EP0794553A3 - Réacteur à plasma de haute densité pour la cvd et la gravure - Google Patents
Réacteur à plasma de haute densité pour la cvd et la gravure Download PDFInfo
- Publication number
- EP0794553A3 EP0794553A3 EP97106424A EP97106424A EP0794553A3 EP 0794553 A3 EP0794553 A3 EP 0794553A3 EP 97106424 A EP97106424 A EP 97106424A EP 97106424 A EP97106424 A EP 97106424A EP 0794553 A3 EP0794553 A3 EP 0794553A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- wafer
- chamber
- plural
- plasma reactor
- spray nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 title 1
- 238000001020 plasma etching Methods 0.000 title 1
- 239000007789 gas Substances 0.000 abstract 4
- 239000007921 spray Substances 0.000 abstract 4
- 239000000376 reactant Substances 0.000 abstract 3
- 230000008878 coupling Effects 0.000 abstract 1
- 238000010168 coupling process Methods 0.000 abstract 1
- 238000005859 coupling reaction Methods 0.000 abstract 1
- 230000001939 inductive effect Effects 0.000 abstract 1
- 238000009616 inductively coupled plasma Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 238000005507 spraying Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US113776 | 1993-08-27 | ||
| US08/113,776 US5614055A (en) | 1993-08-27 | 1993-08-27 | High density plasma CVD and etching reactor |
| EP94305090A EP0641013B1 (fr) | 1993-08-27 | 1994-07-12 | Système d'injection de gaz dans un réacteur à plasma |
Related Parent Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP94305090.6 Division | 1994-07-12 | ||
| EP94305090A Division EP0641013B1 (fr) | 1993-08-27 | 1994-07-12 | Système d'injection de gaz dans un réacteur à plasma |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0794553A2 EP0794553A2 (fr) | 1997-09-10 |
| EP0794553A3 true EP0794553A3 (fr) | 1998-05-20 |
Family
ID=22351456
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP94305090A Expired - Lifetime EP0641013B1 (fr) | 1993-08-27 | 1994-07-12 | Système d'injection de gaz dans un réacteur à plasma |
| EP97106424A Withdrawn EP0794553A3 (fr) | 1993-08-27 | 1994-07-12 | Réacteur à plasma de haute densité pour la cvd et la gravure |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP94305090A Expired - Lifetime EP0641013B1 (fr) | 1993-08-27 | 1994-07-12 | Système d'injection de gaz dans un réacteur à plasma |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US5614055A (fr) |
| EP (2) | EP0641013B1 (fr) |
| JP (1) | JP3691528B2 (fr) |
| KR (1) | KR100201121B1 (fr) |
| DE (1) | DE69425203T2 (fr) |
Families Citing this family (384)
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|---|---|---|---|---|
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Also Published As
| Publication number | Publication date |
|---|---|
| DE69425203D1 (de) | 2000-08-17 |
| EP0641013A3 (fr) | 1995-07-12 |
| EP0641013A2 (fr) | 1995-03-01 |
| JP3691528B2 (ja) | 2005-09-07 |
| US5614055A (en) | 1997-03-25 |
| KR100201121B1 (ko) | 1999-06-15 |
| EP0641013B1 (fr) | 2000-07-12 |
| DE69425203T2 (de) | 2000-11-30 |
| EP0794553A2 (fr) | 1997-09-10 |
| US5976308A (en) | 1999-11-02 |
| KR950007617A (ko) | 1995-03-21 |
| JPH07169703A (ja) | 1995-07-04 |
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