EP0396227A2 - Dispositifs magnétiques avec pôles relevés - Google Patents

Dispositifs magnétiques avec pôles relevés Download PDF

Info

Publication number
EP0396227A2
EP0396227A2 EP90302360A EP90302360A EP0396227A2 EP 0396227 A2 EP0396227 A2 EP 0396227A2 EP 90302360 A EP90302360 A EP 90302360A EP 90302360 A EP90302360 A EP 90302360A EP 0396227 A2 EP0396227 A2 EP 0396227A2
Authority
EP
European Patent Office
Prior art keywords
pole
cobalt
weight
bath
oersteds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP90302360A
Other languages
German (de)
English (en)
Other versions
EP0396227A3 (fr
EP0396227B1 (fr
Inventor
Harold B. Shukovsky
Michelle Martin
Michael Mallary
Alan Lee Sidman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Quantum Corp
Original Assignee
Digital Equipment Corp
Quantum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Digital Equipment Corp, Quantum Corp filed Critical Digital Equipment Corp
Publication of EP0396227A2 publication Critical patent/EP0396227A2/fr
Publication of EP0396227A3 publication Critical patent/EP0396227A3/fr
Application granted granted Critical
Publication of EP0396227B1 publication Critical patent/EP0396227B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/562Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/3113Details for improving the magnetic domain structure or avoiding the formation or displacement of undesirable magnetic domains
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/24Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids
    • H01F41/26Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids using electric currents, e.g. electroplating
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers

Definitions

  • the present invention relates to read/write devices for high density magnetic recording.
  • Domain wall motion results in flux being transmitted through a head along the walls of a domain, or domains, the flux spreading out along the domain walls as the flux seeks to return to equilibrium.
  • domain wall motion facilitates conduction of flux at low frequencies, it is a poor vehicle for conduction of flux at high frequencies.
  • defects in the material in a head can be the source of Barkhausen noise as wall motion is perturbed by these defects. Such noise can result in erroneous readings of recorded data.
  • Figure 1a schematically shows a pole tip region 10 of a magnetic transducer, such as a prior art thin film head, configured to achieve conduction by domain rotation when reading flux from a magnetic medium.
  • Pole P1 is provided with central magnetic domains 12, having an axis of anisotropy (easy axis) indicated by the at rest domain state arrows 14 transverse to the longitudinal axis of the pole.
  • the probability of Barkhausen noise is inversely related to center region width W c .
  • Figure 1b shows a prior art pole piece P1 having a narrow width with a criss-cross domain structure.
  • the edge domains each still have a width W x but there is no appreciable width of a center conduction section.
  • W t 2W x .
  • a preferred deposition stream includes a nickel-­iron plating bath with cobalt content in the range of about 20-25% by weight, and preferably having cobalt chloride hexahydrate at about 3.65 grams per liter.
  • the bath preferably is a modified Watt's bath including nickelous chloride, sodium saccharin, ferrous chloride, and cobaltous chloride.
  • High density recording requires a head design with narrow track width, and preferably with the domain configuration shown in Fig. 1a. This is achieved by reducing the width W t of the pole(s). However, as the head pole width W t is narrowed down to around three microns, the central flux conduction region width W c tends to approach zero, with the domain structure thus assuming the known configuration shown in Fig. 1b. At this point, domain rotation fails as a functional mechanism of flux conduction and the head becomes less efficient. Therefore, the ratio of W c /W t appears to have significance in narrow track head design.
  • Our preferred ratio of W c /W t is in the range of 0.5 to 0.7, with an acceptable level of coercivity (H c ) at about one Oersted or less, at least for maintaining domain rotation in a narrow track head about three microns wide.
  • the acceptable level of coercivity for a given geometry may be defined as that level which permits a transverse at rest domain state orientation to resume prior to reading when cycling between reading and writing.
  • a preferred method for forming at least one pole of a magnetic transducer for a chosen pole width includes determining maximum desired P, relating that P to a target H k as in Fig. 2, relating that target H k (as an annealed value) to a known cobalt bath concentration which yields test samples having the target H k (after anneal), and then forming a pole in a bath having that concentration, the pole then being annealed to achieve the target H k of Fig. 2.
  • the present invention may be practiced with a modified Watt's bath.
  • a preferred bath which yielded favorable results is shown below: 109g/1 nickelous chloride (hydrated), 25g/1 boric acid, .8g/1 sodium saccharin, .2g/1 sodium lauryl sulphate, 1-2g/1 ferrous chloride (hydrated), 0-9.75g/1 cobaltous chloride (hydrated and preferably 3.65g/1), pH ⁇ 2.5, T ⁇ 25C, and Current density in the range of 5-10 milliamp/cm2.
  • the wafer is annealed preferably in a vacuum in a magnetic field greater than the calculated demagnetization field of the pole tip.
  • the axis of the applied field is parallel to the easy axis of the plated film. This process results in the change in H k as shown in Fig. 2c.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Magnetic Brush Developing In Electrophotography (AREA)
EP90302360A 1989-05-01 1990-03-06 Dispositifs magnétiques avec pôles relevés Expired - Lifetime EP0396227B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US34571989A 1989-05-01 1989-05-01
US345719 1989-05-01

Publications (3)

Publication Number Publication Date
EP0396227A2 true EP0396227A2 (fr) 1990-11-07
EP0396227A3 EP0396227A3 (fr) 1991-01-09
EP0396227B1 EP0396227B1 (fr) 1995-05-17

Family

ID=23356209

Family Applications (1)

Application Number Title Priority Date Filing Date
EP90302360A Expired - Lifetime EP0396227B1 (fr) 1989-05-01 1990-03-06 Dispositifs magnétiques avec pôles relevés

Country Status (6)

Country Link
US (1) US5571573A (fr)
EP (1) EP0396227B1 (fr)
JP (1) JPH0772929B2 (fr)
AT (1) ATE122812T1 (fr)
CA (1) CA2012294C (fr)
DE (1) DE69019416T2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0725386A3 (fr) * 1995-02-03 1998-03-25 Hitachi, Ltd. Système de stockage à disque, tête magnétique à films minces y afférant et procédé de fabrication

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5830587A (en) * 1992-02-06 1998-11-03 Mke-Quantum Components Colorado, Llc Magnetic devices with enhanced poles
US6353511B1 (en) 1999-06-15 2002-03-05 Read-Rite Corporation Thin film write head for improved high speed and high density recording
US6342311B1 (en) 1999-10-08 2002-01-29 Seagate Technology, Inc. High magnetic moment seed layer materials for writer pole tips
US9797057B2 (en) * 2009-08-24 2017-10-24 Empire Technology Development Llc Magnetic electro-plating
RU2623536C2 (ru) * 2015-08-11 2017-06-27 Роберт Дмитриевич Тихонов Способ электрохимического локального осаждения пленок пермаллоя Ni81Fe19 для интегральных микросистем

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1052649A (fr) * 1964-06-05
GB1143757A (fr) * 1965-03-29
US3518170A (en) * 1965-07-26 1970-06-30 Ibm Electrodeposition of iron group metals
US3483029A (en) * 1966-07-15 1969-12-09 Ibm Method and composition for depositing nickel-iron-boron magnetic films
US3880602A (en) * 1967-07-28 1975-04-29 Centre Nat Rech Scient Thin layer magnetic structures for binary information stores
US3533922A (en) * 1968-06-26 1970-10-13 Honeywell Inc Composition and process for plating ferromagnetic film
US3847759A (en) * 1970-11-27 1974-11-12 Raytheon Co Method of making a magnetic memory device
US3736576A (en) * 1970-11-27 1973-05-29 Plated wire magnetic memory device
US3814591A (en) * 1972-06-30 1974-06-04 Honeywell Inc Plated wire memory element
US3894924A (en) * 1972-11-08 1975-07-15 Raytheon Co Apparatus for plating elongated bodies
US3866192A (en) * 1973-03-01 1975-02-11 Honeywell Inc Plated wire memory element
US3887338A (en) * 1973-06-29 1975-06-03 Sperry Rand Corp Plated wire memory
US3963569A (en) * 1973-12-06 1976-06-15 Raytheon Company Apparatus for plating elongated bodies
US4208254A (en) * 1976-09-22 1980-06-17 Satoshi Ichioka Method of plating an iron-cobalt alloy on a substrate
US4102756A (en) * 1976-12-30 1978-07-25 International Business Machines Corporation Nickel-iron (80:20) alloy thin film electroplating method and electrochemical treatment and plating apparatus
US4103315A (en) * 1977-06-24 1978-07-25 International Business Machines Corporation Antiferromagnetic-ferromagnetic exchange bias films
US4150981A (en) * 1977-08-15 1979-04-24 Allied Chemical Corporation Glassy alloys containing cobalt, nickel and iron having near-zero magnetostriction and high saturation induction
US4242710A (en) * 1979-01-29 1980-12-30 International Business Machines Corporation Thin film head having negative magnetostriction
NL8102148A (nl) * 1981-05-01 1982-12-01 Philips Nv Magnetisch overdrachtselement alsmede magnetisch permeabel onderdeel voor een magnetisch overdrachtselement.
EP0108355B1 (fr) * 1982-11-04 1988-01-20 Kao Corporation Tête magnétique
JPS6082638A (ja) * 1983-10-07 1985-05-10 Hitachi Ltd Νi−Co−Feの三元系合金薄膜およびその製造方法
DE3603903A1 (de) * 1986-02-07 1987-08-13 Siemens Ag Magnetische speichereinrichtung mit einem senkrecht zu magnetisierenden aufzeichnungsmedium
EP0232505A1 (fr) * 1985-12-20 1987-08-19 Siemens Aktiengesellschaft Dispositif de stockage magnétique à milieu d'enregistrement à magnétiser perpendiculairement
JPS62149007A (ja) * 1985-12-23 1987-07-03 Matsushita Electric Ind Co Ltd 垂直磁気ヘツド
US4661216A (en) * 1986-04-21 1987-04-28 International Business Machines Corporation Electrodepositing CoNiFe alloys for thin film heads
US4907113A (en) * 1987-07-29 1990-03-06 Digital Equipment Corporation Three-pole magnetic recording head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0725386A3 (fr) * 1995-02-03 1998-03-25 Hitachi, Ltd. Système de stockage à disque, tête magnétique à films minces y afférant et procédé de fabrication
CN1068949C (zh) * 1995-02-03 2001-07-25 株式会社日立制作所 磁盘存储系统和薄膜磁头

Also Published As

Publication number Publication date
US5571573A (en) 1996-11-05
DE69019416D1 (de) 1995-06-22
DE69019416T2 (de) 1996-02-29
ATE122812T1 (de) 1995-06-15
EP0396227A3 (fr) 1991-01-09
EP0396227B1 (fr) 1995-05-17
JPH0772929B2 (ja) 1995-08-02
CA2012294C (fr) 1994-10-04
JPH02302918A (ja) 1990-12-14
CA2012294A1 (fr) 1990-11-01

Similar Documents

Publication Publication Date Title
US4780781A (en) Thin film magnetic head having magnetic film of Co-Ni-Fe alloy
US4242710A (en) Thin film head having negative magnetostriction
US6063512A (en) Soft magnetic thin film having Co, Ni and Fe as main ingredients, method of manufacturing the same and magnetic head and magnetic storage unit using the soft magnetic thin film
EP0243627B1 (fr) Alliage du type Co-Ni-Fe électro-déposé pour têtes d'enregistrement revêtues d'un film mince
JP3229718B2 (ja) 軟磁性合金、軟磁性薄膜および多層膜
EP0471946A2 (fr) Matériaux à haut moment magnétique et procédé pour la fabrication de têtes magnétiques à film mince
EP0426326B1 (fr) Tête magnétique de lecture/écriture et procédé de fabrication d'une telle tête
JP3201892B2 (ja) 軟磁性薄膜とそれを用いた磁気インダクティブmrヘッド
EP0076152A1 (fr) Procédé pour la fabrication d'un support magnétique fin continu
EP0396227B1 (fr) Dispositifs magnétiques avec pôles relevés
EP0395111B1 (fr) Procédé de fabrication de films minces à haute densité de flux magnétique composés d'alliages quaternaires déposés de manière électrolytique
US4405677A (en) Post treatment of perpendicular magnetic recording media
Liu et al. High moment FeCoNi alloy thin films fabricated by pulsed-current electrodeposition
EP0596448A2 (fr) Film multicouche magnétiquement doux pour utiliser dans une tête à couche mince et procédé de fabrication de celui-ci
US5830587A (en) Magnetic devices with enhanced poles
US4374009A (en) Electrochemical post treatment of perpendicular magnetic recording media
US6337007B1 (en) Method of making a Co-Fe-Ni soft magnetic thin film
US7001499B2 (en) Method for electroplating a body-centered cubic nickel-iron alloy thin film with a high saturation flux density
US3691032A (en) Permalloy film plated wires having superior nondestructive read-out characteristics and method of forming
US20030085131A1 (en) Electro-deposition of high saturation magnetization Fe-Ni-Co films
EP1821289A2 (fr) Film mince magnétique doux, son procédé de fabrication et tête magnétique
JPH0636929A (ja) めっき磁性薄膜およびその製造方法
JPH1046383A (ja) Ni−Fe合金電気めっき方法およびNi−Fe合金電気めっき膜
JP3432667B2 (ja) 高密度磁気記録ヘッド用軟磁性薄膜
JP2003022909A (ja) 磁性薄膜とその製造方法、及びそれを用いた磁気ヘッド

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 19900323

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT BE CH DE DK ES FR GB GR IT LI LU NL SE

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): AT BE CH DE DK ES FR GB GR IT LI LU NL SE

17Q First examination report despatched

Effective date: 19931006

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: QUANTUM CORPORATION

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE CH DE DK ES FR GB GR IT LI LU NL SE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 19950517

Ref country code: LI

Effective date: 19950517

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 19950517

Ref country code: DK

Effective date: 19950517

Ref country code: CH

Effective date: 19950517

Ref country code: BE

Effective date: 19950517

Ref country code: AT

Effective date: 19950517

REF Corresponds to:

Ref document number: 122812

Country of ref document: AT

Date of ref document: 19950615

Kind code of ref document: T

RIN1 Information on inventor provided before grant (corrected)

Inventor name: SIDMAN, ALAN LEE

Inventor name: MALLARY, MICHAEL

Inventor name: MARTIN, MICHELLE

Inventor name: SHUKOVSKY, HAROLD B.

REF Corresponds to:

Ref document number: 69019416

Country of ref document: DE

Date of ref document: 19950622

ET Fr: translation filed
ITF It: translation for a ep patent filed
PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Effective date: 19950817

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 19950828

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

NLV1 Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents act
PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: LU

Payment date: 19960201

Year of fee payment: 7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: ES

Payment date: 19960315

Year of fee payment: 7

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19970306

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20010219

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20010220

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20010221

Year of fee payment: 12

REG Reference to a national code

Ref country code: GB

Ref legal event code: IF02

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20020306

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20021001

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20020306

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20021129

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED.

Effective date: 20050306