Holographie
DE102015215559B4 (de) Verfahren zur hochauflösenden Abbildung eines Oberflächenbereiches bei streifendem Einfall der Messstrahlung
DE1564075C (de) Verfahren zur kontrastreichen Abbildung von Phasen- oder Amplitudenobjekten in einem Korpuskularstrahlgerät, insbesondere einem Elektronenmikroskop
DE2712837A1 (de) Mikroskop mit grosser schaerfentiefe

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): BE CH DE FR GB IT LI NL SE

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): BE CH DE FR GB IT LI NL SE

17P Request for examination filed

Effective date: 19900201

17Q First examination report despatched

Effective date: 19911106

ITF It: translation for a ep patent filed
GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): BE CH DE FR GB IT LI NL SE

REF Corresponds to:

Ref document number: 3788508

Country of ref document: DE

Date of ref document: 19940127

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)

Effective date: 19940124

ET Fr: translation filed
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
EAL Se: european patent in force in sweden

Ref document number: 87117658.2

REG Reference to a national code

Ref country code: GB

Ref legal event code: IF02

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CH

Payment date: 20021017

Year of fee payment: 16

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: SE

Payment date: 20021028

Year of fee payment: 16

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20021030

Year of fee payment: 16

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20021104

Year of fee payment: 16

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20021111

Year of fee payment: 16

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20021114

Year of fee payment: 16

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20031128

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20031129

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20031130

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20031130

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: BE

Payment date: 20031209

Year of fee payment: 17

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20040601

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20040602

EUG Se: european patent has lapsed
REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20031128

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20040730

NLV4 Nl: lapsed or anulled due to non-payment of the annual fee

Effective date: 20040601

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20041130

BERE Be: lapsed

Owner name: FIRMA CARL *ZEISS

Effective date: 20041130

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED.

Effective date: 20051128

BERE Be: lapsed

Owner name: FIRMA CARL *ZEISS

Effective date: 20041130