EP0396227A2 - Dispositifs magnétiques avec pôles relevés - Google Patents
Dispositifs magnétiques avec pôles relevés Download PDFInfo
- Publication number
- EP0396227A2 EP0396227A2 EP90302360A EP90302360A EP0396227A2 EP 0396227 A2 EP0396227 A2 EP 0396227A2 EP 90302360 A EP90302360 A EP 90302360A EP 90302360 A EP90302360 A EP 90302360A EP 0396227 A2 EP0396227 A2 EP 0396227A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- pole
- cobalt
- weight
- bath
- oersteds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 45
- 239000010941 cobalt Substances 0.000 claims abstract description 45
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 45
- 238000000034 method Methods 0.000 claims abstract description 32
- 230000008569 process Effects 0.000 claims abstract description 29
- 238000000137 annealing Methods 0.000 claims description 15
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 14
- 230000004907 flux Effects 0.000 claims description 13
- 238000000151 deposition Methods 0.000 claims description 11
- 238000007747 plating Methods 0.000 claims description 11
- 230000008021 deposition Effects 0.000 claims description 9
- 229910052742 iron Inorganic materials 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 230000035699 permeability Effects 0.000 claims description 6
- 229960002089 ferrous chloride Drugs 0.000 claims description 5
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 claims description 5
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 5
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 claims description 4
- 229940097267 cobaltous chloride Drugs 0.000 claims description 4
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims description 4
- GFHNAMRJFCEERV-UHFFFAOYSA-L cobalt chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Co+2] GFHNAMRJFCEERV-UHFFFAOYSA-L 0.000 claims description 3
- 238000004070 electrodeposition Methods 0.000 claims description 3
- 229910000531 Co alloy Inorganic materials 0.000 claims description 2
- 238000007733 ion plating Methods 0.000 claims description 2
- 238000007782 splat cooling Methods 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 238000007738 vacuum evaporation Methods 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 abstract description 3
- 239000000956 alloy Substances 0.000 abstract description 3
- 230000002349 favourable effect Effects 0.000 abstract description 3
- 230000001965 increasing effect Effects 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 2
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 229910000889 permalloy Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 description 21
- 230000005330 Barkhausen effect Effects 0.000 description 5
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 101100165186 Caenorhabditis elegans bath-34 gene Proteins 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- 239000004141 Sodium laurylsulphate Substances 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000006172 buffering agent Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 230000005347 demagnetization Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3113—Details for improving the magnetic domain structure or avoiding the formation or displacement of undesirable magnetic domains
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/24—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids
- H01F41/26—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids using electric currents, e.g. electroplating
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
Definitions
- the present invention relates to read/write devices for high density magnetic recording.
- Domain wall motion results in flux being transmitted through a head along the walls of a domain, or domains, the flux spreading out along the domain walls as the flux seeks to return to equilibrium.
- domain wall motion facilitates conduction of flux at low frequencies, it is a poor vehicle for conduction of flux at high frequencies.
- defects in the material in a head can be the source of Barkhausen noise as wall motion is perturbed by these defects. Such noise can result in erroneous readings of recorded data.
- Figure 1a schematically shows a pole tip region 10 of a magnetic transducer, such as a prior art thin film head, configured to achieve conduction by domain rotation when reading flux from a magnetic medium.
- Pole P1 is provided with central magnetic domains 12, having an axis of anisotropy (easy axis) indicated by the at rest domain state arrows 14 transverse to the longitudinal axis of the pole.
- the probability of Barkhausen noise is inversely related to center region width W c .
- Figure 1b shows a prior art pole piece P1 having a narrow width with a criss-cross domain structure.
- the edge domains each still have a width W x but there is no appreciable width of a center conduction section.
- W t 2W x .
- a preferred deposition stream includes a nickel-iron plating bath with cobalt content in the range of about 20-25% by weight, and preferably having cobalt chloride hexahydrate at about 3.65 grams per liter.
- the bath preferably is a modified Watt's bath including nickelous chloride, sodium saccharin, ferrous chloride, and cobaltous chloride.
- High density recording requires a head design with narrow track width, and preferably with the domain configuration shown in Fig. 1a. This is achieved by reducing the width W t of the pole(s). However, as the head pole width W t is narrowed down to around three microns, the central flux conduction region width W c tends to approach zero, with the domain structure thus assuming the known configuration shown in Fig. 1b. At this point, domain rotation fails as a functional mechanism of flux conduction and the head becomes less efficient. Therefore, the ratio of W c /W t appears to have significance in narrow track head design.
- Our preferred ratio of W c /W t is in the range of 0.5 to 0.7, with an acceptable level of coercivity (H c ) at about one Oersted or less, at least for maintaining domain rotation in a narrow track head about three microns wide.
- the acceptable level of coercivity for a given geometry may be defined as that level which permits a transverse at rest domain state orientation to resume prior to reading when cycling between reading and writing.
- a preferred method for forming at least one pole of a magnetic transducer for a chosen pole width includes determining maximum desired P, relating that P to a target H k as in Fig. 2, relating that target H k (as an annealed value) to a known cobalt bath concentration which yields test samples having the target H k (after anneal), and then forming a pole in a bath having that concentration, the pole then being annealed to achieve the target H k of Fig. 2.
- the present invention may be practiced with a modified Watt's bath.
- a preferred bath which yielded favorable results is shown below: 109g/1 nickelous chloride (hydrated), 25g/1 boric acid, .8g/1 sodium saccharin, .2g/1 sodium lauryl sulphate, 1-2g/1 ferrous chloride (hydrated), 0-9.75g/1 cobaltous chloride (hydrated and preferably 3.65g/1), pH ⁇ 2.5, T ⁇ 25C, and Current density in the range of 5-10 milliamp/cm2.
- the wafer is annealed preferably in a vacuum in a magnetic field greater than the calculated demagnetization field of the pole tip.
- the axis of the applied field is parallel to the easy axis of the plated film. This process results in the change in H k as shown in Fig. 2c.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Electrochemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
- Electroplating Methods And Accessories (AREA)
- Magnetic Brush Developing In Electrophotography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US34571989A | 1989-05-01 | 1989-05-01 | |
| US345719 | 1989-05-01 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP0396227A2 true EP0396227A2 (fr) | 1990-11-07 |
| EP0396227A3 EP0396227A3 (fr) | 1991-01-09 |
| EP0396227B1 EP0396227B1 (fr) | 1995-05-17 |
Family
ID=23356209
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP90302360A Expired - Lifetime EP0396227B1 (fr) | 1989-05-01 | 1990-03-06 | Dispositifs magnétiques avec pôles relevés |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5571573A (fr) |
| EP (1) | EP0396227B1 (fr) |
| JP (1) | JPH0772929B2 (fr) |
| AT (1) | ATE122812T1 (fr) |
| CA (1) | CA2012294C (fr) |
| DE (1) | DE69019416T2 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0725386A3 (fr) * | 1995-02-03 | 1998-03-25 | Hitachi, Ltd. | Système de stockage à disque, tête magnétique à films minces y afférant et procédé de fabrication |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5830587A (en) * | 1992-02-06 | 1998-11-03 | Mke-Quantum Components Colorado, Llc | Magnetic devices with enhanced poles |
| US6353511B1 (en) | 1999-06-15 | 2002-03-05 | Read-Rite Corporation | Thin film write head for improved high speed and high density recording |
| US6342311B1 (en) | 1999-10-08 | 2002-01-29 | Seagate Technology, Inc. | High magnetic moment seed layer materials for writer pole tips |
| US9797057B2 (en) * | 2009-08-24 | 2017-10-24 | Empire Technology Development Llc | Magnetic electro-plating |
| RU2623536C2 (ru) * | 2015-08-11 | 2017-06-27 | Роберт Дмитриевич Тихонов | Способ электрохимического локального осаждения пленок пермаллоя Ni81Fe19 для интегральных микросистем |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1052649A (fr) * | 1964-06-05 | |||
| GB1143757A (fr) * | 1965-03-29 | |||
| US3518170A (en) * | 1965-07-26 | 1970-06-30 | Ibm | Electrodeposition of iron group metals |
| US3483029A (en) * | 1966-07-15 | 1969-12-09 | Ibm | Method and composition for depositing nickel-iron-boron magnetic films |
| US3880602A (en) * | 1967-07-28 | 1975-04-29 | Centre Nat Rech Scient | Thin layer magnetic structures for binary information stores |
| US3533922A (en) * | 1968-06-26 | 1970-10-13 | Honeywell Inc | Composition and process for plating ferromagnetic film |
| US3847759A (en) * | 1970-11-27 | 1974-11-12 | Raytheon Co | Method of making a magnetic memory device |
| US3736576A (en) * | 1970-11-27 | 1973-05-29 | Plated wire magnetic memory device | |
| US3814591A (en) * | 1972-06-30 | 1974-06-04 | Honeywell Inc | Plated wire memory element |
| US3894924A (en) * | 1972-11-08 | 1975-07-15 | Raytheon Co | Apparatus for plating elongated bodies |
| US3866192A (en) * | 1973-03-01 | 1975-02-11 | Honeywell Inc | Plated wire memory element |
| US3887338A (en) * | 1973-06-29 | 1975-06-03 | Sperry Rand Corp | Plated wire memory |
| US3963569A (en) * | 1973-12-06 | 1976-06-15 | Raytheon Company | Apparatus for plating elongated bodies |
| US4208254A (en) * | 1976-09-22 | 1980-06-17 | Satoshi Ichioka | Method of plating an iron-cobalt alloy on a substrate |
| US4102756A (en) * | 1976-12-30 | 1978-07-25 | International Business Machines Corporation | Nickel-iron (80:20) alloy thin film electroplating method and electrochemical treatment and plating apparatus |
| US4103315A (en) * | 1977-06-24 | 1978-07-25 | International Business Machines Corporation | Antiferromagnetic-ferromagnetic exchange bias films |
| US4150981A (en) * | 1977-08-15 | 1979-04-24 | Allied Chemical Corporation | Glassy alloys containing cobalt, nickel and iron having near-zero magnetostriction and high saturation induction |
| US4242710A (en) * | 1979-01-29 | 1980-12-30 | International Business Machines Corporation | Thin film head having negative magnetostriction |
| NL8102148A (nl) * | 1981-05-01 | 1982-12-01 | Philips Nv | Magnetisch overdrachtselement alsmede magnetisch permeabel onderdeel voor een magnetisch overdrachtselement. |
| EP0108355B1 (fr) * | 1982-11-04 | 1988-01-20 | Kao Corporation | Tête magnétique |
| JPS6082638A (ja) * | 1983-10-07 | 1985-05-10 | Hitachi Ltd | Νi−Co−Feの三元系合金薄膜およびその製造方法 |
| DE3603903A1 (de) * | 1986-02-07 | 1987-08-13 | Siemens Ag | Magnetische speichereinrichtung mit einem senkrecht zu magnetisierenden aufzeichnungsmedium |
| EP0232505A1 (fr) * | 1985-12-20 | 1987-08-19 | Siemens Aktiengesellschaft | Dispositif de stockage magnétique à milieu d'enregistrement à magnétiser perpendiculairement |
| JPS62149007A (ja) * | 1985-12-23 | 1987-07-03 | Matsushita Electric Ind Co Ltd | 垂直磁気ヘツド |
| US4661216A (en) * | 1986-04-21 | 1987-04-28 | International Business Machines Corporation | Electrodepositing CoNiFe alloys for thin film heads |
| US4907113A (en) * | 1987-07-29 | 1990-03-06 | Digital Equipment Corporation | Three-pole magnetic recording head |
-
1990
- 1990-03-06 DE DE69019416T patent/DE69019416T2/de not_active Expired - Fee Related
- 1990-03-06 EP EP90302360A patent/EP0396227B1/fr not_active Expired - Lifetime
- 1990-03-06 AT AT90302360T patent/ATE122812T1/de not_active IP Right Cessation
- 1990-03-15 CA CA002012294A patent/CA2012294C/fr not_active Expired - Fee Related
- 1990-04-18 JP JP2102756A patent/JPH0772929B2/ja not_active Expired - Lifetime
-
1992
- 1992-02-06 US US07/831,615 patent/US5571573A/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0725386A3 (fr) * | 1995-02-03 | 1998-03-25 | Hitachi, Ltd. | Système de stockage à disque, tête magnétique à films minces y afférant et procédé de fabrication |
| CN1068949C (zh) * | 1995-02-03 | 2001-07-25 | 株式会社日立制作所 | 磁盘存储系统和薄膜磁头 |
Also Published As
| Publication number | Publication date |
|---|---|
| US5571573A (en) | 1996-11-05 |
| DE69019416D1 (de) | 1995-06-22 |
| DE69019416T2 (de) | 1996-02-29 |
| ATE122812T1 (de) | 1995-06-15 |
| EP0396227A3 (fr) | 1991-01-09 |
| EP0396227B1 (fr) | 1995-05-17 |
| JPH0772929B2 (ja) | 1995-08-02 |
| CA2012294C (fr) | 1994-10-04 |
| JPH02302918A (ja) | 1990-12-14 |
| CA2012294A1 (fr) | 1990-11-01 |
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