EP1273682A4 - Forage de trou par laser dans une t le de cuivre - Google Patents

Forage de trou par laser dans une t le de cuivre

Info

Publication number
EP1273682A4
EP1273682A4 EP01917661A EP01917661A EP1273682A4 EP 1273682 A4 EP1273682 A4 EP 1273682A4 EP 01917661 A EP01917661 A EP 01917661A EP 01917661 A EP01917661 A EP 01917661A EP 1273682 A4 EP1273682 A4 EP 1273682A4
Authority
EP
European Patent Office
Prior art keywords
copper foil
laser
hole drilling
laser hole
drilling copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP01917661A
Other languages
German (de)
English (en)
Other versions
EP1273682A1 (fr
Inventor
Masaru Sakamoto
Kouji Kitano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mining Holdings Inc
Original Assignee
Nikko Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000103505A external-priority patent/JP3330925B2/ja
Application filed by Nikko Materials Co Ltd filed Critical Nikko Materials Co Ltd
Publication of EP1273682A1 publication Critical patent/EP1273682A1/fr
Publication of EP1273682A4 publication Critical patent/EP1273682A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0026Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
    • H05K3/0038Etching of the substrate by chemical or physical means by laser ablation of organic insulating material combined with laser drilling through a metal layer
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/384Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0355Metal foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03Metal processing
    • H05K2203/0307Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703Plating
    • H05K2203/0723Electroplating, e.g. finish plating

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Laminated Bodies (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Abstract

Cette invention a trait à une tôle de cuivre dans laquelle a été foré un trou par laser. Dans le cadre de ce procédé, au moins la surface de pénétration du laser dans la tôle de cuivre est recouverte d'au moins un type de métal comprenant du cuivre afin de former sur ladite surface un revêtement dont les particules ont une taille comprise entre 0,01 et 3 νm. Cette tôle de cuivre, facile usiner au laser, se prête bien à la fabrication de trous de connexion intercouche de petit diamètre. Il est possible d'obtenir la tôle de cuivre selon l'invention en apportant des améliorations à la surface d'une tôle de cuivre au moment de la production d'une carte à circuit imprimé.
EP01917661A 2000-04-05 2001-03-30 Forage de trou par laser dans une t le de cuivre Withdrawn EP1273682A4 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000103505 2000-04-05
JP2000103505A JP3330925B2 (ja) 2000-04-05 2000-04-05 レーザー穴開け用銅箔
PCT/JP2001/002706 WO2001077420A1 (fr) 2000-04-05 2001-03-30 Forage de trou par laser dans une tôle de cuivre

Publications (2)

Publication Number Publication Date
EP1273682A1 EP1273682A1 (fr) 2003-01-08
EP1273682A4 true EP1273682A4 (fr) 2003-04-16

Family

ID=26345056

Family Applications (1)

Application Number Title Priority Date Filing Date
EP01917661A Withdrawn EP1273682A4 (fr) 2000-04-05 2001-03-30 Forage de trou par laser dans une t le de cuivre

Country Status (3)

Country Link
EP (1) EP1273682A4 (fr)
CN (1) CN1388841A (fr)
WO (1) WO2001077420A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7476449B2 (en) * 2003-02-27 2009-01-13 Furukawa Circuit Foil Co., Ltd. Electromagnetic shielding copper foil, method of production thereof and electromagnetic shield
JP6346556B2 (ja) 2012-03-01 2018-06-20 三井金属鉱業株式会社 キャリア箔付銅箔、キャリア箔付銅箔の製造方法及びそのキャリア箔付銅箔を用いて得られるレーザー孔明け加工用の銅張積層板
CN106457205B (zh) 2014-07-22 2020-09-22 旭化成医疗株式会社 去除组蛋白的吸附材料和生物来源液体净化设备
CN111850628A (zh) * 2020-06-12 2020-10-30 九江德福科技股份有限公司 一种屏蔽阴极板的打孔铜箔制作方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0616489A1 (fr) * 1993-03-19 1994-09-21 Mitsui Mining & Smelting Co., Ltd. Laminé revêtu de cuivre et plaque à circuit imprimé
JPH0987888A (ja) * 1995-09-28 1997-03-31 Nikko Gould Foil Kk 印刷回路用銅箔の処理方法
JPH1018075A (ja) * 1996-06-28 1998-01-20 Nikko Gould Foil Kk 電解銅箔
EP0996318A2 (fr) * 1998-10-19 2000-04-26 Mitsui Mining & Smelting Co., Ltd. Nouvelle feuille composite, procédé de sa production et laminé revêtu de cuivre

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2717911B2 (ja) * 1992-11-19 1998-02-25 日鉱グールド・フォイル株式会社 印刷回路用銅箔及びその製造方法
JP2717910B2 (ja) * 1992-11-19 1998-02-25 日鉱グールド・フォイル株式会社 印刷回路用銅箔及びその製造方法
US5482784A (en) * 1993-12-24 1996-01-09 Mitsui Mining And Smelting Co., Ltd. Printed circuit inner-layer copper foil and process for producing the same
JP3612594B2 (ja) * 1998-05-29 2005-01-19 三井金属鉱業株式会社 樹脂付複合箔およびその製造方法並びに該複合箔を用いた多層銅張り積層板および多層プリント配線板の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0616489A1 (fr) * 1993-03-19 1994-09-21 Mitsui Mining & Smelting Co., Ltd. Laminé revêtu de cuivre et plaque à circuit imprimé
JPH0987888A (ja) * 1995-09-28 1997-03-31 Nikko Gould Foil Kk 印刷回路用銅箔の処理方法
JPH1018075A (ja) * 1996-06-28 1998-01-20 Nikko Gould Foil Kk 電解銅箔
EP0996318A2 (fr) * 1998-10-19 2000-04-26 Mitsui Mining & Smelting Co., Ltd. Nouvelle feuille composite, procédé de sa production et laminé revêtu de cuivre

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1997, no. 07 31 July 1997 (1997-07-31) *
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 05 30 April 1998 (1998-04-30) *
See also references of WO0177420A1 *

Also Published As

Publication number Publication date
WO2001077420A1 (fr) 2001-10-18
EP1273682A1 (fr) 2003-01-08
CN1388841A (zh) 2003-01-01

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