EP1276012A3 - Musterbildungsverfahren unter Verwendung eines Resists - Google Patents

Musterbildungsverfahren unter Verwendung eines Resists Download PDF

Info

Publication number
EP1276012A3
EP1276012A3 EP02254910A EP02254910A EP1276012A3 EP 1276012 A3 EP1276012 A3 EP 1276012A3 EP 02254910 A EP02254910 A EP 02254910A EP 02254910 A EP02254910 A EP 02254910A EP 1276012 A3 EP1276012 A3 EP 1276012A3
Authority
EP
European Patent Office
Prior art keywords
resist
resist film
pattern
patterning process
post
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP02254910A
Other languages
English (en)
French (fr)
Other versions
EP1276012A2 (de
EP1276012B1 (de
Inventor
Satoshi New Funct. Mat. Research Center Watanabe
Tomohiro New Funct. Mat. Research Ctr. Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of EP1276012A2 publication Critical patent/EP1276012A2/de
Publication of EP1276012A3 publication Critical patent/EP1276012A3/de
Application granted granted Critical
Publication of EP1276012B1 publication Critical patent/EP1276012B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
EP02254910.9A 2001-07-13 2002-07-12 Musterbildungsverfahren unter Verwendung eines Resists Expired - Lifetime EP1276012B1 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2001213015 2001-07-13
JP2001213015 2001-07-13
JP2001295653 2001-09-27
JP2001295653 2001-09-27
JP2002045588 2002-02-22
JP2002045588 2002-02-22

Publications (3)

Publication Number Publication Date
EP1276012A2 EP1276012A2 (de) 2003-01-15
EP1276012A3 true EP1276012A3 (de) 2003-03-19
EP1276012B1 EP1276012B1 (de) 2016-03-23

Family

ID=27347152

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02254910.9A Expired - Lifetime EP1276012B1 (de) 2001-07-13 2002-07-12 Musterbildungsverfahren unter Verwendung eines Resists

Country Status (4)

Country Link
US (1) US6878508B2 (de)
EP (1) EP1276012B1 (de)
KR (1) KR100636067B1 (de)
TW (1) TWI282036B (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6830866B2 (en) * 2001-06-15 2004-12-14 Shi-Etsu Chemical Co., Ltd. Resist composition and patterning process
KR100745064B1 (ko) * 2004-09-17 2007-08-01 주식회사 하이닉스반도체 상부 반사방지막 조성물 및 이를 이용한 반도체 소자의패턴 형성 방법
TWI332122B (en) * 2005-04-06 2010-10-21 Shinetsu Chemical Co Novel sulfonate salts and derivatives, photoacid generators, resist compositions and patterning process
US7396482B2 (en) * 2005-10-28 2008-07-08 Infineon Technologies Ag Post exposure resist bake
EP1780198B1 (de) * 2005-10-31 2011-10-05 Shin-Etsu Chemical Co., Ltd. Neuartige Fluorosulfonyloxyalkylsulfonatsalze und Derivate, Generatoren von Photosäure, Resistzusammensetzungen, sowie Musterübertragungsverfahren
EP1780199B1 (de) * 2005-10-31 2012-02-01 Shin-Etsu Chemical Co., Ltd. Neuartige Fluorohydroxyalkylsulfonsäuresalze und Derivate, Generatoren von Photosäure, Resistzusammensetzungen, sowie Musterübertragungsverfahren
JP5124806B2 (ja) * 2006-06-27 2013-01-23 信越化学工業株式会社 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
US8211984B2 (en) * 2006-07-21 2012-07-03 Mitsui Chemicals, Inc. Ring-opening metathesis polymer, hydrogenated product thereof, method for preparing the same, and use thereof
US7527912B2 (en) * 2006-09-28 2009-05-05 Shin-Etsu Chemical Co., Ltd. Photoacid generators, resist compositions, and patterning process
US9104107B1 (en) 2013-04-03 2015-08-11 Western Digital (Fremont), Llc DUV photoresist process
US20230130753A1 (en) * 2021-10-27 2023-04-27 Meta Platforms Technologies, Llc Gray-tone resists and processes

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11130844A (ja) * 1997-10-28 1999-05-18 Mitsui Chem Inc 酸分解性重合体及びその製造方法
JP2000109545A (ja) * 1998-06-29 2000-04-18 Mitsui Chemicals Inc 開環メタセシス重合体の水素添加物、その用途及びその製造方法
EP1004568A2 (de) * 1998-11-02 2000-05-31 Shin-Etsu Chemical Co., Ltd. Esterverbindungen, Polymere, Resistzusammensetzungen und Strukturierungsverfahren
US6207779B1 (en) * 1998-06-30 2001-03-27 Industrial Technology Research Institute Ring-opened polymer
EP1099983A1 (de) * 1999-11-12 2001-05-16 Shin-Etsu Chemical Co., Ltd. Chemisch verstärkte positiv arbeitende Resistzusammensetzung und Strukturierungsverfahren

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2881969B2 (ja) 1990-06-05 1999-04-12 富士通株式会社 放射線感光レジストとパターン形成方法
JP2898143B2 (ja) 1991-06-12 1999-05-31 三井化学株式会社 感光液組成物、感光性フィルム及び積層板
JPH05257285A (ja) 1992-03-12 1993-10-08 Fujitsu Ltd 放射線感光材料およびそれを用いるパターン形成方法
JPH06342212A (ja) 1993-04-07 1994-12-13 Matsushita Electric Ind Co Ltd 微細パターン形成用レジストおよび微細パターン形成方法
JPH07333850A (ja) 1994-06-14 1995-12-22 Sony Corp 感光性組成物
GB9509487D0 (en) * 1995-05-10 1995-07-05 Ici Plc Micro relief element & preparation thereof
JPH09230595A (ja) 1996-02-26 1997-09-05 Nippon Zeon Co Ltd レジスト組成物およびその利用
JP3691897B2 (ja) 1996-03-07 2005-09-07 富士通株式会社 レジスト材料及びレジストパターンの形成方法
WO1997033198A1 (en) 1996-03-07 1997-09-12 The B.F. Goodrich Company Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
JP3785726B2 (ja) 1997-03-12 2006-06-14 Ｊｓｒ株式会社 半導体デバイス製造用感放射線性樹脂組成物
JP3693477B2 (ja) 1997-10-28 2005-09-07 三井化学株式会社 開環メタセシス（共）重合体の水素添加物及びその製造方法
JP3678559B2 (ja) 1997-10-28 2005-08-03 三井化学株式会社 開環メタセシス（共）重合体の水素添加物及びその製造方法
JP3703277B2 (ja) 1997-12-12 2005-10-05 三井化学株式会社 酸解離性基を有する狭分散性重合体及びその製造方法
KR100510448B1 (ko) * 1998-01-13 2005-10-21 삼성전자주식회사 열적 흐름 공정을 이용한 반도체장치의 미세 포토레지스트 패턴형성방법
JP4131062B2 (ja) 1998-09-25 2008-08-13 信越化学工業株式会社 新規なラクトン含有化合物、高分子化合物、レジスト材料及びパターン形成方法
JP2000357544A (ja) 1999-04-16 2000-12-26 Idemitsu Kosan Co Ltd 色素増感型太陽電池
JP3901401B2 (ja) 1999-07-13 2007-04-04 三井化学株式会社 ポジ型フォトレジスト組成物およびパターン形成方法
KR100518993B1 (ko) * 2000-04-27 2005-10-06 신에쓰 가가꾸 고교 가부시끼가이샤 신규한 에스테르 화합물, 고분자 화합물, 레지스트 재료및 패턴 형성 방법
JP4365049B2 (ja) * 2000-10-20 2009-11-18 富士フイルム株式会社 サーマルフロー用化学増幅型ポジレジスト組成物を用いたパターン形成方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11130844A (ja) * 1997-10-28 1999-05-18 Mitsui Chem Inc 酸分解性重合体及びその製造方法
JP2000109545A (ja) * 1998-06-29 2000-04-18 Mitsui Chemicals Inc 開環メタセシス重合体の水素添加物、その用途及びその製造方法
US6372854B1 (en) * 1998-06-29 2002-04-16 Mitsui Chemicals, Inc. Hydrogenated ring-opening metathesis polymer and its use and production
US6207779B1 (en) * 1998-06-30 2001-03-27 Industrial Technology Research Institute Ring-opened polymer
EP1004568A2 (de) * 1998-11-02 2000-05-31 Shin-Etsu Chemical Co., Ltd. Esterverbindungen, Polymere, Resistzusammensetzungen und Strukturierungsverfahren
EP1099983A1 (de) * 1999-11-12 2001-05-16 Shin-Etsu Chemical Co., Ltd. Chemisch verstärkte positiv arbeitende Resistzusammensetzung und Strukturierungsverfahren

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Section Ch Week 199930, Derwent World Patents Index; Class A17, AN 1999-352899, XP002217910 *

Also Published As

Publication number Publication date
US20030108819A1 (en) 2003-06-12
KR100636067B1 (ko) 2006-10-20
EP1276012A2 (de) 2003-01-15
TWI282036B (en) 2007-06-01
KR20030032825A (ko) 2003-04-26
EP1276012B1 (de) 2016-03-23
US6878508B2 (en) 2005-04-12

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