EP0280362B1 - Elément chauffant en couche mince - Google Patents

Elément chauffant en couche mince Download PDF

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Publication number
EP0280362B1
EP0280362B1 EP88200279A EP88200279A EP0280362B1 EP 0280362 B1 EP0280362 B1 EP 0280362B1 EP 88200279 A EP88200279 A EP 88200279A EP 88200279 A EP88200279 A EP 88200279A EP 0280362 B1 EP0280362 B1 EP 0280362B1
Authority
EP
European Patent Office
Prior art keywords
metal oxide
heating element
oxide film
doped
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP88200279A
Other languages
German (de)
English (en)
Other versions
EP0280362A3 (en
EP0280362A2 (fr
Inventor
Hans Auding
Günter Dipl.-Phys. Frank
Heiner Dr. rer. nat. Köstlin
Bruno Dr. Rer. Nat. Vitt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Patentverwaltung GmbH
Philips Gloeilampenfabrieken NV
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Patentverwaltung GmbH, Philips Gloeilampenfabrieken NV, Koninklijke Philips Electronics NV filed Critical Philips Patentverwaltung GmbH
Publication of EP0280362A2 publication Critical patent/EP0280362A2/fr
Publication of EP0280362A3 publication Critical patent/EP0280362A3/de
Application granted granted Critical
Publication of EP0280362B1 publication Critical patent/EP0280362B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/20—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by pyrolytic processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/02—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient
    • H01C7/021—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient formed with two or more layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible
    • H05B3/26—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
    • H05B3/265—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an inorganic material, e.g. ceramic

Definitions

  • the invention relates to a thin-film heating element, consisting of a temperature-stable, electrically insulating substrate with a thin, electrically conductive, with mutually compensating foreign atoms from at least one element forming an acceptor and at least one element forming a donor-doped metal oxide layer, which is provided with connection electrodes .
  • An acceptor represents a local defect in a semiconductor that can accept an electron or, in an equivalent manner, can emit a defect electron.
  • the associated electronic energy level lies in the forbidden band, whereby the exact position together with the cross-section for electrons determines the effect of the acceptor.
  • the host lattice atom is replaced by an atom that has one valence electron less than the host lattice atom.
  • a donor is an impurity in a semiconductor that can donate an electron located at it.
  • the associated electronic energy level lies in the forbidden band, whereby the exact position and the cross-section for electrons and defect electrons determine the effect of the donor.
  • a host lattice atom is replaced by an atom that has one valence electron more than the host lattice atom.
  • glass or ceramic substrates are coated in a pyrolytic process from solutions which contain, for example, the chlorides, bromides, iodides, sulfates, nitrates, oxalates or acetates of tin, indium, cadmium, tin and antimony, tin and indium or tin and cadmium contain no dopant additives such as tin, iron, copper or chrome.
  • the layers formed by pyrolytic deposition then consist of the corresponding metal oxide (s).
  • thin-film heating elements that reach surface temperatures higher than 500 ° C.
  • US Pat. No. 2,564,709 discloses thin, electrically conductive indium oxide layers which are doped with each other in pairs to compensate for foreign atoms composed of at least one acceptor and at least one donor-forming element in an amount of up to 10 atom%. however, the amounts of the acceptor and donor-forming elements each differ by more than 10%.
  • This known layer material has proven to be insufficiently stable at higher surface temperatures.
  • the invention has for its object to provide a thin-film heating element that is stable up to temperatures of over 600 ° C and high-resistance enough to operate it on mains voltage.
  • the metal oxide layer is doped with amounts of the mutually compensating foreign atoms which differ by no more than 10% in an amount of up to 10 atom% each.
  • the invention is based on the knowledge that with thin, electrically conductive metal oxide layers on appropriately temperature-stable substrates, surface temperatures of 1000 ° C. at power densities of more than 10 W / cm2, corresponding to current densities of more than 1000 A / cm2 with a low positive temperature coefficient of electrical resistance ⁇ ⁇ 3.10 ⁇ 4 K ⁇ 1 can be achieved if the metal oxide layers are doped with both relatively high and approximately equal amounts of mutually compensating foreign atoms each consisting of at least one element forming acceptors and at least one element forming donors.
  • the relatively high doping leads to reduced electron mobility and thus to relatively high resistance values.
  • the low positive temperature coefficient of the electrical resistance and its temperature stability of the layers according to the invention is attributed to the pairwise compensation of the elements forming the acceptors and donors.
  • SnO2 layers on hard glass, quartz glass or glass ceramic substrates are used as metal oxide layers for the construction of the heating element.
  • the metal oxide layers are not to be considered independently of the substrate, in particular the thermal stability, the thermal expansion coefficient of the substrate material and also a possible diffusion of foreign substances from the substrate into the metal oxide layer.
  • quartz glasses and glass ceramics with their extremely low expansion coefficients ( ⁇ 0/1000 ⁇ 0.5 or 0.1.10 ⁇ 6 K ⁇ 1) are suitable for a coating with doping SnO2 or In2O3 layers ( ⁇ ⁇ 4.10 ⁇ 6 K ⁇ 1) have been found to be equally suitable substrates, such as hard glasses with an expansion coefficient ⁇ ⁇ 3 to 4.10 ⁇ 6 K ⁇ 1.
  • a SnO2 layer is doped with indium, boron and / or aluminum as the acceptor-forming element (s) and with antimony and / or fluorine as the donor-forming element (s).
  • the metal oxide layer is doped with at least one acceptor and one donor-forming element in an amount of 3 to 5 atom% each.
  • the advantages achieved by the invention are, in particular, that heating elements are created which can be switched on and off abruptly, which due to their low heat capacity have already reached their final temperature after a relatively short period ( ⁇ 4 to 5 minutes), and which have been switched off cool down the power supply just as quickly.
  • Another advantage is that the metal oxide layers according to the invention are optically clear, free from streaks, streak-free and crack-free and have a high degree of transparency. These properties of the metal oxide layers according to the invention have a particularly advantageous effect if transparent substrates are used; For example, a bread roaster can be equipped with transparent heating disks, with which the browning of the toasted goods can easily be checked visually.
  • the heating elements according to the invention retain unchanged properties in air for several 1000 operating hours and switching cycles. This also applies to large-area heating elements of more than 1dm2.
  • Another advantage is that the sheet resistance of the layers according to the invention can be selected such that they can be operated directly from the mains voltage after electrodes, for example metal layer electrodes, have been attached.
  • Layers according to the invention were produced from a solution by spray pyrolysis.
  • 9.6 g SbCl3 and 9.3 g InCl3 were dissolved as dopants in a solution of 100 ml SnCl4 in 500 ml butyl acetate.
  • This addition of dopant corresponds to a doping of 4.5 atom% Sb and 4.5 atom% In.
  • SnO2 layers with a density of free charge carriers of N ⁇ 6.1020 / cm3 were made by spraying the above solution as a fine aerosol on about 500 ° C hot substrates with a dimension of 15x15 cm2 from a hard glass, as sprayed commercially under the trademarks Pyrex or Tempax.
  • the layers had a layer thickness of 0.1 ⁇ m and, after an annealing process (forming process) in air at a temperature of 600 ° C. over a period of 1 h, a sheet resistance of 160 ⁇ .
  • the metal oxide layers produced in the context of the invention have surface resistances of between approximately 20 and 500 ⁇ with layer thicknesses in the range from 0.05 to 0.5 ⁇ m.
  • substrates of 15x15 cm2 made of glass ceramic were also coated with SnO2 layers with a thickness of 0.3 ⁇ m. These layers also had a stable sheet resistance of ⁇ 60 ⁇ after a formation process at a temperature of ⁇ 600 ° C for a period of ⁇ 1 h.
  • Metal-layer electrodes were also attached to the substrates coated in this way and electrically heated hot plates were built from these heating elements, which were operated at a mains voltage of 220 V with an output of 800 W and a surface temperature of 600 ° C. After 200 turns on and off, the electrical resistance of the layers was unchanged. This heating element was still operational even with an output of 1.1 kW.
  • Quartz glass tubes can e.g. use as a heat exchanger in instantaneous water heaters, in coffee machines or in general as a heat exchanger in professional applications.
  • While continuous operation of the heating elements up to a recrystallization temperature of around 700 ° C is possible on glass ceramic substrates, operating temperatures of 1000 ° C can be achieved on quartz glass tubes, quartz glass rods or quartz glass plates. For example, a 1 dm2 quartz glass plate with a sheet resistance of R 37 ⁇ was operated at this temperature for a period of 1000 h.
  • Heating elements with plate-shaped substrates can be used as heating disks for toasters, heating or hot plates, warming plates, table ovens, irons, as floor heating in heatable thermos jugs or similar devices.
  • Heating elements with tubular substrates can be used as heat exchangers for instantaneous heaters, coffee machines, dishwashers, washing machines, tumble dryers, room air heaters, hair dryers or similar devices.
  • Heating elements with rod-shaped or tubular substrates can be used, for example, as infrared radiators or radiation ovens.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Resistance Heating (AREA)
  • Surface Heating Bodies (AREA)

Claims (13)

  1. Elément de chauffage à couche mince comportant un substrat stable en température électriquement isolant présentant une couche métallique dopée d'atomes étrangers mutuellement compensés par paires, chacun constitué au moins d'un élément constituant un accepteur et d'un élément constituant un donneur, la couche métallique comportant des électrodes de connexion, caractérisé en ce que la couche en oxyde métallique est dopée tout au plus de 10% de chacun des atomes étrangers qui se compensent mutuellement par paires, les quantités d'atomes présentant une différence maximale de 10%.
  2. Elément de chauffage selon la revendication 1, caractérisé en ce que la couche en oxyde métallique est une couche de SnO₂.
  3. Elément de chauffage selon la revendication 2, caractérisé en ce que la couche en oxyde métallique est dopée d'indium, de bore et/ou d'aluminium comme élément(s) formant des accepteurs.
  4. Elément de chauffage selon la revendication 2, caractérisé en ce que la couche en oxyde métallique est dopée d'antimoine et/ou de fluor comme élément(s) formant des donneurs.
  5. Elément de chauffage selon la revendication 2, caractérisé en ce que la couche en oxyde métallique est dopée de zinc comme élément formant des accepteurs.
  6. Elément de chauffage selon la revendication 1, caractérisé en ce que la couche en oxyde métallique est dopée d'un élément formant au moins des accepteurs et des donneurs dans une quantité comprise entre 3 et 5% en atomes.
  7. Elément de chauffage selon l'une quelconque des revendications précédentes, caractérisé en ce que la couche métallique est fabriquée par pyrolyse d'une solution contenant les éléments indispensables pour la fabrication de ladite couche.
  8. Elément de chauffage selon au moins l'une quelconque des revendications précédentes, caractérisé en ce que le substrat est constitué de verre dur.
  9. Elément de chauffage selon au moins l'une quelconque des revendications précédentes, caractérisé en ce que le substrat est constitué de verte de quartz.
  10. Elément de chauffage selon au moins l'une quelconque des revendications précédentes, caractérisé en ce que le substrat est constitué de céramique de verte.
  11. Utilisation selon les revendications 1 à 10 de l'élément de chauffage comme élément de chauffage pour grille-pain, plaques de chauffage ou de cuisson, réchauds, fours de table, fers à repasser, ou bouteilles isolantes pouvant être chauffées.
  12. Utilisation selon les revendications 1 à 10 d'éléments de chauffage tubulaires comme échangeur de chaleur pour chauffe-eau instantanés, cafetières, lave-vaisselle, machines à laver, sèche-linge, dispositifs de chauffage à air chaud ou sèche-cheveux.
  13. Utilisation selon les revendications 1 à 10 d'éléments de chauffage en forme de tube ou de tige comme radiateurs aux rayons infra-rouge ou comme fours de rayonnement.
EP88200279A 1987-02-21 1988-02-16 Elément chauffant en couche mince Expired - Lifetime EP0280362B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19873705639 DE3705639A1 (de) 1987-02-21 1987-02-21 Duennschicht-heizelement
DE3705639 1987-02-21

Publications (3)

Publication Number Publication Date
EP0280362A2 EP0280362A2 (fr) 1988-08-31
EP0280362A3 EP0280362A3 (en) 1990-01-31
EP0280362B1 true EP0280362B1 (fr) 1994-05-04

Family

ID=6321510

Family Applications (1)

Application Number Title Priority Date Filing Date
EP88200279A Expired - Lifetime EP0280362B1 (fr) 1987-02-21 1988-02-16 Elément chauffant en couche mince

Country Status (4)

Country Link
US (1) US4889974A (fr)
EP (1) EP0280362B1 (fr)
JP (1) JP2616947B2 (fr)
DE (2) DE3705639A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202008008709U1 (de) 2008-06-28 2009-11-19 Moser, Helmut Tisch sowie Tischplatte eines Tisches

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2640803B1 (fr) * 1988-12-15 1991-01-04 Neiman Sa Resistance en ceramique a haute temperature
JPH02220386A (ja) * 1989-02-21 1990-09-03 Nippon Electric Glass Co Ltd 遠赤外線ヒーター
US5408574A (en) * 1989-12-01 1995-04-18 Philip Morris Incorporated Flat ceramic heater having discrete heating zones
GB9211331D0 (en) * 1992-05-28 1992-07-15 Chinacraft Ltd Hot plate for food
JP2961466B2 (ja) * 1992-08-19 1999-10-12 株式会社河合楽器製作所 ヒーター
US5468936A (en) * 1993-03-23 1995-11-21 Philip Morris Incorporated Heater having a multiple-layer ceramic substrate and method of fabrication
US5725912A (en) * 1993-11-22 1998-03-10 Lin; Pan-Tien Method of manufacturing an electric heating film of semiconductor
EP0654956A1 (fr) * 1993-11-24 1995-05-24 U'LAMP ENTERPRISES Co., Ltd. Méthode de fabrication d'une couche chauffée électriquement
US5616266A (en) * 1994-07-29 1997-04-01 Thermal Dynamics U.S.A. Ltd. Co. Resistance heating element with large area, thin film and method
US5577158A (en) * 1995-07-17 1996-11-19 White Consolidated Industries, Inc. Capacitive leakage current cancellation for heating panel
DE19535068C2 (de) * 1995-09-21 1997-08-21 Lpkf Cad Cam Systeme Gmbh Beschichtung zur strukturierten Erzeugung von Leiterbahnen auf der Oberfläche von elektrisch isolierenden Substraten, Verfahren zum Herstellen der Beschichtung und von strukturierten Leiterbahnen
US5940579A (en) * 1997-02-26 1999-08-17 White Consolidated Industries, Inc. Capacitive leakage current cancellation for heating panel
US5932128A (en) * 1997-02-26 1999-08-03 White Consolidated Industries, Inc. Switching control system for heating panel with leakage current cancellation
US6037572A (en) * 1997-02-26 2000-03-14 White Consolidated Industries, Inc. Thin film heating assemblies
WO1998051127A1 (fr) 1997-05-06 1998-11-12 Thermoceramix, L.L.C. Revetements resistants obtenus par formation d'un depot
FR2778304B1 (fr) * 1998-05-04 2000-06-02 Production De L Aube Soc Ind D Procede d'apport de chaleur a un objet et conteneur de maintien et de remise en temperature de plats
AUPP599598A0 (en) * 1998-09-18 1998-10-08 Email Limited Self-regulating nanoscale heating element
US6111224A (en) * 1999-12-02 2000-08-29 Hatco Corporation Food warming oven with transparent heating shelves
US7081602B1 (en) 2000-02-01 2006-07-25 Trebor International, Inc. Fail-safe, resistive-film, immersion heater
US6663914B2 (en) 2000-02-01 2003-12-16 Trebor International Method for adhering a resistive coating to a substrate
US6674053B2 (en) 2001-06-14 2004-01-06 Trebor International Electrical, thin film termination
US6580061B2 (en) * 2000-02-01 2003-06-17 Trebor International Inc Durable, non-reactive, resistive-film heater
JP2004528677A (ja) 2000-11-29 2004-09-16 サーモセラミックス インコーポレイテッド 抵抗加熱器及びその使用法
US6728479B2 (en) * 2001-06-11 2004-04-27 Aoyagi (H.K.) Ltd. Panel-type heating element and method for the manufacture thereof
DE10258727A1 (de) * 2002-12-05 2004-06-24 Schott Glas Ofen
AU2003290429A1 (en) * 2002-12-25 2004-07-22 Casio Computer Co., Ltd. Optical dna sensor, dna reading apparatus, identification method of dna and manufacturing method of optical dna sensor
US6991003B2 (en) * 2003-07-28 2006-01-31 M.Braun, Inc. System and method for automatically purifying solvents
DE602004011386T2 (de) * 2003-11-20 2009-01-08 Koninklijke Philips Electronics N.V. Dünnschichtheizelement
DE102004019715A1 (de) * 2004-04-20 2005-11-17 Daimlerchrysler Ag Kraftstoffbehälter
EP1653778A1 (fr) * 2004-10-26 2006-05-03 Cheng-Ping Lin Film de chauffage avec stabilisation de température automatisée
EP1681905A1 (fr) * 2005-01-17 2006-07-19 Cheng-Ping Lin Méthode de fabrication d'un film électrique chauffant à semiconducteur
AU2008219092A1 (en) * 2007-02-20 2008-08-28 Thermoceramix Inc. Gas heating apparatus and methods
DE102008050895A1 (de) 2008-09-25 2010-04-01 E.G.O. Elektro-Gerätebau GmbH Pumpe für Fluide
GB0908860D0 (en) * 2009-05-22 2009-07-01 Sagentia Ltd Iron
DE102010063934A1 (de) * 2010-12-22 2012-06-28 BSH Bosch und Siemens Hausgeräte GmbH Heizkörper sowie Haushaltsgerät mit einem Heizkörper und Verfahren zum Herstellen
US9408497B2 (en) 2013-08-21 2016-08-09 Whirlpool Corporation Multi-functional toasting platform utilizing a coated clear-glass heating element
US20150297029A1 (en) 2014-04-16 2015-10-22 Spectrum Brands, Inc. Cooking appliance using thin-film heating element
EP3132653A4 (fr) 2014-04-16 2018-06-06 Spectrum Brands, Inc. Système de récipient portable pour chauffer une boisson
WO2015161110A1 (fr) * 2014-04-16 2015-10-22 Spectrum Brands, Inc. Grille-pain utilisant un élément chauffant à film mince
KR101737693B1 (ko) * 2015-07-02 2017-05-18 구각회 저전력 고열 면상 발열체
EP3317134B1 (fr) * 2015-07-03 2022-01-12 Kautex Textron GmbH & Co. KG Dispositif de décongélation pour réservoir de liquide fonctionnel
WO2018136689A1 (fr) 2017-01-20 2018-07-26 Bunn-O-Matic Corporation Chauffe-eau à la demande à réponse instantanée
EP3447304B1 (fr) * 2017-08-25 2026-04-15 Sanhua AWECO Appliance Systems GmbH Élément de chauffage en couches minces pour une pompe à fluide
CN111447695B (zh) * 2020-05-05 2022-12-30 中山市烯帝科技有限公司 石墨烯远红外发热板的制作方法及其配方

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2564709A (en) * 1950-11-24 1951-08-21 Corning Glass Works Electrically conducting coating on glass and other ceramic bodies
US3108019A (en) * 1958-02-14 1963-10-22 Corning Glass Works Method of stabilizing the electrical resistance of a metal oxide film
US3044903A (en) * 1958-08-25 1962-07-17 Philco Corp Thin film resistors
US3551195A (en) * 1968-08-29 1970-12-29 Matsushita Electric Industrial Co Ltd Resistor composition and article
SU577700A1 (ru) * 1975-12-08 1977-10-25 Предприятие П/Я Р-6707 Токопровод щий материал дл пленочных электронагревателей
US4340508A (en) * 1979-01-29 1982-07-20 Trw Inc. Resistance material, resistor and method of making the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202008008709U1 (de) 2008-06-28 2009-11-19 Moser, Helmut Tisch sowie Tischplatte eines Tisches

Also Published As

Publication number Publication date
US4889974A (en) 1989-12-26
EP0280362A3 (en) 1990-01-31
JPS63252378A (ja) 1988-10-19
DE3705639A1 (de) 1988-09-01
DE3889359D1 (de) 1994-06-09
JP2616947B2 (ja) 1997-06-04
EP0280362A2 (fr) 1988-08-31

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