EP0977182A2 - Magnetisches Speichermedium aus Nanopartikeln - Google Patents
Magnetisches Speichermedium aus Nanopartikeln Download PDFInfo
- Publication number
- EP0977182A2 EP0977182A2 EP99305758A EP99305758A EP0977182A2 EP 0977182 A2 EP0977182 A2 EP 0977182A2 EP 99305758 A EP99305758 A EP 99305758A EP 99305758 A EP99305758 A EP 99305758A EP 0977182 A2 EP0977182 A2 EP 0977182A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- particles
- storage medium
- magnetic storage
- set forth
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/68—Record carriers characterised by the selection of the material comprising one or more layers of magnetisable material homogeneously mixed with a bonding agent
- G11B5/70—Record carriers characterised by the selection of the material comprising one or more layers of magnetisable material homogeneously mixed with a bonding agent on a base layer
- G11B5/712—Record carriers characterised by the selection of the material comprising one or more layers of magnetisable material homogeneously mixed with a bonding agent on a base layer characterised by the surface treatment or coating of magnetic particles
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/0036—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties showing low dimensional magnetism, i.e. spin rearrangements due to a restriction of dimensions, e.g. showing giant magnetoresistivity
- H01F1/0045—Zero dimensional, e.g. nanoparticles, soft nanoparticles for medical/biological use
- H01F1/0054—Coated nanoparticles, e.g. nanoparticles coated with organic surfactant
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/0036—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties showing low dimensional magnetism, i.e. spin rearrangements due to a restriction of dimensions, e.g. showing giant magnetoresistivity
- H01F1/0045—Zero dimensional, e.g. nanoparticles, soft nanoparticles for medical/biological use
- H01F1/0063—Zero dimensional, e.g. nanoparticles, soft nanoparticles for medical/biological use in a non-magnetic matrix, e.g. granular solids
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/0036—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties showing low dimensional magnetism, i.e. spin rearrangements due to a restriction of dimensions, e.g. showing giant magnetoresistivity
- H01F1/009—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties showing low dimensional magnetism, i.e. spin rearrangements due to a restriction of dimensions, e.g. showing giant magnetoresistivity bidimensional, e.g. nanoscale period nanomagnet arrays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/90—Magnetic feature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/256—Heavy metal or aluminum or compound thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/256—Heavy metal or aluminum or compound thereof
- Y10T428/257—Iron oxide or aluminum oxide
Definitions
- the present invention relates to a magnetic storage medium of very high information bit storage density. More particularly, the invention relates to a magnetic storage medium utilizing magnetic nanoparticles to form a layer on a substrate.
- Patterning a substrate is critical to fabrication of integrated circuits and data storage media.
- the limitations of conventional lithographic patterning for dimensions below 0.1 micron ( 100 nm.) are well known, and are described in "Lithography for ULSI” , by S. Okazaki, in a review paper ( p. 18, vol. 2440 , Proceedings of SPIE ).
- Optical lithography with a light source in the deep ultra-violet (“DUV”) is expected to serve in circuit and media fabrication for feature sizes down to about 0.05 micron (50 nm), but not for smaller sizes.
- DUV deep ultra-violet
- DUV optical lithography is currently anticipated to be extended to lateral dimensions of ⁇ 50 nm, but such extension is not certain and may be expensive.
- X-ray lithography and Extreme UV lithography are being considered but both require enormous capital investments (both for the radiation sources and the supporting optical systems).
- Direct write systems including electron beam and scanning probe based lithography are in development, but the serial nature of the pattering process makes these prohibitively slow for manufacturing.
- Microcontact printing and nano-imprint lithography are new patterning techniques which hold some promise in and around 50 nm feature sizes but these methods are not well proven at the present. It would be desirable to have an inexpensive, large area, method for lateral patterning that does not require lithography, and that is suitable for feature sizes below 50 nm.
- magnetic storage media for example tapes and disks having coatings of magnetic particles thereon
- a number of difficulties prevent attainment of high densities.
- the usual coatings of magnetic particles are applied on flexible media, wide variations in individual particle diameters raise the minimum information bit storage size, and thus decrease the attainable areal information bit storage density.
- conventional rigid magnetic storage media sometimes called 'hard drive" disks
- magnetic films are often applied by sputter deposition. The resultant broad distribution of grain sizes and inter-granular spacings creates both low effective areal bit densities and undesirably low signal-to-noise ratios..
- the present invention therefore provides a magnetic storage medium as claimed in claim 1.
- the medium includes a layer which comprises a multilayer formed of substantially equally spaced-apart particles disposed at a plurality of distances from the surface of the substrate.
- a multilayer comprises a first monolayer of particles having the claimed coating to maintain them in spaced-apart relationship and a second monolayer of particles disposed over the claimed coating.
- an affinity layer may be disposed between the magnetic particles and in a selected pattern over at least part of the surface of the substrate, the affinity layer being composed of an affinity material adapted to preferentially attract and retain said particles in the aforesaid selected pattern over the substrate surface.
- an affinity material may comprise bi-functional molecules which can be expressed generally in the form X-R-Y where X and Y are the active head groups and R is a hydrocarbon or fluorocarbon chain preferably containing 3-22 carbon atoms.
- the chemical functional groups X and Y may be the same although they are generally not, because the substrate surface and the nanoparticle surface are generally comprised of different materials.
- affinity layer is trismethoxysilylpropane thiol, which may be expressed as (CH3O)3Si-CH2-CH2-CH2-SH, which selectively binds noble metal coated nanocrystals to silicon oxide surfaces.
- substantially uniform diameter shall be understood to mean that the magnetic particles have diameters characterized by a standard deviation of less than 10% of their average.
- the present invention also provides a method of forming a magnetic storage medium according to claim 13.
- Figure 1 is a transmission electron micrograph (TEM) photo of an ordered monolayer of Co particles, each black dot being a single 8 nm. diameter Co particle, with an inset showing an electron diffraction pattern from the ordered monolayer (not only from a single particle).
- TEM transmission electron micrograph
- Figure 2 shows the general steps of a fabrication method for forming a magnetic storage medium of the present invention on a substrate.
- Figure 3 shows a plan view of the magnetic storage medium of Figure 2.
- Figure 4 is a sectional view of a magnetic storage medium based on a multilayer of monodisperse nm-scale Co particles.
- Figure 5 is a sectional view of an alternative magnetic storage medium based on two ordered monolayers of monodisperse nm-scale Co particles.
- Figure 6 is a transmission electron micrograph (TEM) photo of an ordered multilayer of Co particles of Figure 4, each black dot being a single 8 nm. diameter Co particle.
- TEM transmission electron micrograph
- Figure 1 is a transmission electron micrograph (TEM) photo of an ordered monolayer of cobalt particles, with each black dot being a single 8 nm diameter particle. The dots are regularly separated by the organic stabilizer layer, which appears as the lighter region between the particles.
- the TEM was recorded at 120 KV electron beam energy on a Philips EM 420 microscope.
- Figure 2 shows the general fabrication method to form the magnetic storage medium of the present invention: creating a periodic array or layer 4 of nm-scale magnetic particles 1 on a substrate 5, and then stabilizing the particles 1 in their positions within layer 4 .
- a monodisperse sample of ferromagnetic particles 1 with diameter of the order 5-20 nm (“nanoparticles”) is made according to the methods of the aforesaid patent application of Murray and Sun.
- the particles 1 consist of an inorganic core 2, surrounded by an organic stabilizing layer 3.
- the particles 1 are soluble in a hydrocarbon solvent such as dodecane.
- a bottle containing dodecane and the aforesaid ferromagnetic particles 1 dissolved in the dodecane is prepared according to the methods described in the aforesaid Murray et al application.
- the concentration of said particles 1 can be approximately 0.1 grams of particles in 0.01 litre of dodecane.
- the magnetic nanoparticles utilized in this invention comprise a magnetic material selected from the group consisting of elements Co, Fe, Ni, Mn, Sm, Nd, Pr, Pt, Gd, an intermetallic compound of the aforesaid elements, a binary alloy of said elements, a ternary alloy of said elements, an oxide of Fe further comprising at least one of said elements other than Fe, barium ferrite, and strontium ferrite.
- each particle 1 has a 2 layer structure consisting of a ferromagnetic core (Co, Fe, Ni) surrounded by a noble metal layer ("shell" of Pt, Au, Ag, Pd).
- a noble metal shell protects the magnetic core against oxidation, and is also useful in forming covalent links between the particles 1 and the surface of substrate 5.
- the preferred substrate is a Si wafer, or a glass substrate, with the requirement that the surface is flat. Ideally, the rms roughness of the substrate should be similar to the particle diameter, hereinafter called " D".
- the diameter D of the magnetic nanoparticles 1 of this invention is preferably 5 - 15 nm.
- An important feature of the present invention is that optimum ordered, periodic formation of monolayer 4 is best achieved when the particles 1 have a substantially uniform diameter---when the size distribution of the nanoparticles is narrow.
- the standard deviation of the distribution of particle diameters be ⁇ 10 %, with 7% or smaller being preferred.
- the monolayer depicted in Figure 1 consists of Co particles with a 5% size distribution. It is desirable that the distribution of particle diameters be ⁇ 10%. It is preferred that the distribution be 7 % (or less). while this narrow size distribution is optimum, broader size distributions and monolayer arrays with imperfect ordering may also be formed in accordance with the present invention.
- the particles 1 comprise the inorganic, magnetic core 2 described above, and are surrounded with an organic stabilizer layer 3 having an effective thickness of about 1 - 5 nm, with 2 - 4 nm being preferred.
- Suitable molecules for this organic stabilizer layer 3 include long chain organic compounds of the form R-X, where R is a member selected from the group consisting of 1) a hydrocarbon chain in straight or branched formation, said hydrocarbon chain comprising 6 to 22 carbon atoms, and 2) a fluorocarbon chain in straight or branched formation, said fluorocarbon chain comprising 6 to 22 carbon atoms , and where X is selected from carboxylic acid, phosphonic acid, phosphinic acid, sulfonic acid, sulfinic acid,and thiol.
- the effective thickness of the aforesaid organic stabilizer layer 3 may be adjusted by changing the carbon chain length, with Oleic Acid having an 18 carbon chain being an inexpensive and convenient example ( 2 nm effective thickness).
- An ordered layer 4 of the nanoparticles 1 is formed as a monolayer on the substrate 5 by any suitable method.
- slow evaporation of the solvent from a film of uniform thickness as described in Murray et al, Science, 1995, v. 270, p.1335 may be used.
- the dodecane or other suitable solvent is removed by air drying, or heating in an oven to about 40°C (or slightly higher temperature).
- the ordered array of the present invention forms as the solvent is slowly removed , and a driving force to form said array is an attractive force between the Oleic acid organic stabilizer layer 3 of mutually adjacent Co particles 1.
- Several methods may be used to coat a film of uniform thickness of the liquid dispersion containing both particles and solvent, including but not limited to dip coating, spin coating, and coating using a blade moved at controlled speed parallel to the substrate surface.
- the Langmuir-Blodgett assembly method as described in M.C. Petty, "Langmuir-Blodgett Films, an Introduction” , copyright 1996 by Cambridge Univ. Press, NY. ISBN # 0 521 41396 6, may be used to form the ordered monolayer of particles.
- Step 1 wet chemical processing is used up to this point, and that dry, vacuum based processing is used subsequent to this point.
- the sample is placed in a plasma enhanced chemical vapor deposition (PE CVD) tool, or similar plasma reactor.
- PE CVD plasma enhanced chemical vapor deposition
- the organic stabilizer coating 3 may now be removed if desired (see Step 1, Figure 2 ). Suitable methods for Step 1 are heating in vacuum, exposure to UV light, and exposure to an oxygen plasma. (If the latter method is used, a hydrogen plasma exposure is used to remove any oxide from the layer 4 of magnetic nanoparticles 1.) . Alternatively, the aforesaid organic stabilizer coating 3 may be left in place.
- a protective coating 7 may now be deposited in the encapsulation step ( see Step 2, Figure 2 ), to hold the nanoparticle 1 of monolayer 4 in place and to protect layer 4.
- the coating 7 must be hard and adherent to the substrate 5.
- Suitable materials for the protective overcoating 7 include diamond like carbon (DLC), amorphous C or Si, and oxides such as aluminum oxide or Si oxide.
- the preferred material for coating 7 is diamond like carbon (DLC), deposited by heating the substrate 5 to about 100 to 300°C, and exposing the sample to a hexane plasma (or similar carbon source molecule).
- the preferred thickness for coating 7 is at least 10 nm.
- the coating 7 may be deposited by any suitable method known to those skilled in the art. For example, some methods utilize a plasma enhanced chemical vapor deposition (PE CVD) tool, or a reactive sputtering tool. Moreover, it may be convenient to deposit the coating 7 in the same chamber or tool that may have been used to remove the organic stabilizer layer 3 from the particles 1.
- PE CVD plasma enhanced chemical vapor deposition
- reactive sputtering tool it may be convenient to deposit the coating 7 in the same chamber or tool that may have been used to remove the organic stabilizer layer 3 from the particles 1.
- Figure 3 shows a plan view of the preferred embodiment of this invention, after Step 1 of Figure 2 (the protective overcoating 7 is not shown ).
- the preferred spacing B between bits in the form of nanoparticles 1 is about 12 nm. in this example, the preferred diameter (D) of each Co nanoparticle bit is 8 nm, and the preferred distance between particles (E) is about 4 nm. ( The distance E is 2 X the effective thickness of the organic coat, before removal of said coat. See Figure 2A.)
- the resulting information density using 1 magnetic particle / bit is 6 x 1012 (6 Tbit) per square inch.
- current technology using magnetic thin films rather than magnetic nm-scale particles provides a density on the order of 109 to 1010 (1 to 10 Gbit) per square inch.
- nm-scale particles specifically magnetic particles ordered in a single layer.
- alternative embodiment of the ordered arrays of the present invention may use multiple layers of such nm-scale particles.
- Magnetic recording media based on multiple layers of magnetic particles are especially useful when multiple-valued recording schemes are used, wherein each magnetic recording bit can be assigned > 2 values, for example 3 or 4 values, and a greater information storage density is thus achieved.
- the magnetic recording media shown in Figures 4 and 5 are useful for the simple case of the 3 value recording scheme, wherein 3 magnetic states of each bit are defined and the 3 magnetic states are all particles with parallel magnetic moments in the UP direction, all particles with parallel magnetic moments in the DOWN direction, and particles spin UP + particles spin DOWN.
- the multilayer of particles simply places more magnetic particles per unit area than the ordered monolayer, which results in a larger magnetization signal for a given bit area.
- Figure 4 is a section view of a magnetic recording medium based on a multilayer 4A of monodisperse nm-scale Co particles 1.
- the recording medium consists of a substrate 5, an undercoat 6 (coating on the substrate), a multilayer 4A of close packed nm-scale particles 1, and a protective overcoat 7.
- the substrate 5 may be either rigid (such as glass, or a Si wafer) or flexible, such as a polymeric plastic disc.
- An undercoat 6, which is applied to the substrate 5 to promote ordered multilayer formation and enables the formation of chemical links between particles 1 and substrate 5, may preferably comprise an affinity material comprising bi- functional molecules of the form X-R-Y, wherein R is selected from hydrocarbon and fluorocarbon chains of between 3 and 22 carbon atoms, and X and Y are selected from: sulfonic acids R-SO2OH sulfinic acids R-SOOH phosphinic acids R2POOH phosphonic acids R-OPO(OH)2 carboxylic acids R-COOH thiols R-SH trismethoxysilane R-Si(OCH3)3 trisethoxysilane R-Si(OCH2CH3)3 trichlorosilane R-SiCl3
- the multilayer 4A is preferably formed on undercoat 6 by evaporation of a solvent from a film of uniform thickness, said film being a solution of the nm-scale particles in a solvent such as dodecane.
- the nm-scale particles 1 in Figure 4 may preferably have a chemical composition and size distribution as described above in reference to Figure 2.
- the magnetic material should be selected from the group consisting of elements Co, Fe, Ni, Mn, Sm, Nd, Pr, Pt, Gd, an intermetallic compound of the aforesaid elements, a binary alloy of said elements, a ternary alloy of said elements, an oxide of Fe further comprising at least one of said elements other than Fe, barium ferrite, and strontium ferrite.
- the particles may preferably be composed of a ferromagnetic transition metal ( Co, Fe or Ni ), or are binary alloys of Co, Fe and Ni, or ternary alloys of these elements.
- each particle has a 2 layer structure consisting of a ferromagnetic core (Co, Fe, Ni) surrounded by a noble metal layer ("shell" of Pt, Au, Ag, Pd).
- the diameter of the particles should be 5 - 15 nm, and the standard deviation of the distribution of the particle diameters should preferably be ⁇ 7%, with 5 % (or less) being most preferred.
- Figure 5 is a section view of an alternative magnetic recording medium that consists of 2 layers of ordered monodisperse nm-scale Co particles 1, with a protective coating 7B deposited between layers 4B and 4C of nm-scale particles 1.
- the recording medium comprises a substrate 5, an undercoat 6 on the substrate (preferably but not necessarily of affinity material as described hereinabove), a first layer 4B of nm-scale particles 1 (an ordered array as in Figure 3), a first protective coating layer 7B, a second layer 4C of nm-scale particles 1 (another ordered array as in Figure 3), and a second protective coating layer 7C.
- the substrate 5 may be either rigid (such as glass, or a Si wafer) or flexible, such as a polymeric plastic disc.
- a coating 6 ("undercoat") is applied to the substrate to promote ordered multilayer formation.
- the thickness of the first overcoating 7B may be adjusted to change the interaction of the first ordered monolayer 4B with the second monolayer 4C.
- Figure 6A may continue with more layers, as will be readily understood.
- Figure 6 is a transmission electron micrograph (TEM) photo of an ordered multilayer of Co particles of Figure 4, each black dot being a single 8 nm. diameter Co particle. The top-most layer appears black, and a missing Co particle is highlighted by the while arrow (this is a defect in the ordered multilayer array). The second layer down appears as gray dots.
- the multilayer 4A of Figure 4 is formed by solvent evaporation from a solution of the same particles described above in reference to Figure 2, which depicts formation of an ordered monolayer), but in the multilayer case a higher temperature may preferably be used to increase the particle mobility and to remove solvent at a faster rate. For example, the multilayer whose TEM photo is shown in Figure 6 was prepared at 60°C.
- the "undercoat" layer 6 on the substrate 5 may comprise an affinity material which enables the formation of chemical links between the particles 1 and the substrate 5.
- an affinity material comprises bi-functional molecules of the form X-R-Y, wherein R is selected from hydrocarbon and fluorocarbon chains of between 3 and 22 carbon atoms, and X and Y are selected from: sulfonic acids R-SO2OH sulfinic acids R-SOOH phosphinic acids R2POOH phosphonic acids R-OPO(OH)2 carboxylic acids R-COOH thiols R-SH trismethoxysilane R-Si(OCH3)3 trisethoxysilane R-Si(OCH2CH3)3 trichlorosilane R-SiCl3
- the bi-functional molecule there is a tri-alkoxysilane group (trimethoxy- and triethoxy- silanes being preferred), which will link covalently to SiO2 and metal oxide surfaces.
- a glass substrate, or Si wafer coated with SiO2, or a metal oxide coating on the substrate is preferably used.
- at the other end of the bifunctional molecule there is a carboxylic acid, phosphonic acid, phosphinic acid, sulphonic acid, sulphinic acid, or thiol group.
- Figure 7 shows a method of the present invention, and by this method it is possible to create an ordered monolayer of nm-scale particles in selected regions of a substrate surface, while leaving the remaining regions of the surface free of said particles.
- selected regions of the substrate 5 can be made with customized properties by selective placement of ordered arrays (layers 4) of nm-scale particles 1.
- the undercoat layer 6 on the substrate comprises an affinity material (enabling the formation of chemical links between the particles 1 and the substrate 5 ), and the undercoat layer 6 (affinity coating) is patterned as shown in Step A of Figure 7 using standard lithographic methods.
- the pattern of the affinity coating may have any shape, either geometric or an arbitrary shape, as shown in Fig. 7.
- Step A of Fig. 7 the ordered monolayer array of nm-scale particles is formed by the methods described above in reference to Figure 2.
- the result of the fabrication process with a patterned affinity coating is Step B of Figure 7, where ordered layers 4 of nm-scale particles 1 are then formed only in the selected regions covered with affinity coating 6.
- the selected regions then have the properties of the nm-scale particle layer 4.
- the remaining regions without the affinity coating maintain the properties of the original surface of substrate 5.
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
- Paints Or Removers (AREA)
- Hard Magnetic Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US127453 | 1998-07-31 | ||
| US09/127,453 US6162532A (en) | 1998-07-31 | 1998-07-31 | Magnetic storage medium formed of nanoparticles |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP0977182A2 true EP0977182A2 (de) | 2000-02-02 |
| EP0977182A3 EP0977182A3 (de) | 2000-06-28 |
| EP0977182B1 EP0977182B1 (de) | 2005-04-20 |
Family
ID=22430201
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP99305758A Expired - Lifetime EP0977182B1 (de) | 1998-07-31 | 1999-07-21 | Magnetisches Speichermedium aus Nanopartikeln |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6162532A (de) |
| EP (1) | EP0977182B1 (de) |
| JP (1) | JP2000048340A (de) |
| KR (1) | KR100336735B1 (de) |
| CN (1) | CN1110797C (de) |
| AT (1) | ATE293829T1 (de) |
| DE (1) | DE69924794T2 (de) |
| SG (1) | SG77260A1 (de) |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002005299A1 (en) * | 2000-07-10 | 2002-01-17 | Council For The Central Laboratory Of The Research Councils | Nanostructures |
| US6500497B1 (en) | 2001-10-01 | 2002-12-31 | Data Storage Institute | Method of magnetically patterning a thin film by mask-controlled local phase transition |
| EP1226878A3 (de) * | 2001-01-24 | 2003-08-13 | Matsushita Electric Industrial Co., Ltd. | In Linien gebrachte feine Teilchen, Verfahren zu deren Herstellung und diese verwendender Apparat |
| US6713173B2 (en) | 1996-11-16 | 2004-03-30 | Nanomagnetics Limited | Magnetizable device |
| WO2004045793A1 (ja) * | 2002-11-15 | 2004-06-03 | Fujitsu Limited | 合金ナノパーティクル及びその製造方法並びに合金ナノパーティクルを用いた磁気記録媒体 |
| US6815063B1 (en) | 1996-11-16 | 2004-11-09 | Nanomagnetics, Ltd. | Magnetic fluid |
| EP1357544A3 (de) * | 2002-04-25 | 2005-03-09 | Fuji Photo Film Co., Ltd. | Magnetisches Aufzeichnungsmedium |
| US6896957B1 (en) | 1996-11-16 | 2005-05-24 | Nanomagnetics, Ltd. | Magnetizable device |
| WO2005045809A3 (en) * | 2003-10-09 | 2005-06-23 | Seagate Technology Llc | Method and system for magnetic recording using self-organized magnetic nanoparticles |
| WO2005015579A3 (en) * | 2002-12-02 | 2005-08-11 | Univ North Carolina State | Methods of forming three-dimensional nanodot arrays in a matrix |
| US6986942B1 (en) | 1996-11-16 | 2006-01-17 | Nanomagnetics Limited | Microwave absorbing structure |
| FR2877662A1 (fr) * | 2004-11-09 | 2006-05-12 | Commissariat Energie Atomique | Reseau de particules et procede de realisation d'un tel reseau. |
| CN100336112C (zh) * | 2002-06-10 | 2007-09-05 | 富士通株式会社 | 垂直磁存储媒体、其制造方法和磁存储装置 |
| US7577078B2 (en) | 2002-12-14 | 2009-08-18 | Samsung Electronics Co., Ltd. | Magnetic recording medium and apparatus and method for reading data from the magnetic recording medium using parallel and anti-parallel magnetization direction in separate magnetic layers |
| EP2216730A1 (de) * | 2009-02-10 | 2010-08-11 | Deutsche Telekom AG | Verfahren zum Verschlüsseln und/oder Entschlüsseln von Personendaten |
| WO2011004992A1 (en) | 2009-07-10 | 2011-01-13 | Korea University Research And Business Foundation | Self-cleaning surfaces |
Families Citing this family (126)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3742153B2 (ja) * | 1996-08-29 | 2006-02-01 | 日鉄鉱業株式会社 | 被覆粉体固結物およびその製造方法 |
| US6933331B2 (en) | 1998-05-22 | 2005-08-23 | Nanoproducts Corporation | Nanotechnology for drug delivery, contrast agents and biomedical implants |
| US20060003163A1 (en) * | 1996-11-16 | 2006-01-05 | Nanomagnetics Limited | Magnetic fluid |
| US7384680B2 (en) * | 1997-07-21 | 2008-06-10 | Nanogram Corporation | Nanoparticle-based power coatings and corresponding structures |
| US7029726B1 (en) | 1999-07-27 | 2006-04-18 | Quantum Corporation | Method for forming a servo pattern on a magnetic tape |
| US7153366B1 (en) | 1998-03-24 | 2006-12-26 | Quantum Corporation | Systems and method for forming a servo pattern on a magnetic tape |
| US6495240B1 (en) * | 1999-02-10 | 2002-12-17 | Tdk Corporation | Patterned magnetic recording medium possessing recording portions with a lower height than the surrounding non-magnetic matrix |
| US6387530B1 (en) * | 1999-08-27 | 2002-05-14 | Seagate Technology Llc | Patterned magnetic media via thermally induced phase transition |
| US20040178076A1 (en) * | 1999-10-01 | 2004-09-16 | Stonas Walter J. | Method of manufacture of colloidal rod particles as nanobarcodes |
| US7225082B1 (en) | 1999-10-01 | 2007-05-29 | Oxonica, Inc. | Colloidal rod particles as nanobar codes |
| US6919009B2 (en) * | 1999-10-01 | 2005-07-19 | Nanoplex Technologies, Inc. | Method of manufacture of colloidal rod particles as nanobarcodes |
| US20040209376A1 (en) * | 1999-10-01 | 2004-10-21 | Surromed, Inc. | Assemblies of differentiable segmented particles |
| US7045049B1 (en) * | 1999-10-01 | 2006-05-16 | Nanoplex Technologies, Inc. | Method of manufacture of colloidal rod particles as nanobar codes |
| US7153597B2 (en) * | 2001-03-15 | 2006-12-26 | Seagate Technology Llc | Magnetic recording media having chemically modified patterned substrate to assemble self organized magnetic arrays |
| US7041394B2 (en) * | 2001-03-15 | 2006-05-09 | Seagate Technology Llc | Magnetic recording media having self organized magnetic arrays |
| JP3861197B2 (ja) * | 2001-03-22 | 2006-12-20 | 株式会社東芝 | 記録媒体の製造方法 |
| AU2002307090A1 (en) * | 2001-04-03 | 2002-10-21 | Surromed, Inc. | Methods and reagents for multiplexed analyte capture, surface array self-assembly, and analysis of complex biological samples |
| US20020145826A1 (en) * | 2001-04-09 | 2002-10-10 | University Of Alabama | Method for the preparation of nanometer scale particle arrays and the particle arrays prepared thereby |
| US6855426B2 (en) | 2001-08-08 | 2005-02-15 | Nanoproducts Corporation | Methods for producing composite nanoparticles |
| US6566665B2 (en) * | 2001-08-17 | 2003-05-20 | International Business Machines Corporation | Method and apparatus for linking and/or patterning self-assembled objects |
| US6940681B2 (en) * | 2001-08-20 | 2005-09-06 | Quantum Corporation | Optical to magnetic alignment in magnetic tape system |
| US20030059604A1 (en) * | 2001-09-05 | 2003-03-27 | Fuji Photo Film Co., Ltd. | Material coated with dispersion of ferromagnetic nanoparticles, and magnetic recording medium using the material |
| SG102013A1 (en) | 2001-11-09 | 2004-02-27 | Inst Data Storage | Manufacturing method for high-density magnetic data storage media |
| US7374597B2 (en) * | 2001-12-10 | 2008-05-20 | The United States Of America As Represented By The Secretary Of The Navy | Synthesis of metal nanoparticle compositions from metallic and ethynyl compounds |
| JP2003178419A (ja) | 2001-12-12 | 2003-06-27 | Fuji Photo Film Co Ltd | 記録媒体 |
| US7282710B1 (en) | 2002-01-02 | 2007-10-16 | International Business Machines Corporation | Scanning probe microscopy tips composed of nanoparticles and methods to form same |
| US6897650B2 (en) * | 2002-02-11 | 2005-05-24 | International Business Machines Corporation | Magnetic-field sensor device |
| US6805904B2 (en) * | 2002-02-20 | 2004-10-19 | International Business Machines Corporation | Process of forming a multilayer nanoparticle-containing thin film self-assembly |
| JP2003248916A (ja) * | 2002-02-20 | 2003-09-05 | Fujitsu Ltd | 磁気記録媒体用ナノ粒子並びにそれを用いた磁気記録媒体及び磁気記録媒体の製造方法 |
| US6878445B2 (en) * | 2002-03-08 | 2005-04-12 | Fuji Photo Film Co., Ltd. | Nanoparticle coated material and production method of same |
| WO2003100877A1 (en) * | 2002-05-24 | 2003-12-04 | National Institute Of Advenced Industrial Science And Technology | Magnetoresistance effect device and magnetism sensor using the same |
| JP4524078B2 (ja) * | 2002-05-31 | 2010-08-11 | 富士フイルム株式会社 | 磁性粒子およびその製造方法、並びに、磁気記録媒体およびその製造方法 |
| AU2003213086A1 (en) * | 2002-06-28 | 2004-01-19 | Seagate Technology Llc | Increased packing density in self-organized magnetic array |
| JP4179922B2 (ja) * | 2002-07-03 | 2008-11-12 | 富士フイルム株式会社 | 磁気記録媒体及びその製造方法 |
| JP2004110917A (ja) * | 2002-09-18 | 2004-04-08 | Hitachi Ltd | 磁気記録媒体とそれを用いた磁気ディスク装置およびその製造方法 |
| US8553517B2 (en) | 2002-10-14 | 2013-10-08 | Samsung Electronics Co., Ltd. | Magnetic medium using spin-polarized electrons and apparatus and method of recording data on the magnetic medium |
| KR100519772B1 (ko) * | 2002-10-14 | 2005-10-07 | 삼성전자주식회사 | 스핀 분극된 전자를 이용한 자성매체 및 자성매체를이용한 정보기록장치 및 기록방법 |
| JP2004165630A (ja) * | 2002-10-21 | 2004-06-10 | Fuji Photo Film Co Ltd | 磁性粒子塗布物、磁性粒子塗布物の製造方法、磁気記録媒体、電磁シールド材 |
| JP4033795B2 (ja) | 2002-11-28 | 2008-01-16 | 株式会社日立グローバルストレージテクノロジーズ | 磁気記録媒体及びそれを搭載した磁気記録装置 |
| US7708974B2 (en) | 2002-12-10 | 2010-05-04 | Ppg Industries Ohio, Inc. | Tungsten comprising nanomaterials and related nanotechnology |
| JP2004220670A (ja) * | 2003-01-14 | 2004-08-05 | Hitachi Ltd | 磁化容易軸の向きが揃ったナノ粒子膜の作成方法とこれを用いた磁気記録媒体及びその製造方法及びその製造装置 |
| US6980390B2 (en) * | 2003-02-05 | 2005-12-27 | Quantum Corporation | Magnetic media with embedded optical servo tracks |
| US7187515B2 (en) * | 2003-02-05 | 2007-03-06 | Quantum Corporation | Method and system for tracking magnetic media with embedded optical servo tracks |
| WO2004070712A1 (ja) | 2003-02-06 | 2004-08-19 | Fujitsu Limited | 磁気記録媒体及びその製造方法、磁気記録媒体に用いられる磁気媒体基板、並びに磁気記憶装置 |
| US20050196606A1 (en) * | 2003-02-20 | 2005-09-08 | Fujitsu Limited | Composite material, structure and polycrystalline structure film and method of making particles |
| JP2004265489A (ja) * | 2003-02-28 | 2004-09-24 | Fuji Photo Film Co Ltd | 磁性粒子塗布物 |
| CN1307617C (zh) * | 2003-03-04 | 2007-03-28 | 鸿富锦精密工业(深圳)有限公司 | 磁存储介质及其制备方法 |
| JP4213076B2 (ja) | 2003-05-14 | 2009-01-21 | 富士通株式会社 | 磁気記録媒体の製造方法 |
| US8345374B2 (en) * | 2003-05-29 | 2013-01-01 | Seagate Technology, Llc | Patterned media for heat assisted magnetic recording |
| US20050019556A1 (en) * | 2003-06-17 | 2005-01-27 | Surromed, Inc. | Labeling and authentication of metal objects |
| DE10327839A1 (de) * | 2003-06-20 | 2005-01-05 | Arvinmeritor Gmbh | Fahrzeugdachmodul |
| JP2005015839A (ja) * | 2003-06-25 | 2005-01-20 | Fuji Photo Film Co Ltd | 合金ナノ粒子 |
| US20050048546A1 (en) * | 2003-07-11 | 2005-03-03 | Sharron Penn | Multiplexed molecular beacon assay for detection of human pathogens |
| JP2005048250A (ja) * | 2003-07-30 | 2005-02-24 | Dowa Mining Co Ltd | 金属磁性粒子の集合体およびその製造法 |
| JP2005056489A (ja) * | 2003-08-04 | 2005-03-03 | Fuji Photo Film Co Ltd | 磁気記録媒体 |
| US7029773B2 (en) * | 2003-10-10 | 2006-04-18 | Seagate Technology Llc | Method and system for magnetic recording using self-organized magnetic nanoparticles |
| WO2005063617A1 (en) * | 2003-12-18 | 2005-07-14 | Massachusets Institute Of Technology | Bioprocesse enhanced by magnetic nanoparticles |
| JP2005305634A (ja) * | 2004-03-26 | 2005-11-04 | Fujitsu Ltd | ナノホール構造体及びその製造方法、スタンパ及びその製造方法、磁気記録媒体及びその製造方法、並びに、磁気記録装置及び磁気記録方法 |
| JP2005327368A (ja) * | 2004-05-14 | 2005-11-24 | Fujitsu Ltd | 磁気記録装置用保護層、磁気ヘッドおよび磁気記録装置 |
| JP4418300B2 (ja) * | 2004-05-25 | 2010-02-17 | 株式会社日立製作所 | 記録媒体作製方法とこれを用いた記録媒体及び情報記録再生装置 |
| US7102201B2 (en) * | 2004-07-15 | 2006-09-05 | International Business Machines Corporation | Strained semiconductor device structures |
| JP2006107550A (ja) * | 2004-09-30 | 2006-04-20 | Fuji Photo Film Co Ltd | 磁気記録媒体およびその製造方法 |
| US20060099462A1 (en) * | 2004-11-05 | 2006-05-11 | Seagate Technology Llc | Nano-scaled reactor for high pressure and high temperature chemical reactions and chemical ordering |
| KR100607222B1 (ko) * | 2004-12-29 | 2006-08-01 | 한양대학교 산학협력단 | 교차하는 전극 사이에 나노 결정체를 이용한 논리 소자또는 기억 소자 및 그 제조 방법 |
| US7521137B2 (en) * | 2005-01-12 | 2009-04-21 | Seagate Technology Llc | Patterned thin films and use of such films as thermal control layers in heat assisted magnetic recording media |
| EP1846322B1 (de) | 2005-01-31 | 2009-10-07 | Freescale Semiconductor, Inc. | Verfahren zur beschichtung einer oberfläche mit nanoteilchen |
| JP2006260705A (ja) * | 2005-03-18 | 2006-09-28 | Fujitsu Ltd | 磁気記録媒体、その製造方法および情報記録再生装置 |
| JP2006286105A (ja) * | 2005-03-31 | 2006-10-19 | Fujitsu Ltd | 磁気記録媒体および磁気記憶装置 |
| EP1911023A2 (de) * | 2005-07-21 | 2008-04-16 | Nxp B.V. | Rom-magnetdatenträger |
| KR101102157B1 (ko) * | 2005-09-16 | 2012-01-02 | 삼성전자주식회사 | 금속 나노 입자를 이용한 휘발성 음저항 소자 |
| US8168284B2 (en) | 2005-10-06 | 2012-05-01 | Wisconsin Alumni Research Foundation | Fabrication of complex three-dimensional structures based on directed assembly of self-assembling materials on activated two-dimensional templates |
| JP2007128605A (ja) * | 2005-11-04 | 2007-05-24 | Kagawa Univ | 磁気記録媒体とその製造方法及びそれを用いた磁気記録読取装置 |
| JP2007128607A (ja) * | 2005-11-04 | 2007-05-24 | Kagawa Univ | 磁気記録媒体とその製造方法及びそれを用いた磁気記録読取装置 |
| JP4521569B2 (ja) * | 2005-11-04 | 2010-08-11 | 国立大学法人 香川大学 | 磁気記録媒体とその製造方法およびそれを用いた磁気記録読み取り装置。 |
| JP2007149155A (ja) * | 2005-11-24 | 2007-06-14 | Hitachi Ltd | 磁気記録媒体、その作製方法、及び磁気ディスク装置 |
| US20070126001A1 (en) * | 2005-12-05 | 2007-06-07 | Sung-Yool Choi | Organic semiconductor device and method of fabricating the same |
| JP2007250824A (ja) * | 2006-03-16 | 2007-09-27 | Fujitsu Ltd | 硬磁性ナノ粒子、その製造方法、磁性流体および磁気記録媒体 |
| US7829140B1 (en) | 2006-03-29 | 2010-11-09 | The Research Foundation Of The State University Of New York | Method of forming iron oxide core metal shell nanoparticles |
| KR100702669B1 (ko) * | 2006-03-30 | 2007-04-03 | 삼성전자주식회사 | 나노 자기 메모리 소자와 그 제조방법 |
| US20070258161A1 (en) * | 2006-05-08 | 2007-11-08 | Seagate Technology Llc | Data storage device with bit patterned media with staggered islands |
| US7807217B2 (en) * | 2006-07-05 | 2010-10-05 | Seagate Technology Llc | Method of producing self-assembled cubic FePt nanoparticles and apparatus using same |
| US7492540B2 (en) * | 2006-09-15 | 2009-02-17 | Hitachi Global Storage Technologies Netherlands B.V. | Apparatus system and method for variable data density patterned media |
| JP4163729B2 (ja) * | 2006-10-03 | 2008-10-08 | 株式会社東芝 | 磁気記録媒体、その製造方法、および磁気記録装置 |
| KR101221789B1 (ko) * | 2006-12-28 | 2013-01-11 | 삼성전자주식회사 | 유기 메모리 소자 및 그의 제조방법 |
| KR100905713B1 (ko) * | 2007-02-06 | 2009-07-01 | 삼성전자주식회사 | 나노결정을 이용한 정보저장매체 및 그 제조방법과,정보저장장치 |
| US8343627B2 (en) * | 2007-02-20 | 2013-01-01 | Research Foundation Of State University Of New York | Core-shell nanoparticles with multiple cores and a method for fabricating them |
| WO2008139597A1 (en) * | 2007-05-01 | 2008-11-20 | Kazufumi Ogawa | Magnetic recording medium, production method thereof and magnetic recording and reading device using the same |
| WO2008139596A1 (en) * | 2007-05-01 | 2008-11-20 | Kazufumi Ogawa | Magnetic recording medium, manufacturing method thereof and magnetic recording and reading device therewith |
| JP2008276890A (ja) * | 2007-05-02 | 2008-11-13 | Kagawa Univ | 磁気記録媒体およびその製造方法ならびにそれを用いた磁気記録読取装置 |
| JP2008276889A (ja) * | 2007-05-02 | 2008-11-13 | Kagawa Univ | 磁気記録媒体および磁気記録媒体の製造方法ならびにそれを用いた磁気記録読取装置 |
| JP2008276887A (ja) * | 2007-05-02 | 2008-11-13 | Kagawa Univ | 磁気記録媒体とその製造方法 |
| JP2008293609A (ja) * | 2007-05-25 | 2008-12-04 | Fujitsu Ltd | 複製用型の製造方法、ナノホール構造体の製造方法、及び磁気記録媒体の製造方法 |
| KR101255051B1 (ko) * | 2007-09-07 | 2013-04-16 | 시게이트 테크놀로지 엘엘씨 | 수퍼 트랙을 가지는 비트 패턴 매체, 재생 헤드 및 수퍼트랙을 가지는 비트패턴 매체에 정보를 기록 재생하는 하드디스크 드라이브 |
| KR101282838B1 (ko) * | 2007-10-23 | 2013-07-05 | 시게이트 테크놀로지 엘엘씨 | 수퍼트랙을 가지는 비트 패턴 매체, 이러한 비트 패턴매체의 트랙 추종 방법, 이러한 비트 패턴 매체에 적합한헤드, 및 이러한 비트 패턴 매체와 헤드를 포함하는 정보기록/재생 장치 |
| US9183870B2 (en) * | 2007-12-07 | 2015-11-10 | Wisconsin Alumni Research Foundation | Density multiplication and improved lithography by directed block copolymer assembly |
| US8268545B2 (en) * | 2008-06-09 | 2012-09-18 | Seagate Technology Llc | Formation of a device using block copolymer lithography |
| US7976715B2 (en) * | 2008-06-17 | 2011-07-12 | Hitachi Global Storage Technologies Netherlands B.V. | Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks |
| US7713753B2 (en) * | 2008-09-04 | 2010-05-11 | Seagate Technology Llc | Dual-level self-assembled patterning method and apparatus fabricated using the method |
| US8947809B2 (en) * | 2008-09-19 | 2015-02-03 | Seagate Technology Llc | Encoding scheme for bit patterned media |
| US7920354B2 (en) * | 2008-09-15 | 2011-04-05 | Seagate Technology Llc | Phase servo patterns for bit patterned media |
| US20100223206A1 (en) * | 2008-11-14 | 2010-09-02 | Sharrock Michael P | Method of providing and selecting particles to increase signal-to-noise ratio in magnetic recording media |
| US8247025B2 (en) * | 2009-05-19 | 2012-08-21 | Korea University Research And Business Foundation | Magnetic nanoparticle fabrication |
| JP5259645B2 (ja) | 2010-04-14 | 2013-08-07 | 株式会社東芝 | 磁気記録媒体及びその製造方法 |
| JP5598080B2 (ja) * | 2010-05-17 | 2014-10-01 | 大日本印刷株式会社 | ガスバリア性シートの製造方法 |
| US9299381B2 (en) | 2011-02-07 | 2016-03-29 | Wisconsin Alumni Research Foundation | Solvent annealing block copolymers on patterned substrates |
| KR101999870B1 (ko) | 2011-09-15 | 2019-10-02 | 위스콘신 얼럼나이 리서어치 화운데이션 | 화학적으로 패턴화된 표면과 제2 표면 사이의 블록 공중합체 막의 유도 조립 |
| JP5901975B2 (ja) * | 2012-01-13 | 2016-04-13 | 株式会社東芝 | 情報記録装置、及び情報記録方法 |
| US9372398B2 (en) | 2012-03-02 | 2016-06-21 | Wisconsin Alumni Research Foundation | Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers |
| JP6019744B2 (ja) | 2012-05-21 | 2016-11-02 | 株式会社リコー | 磁性体組成物とそれを用いた磁性体成形体 |
| US8926851B2 (en) * | 2012-11-18 | 2015-01-06 | HGST Netherlands B.V. | Method for making a film of uniformly arranged core-shell nanoparticles on a substrate |
| US9818514B2 (en) | 2013-07-26 | 2017-11-14 | University Of Florida Research Foundation, Incorporated | Nanocomposite magnetic materials for magnetic devices and systems |
| JP2015056186A (ja) * | 2013-09-10 | 2015-03-23 | 株式会社東芝 | パターン形成方法、及び磁気記録媒体の製造方法 |
| WO2015105939A1 (en) | 2014-01-08 | 2015-07-16 | University Of Houston System | Systems and methods for locally reducing oxides |
| US9761357B2 (en) | 2014-03-13 | 2017-09-12 | International Business Machines Corporation | Multi-layer magnetic nanoparticles for magnetic recording |
| JP2016024838A (ja) | 2014-07-24 | 2016-02-08 | 株式会社東芝 | 磁気記録媒体の製造方法 |
| EP3199494B1 (de) * | 2014-09-22 | 2019-03-13 | Sekisui Chemical Co., Ltd. | Kohlenstoffbeschichtete vanadiumdioxidpartikel |
| US9627115B2 (en) * | 2015-09-14 | 2017-04-18 | Elwha Llc | Magnetic plasmonic nanoparticle dimer |
| US9627114B2 (en) | 2015-09-14 | 2017-04-18 | Elwha Llc | Magnetic plasmonic nanoparticle positioned on a magnetic plasmonic substrate |
| WO2017192986A1 (en) * | 2016-05-05 | 2017-11-09 | Arizona Board Of Regents For And On Behalf Of Arizona State University | Phase-locked spin torque oscillator array |
| CN109516797B (zh) * | 2018-12-19 | 2021-05-25 | 北矿科技股份有限公司 | 一种低sfd磁记录材料及其制备方法 |
| CN109574707B (zh) * | 2019-01-24 | 2021-09-21 | 中国人民解放军空军工程大学 | 一种微孔磁性介质复合陶瓷吸波超材料及其制备方法 |
| US20220302408A1 (en) * | 2019-08-27 | 2022-09-22 | Oti Lumionics Inc. | Light transmissive electrode for light emitting devices |
| US20230059388A1 (en) * | 2020-01-22 | 2023-02-23 | 3M Innovative Properties Company | Magnetic film |
| CN115362517B (zh) * | 2020-04-02 | 2025-08-15 | 株式会社村田制作所 | 磁性材料及电感器 |
| JP7359291B2 (ja) * | 2020-04-02 | 2023-10-11 | 株式会社村田製作所 | 磁性材料およびインダクタ |
| CN115287651B (zh) * | 2022-08-18 | 2023-07-18 | 太原理工大学 | 金刚石颗粒簇均匀排列的金刚石增强耐磨层及其制备方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5302434A (en) * | 1992-08-07 | 1994-04-12 | International Business Machines Corporation | Magnetic recording disk for contact recording |
| JP2885587B2 (ja) * | 1992-10-28 | 1999-04-26 | 科学技術振興事業団 | 2次元粒子薄膜製造方法 |
| JPH0916934A (ja) * | 1995-06-27 | 1997-01-17 | Fujitsu Ltd | 磁気記録装置、磁気記録媒体及びその製造方法 |
| US5766764A (en) * | 1996-06-04 | 1998-06-16 | The Boeing Company | Nanoscale amorphous magnetic metals |
| JPH1092637A (ja) * | 1996-09-13 | 1998-04-10 | Fujitsu Ltd | 磁気記録媒体及び装置 |
-
1998
- 1998-07-31 US US09/127,453 patent/US6162532A/en not_active Expired - Lifetime
-
1999
- 1999-07-07 CN CN99110405A patent/CN1110797C/zh not_active Expired - Lifetime
- 1999-07-15 KR KR1019990028700A patent/KR100336735B1/ko not_active Expired - Fee Related
- 1999-07-21 AT AT99305758T patent/ATE293829T1/de not_active IP Right Cessation
- 1999-07-21 DE DE69924794T patent/DE69924794T2/de not_active Expired - Lifetime
- 1999-07-21 EP EP99305758A patent/EP0977182B1/de not_active Expired - Lifetime
- 1999-07-24 SG SG1999003648A patent/SG77260A1/en unknown
- 1999-07-26 JP JP11210741A patent/JP2000048340A/ja active Pending
Cited By (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6986942B1 (en) | 1996-11-16 | 2006-01-17 | Nanomagnetics Limited | Microwave absorbing structure |
| US6896957B1 (en) | 1996-11-16 | 2005-05-24 | Nanomagnetics, Ltd. | Magnetizable device |
| US6815063B1 (en) | 1996-11-16 | 2004-11-09 | Nanomagnetics, Ltd. | Magnetic fluid |
| US6713173B2 (en) | 1996-11-16 | 2004-03-30 | Nanomagnetics Limited | Magnetizable device |
| WO2002005299A1 (en) * | 2000-07-10 | 2002-01-17 | Council For The Central Laboratory Of The Research Councils | Nanostructures |
| US6696107B2 (en) | 2000-07-10 | 2004-02-24 | Council For The Central Laboratory Of The Research Councils | Nanostructures |
| EP1226878A3 (de) * | 2001-01-24 | 2003-08-13 | Matsushita Electric Industrial Co., Ltd. | In Linien gebrachte feine Teilchen, Verfahren zu deren Herstellung und diese verwendender Apparat |
| US7220482B2 (en) | 2001-01-24 | 2007-05-22 | Matsushita Electric Industrial Co., Ltd. | Aligned fine particles, method for producing the same and device using the same |
| GB2380310B (en) * | 2001-10-01 | 2005-04-13 | Inst Data Storage | Making a patterned magnetic nanostructure by mask-controlled phase transition |
| GB2380310A (en) * | 2001-10-01 | 2003-04-02 | Inst Data Storage | Patterned magnetic nanostructure |
| US6500497B1 (en) | 2001-10-01 | 2002-12-31 | Data Storage Institute | Method of magnetically patterning a thin film by mask-controlled local phase transition |
| US7118816B2 (en) | 2002-04-25 | 2006-10-10 | Fuji Photo Film Co., Ltd. | Magnetic recording medium |
| EP1357544A3 (de) * | 2002-04-25 | 2005-03-09 | Fuji Photo Film Co., Ltd. | Magnetisches Aufzeichnungsmedium |
| CN100336112C (zh) * | 2002-06-10 | 2007-09-05 | 富士通株式会社 | 垂直磁存储媒体、其制造方法和磁存储装置 |
| WO2004045793A1 (ja) * | 2002-11-15 | 2004-06-03 | Fujitsu Limited | 合金ナノパーティクル及びその製造方法並びに合金ナノパーティクルを用いた磁気記録媒体 |
| US7105118B2 (en) | 2002-12-02 | 2006-09-12 | North Carolina State University | Methods of forming three-dimensional nanodot arrays in a matrix |
| WO2005015579A3 (en) * | 2002-12-02 | 2005-08-11 | Univ North Carolina State | Methods of forming three-dimensional nanodot arrays in a matrix |
| US7577078B2 (en) | 2002-12-14 | 2009-08-18 | Samsung Electronics Co., Ltd. | Magnetic recording medium and apparatus and method for reading data from the magnetic recording medium using parallel and anti-parallel magnetization direction in separate magnetic layers |
| WO2005045809A3 (en) * | 2003-10-09 | 2005-06-23 | Seagate Technology Llc | Method and system for magnetic recording using self-organized magnetic nanoparticles |
| FR2877662A1 (fr) * | 2004-11-09 | 2006-05-12 | Commissariat Energie Atomique | Reseau de particules et procede de realisation d'un tel reseau. |
| WO2006051186A3 (fr) * | 2004-11-09 | 2006-12-14 | Commissariat Energie Atomique | Reseau de particules et procede de realisation d’un tel reseau |
| US7985469B2 (en) | 2004-11-09 | 2011-07-26 | Commissariat A L'energie Atomique | Particle network comprising particles disposed on a substrate and method for realizing such a network |
| EP2216730A1 (de) * | 2009-02-10 | 2010-08-11 | Deutsche Telekom AG | Verfahren zum Verschlüsseln und/oder Entschlüsseln von Personendaten |
| WO2011004992A1 (en) | 2009-07-10 | 2011-01-13 | Korea University Research And Business Foundation | Self-cleaning surfaces |
| EP2451756A4 (de) * | 2009-07-10 | 2016-04-13 | Univ Korea Res & Bus Found | Selbstreinigende oberflächen |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0977182A3 (de) | 2000-06-28 |
| DE69924794D1 (de) | 2005-05-25 |
| EP0977182B1 (de) | 2005-04-20 |
| JP2000048340A (ja) | 2000-02-18 |
| SG77260A1 (en) | 2000-12-19 |
| CN1110797C (zh) | 2003-06-04 |
| KR100336735B1 (ko) | 2002-05-13 |
| ATE293829T1 (de) | 2005-05-15 |
| KR20000011748A (ko) | 2000-02-25 |
| US6162532A (en) | 2000-12-19 |
| CN1243999A (zh) | 2000-02-09 |
| DE69924794T2 (de) | 2006-03-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0977182B1 (de) | Magnetisches Speichermedium aus Nanopartikeln | |
| US6673401B2 (en) | Nanoparticle structures utilizing synthetic DNA lattices | |
| US7153597B2 (en) | Magnetic recording media having chemically modified patterned substrate to assemble self organized magnetic arrays | |
| US5138174A (en) | Nanometer-scale structures and lithography | |
| US6805904B2 (en) | Process of forming a multilayer nanoparticle-containing thin film self-assembly | |
| US7820064B2 (en) | Spinodally patterned nanostructures | |
| US7906367B2 (en) | Method of forming fine particle pattern, and method of producing a device | |
| WO2005015792A2 (en) | Fabrication of nanoparticle arrays | |
| Pileni et al. | Self assemblies of nanocrystals: preparation, collective properties and uses | |
| US20050079282A1 (en) | Ultra-high-density magnetic recording media and methods for making the same | |
| Chen et al. | Electrostatic assembly of gold colloidal nanoparticles on organosilane monolayers patterned by microcontact electrochemical conversion | |
| JP2001277200A (ja) | 微細加工装置 | |
| Yang et al. | Fabrication of FePt nanoparticles for self-organized magnetic array | |
| US20020034666A1 (en) | Magnetic recording medium utilizing patterned nanoparticle arrays | |
| US20160071537A1 (en) | Fabrication of bit patterned media using microcontact printing | |
| Sohn et al. | The fabrication of Co–Pt electro-deposited bit patterned media with nanoimprint lithography | |
| Vengasandra et al. | Microfluidic ultramicroscale deposition and patterning of quantum dots | |
| US7931977B2 (en) | Information storage media | |
| US20050068679A1 (en) | Magnetic storage medium and method for making same | |
| Choi et al. | Fabrication of patterned magnetic nanomaterials for data storage media | |
| Nutter et al. | Fabrication of patterned Pt/Co multilayers for high-density probe storage | |
| KR100526828B1 (ko) | 양자점 형성방법 | |
| Ouchi et al. | Electrochemical fabrication of CoPt nanodot arrays on glass disks by UV nanoimprint lithography | |
| US20080093550A1 (en) | Method For Adhering Nanostructures to End of Probe of Microscope and Microscope Having Probe Made By the Same Method | |
| CN1527288A (zh) | 磁存储介质及其制备方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
|
| AX | Request for extension of the european patent |
Free format text: AL;LT;LV;MK;RO;SI |
|
| PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
| AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
|
| AX | Request for extension of the european patent |
Free format text: AL;LT;LV;MK;RO;SI |
|
| 17P | Request for examination filed |
Effective date: 20001116 |
|
| AKX | Designation fees paid |
Free format text: AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
|
| 17Q | First examination report despatched |
Effective date: 20020813 |
|
| GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
| GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
| GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
| AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20050420 Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20050420 Ref country code: ES Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20050420 Ref country code: CH Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20050420 Ref country code: BE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20050420 Ref country code: AT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20050420 |
|
| REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D |
|
| REG | Reference to a national code |
Ref country code: CH Ref legal event code: NV Representative=s name: INTERNATIONAL BUSINESS MACHINES CORPORATION Ref country code: CH Ref legal event code: EP |
|
| REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D |
|
| REF | Corresponds to: |
Ref document number: 69924794 Country of ref document: DE Date of ref document: 20050525 Kind code of ref document: P |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20050720 Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20050720 Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20050720 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20050721 Ref country code: CY Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20050721 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20050731 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20050920 |
|
| REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
| PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
| ET | Fr: translation filed | ||
| 26N | No opposition filed |
Effective date: 20060123 |
|
| REG | Reference to a national code |
Ref country code: GB Ref legal event code: 746 Effective date: 20090619 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20100730 Year of fee payment: 12 Ref country code: IE Payment date: 20100716 Year of fee payment: 12 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: IT Payment date: 20100721 Year of fee payment: 12 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20110801 Year of fee payment: 13 |
|
| REG | Reference to a national code |
Ref country code: NL Ref legal event code: V1 Effective date: 20120201 |
|
| REG | Reference to a national code |
Ref country code: IE Ref legal event code: MM4A |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20120201 Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20110721 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20110721 |
|
| REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20130329 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20120731 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20180628 Year of fee payment: 20 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20180726 Year of fee payment: 20 |
|
| REG | Reference to a national code |
Ref country code: DE Ref legal event code: R071 Ref document number: 69924794 Country of ref document: DE |
|
| REG | Reference to a national code |
Ref country code: GB Ref legal event code: PE20 Expiry date: 20190720 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION Effective date: 20190720 |