EP1062034A1 - Appareil et procede pour la production d'une pluralite d'articles marques de fa on unique - Google Patents

Appareil et procede pour la production d'une pluralite d'articles marques de fa on unique

Info

Publication number
EP1062034A1
EP1062034A1 EP99910489A EP99910489A EP1062034A1 EP 1062034 A1 EP1062034 A1 EP 1062034A1 EP 99910489 A EP99910489 A EP 99910489A EP 99910489 A EP99910489 A EP 99910489A EP 1062034 A1 EP1062034 A1 EP 1062034A1
Authority
EP
European Patent Office
Prior art keywords
articles
substrate
indicia
photomask
article
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP99910489A
Other languages
German (de)
English (en)
Inventor
Anthony Robert Corless
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Research Laboratories Ltd
Original Assignee
Central Research Laboratories Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GBGB9805510.6A external-priority patent/GB9805510D0/en
Priority claimed from GBGB9805512.2A external-priority patent/GB9805512D0/en
Priority claimed from GBGB9805508.0A external-priority patent/GB9805508D0/en
Application filed by Central Research Laboratories Ltd filed Critical Central Research Laboratories Ltd
Publication of EP1062034A1 publication Critical patent/EP1062034A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0046—Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00497—Features relating to the solid phase supports
    • B01J2219/005—Beads
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00497—Features relating to the solid phase supports
    • B01J2219/00502—Particles of irregular geometry
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/0054—Means for coding or tagging the apparatus or the reagents
    • B01J2219/00542—Alphanumeric characters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/0054—Means for coding or tagging the apparatus or the reagents
    • B01J2219/00547—Bar codes
    • B01J2219/00549—2-dimensional
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00596—Solid-phase processes
    • C—CHEMISTRY; METALLURGY
    • C40—COMBINATORIAL TECHNOLOGY
    • C40B—COMBINATORIAL CHEMISTRY; LIBRARIES, e.g. CHEMICAL LIBRARIES
    • C40B70/00—Tags or labels specially adapted for combinatorial chemistry or libraries, e.g. fluorescent tags or bar codes

Definitions

  • the present invention relates to an apparatus for, and method of, manufacturing a
  • combinatorial chemistry capable of being used in the area of chemistry known as combinatorial chemistry.
  • Combinatorial chemistry is a technique whereby very many different chemical
  • combination matrix having a recording means which is smaller than about 10 mm square
  • indicia unique labels or codes
  • the articles may be beads, for
  • articles are formed in rows and columns and thereby define an array.
  • example is an array of 100 rows by 100 columns, giving 10000 individual beads or
  • the number of articles or beads produced exceeds thousands and most
  • the medium applied via the or each printing screen is a
  • Bonding of the medium may be by way of drying, heating, firing, or
  • UV ultra violet
  • Uniquely labelled articles are preferably smaller than 10 mm x 10 mm, preferably as
  • photomask to define a first set of unique low order indicia at first locations on the
  • indicia and high order indicia are unique for each article and disassembling the substrate
  • Labelled articles may be formed using for example, screen printing then different codes
  • a third photomask is used in conjunction with said first (low order) photomask
  • the third photomask is termed a middle order
  • first and second middle order photomasks are used. In this case the high
  • Photomasks are preferably of the type used in photolithography. In addition, further processing of the material used in photolithography.
  • middle order photomasks may be used. Typically middle order photomasks comprise
  • indicia which may be, for example, numerals 0-9, located at different positions thereon.
  • Indicia may be located at an orientation corresponding to a lower, left hand corner of a
  • any of 100000 bead positions with an array of 100 x 100 rows and columns of articles any of 100000 bead positions with an array of 100 x 100 rows and columns of articles.
  • a set of 100 photomasks each having a number in the range 00-99 may be
  • Each photomask pattern is configured so that the area of
  • photomasks may be rotatable with respect to a substrate.
  • a reversal bake of the substrate is preferably performed. This baking
  • Wafers may be divided into lots after an exposure. All wafers in each of these lots are
  • the middle order photomasks are
  • a second reversal bake may be performed.
  • Wafers are then re-arranged in a combinatorial fashion to form for example 10 lots of 10
  • reversal bake is preferably performed. Following this reversal bake wafers are preferably
  • each wafer carrying a unique pattern or code.
  • Figure 1 shows a diagrammatic sectional view of a sketch of a screen printing apparatus
  • Figures 2 a to e show diagrammatically successive views illustrating a method of
  • Figure 3 is a diagrammatic view of an alternative apparatus for producing uniquely
  • Figure 4 is a diagrammatic view of an article, showing an overlay of an active area using
  • Figure 5 is a diagrammatic view of the article in Figure 4, showing an overlay of an
  • Figure 6 is a diagrammatic view of the article in Figure 4, showing an overlay of an
  • Figure 7 is a diagrammatic view of the article in Figure 4 showing an overlay of an active area and a second middle order photomask;
  • Figure 8 is a diagrammatic view of the article of Figure 4 carrying the final label
  • Tile or substrate 10 defines a substrate from which articles or beads 12 are to be formed.
  • a first printing screen 24 overlays the tile 10.
  • Screen 24 has defined in it a plurality of
  • Each gap or aperture represents a
  • recognisable code such as, for example, a decimal digit or group of digits.
  • each screen is by way of a mechanical rest or other well know technique.
  • Paste 20 is applied to the surface of screen 24 and a squeegee 22 is drawn across the
  • Paste 20 is sufficiently viscous to
  • a subsequent screen also having locators (to enable registration of each
  • Fresh paste 20 (which may be
  • Tile 10 is then used to produce beads, for example, by laser cutting or "dicing" the tile
  • Tile 10 conveniently is sized such it comprises an array of 10,000 of the beads.
  • the paste may be rendered permanent by a firing, sintering or curing cycle or exposing it
  • the paste 20 may comprise materials which may be screen printed: these include
  • Some pastes 20 have useful chemical activities such as acting as
  • catalysts include platinum or palladium bearing film.
  • First screen 24 has an
  • screen 14 is arranged such that no paste 20 is printed.
  • Screen 24 is termed the "high order
  • the high order screen 24 also has on its surface, (preferably in an area within 10
  • locators or a set of
  • Tile or substrate 10 is then exposed in a first printing stage to transfer the pattern or
  • indicia of the high order screen 24 are transferred as a set of printed paste
  • the set of paste features 20 are then dried for example in an infra red tunnel
  • tiles 10 may also be sintered or fired.
  • the next stage is to print or expose the tiles 10 using a so-called "low-order screen" 15.
  • the low-order screen 15 bears encodings "—,—,-0,000" to "—,—,-9,999".
  • encoding patterns are arranged so that one low-order code section aligns against each bead position. Again the labels defined by paste 20 marks are dried and optionally fired
  • each of the tiles 10 bears a set of encodings
  • paste 20 can be dried or fired to a final permanent form.
  • each tile is exposed to a unique pairing of screens at the final exposure
  • a bead 10 is defined; the bead 10 may be anything between approximately 250 ⁇ m-
  • binary codes such as a two dimensional (2-D) bar code.
  • 2-D two dimensional bar code
  • a set of 1,000,000,000,000 unique numbers (0-999,999,999,999) requires 12 digits for
  • fabrication comprises a glass disc or silicon wafer of order 150 mm diameter.
  • the disc or silicon wafer of order 150 mm diameter.
  • a first photomask 14, termed hereinafter the low order photomask, has a series of
  • each bead for example in the lower, right hand corner of one face of the
  • Exposure of a substrate coated with a metalisation layer acts as a support on which
  • AZ5214E photoresist manufactured by Hoechst may be used for this purpose.
  • Photoresist 16 is a positive working resist, capable of high resolution, in which the action
  • UV light from a source 18 generates radicals which are soluble in developer, but
  • photoresist 16 may be "reversed" in its action from positive to
  • Figure 8 shows diagrammatically a composite overlay of an active area of exposure fields
  • a single photomask 14 is manufactured for each
  • sets of 10,000,000 beads may be
  • the low order photomask is relatively difficult to manufacture, and therefore expensive
  • each position has a different code. Its entire area is written by, for example, an
  • step-and-repeat patterning can be utilised to facilitate their fabrication if this is desired.
  • a further advantage is that, provided
  • the first photomask stage uses an exposure unit able to image substantially the whole of
  • the substrate at any one time then, the remaining stages are compatible with the use of a
  • wafer stepper (reticle) exposure system reticle
  • the beads are to be produced initially in the form of a "large" flat
  • substrate conveniently is sized so that it comprises an array of 10,000 of the beads.
  • a presently preferred resist is AZ5214E which is
  • All of the substrates are then exposed in a first exposure stage to transfer the pattern of
  • the "low-order plate” as a latent image in the resist.
  • Said low-order plate is designed so
  • Figure 8 shows a cell of the high order plate.
  • AZ5214E resist may be made of a useful property of the AZ5214E resist which is presently preferred.
  • Exposed areas of this resist may be "reversed" (i.e. rendered substantially insoluble to
  • the bake may marginally impair the sensitivity
  • image "fixing” includes development of the image or a reversal process or
  • Each substrate may be exposed to a separate mask, using 100 masks bearing the
  • example substrates 0-9 are exposed to — , — ,-0-, — , 10-19 to — , — ,-1-, — and so on
  • the substrates are then re-divided into 10 lots in this case being for
  • Dicing of the beads may be achieved by laser cutting or chemical
  • correction codes relating to groups of symbols especially the high-order and low-order

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne un appareil et un procédé permettant de marquer un grand nombre (normalement plus de 106) d'articles (12). Normalement, 10000 articles (12) sont définis sur un substrat (10) selon une matrice de 100 rangées et de 100 colonnes. Selon un procédé, on fait appel à une technique de sérigraphie et à un masque pour former une marque unique sur chaque article du substrat (10). Plusieurs substrats (10) peuvent être formés de cette façon. Une seconde, éventuellement une troisième et encore d'autres marques sont ensuite appliquées sur tous les articles (12) définis sur un substrat (10). Une marque différente est appliquée sur tous les articles (12) définis sur un substrat (10) différent. Il en résulte qu'un nombre très élevé d'articles (12) uniques sont fabriqués rapidement et relativement simplement. Selon un autre procédé, on fait appel à une technique de photolithographie. Les deux procédés différents peuvent être combinés. Les substrats (10) sont découpés en cubes ou en article (12) portant un marquage unique et peuvent être utilisés en chimie combinatoire. Grâce à l'invention, on a résolu les problèmes associés aux systèmes de l'art antérieur, par le fait qu'un grand nombre d'articles (12) marqués peuvent être fabriqués en moins d'étapes.
EP99910489A 1998-03-13 1999-03-15 Appareil et procede pour la production d'une pluralite d'articles marques de fa on unique Withdrawn EP1062034A1 (fr)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
GBGB9805510.6A GB9805510D0 (en) 1998-03-13 1998-03-13 Apparatus for and method of manufacturing a plurality of uniquely labelled articles
GB9805512 1998-03-13
GB9805510 1998-03-13
GB9805508 1998-03-13
GBGB9805512.2A GB9805512D0 (en) 1998-03-13 1998-03-13 Apparatus for and method of manufacturing a plurality of uniquely labelled articles
GBGB9805508.0A GB9805508D0 (en) 1998-03-13 1998-03-13 Apparatus for and method of manufacturing a plurality of uniquely labelled articles
PCT/GB1999/000762 WO1999047254A1 (fr) 1998-03-13 1999-03-15 Appareil et procede pour la production d'une pluralite d'articles marques de façon unique

Publications (1)

Publication Number Publication Date
EP1062034A1 true EP1062034A1 (fr) 2000-12-27

Family

ID=27269243

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99910489A Withdrawn EP1062034A1 (fr) 1998-03-13 1999-03-15 Appareil et procede pour la production d'une pluralite d'articles marques de fa on unique

Country Status (3)

Country Link
EP (1) EP1062034A1 (fr)
CA (1) CA2323880A1 (fr)
WO (1) WO1999047254A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7015047B2 (en) 2001-01-26 2006-03-21 Aviva Biosciences Corporation Microdevices having a preferential axis of magnetization and uses thereof
US7811768B2 (en) 2001-01-26 2010-10-12 Aviva Biosciences Corporation Microdevice containing photorecognizable coding patterns and methods of using and producing the same
CN100404692C (zh) 2001-05-11 2008-07-23 松下电器产业株式会社 生物分子基底,使用它的检验和诊断方法及装置
WO2016042508A1 (fr) * 2014-09-17 2016-03-24 Coding Management S.A. Procédé de fabrication d'étiquette tissée, contenant une information unique, lisible électroniquement

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4343877A (en) * 1981-01-02 1982-08-10 Amdahl Corporation System for design and production of integrated circuit photomasks and integrated circuit devices
US4613230A (en) * 1981-05-06 1986-09-23 Tokyo Shibaura Denki Kabushiki Kaisha Wafer exposure apparatus
JPH0434541Y2 (fr) * 1986-03-03 1992-08-17
JPH01241815A (ja) * 1988-03-24 1989-09-26 Seiko Epson Corp 半導体装置のチップ識別方法
US5314829A (en) * 1992-12-18 1994-05-24 California Institute Of Technology Method for imaging informational biological molecules on a semiconductor substrate
GB9521943D0 (en) * 1995-10-26 1996-01-03 Univ Hertfordshire Coded particles for process sequence tracking in combinatorial compound library preparation

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO9947254A1 *

Also Published As

Publication number Publication date
CA2323880A1 (fr) 1999-09-23
WO1999047254A1 (fr) 1999-09-23

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