EP0409665A1 - Matériel photographique à halogénure d'argent avec revêtement antistatique - Google Patents
Matériel photographique à halogénure d'argent avec revêtement antistatique Download PDFInfo
- Publication number
- EP0409665A1 EP0409665A1 EP90308018A EP90308018A EP0409665A1 EP 0409665 A1 EP0409665 A1 EP 0409665A1 EP 90308018 A EP90308018 A EP 90308018A EP 90308018 A EP90308018 A EP 90308018A EP 0409665 A1 EP0409665 A1 EP 0409665A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- group
- silver halide
- photographic material
- halide photographic
- material according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 117
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 60
- 239000004332 silver Substances 0.000 title claims abstract description 60
- 239000000463 material Substances 0.000 title claims abstract description 46
- 238000000576 coating method Methods 0.000 title claims description 34
- 239000011248 coating agent Substances 0.000 title claims description 32
- 229920001600 hydrophobic polymer Polymers 0.000 claims abstract description 26
- 239000000839 emulsion Substances 0.000 claims abstract description 25
- 239000002245 particle Substances 0.000 claims abstract description 24
- 229920001940 conductive polymer Polymers 0.000 claims abstract description 22
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 16
- 239000002736 nonionic surfactant Substances 0.000 claims abstract description 16
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims abstract description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 10
- 125000005250 alkyl acrylate group Chemical group 0.000 claims abstract description 8
- 239000002985 plastic film Substances 0.000 claims abstract description 8
- 229920006255 plastic film Polymers 0.000 claims abstract description 8
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical group NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 4
- 239000006185 dispersion Substances 0.000 claims abstract description 4
- 150000001875 compounds Chemical class 0.000 claims description 21
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 13
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 12
- 229920000233 poly(alkylene oxides) Polymers 0.000 claims description 9
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 6
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 6
- 229910052717 sulfur Chemical group 0.000 claims description 6
- 125000003831 tetrazolyl group Chemical group 0.000 claims description 6
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 claims description 5
- 125000003277 amino group Chemical group 0.000 claims description 5
- 125000003172 aldehyde group Chemical group 0.000 claims description 4
- 125000004069 aziridinyl group Chemical group 0.000 claims description 4
- 125000003700 epoxy group Chemical group 0.000 claims description 4
- 150000003242 quaternary ammonium salts Chemical group 0.000 claims description 4
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 4
- 229920003171 Poly (ethylene oxide) Chemical group 0.000 claims description 3
- AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical group C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 claims description 3
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 claims description 3
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 3
- 150000003440 styrenes Chemical class 0.000 claims description 3
- 125000000626 sulfinic acid group Chemical group 0.000 claims description 3
- 229920002284 Cellulose triacetate Polymers 0.000 claims description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 claims description 2
- 150000003926 acrylamides Chemical class 0.000 claims description 2
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims description 2
- 150000001450 anions Chemical class 0.000 claims description 2
- 125000004391 aryl sulfonyl group Chemical group 0.000 claims description 2
- 125000004434 sulfur atom Chemical group 0.000 claims description 2
- 150000003866 tertiary ammonium salts Chemical group 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 abstract description 7
- 239000010410 layer Substances 0.000 description 30
- 229920000642 polymer Polymers 0.000 description 13
- 238000011161 development Methods 0.000 description 12
- 230000018109 developmental process Effects 0.000 description 12
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 108010010803 Gelatin Proteins 0.000 description 10
- 229920000159 gelatin Polymers 0.000 description 10
- 239000008273 gelatin Substances 0.000 description 10
- 235000019322 gelatine Nutrition 0.000 description 10
- 235000011852 gelatine desserts Nutrition 0.000 description 10
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 229920000126 latex Polymers 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 239000004816 latex Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 238000003851 corona treatment Methods 0.000 description 5
- 125000000753 cycloalkyl group Chemical group 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 230000003068 static effect Effects 0.000 description 5
- ZTHYODDOHIVTJV-UHFFFAOYSA-N Propyl gallate Chemical compound CCCOC(=O)C1=CC(O)=C(O)C(O)=C1 ZTHYODDOHIVTJV-UHFFFAOYSA-N 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 238000000586 desensitisation Methods 0.000 description 4
- 125000000623 heterocyclic group Chemical group 0.000 description 4
- 239000004848 polyfunctional curative Substances 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 206010070834 Sensitisation Diseases 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 3
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 3
- 239000002216 antistatic agent Substances 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000007720 emulsion polymerization reaction Methods 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000006224 matting agent Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000010979 pH adjustment Methods 0.000 description 3
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 3
- 230000000379 polymerizing effect Effects 0.000 description 3
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 3
- 235000019252 potassium sulphite Nutrition 0.000 description 3
- 239000003755 preservative agent Substances 0.000 description 3
- 239000000473 propyl gallate Substances 0.000 description 3
- 235000010388 propyl gallate Nutrition 0.000 description 3
- 229940075579 propyl gallate Drugs 0.000 description 3
- 239000000837 restrainer Substances 0.000 description 3
- 230000008313 sensitization Effects 0.000 description 3
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- KAMCBFNNGGVPPW-UHFFFAOYSA-N 1-(ethenylsulfonylmethoxymethylsulfonyl)ethene Chemical compound C=CS(=O)(=O)COCS(=O)(=O)C=C KAMCBFNNGGVPPW-UHFFFAOYSA-N 0.000 description 2
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- INVVMIXYILXINW-UHFFFAOYSA-N 5-methyl-1h-[1,2,4]triazolo[1,5-a]pyrimidin-7-one Chemical compound CC1=CC(=O)N2NC=NC2=N1 INVVMIXYILXINW-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- ZUIVNYGZFPOXFW-UHFFFAOYSA-N chembl1717603 Chemical compound N1=C(C)C=C(O)N2N=CN=C21 ZUIVNYGZFPOXFW-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 2
- 229960000878 docusate sodium Drugs 0.000 description 2
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 150000003283 rhodium Chemical class 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- QDNPCYCBQFHNJC-UHFFFAOYSA-N 1,1'-biphenyl-3,4-diol Chemical compound C1=C(O)C(O)=CC=C1C1=CC=CC=C1 QDNPCYCBQFHNJC-UHFFFAOYSA-N 0.000 description 1
- AIGNCQCMONAWOL-UHFFFAOYSA-N 1,3-benzoselenazole Chemical compound C1=CC=C2[se]C=NC2=C1 AIGNCQCMONAWOL-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical compound C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- QOOQLKSEGVNYLA-UHFFFAOYSA-N 1-$l^{1}-oxidanylbutane Chemical compound CCCC[O] QOOQLKSEGVNYLA-UHFFFAOYSA-N 0.000 description 1
- TXJYONBSFGLSSF-UHFFFAOYSA-N 1-(diethylamino)propane-1,2-diol Chemical compound CCN(CC)C(O)C(C)O TXJYONBSFGLSSF-UHFFFAOYSA-N 0.000 description 1
- NXVHEHXRZVQDCR-UHFFFAOYSA-N 1-n,1-n-diethyl-2-methylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C=C1C NXVHEHXRZVQDCR-UHFFFAOYSA-N 0.000 description 1
- GNGKTGNSRQXADG-UHFFFAOYSA-N 1-n,1-n-diethylbenzene-1,2,4-triamine;2-methyl-4-morpholin-4-ylaniline Chemical compound CCN(CC)C1=CC=C(N)C=C1N.C1=C(N)C(C)=CC(N2CCOCC2)=C1 GNGKTGNSRQXADG-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- XIROXSOOOAZHLL-UHFFFAOYSA-N 2',3',4'-Trihydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C(O)=C1O XIROXSOOOAZHLL-UHFFFAOYSA-N 0.000 description 1
- XIWRQEFBSZWJTH-UHFFFAOYSA-N 2,3-dibromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1Br XIWRQEFBSZWJTH-UHFFFAOYSA-N 0.000 description 1
- YZDIUKPBJDYTOM-UHFFFAOYSA-N 2,5-diethylbenzene-1,4-diol Chemical compound CCC1=CC(O)=C(CC)C=C1O YZDIUKPBJDYTOM-UHFFFAOYSA-N 0.000 description 1
- AXCGIKGRPLMUDF-UHFFFAOYSA-N 2,6-dichloro-1h-1,3,5-triazin-4-one;sodium Chemical compound [Na].OC1=NC(Cl)=NC(Cl)=N1 AXCGIKGRPLMUDF-UHFFFAOYSA-N 0.000 description 1
- XQHGAEQBYRZJIX-UHFFFAOYSA-N 2-amino-4-chloro-6-phenylphenol Chemical compound NC1=CC(Cl)=CC(C=2C=CC=CC=2)=C1O XQHGAEQBYRZJIX-UHFFFAOYSA-N 0.000 description 1
- UDVRKKAWBVVSAM-UHFFFAOYSA-N 2-amino-6-phenylphenol Chemical compound NC1=CC=CC(C=2C=CC=CC=2)=C1O UDVRKKAWBVVSAM-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- IQMGXSMKUXLLER-UHFFFAOYSA-N 2-hydroxy-5-sulfobenzoic acid;sodium Chemical compound [Na].OC(=O)C1=CC(S(O)(=O)=O)=CC=C1O IQMGXSMKUXLLER-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical compound C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 description 1
- YBMTWYWCLVMFFD-UHFFFAOYSA-N 3-methylbutyl 3,4,5-trihydroxybenzoate Chemical compound CC(C)CCOC(=O)C1=CC(O)=C(O)C(O)=C1 YBMTWYWCLVMFFD-UHFFFAOYSA-N 0.000 description 1
- SJSJAWHHGDPBOC-UHFFFAOYSA-N 4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=CC=C1 SJSJAWHHGDPBOC-UHFFFAOYSA-N 0.000 description 1
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 1
- UIHHTFWECCZVRB-UHFFFAOYSA-N 4-amino-2-phenyl-4h-pyrazol-3-one Chemical compound O=C1C(N)C=NN1C1=CC=CC=C1 UIHHTFWECCZVRB-UHFFFAOYSA-N 0.000 description 1
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 1
- 125000004860 4-ethylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])C([H])([H])[H] 0.000 description 1
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 1
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- BISHACNKZIBDFM-UHFFFAOYSA-N 5-amino-1h-pyrimidine-2,4-dione Chemical compound NC1=CNC(=O)NC1=O BISHACNKZIBDFM-UHFFFAOYSA-N 0.000 description 1
- BQCIJWPKDPZNHD-UHFFFAOYSA-N 5-bromo-2h-benzotriazole Chemical compound C1=C(Br)C=CC2=NNN=C21 BQCIJWPKDPZNHD-UHFFFAOYSA-N 0.000 description 1
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 1
- XPAZGLFMMUODDK-UHFFFAOYSA-N 6-nitro-1h-benzimidazole Chemical compound [O-][N+](=O)C1=CC=C2N=CNC2=C1 XPAZGLFMMUODDK-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- RPWFJAMTCNSJKK-UHFFFAOYSA-N Dodecyl gallate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC(O)=C(O)C(O)=C1 RPWFJAMTCNSJKK-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- NWBJYWHLCVSVIJ-UHFFFAOYSA-N N-benzyladenine Chemical compound N=1C=NC=2NC=NC=2C=1NCC1=CC=CC=C1 NWBJYWHLCVSVIJ-UHFFFAOYSA-N 0.000 description 1
- ISLYUUGUJKSGDZ-UHFFFAOYSA-N OC1=CC=NC2=NC=NN12 Chemical compound OC1=CC=NC2=NC=NN12 ISLYUUGUJKSGDZ-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 1
- 125000004442 acylamino group Chemical group 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000010420 art technique Methods 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000001541 aziridines Chemical class 0.000 description 1
- 150000001556 benzimidazoles Chemical class 0.000 description 1
- AMTXUWGBSGZXCJ-UHFFFAOYSA-N benzo[e][1,3]benzoselenazole Chemical group C1=CC=C2C(N=C[se]3)=C3C=CC2=C1 AMTXUWGBSGZXCJ-UHFFFAOYSA-N 0.000 description 1
- KXNQKOAQSGJCQU-UHFFFAOYSA-N benzo[e][1,3]benzothiazole Chemical compound C1=CC=C2C(N=CS3)=C3C=CC2=C1 KXNQKOAQSGJCQU-UHFFFAOYSA-N 0.000 description 1
- WMUIZUWOEIQJEH-UHFFFAOYSA-N benzo[e][1,3]benzoxazole Chemical compound C1=CC=C2C(N=CO3)=C3C=CC2=C1 WMUIZUWOEIQJEH-UHFFFAOYSA-N 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000000555 dodecyl gallate Substances 0.000 description 1
- 235000010386 dodecyl gallate Nutrition 0.000 description 1
- 229940080643 dodecyl gallate Drugs 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004924 electrostatic deposition Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical class OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-ZSJDYOACSA-N heavy water Substances [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 150000002443 hydroxylamines Chemical class 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229920000831 ionic polymer Polymers 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- ZVJHJDDKYZXRJI-UHFFFAOYSA-N pyrroline Natural products C1CC=NC1 ZVJHJDDKYZXRJI-UHFFFAOYSA-N 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 125000003748 selenium group Chemical group *[Se]* 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- PPASLZSBLFJQEF-RKJRWTFHSA-M sodium ascorbate Substances [Na+].OC[C@@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RKJRWTFHSA-M 0.000 description 1
- 235000010378 sodium ascorbate Nutrition 0.000 description 1
- 229960005055 sodium ascorbate Drugs 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- FZHLWVUAICIIPW-UHFFFAOYSA-M sodium gallate Chemical compound [Na+].OC1=CC(C([O-])=O)=CC(O)=C1O FZHLWVUAICIIPW-UHFFFAOYSA-M 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- PPASLZSBLFJQEF-RXSVEWSESA-M sodium-L-ascorbate Chemical compound [Na+].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RXSVEWSESA-M 0.000 description 1
- HLWRUJAIJJEZDL-UHFFFAOYSA-M sodium;2-[2-[bis(carboxymethyl)amino]ethyl-(carboxymethyl)amino]acetate Chemical compound [Na+].OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC([O-])=O HLWRUJAIJJEZDL-UHFFFAOYSA-M 0.000 description 1
- AMZPPWFHMNMIEI-UHFFFAOYSA-M sodium;2-sulfanylidene-1,3-dihydrobenzimidazole-5-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C2NC(=S)NC2=C1 AMZPPWFHMNMIEI-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 125000005420 sulfonamido group Chemical group S(=O)(=O)(N*)* 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- CBDKQYKMCICBOF-UHFFFAOYSA-N thiazoline Chemical compound C1CN=CS1 CBDKQYKMCICBOF-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/061—Hydrazine compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/067—Additives for high contrast images, other than hydrazine compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
- G03C1/89—Macromolecular substances therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
- G03C1/89—Macromolecular substances therefor
- G03C1/895—Polyalkylene oxides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/95—Photosensitive materials characterised by the base or auxiliary layers rendered opaque or writable, e.g. with inert particulate additives
Definitions
- This invention relates to a silver halide photographic material having an antistatic coating on a plastic film support. More particularly, this invention relates to a silver halide photographic material having improved antistatic quality.
- Plastic film supports generally have a great tendency to experience static buildup, which in many cases have put various limitations on the use of these supports.
- plastic film supports such as polyethylene terephthalate films are commonly used but they often experience static buildup, particularly at low temperatures in the winter season. Provisions against this static buildup problem bear particular importance to recent practices in the photographic industry including high-speed coating of high-sensitivity photographic emulsions and exposure of high-sensitivity photographic materials in automatic printers.
- antistatic agents are customarily used in photographic materials and recently employed antistatic agents include fluorine-containing surfactants, cationic surfactants, amphoteric surfactants, surfactants or high-molecular weight compounds containing polyethylene oxide groups, and polymers having sulfonic acid or phosphoric acid groups in the molecule.
- an object of the present invention to provide a silver halide photographic material having a highly transparent and haze-free antistatic coating.
- Another object of the present invention is to provide a highly stable silver halide photographic material that exhibits high antistatic capability and which yet will not undergo desensitization with time even if a tetrazolium or hydrazine compound is used.
- a silver halide photographic material having at least a light-sensitive emulsion layer and an antistatic coating containing (1) a water soluble conductive polymer, (2) hydrophobic polymer particles and (3) a curing agent on a plastic film support, which hydrophobic polymer particles contain an acrylamide group or contain styrene and an alkyl acrylate and/or an alkyl methacrylate that have 1 - 12 carbon atoms, and form a stable dispersion with the aid of a nonionic surfactant having 3 or more alkylene oxide chains.
- the light-sensitive emulsion layer in this photographic material desirably contains a tetrazolium or hydrazine compound.
- the water-soluble conductive polymer used in the present invention is capable of forming a transparent layer even if it is used alone but the resulting layer can readily crack if the drying conditions vary even by the slightest degree. In accordance with the present invention, this problem is effectively prevented by incorporating hydrophobic polymer particles.
- the water-soluble conductive polymer for use in the present invention may be a polymer having at least one conductive group selected from the group consisting of a sulfonic acid group, a sulfate ester group, a quaternary ammonium salt group, a tertiary ammonium salt group, a carboxyl group and a polyethylene oxide group.
- a sulfonic acid group, a sulfate ester group and a quaternary ammonium salt group are preferred.
- These conductive groups must be present in an amount of at least 5 wt% per molecule of the polymer.
- the water-soluble conductive polymer may also contain a carboxyl group, a hydroxyl group, an amino group, an epoxy group, an aziridine group, an active methylene group, a sulfinic acid group, an aldehyde group or a vinylsulfone group.
- a carboxyl group, a hydroxyl group, an amino group, an epoxy group, an aziridine group and an aldehyde group are preferred.
- These groups are preferably contained in an amount of at least 5 wt% per molecule of the polymer.
- the water-soluble conductive polymer generally has a molecular weight in the range of 3,000 - 100,000, with the range of 3,500 - 50,000 being preferred.
- the water-soluble conductive polymer that can be used in the present invention may be exemplified by, but not limited to, the following compounds.
- x, y, z and w each represents the mol% of the relevant monomer component, and M represents the average molecular weight (the term "average molecular weight” as used herein means the number average molecular weight).
- the polymers enumerated above can be synthesized by polymerizing monomers that are either commercially available or obtainable in the usual manner. These compounds are added in amounts that generally range from 0.01 to 10 g/m2, preferably form 0.1 to 5 g/m2.
- the hydrophobic polymer particles to be incorporated in the water-soluble conductive polymer layer used in the present invention are contained in the form of a "latex" that is substantially insoluble in water.
- the hydrophobic polymer contains an acrylamide group or contains styrene and an alkyl acrylate and/or an alkyl methacrylate that have 1 - 12 carbon atoms.
- Hydrophobic polymers containing an acrylamide group are obtained by polymerizing monomers selected from among any desired combinations of acrylamide and methacrylamide derivatives.
- an acrylamide derivative and/or a methacrylamide derivative is contained in an amount of at least 0.1 mol%, with the content of at least 1 mol% being particularly preferred.
- Hydrophobic polymers that are composed of styrene and an alkyl acrylate and/or an alkyl methacrylate having 1 - 12 carbon atoms are obtained by polymerizing monomers selected from among any desired combinations of styrene, styrene derivatives, alkyl acrylates and alkyl methacrylates.
- a styrene derivative, an alkyl acrylate or an alkyl methacrylate is contained in an amount of at least 10 mol%, with the content of at least 30 mol% being particularly preferred.
- Latices of these hydrophobic polymers can be formed by either one of the following two methods: i) emulsion polymerization and ii) dissolving a solid polymer in a low-boiling solvent, forming a fine dispersion of the polymer particles, and then distilling off the solvent.
- Emulsion polymerization is preferred since it is capable of producing a latex of fine polymer particle of a uniform size.
- Nonionic surfactants are preferably used in emulsion polymerization and, in the present invention, nonionic surfactants having 3 or more alkylene oxide chains to be described below are used. These nonionic surfactants are used in amounts of no more than 10 wt% of the monomers. The excessive use of surfactants will make the conductive layer cloudy and hence should be avoided.
- Molecular weights of at least 3,000 will suffice for the hydrophobic polymer and the transparency of the conductive layer will be little affected by the difference in the molecular weight of the hydrophobic polymer if it is no less than 3,000.
- the hydrophobic polymer particles are preferably used in an amount of 0.1 to 10 g/m2, more preferably from 0.3 to 5 g/m2.
- hydrophobic polymer that can be used in the present invention are listed below.
- the antistatic coating is formed on a transparent support.
- All photographic transparent supports may be used but preferred examples are polyethylene terephthalate and cellulose triacetate films that are adapted to transmit at least 90% of visible light.
- These transparent supports can be prepared by methods that are well known to one skilled in the art. If desired, they may be blued by adding dyes in small amounts that will not substantially impair light transmission.
- the supports to be used in the present invention may coated with a subbing layer containing a latex polymer after corona discharge treatment.
- Corona discharge treatment is preferably performed to provide an energy of 1 mW - 1 kW/m2 per minute.
- supports coated with a latex-containing subbing layer may be subjected to another corona discharge treatment before an antistatic coating is applied.
- a polyfunctional aziridine is preferably used as a curing agent to cure the antistatic coating provided in accordance with the present invention.
- Particularly preferred are bifunctional or trifunctional aziridines that have molecular weights of no more than 600.
- the curing agent is preferably used in an amount of 0.01 to 10 g/m2, with the range of 0.05 to 5 g/m2 being particularly preferred.
- the antistatic coating may be positioned closer to the support than a light-sensitive layer, or it may be provided on the back side of the support which is opposite the light-sensitive layer.
- a nonionic surfactant is used as a dispersant in the present invention and a polyalkylene oxide compound is a preferred nonionic surfactant.
- the polyalkylene oxide compound to be used in the present invention is a compound that contains at least 3, preferably no more than 500, polyalkylene oxide chains in the molecule.
- Such compounds can be synthesized either by condensation reaction between polyalkylene oxides and compounds having active hydrogen atoms such as aliphatic alcohols, phenols, aliphatic acids, aliphatic mercaptans or organic amines, or by condensing polyols such as polypropylene glycol or polyoxytetramethylene polymers with aliphatic mercaptans, organic amines, ethylene oxide or propylene oxide.
- Each of the polyalkylene oxide chains in the molecule of the polyalkylene oxide compound may be divided into two or more segments to form a block copolymer.
- the polyalkylene oxide has a total degree of polymerization in the range of 3 - 100.
- the nonionic surfactant is preferably used in an amount ranging from 0.0001 to 0.1 g/m2, with the range of 0.0005 to 0.05 g/m2 being more preferred.
- the hydrazine compound to be used in the present invention is preferably represented by the following general formula (H): where R1 is a monovalent organic residue; R2 is a hydrogen atom or a monovalent organic residue; Q1 and Q2 are each a hydrogen atom, an optionally substituted alkylsulfonyl group, or an optionally substituted arylsulfonyl group; X1 is an oxygen atom or a sulfur atom.
- Monovalent organic groups represented by R1 and R2 include aromatic residues, heterocyclic residues and aliphatic residues.
- Illustrative aromatic residues include a phenyl group and a naphthyl group, which may have such substituents as alkyl, alkoxy, acylhydrazinol dialkylamino, alkoxycarbonyl, cyano, carboxy, nitro, alkylthio, hydroxy, sulfonyl, carbamoyl, halogen, acylamino, sulfonamido, urea and thiourea.
- Substituted phenyl groups include 4-methylphenyl, 4-ethylphenyl, 4-oxyethylphenyl, 4-dodecylphenyl, 4-carboxyphenyl, 4-diethylaminophenyl, 4-octylaminophenyl, 4-benzylaminophenyl, 4-acetamido-2-methylphenyl, 4-(3-ethylthioureido_phenyl, 4-[2-(2,4-di-tert-butylphenoxy)butylamido]phenyl and 4-[2-(2,4-di-tert-butylphenoxy) butylamido]phenyl.
- heterocyclic residues are 5- or 6-membered single or fused rings having at least one of oxygen, nitrogen, sulfur and selenium atoms. These rings may have substituents.
- Specific examples of heterocyclic residues include: pyrroline, pyridine, quinoline, indole, oxazole, benzoxazole, naphthoxazole, imidazole, benzimidazole, thiazoline, thiazole, benzothiazole, naphthothiazole, selenazole, benzoselenazole and naphthoselenazole rings.
- hetero rings may be substituted by alkyl groups having 1 - 4 carbon atoms such as methyl and ethyl, alkoxy groups having 1 - 4 carbon atoms such as methoxy and ethoxy, aryl groups having 6 - 18 carbon atoms such as phenyl, halogen atoms such as chlorine and bromine, alkoxycarbonyl groups, cyano group, amino group, etc.
- Illustrative aliphatic residues include straight-chained or branched alkyl groups, cycloalkyl groups, substituted alkyl or cycloalkyl groups, alkenyl groups and alkynyl groups.
- Exemplary straight-chained or branched alkyl groups are alkyl groups having 1 - 18, preferably 1 - 8, carbon atoms, such as methyl, ethyl, isobutyl and 1-octyl.
- Exemplary cycloalkyl groups include cyclopropyl, cyclohexyl, adamantyl, etc. having 3-10 carbon atoms.
- Substituents on alkyl and cycloalkyl groups include an alkoxy group (e.g. methoxy, ethoxy, propoxy or butoxy), an alkoxycarbonyl group, a carbamoyl group, a hydroxy group, an alkylthio group, an amido group, an acyloxy group, a cyano group, a sulfonyl group, a halogen atom (e.g. Cl, Br, F or I), an aryl group (e.g. phenyl, halogen-substituted phenyl or alkyl-substituted phenyl), etc.
- an alkoxy group e.g. methoxy, ethoxy, propoxy or butoxy
- an alkoxycarbonyl group e.g. methoxy, ethoxy, propoxy or butoxy
- a carbamoyl group e.g. methoxy, ethoxy, propoxy or but
- substituted alkyl or cycloalkyl group examples include 3-methoxypropyl, ethoxycarbonylmethyl, 4-chlorocyclohexyl, benzyl, p-methylbenzyl and p-chlorobenzyl.
- An exemplary alkenyl group is an allyl group, and an exemplary alkynyl group is a propargyl group.
- the hydrazine compound represented by the general formula (H) is incorporated in a silver halide emulsion layer and/or a non-light-sensitive layer on the same side as silver halide emulsion layers on a support.
- the hydrazine compound is incorporated in a silver halide emulsion layer and/or an underlying layer.
- the hydrazine compound is preferably added in an amount of 10 ⁇ 5 to 10 ⁇ 1 mole per mole of Ag, more preferably from 10 ⁇ 4 to 10 ⁇ 2 mole per mole of Ag.
- This tetrazolium compound to be used in the present invention is described below.
- This tetrazolium compound may be represented by the following general formula (T): where R1, R2 and R3 are each independently a substituted or unsubstituted phenyl group; X ⁇ is an anion; and n is 2.
- Preferred substituents are either a hydrogen atom or those which have a negative or positive value of Hamett's sigma ( ⁇ P) which represents an electron withdrawing ability. Substituents having a negative value of ⁇ P are particularly preferred.
- Hamett's sigma value in relation to phenyl substitution is found in many documents including the article of C. Hansch et al. in Journal of Medical Chemistry, 20 , 304, 1977.
- tetrazolium compounds to be used in the present invention can be easily synthesized by known methods, for example, the one described in Chemical Reviews, 55 , 335-483.
- the totrazolium compound to be used in the present invention is preferably incorporated in an amount of from about 1 mg to 10 g, more preferably from about 10 mg to about 2 g, per mole of the silver halide in the silver halide photographic material of the present invention.
- the silver halide in the silver halide emulsion to be used in the photographic material of the present invention may be selected from among those which are commonly used in silver halide emulsions as illustrated by silver bromide, silver chloride, silver iodobromide, silver chlorobromide, silver chloroiodobromide, etc.
- Silver halide grains may be prepared by an acid method, a neutral method or an ammoniacal method.
- the silver halide grains to be used in the present invention may have a uniform silver halide composition throughout the interior of grains, or they may be core/shell grains having different silver halide compositions in the bulk and the surface layer of grains.
- the silver halide grains may be of a type in which a latent image is formed predominantly on the surface or of a type in which a latent image is formed predominantly in the bulk.
- the silver halide emulsions to be used in the present invention may be stabilized with various compounds such as those described in prior patents including U.S. Patent Nos. 2,444,607, 2,716,062, 3,512,982, West German Patent Publication Nos. 1,189,380, 2,058, 626, 2,118,411, Japanese Patent Publication No. 4133/1968, U.S. Patent No. 3,342,596, Japanese Patent Publication No. 4417/1972, West German Patent Publication No. 2,149,789, Japanese Patent Publication Nos. 2825/1964 and 13566/1974.
- Preferred examples of the compounds that can be used for stabilizing purposes include: 5,6-trimethylene-7-hydroxy-5-triazolo(1,5-a)pyrimidine, 5,6-tetramethylene-7-hydroxy-5-triazole(1,5-a)pyrimidine, 5-methyl-7-hydroxy-S-triazolo(1,5-a)-pyrimidine, 5-methyl-7-hydroxy-S-triazolo(1,5-a)pyrimidine, 7-hydroxy-S-triazolo(1,5-a)pyrimidine, 5-methyl-6-boromo-7-hydroxy-S-triazolo(1,5-a)pyrimidine, gallic acid esters (e.g.
- mercaptans e.g. 1-phenyl-5-mercaptotetrazole, 2-mercaptobenzothiazole
- benzotriazoles e.g. 5-bromobenzotriazole, 5-methylbenzotriazole
- benzimidazoles e.g. 6-nitrobenzimidazole
- the silver halide photographic material of the present invention and/or developers may have amino compounds incorporated therein.
- developing agents such as phenidone and hydroquinone, or restrainers such as benzotriazole may be incorporated in emulsion layers.
- developing agents and restrainers may be incorporated in backing layers in order to enhance the ability of various processing solutions.
- Gelatin is used with particular advantage as a hydrophilic colloid in the present invention.
- Gelatin to be used in the present invention may be pretreated with either an alkali or an acid. If ossein gelatin is to be used, it is preferably freed of the calcium or iron content.
- the preferred calcium content is from 1 to 999 ppm, with the range of 1 - 500 ppm being more preferred.
- the preferred iron content is from 0.01 to 50 ppm, with the range of 0.1 - 10 ppm being more preferred. Adjustments of the calcium or iron content can be accomplished by passing an aqueous gelatin solution through an ion-exchanging device.
- Illustrative developing agents that can be used to develop the silver halide photographic material of the present invention include chlorohydroquinone, bromohydroquinone, methylhydroquinone, 2,3-dibromohydro quinone, 2,5-diethylhydroquinone, catechol, its derivatives such as 4-chlorocatechool, 4-phenylcatechol, 3-methyoxycatechol, pyrogallol, its derivatives such as 4-acetylpyrogallol, ascorbic acid and its derivatives such as sodium ascorbate.
- heterocyclic developing agents include 3-pyrazolidones such as 1-phenyl-3-pyrazolidone, 1-phenyl-4,4-dimethl-3-pyrazolidone and 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone, 1-phenyl-4-amino-5-pyrazolone, and 5-aminouracil.
- the developing agents that can be used effectively in the present invention are described in T.H. James, ed., The Theory of the Photographic Process, 4th ed., pp. 291-334 and Journal of the American Chemical Society, 73 , 3,100 (1951). These developing agents may be used either singly or as admixtures and they are preferably used as admixtures. Developers that are used to develop the photographic material of the present invention may contain preservatives selected from among sulfites such as sodium sulfite and potassium sulfite and the inclusion of such preservatives will not be deleterious to the objects of the present invention. Hydroxylamines and hydrazide compounds may also be used as preservatives and, in this case, they are preferably used in amounts of 5 - 500 g, more preferably from 20 to 200 g, per liter of the developer.
- Glycols may be contained as organic solvents in the developer and exemplary glycols include ethylene glycol, diethylene glycol, propylene glycol, triethylene glycol, 1,4-butanediol and 1,5-pentanediol, with diethylene glycol being preferably used. These glycols are preferably used in amounts of 5 - 500 g, more preferably from 20 to 200 g, per liter of the developer. These organic solvents may be used either singly or as admixtures.
- the silver halide photographic material of the present invention has very good keeping quality if it is processed with a developer that contains one or more of the development restrainers described above.
- the developer of the composition described above preferably has a pH of 9 - 13, with the range of 10 - 12 being more preferred from the viewpoint of preservability and photographic characteristics.
- the proportion of potassium ions is preferably higher than that of sodium ions in order to enhance the activity of the developer.
- the silver halide photographic material of the present invention can be processed under various conditions.
- the processing temperature for example, the development temperature is preferably not higher than 50°C, more preferably within the range of about 25 - about 40°C.
- the development time is typically set to be no longer than 2 min, and particularly good results are often achieved by completing the development within 10 - 50 sec.
- Other processing steps such as washing, stopping, stabilizing and fixing may also be performed under usual conditions. If desired, prehardening, neutralizing and any other necessary steps may be included. Of course, these steps may be omitted depending on the case.
- Development may be carried out either manually (e.g. tray development or rack development) or mechanically (e.g. roller development or hanger development).
- the applied antistatic coatings were dried at 90°C for 2 min and subsequently heat-treated at 140°C for 90 sec.
- Gelatin was applied onto these antistatic coatings to provide a deposit of 2.0 g/m2.
- the so prepared samples were subjected to a haze test.
- Formaldehyde and 2,4-dichloro-6-hydroxy-S-triazine sodium were used as hardeners of gelatin.
- the results of the haze test are shown in Table 1.
- Table 1 shows that the samples prepared in accordance with the present invention had satisfactory haze resistance.
- Silver chlorobromide (5 mol% AgBr) grains that contained a rhodium salt in an amount of 10 ⁇ 5 mole per mole of silver and which had an average grain size of 0.11 ⁇ m with a monodispersibility of 15 were prepared by a controlled double-jet method in an acidic atmosphere (pH 3.0). The grains were grown in a system containing 30 mg of benzyladenine in 1,000 ml of a 1% aqueous gelatin solution. After mixing silver and the halide, 6-methyl-4-hydroxy-1,3,3a-7-tetraazaindene was added in an amount of 600 mg per mole of silver halide, and the mixture was subsequently washed and desalted.
- 6-methyl-4-hydroxy-1,3,3a,7-tetraazaindene was added in an amount of 60 mg per mole of silver halide and thereafter sodium thiosulfate was added in an amount of 15 mg per mole of silver halide, followed by sulfur sensitization at 60°C. After the sulfur sensitization, 6-methyl-4-hydroxy-1,3,3a,7-tetraazaindene was added as a stabilizer in an amount of 600 mg per mole of silver halide.
- Coating solution for the protective film for the emulsion layer was prepared to provide the deposits described below and was applied together with the emulsion to be superposed on the latter.
- the other side of the support which was opposite the emulsion layer was subjected to corona discharge treatment at a power of 30 W/m2 per min and coated with a poly(styrene-butyl acrylate-glycidyl methacrylate) latex polymer in the presence of a hardener (hexamethylene aziridine), and further overlaid with an antistatic coating as in Example 1.
- a coating solution for backing layer was prepared to the formula indicated below in such a way the additives contained would have the deposits also shown below. The so prepared solution was coated to form a backing layer.
- a coating solution for the protective film for backing layer was prepared to the formula shown below in such a way that the additives used would provide the deposits also shown below.
- the so prepared coating solution was applied together with the backing layer in superposion on the latter.
- Dioctyl sulfosuccinate ester 200 mg/m2 Matting agent (polymethyl methacrylate; average particle size, 4.0 ⁇ m) 50 mg/m2 Alkali-processed gelatin (isoelectric point 4.9) 1.0 g/m2 Fluorinated sodium dodecylbenzene-sulfonate 50 mg/m2 Bis(vinylsulfonylmethyl)ether 20 mg/m2
- Each of the samples thus prepared was divided into two parts; one part was stored at 23°C ⁇ 55% r.h. for 3 days, and the other part was humidified at 23°C ⁇ 55% for 3h. packed in superposion on the another in a moisture-proof bag and stored under accelerated aging conditions (at 55°C for 3 days) to prepare aged specimens. Both types of specimens were exposed through an optical step wedge and processed with a developer and a fixing solution that had the formulations shown below. Thereafter, the sensitivity and specific surface resistance of each specimen were measured. The sensitivity was determined as the amount of exposure necessary to provide an optical density of 1.0 and expressed in terms of relative values.
- Silver chlorobromide (2 mol% AgBr) grains that contained a rhodium salt in an amount of 10 ⁇ 5 mole per mole of silver and which had an average grain size of 0.20 ⁇ m at a monodispersibility of 20 were prepared as in example 2. These grains were desalted and subjected to sulfur sensitization as in Example 2.
- Additives prepared to provide the deposits described below were added to the emulsion thus prepared, and the resulting coating solution was applied to subbed polyethylene terephthalate films of the same type as used in Example 1.
- the coating solution described above was applied after preliminary pH adjustment to 6.5 with sodium hydroxide.
- a coating solution for protective film for the emulsion layer was prepared using the additives described below in such a way that they would provide the deposits also shown below, and the thus prepared coating solution was applied together with the emulsion coating solution in superposition on the latter.
- This coating solution was applied after preliminary pH adjustment to 5.4 with citric acid.
- an antistatic coating and a backing layer were provided as in Example 2 on the other side of the support which was opposite the emulsion layer, except that formaldehyde was used as a hardener in the backing layer.
- the present invention successfully provides a highly stable silver halide photographic material that has a haze-free and highly transparent antistatic coating and which will undergo less increase in specific surface resistance over time as well as less desensitization even if a supercontrasty agent such as a tetrazolium or hydrazine compound is used.
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1189663A JP2796845B2 (ja) | 1989-07-21 | 1989-07-21 | 帯電防止処理をしたハロゲン化銀写真感光材料 |
| JP189663/89 | 1989-07-21 | ||
| JP197484/89 | 1989-07-27 | ||
| JP1197484A JP2829635B2 (ja) | 1989-07-27 | 1989-07-27 | 帯電防止処理をしたハロゲン化銀写真感光材料 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP0409665A1 true EP0409665A1 (fr) | 1991-01-23 |
Family
ID=26505595
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP90308018A Withdrawn EP0409665A1 (fr) | 1989-07-21 | 1990-07-20 | Matériel photographique à halogénure d'argent avec revêtement antistatique |
Country Status (2)
| Country | Link |
|---|---|
| EP (1) | EP0409665A1 (fr) |
| KR (1) | KR910003430A (fr) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2246870A (en) * | 1990-07-31 | 1992-02-12 | Ilford Ltd | Photographic materials with anti-static coatings |
| EP0497265A1 (fr) * | 1991-01-29 | 1992-08-05 | Konica Corporation | Matériau photographique à l'halogénure d'argent sensible à la lumière |
| US5238706A (en) * | 1992-06-26 | 1993-08-24 | Minnesota Mining And Manufacturing Company | Antistatic film bases and their process of manufacturing |
| EP0566374A3 (fr) * | 1992-04-15 | 1994-10-26 | Konishiroku Photo Ind | Matériau photographique sensible à la lumière à base d'halogénure d'argent et procédé pour l'obtention d'une image. |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1548799A (en) * | 1976-08-31 | 1979-07-18 | Fuji Photo Film Co Ltd | Light-sensitive silver halide photographic material |
| US4192683A (en) * | 1975-12-17 | 1980-03-11 | Konishiroku Photo Industry Co., Ltd. | Photographic light-sensitive material |
| US4225665A (en) * | 1978-12-20 | 1980-09-30 | E. I. Du Pont De Nemours And Company | Photographic element in which the antistatic layer is interlinked in the base |
-
1990
- 1990-07-20 EP EP90308018A patent/EP0409665A1/fr not_active Withdrawn
- 1990-07-20 KR KR1019900011030A patent/KR910003430A/ko not_active Withdrawn
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4192683A (en) * | 1975-12-17 | 1980-03-11 | Konishiroku Photo Industry Co., Ltd. | Photographic light-sensitive material |
| GB1548799A (en) * | 1976-08-31 | 1979-07-18 | Fuji Photo Film Co Ltd | Light-sensitive silver halide photographic material |
| US4225665A (en) * | 1978-12-20 | 1980-09-30 | E. I. Du Pont De Nemours And Company | Photographic element in which the antistatic layer is interlinked in the base |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2246870A (en) * | 1990-07-31 | 1992-02-12 | Ilford Ltd | Photographic materials with anti-static coatings |
| EP0497265A1 (fr) * | 1991-01-29 | 1992-08-05 | Konica Corporation | Matériau photographique à l'halogénure d'argent sensible à la lumière |
| US5244773A (en) * | 1991-01-29 | 1993-09-14 | Konica Corporation | Silver halide photographic light sensitive material |
| EP0566374A3 (fr) * | 1992-04-15 | 1994-10-26 | Konishiroku Photo Ind | Matériau photographique sensible à la lumière à base d'halogénure d'argent et procédé pour l'obtention d'une image. |
| US5238706A (en) * | 1992-06-26 | 1993-08-24 | Minnesota Mining And Manufacturing Company | Antistatic film bases and their process of manufacturing |
Also Published As
| Publication number | Publication date |
|---|---|
| KR910003430A (ko) | 1991-02-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0404091A2 (fr) | Matériaux photographiques à l'halogènne d'argent | |
| EP0495314B1 (fr) | Traitement d'un matériau photographique à caractère antistatique | |
| EP0497265A1 (fr) | Matériau photographique à l'halogénure d'argent sensible à la lumière | |
| US5079136A (en) | Plastic film with antistatic layer and silver halide photographic light-sensitive material using the same | |
| US5098822A (en) | Antistatic layer containing hydrophobic polymer particles and conductive polymer | |
| EP0386529B1 (fr) | Matériau d'halogénure d'argent photographique sensible à la lumière inhibé lors de la production des taches par la poussière | |
| US5238801A (en) | Process of treating a silver halide photographic element | |
| EP0410820B1 (fr) | Matériel photographique à l'halogénure d'argent | |
| EP0409665A1 (fr) | Matériel photographique à halogénure d'argent avec revêtement antistatique | |
| US5286618A (en) | Method for providing antistatic layer | |
| EP0402774B1 (fr) | Couche antistatique | |
| US5084339A (en) | Plastic film with transparent support and antistatic layer | |
| JP2829635B2 (ja) | 帯電防止処理をしたハロゲン化銀写真感光材料 | |
| JP2829624B2 (ja) | 帯電防止層 | |
| EP0452102A1 (fr) | Matériaux photographiques à l'halogénure d'argent conditionnés et leur procédé de production | |
| JP2796845B2 (ja) | 帯電防止処理をしたハロゲン化銀写真感光材料 | |
| EP0430110B1 (fr) | Procédé pour réaliser une couche antistatique | |
| JP2829634B2 (ja) | 帯電防止処理をしたハロゲン化銀写真感光材料 | |
| EP0432654B1 (fr) | Couche antistatique | |
| JP2939349B2 (ja) | ハロゲン化銀写真感光材料 | |
| EP0391402A1 (fr) | Film en matière plastique avec une couche antistatique et matériau photographique photosensible à l'halogénure d'argent l'utilisant | |
| JP2838552B2 (ja) | ハロゲン化銀写真感光材料 | |
| JPH0693088B2 (ja) | ハロゲン化銀写真感光材料 | |
| JPH0359645A (ja) | 帯電防止処理をしたハロゲン化銀写真感光材料 | |
| JPH0359647A (ja) | 帯電防止処理をしたハロゲン化銀写真感光材料 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): DE GB IT |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
| 18D | Application deemed to be withdrawn |
Effective date: 19910724 |