EP1320118A2 - Réacteur pour le revêtement simultané des deux faces de verres de lunettes - Google Patents

Réacteur pour le revêtement simultané des deux faces de verres de lunettes Download PDF

Info

Publication number
EP1320118A2
EP1320118A2 EP02026291A EP02026291A EP1320118A2 EP 1320118 A2 EP1320118 A2 EP 1320118A2 EP 02026291 A EP02026291 A EP 02026291A EP 02026291 A EP02026291 A EP 02026291A EP 1320118 A2 EP1320118 A2 EP 1320118A2
Authority
EP
European Patent Office
Prior art keywords
coating
gas supply
substrate
microwave energy
evacuating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP02026291A
Other languages
German (de)
English (en)
Other versions
EP1320118B1 (fr
EP1320118A3 (fr
Inventor
Lars Dr. Bewig
Thomas Küpper
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schott AG
Original Assignee
Schott AG
Carl Zeiss AG
Schott Glaswerke AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schott AG, Carl Zeiss AG, Schott Glaswerke AG filed Critical Schott AG
Publication of EP1320118A2 publication Critical patent/EP1320118A2/fr
Publication of EP1320118A3 publication Critical patent/EP1320118A3/fr
Application granted granted Critical
Publication of EP1320118B1 publication Critical patent/EP1320118B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge

Definitions

  • Coating reactors are known for coating substrates become, with a bottom part, a lid part and side walls, one Feed line for gaseous media into the interior of the coating reactor as well as microwave windows for coupling RF energy or Microwave energy that is used to ignite a plasma inside the reactor becomes.
  • the microwave energy is preferably pulsed Microwave energy.
  • An apparatus and a method for coating a Substrate using pulsed microwave energy is, for example, in DE 38 30 249 C2.
  • DE 44 14 0831 A1 describes a device for producing thin layers on plastic substrates by means of vapor deposition Low pressure plasma with two diametrically opposed ones Sources and a coating chamber in which the substrates between the Areas of impact of both sources are known.
  • a disadvantage of all devices according to the prior art is that inhomogeneous layers are deposited, especially in the Marginal areas, the coating conditions of the substrate to be coated vary to be coated substrate and were therefore difficult to reproduce and the volume of such reactors has been relatively large, so that Gas change times and thus the process times were relatively long.
  • Another The disadvantage of the devices according to the prior art was that Fluctuations in layer thickness could not be avoided.
  • the object of the invention is therefore a device for coating Specify substrates that avoids the disadvantages mentioned above.
  • the object is achieved by a device according to claim 1 solved, which is characterized in that the waveguide for coupling Microwave energy, gas supply device and the device for evacuation of the coating space are arranged coaxially to one another.
  • Particularly easy loading of the coating reactor or Coating room with a substrate to be coated results if the Device for coating substrates from two sub-devices, each with a waveguide for coupling microwave energy, one Gas supply device and a device for evacuating the Coating room is executed and the first and second sub-device are movable against each other, with a through the method Coating room can be opened or closed.
  • the Coating room itself is one from the device for coating Device removable from substrates, which advantageously has two connections for Gas supply and two connections for evacuating the coating room and microwave windows for coupling in microwave energy.
  • Such a replaceable coating room has the advantage that reproducible coating ratios for each substrate to be coated available.
  • the microwave window are preferably part of the coating room itself, before each new one Coating can be exchanged.
  • the invention thus establishes that the coating conditions are reproducible for everyone Coating process of a lens can be adjusted.
  • the Coating room according to the invention can be used as a disposable room, that is as Coating space which is discarded after each coating has been applied, be trained. Alternatively, it can be provided after the coating room clean every coating so that one is on the microwave windows precipitating coating is removed after each coating.
  • the coating space is in the form of a tube is executed, wherein the first and the second gas supply device and the first and second means for evacuating the coating room are arranged opposite to each other, in a tubular Coating room mainly coaxial to the pipe axis.
  • a tubular Coating space has the advantage that it is rotationally shaped and the same Has symmetry like the object to be coated. This will create a achieved particularly uniform coating.
  • the invention is not based on tubular or rotationally symmetrical Coating rooms limited, other geometries are also possible.
  • the substrate to be coated is an eyeglass or a lens substrate.
  • the device 1 shows a device 1 according to the invention for coating a Substrate 3, in the present case a curved substrate 3, for example a lens or an eyeglass substrate is shown.
  • the device 1 consists of two Sub-devices 3, 5, which can be moved in the direction of the tube axis A.
  • Each of the two sub-devices 3, 5 comprises a waveguide 6 with openings 7.1, 7.2 for coupling microwave or radio frequency energy from one Microwave or high frequency generator, not shown. Furthermore points each of the two sub-devices has a tubular vacuum connection 9.1, 9.2 on.
  • the coating reactor 10 in to which the substrate 3 to be coated is inserted, connected and a Pump for evacuating the coating room 10. The pump for Evacuation of the coating room 10 is not shown here.
  • Within of the tubular vacuum connection runs coaxially to the tube axis Gas supply line 12.1.
  • the coating space 10 is essentially like the vacuum connection 9.1, 9.2 tubular. He can through the opening 14 when pulled apart Sub-devices, as shown in Figure 1, in the coating device be inserted.
  • the coating room 10 comprises connections 9.3 and 9.4 which with the vacuum connections 9.1 and 9.2 a vacuum-tight connection form.
  • Coating space 10 also includes two gas supply connections 12.3 and 12.4, which with the coating chamber 10 inserted Gas supply lines 12.1 and 12.2 also a vacuum-tight connection form.
  • the microwave energy is transferred into the coating room 10, for example Microwave window 16.1 and 16.2 coupled.
  • Coating room 10 can be removed. For example, this leaves the Cleaning the co-coated after each coating process Microwave window too.
  • it can also be used for each spectacle lens to be coated a new coating room can be used. That way you can the same coating conditions are always ensured.
  • FIG. 10 clearly shows that when the two sub-devices move together in the coaxial direction are, the vacuum connections 9.3 and 9.4 of the coating chamber 10 with the Vacuum connections 9.1 and 9.2 of the first and second sub-devices Form a tight connection, as well as the gas supply lines 12.3 and 12.4 with the gas supply lines 12.1 and 12.2 of the first and second sub-devices.
  • the coaxial arrangement of the gas supply line can also be clearly seen in FIG for vacuum connection.
  • the ends Gas supply lines on opposite sides of the substrate so that a very uniform introduction of the gas into the reactor space is ensured and thereby a more homogeneous coating compared to the prior art of the substrate is guaranteed.
  • the microwave energy is coupled in via the waveguide 6 with the openings 7.1, 7.2 from a microwave source located outside the device 1.
  • the waveguide 6 is arranged coaxially with the largely tubular vacuum connection 9.1, 9.2 and with the coating chamber.
  • the waveguide 6, into which the microwave energy is coupled in via the openings 7.1, 7.2, like the tubular coating space 10, which is also referred to as the coating reactor, can be designed to be rotationally symmetrical, for example as a tube that surrounds the coating space. Other configurations are also possible without departing from the invention.
  • the microwave energy supplied via the waveguide 6 into the coating reactor or the coating chamber is coupled into the coating space 10, in which the substrate 3 is located, via microwave windows 16.1, 16.2.
  • the coating is preferably carried out by means of the PICVD method, as disclosed for example in DE 38 30 249 C2.
  • the gas of a gas atmosphere and a precursor gas are first introduced into the interior of the coating reactor 10 via the gas supply lines 12.1, 12.2, 12.3 and 12.4.
  • a plasma is then ignited in the interior of the coating reactor 10 by means of coupled-in energy, for example HF energy or microwave energy.
  • the plasma is ignited with the aid of the microwave energy supplied via the waveguide structure 6.
  • the microwave energy supplied via the waveguide 6 is coupled into the interior of the reactor via the electrical windows 16.1, 16.2. As described above, microwave energy is pulsed microwave energy.
  • the advantage of a pulsed plasma lies in the substantially lower thermal load on the substrate to be coated, which is preferably a plastic material.
  • the excitation of the plasma by pulsed microwave radiation allows coating with alternating layers or gradient layers, as disclosed, for example, in US Pat. No. 5,736,207.
  • the precursor gases introduced into the interior of the three-dimensional hollow body or the reactor can comprise, for example, HMDSN, HMDSO or TiCl 4 .
  • An O 2 atmosphere, an N 2 atmosphere or an N 2 + NH 3 atmosphere are conceivable as the gas atmosphere.
  • the substrate can be provided on all sides with a coating such as, for example, a SiO x , a Ti0 x or a Si0 x or a Si x N y coating, preferably with a thickness in the range from 10 to 10,000 nm.
  • a coating such as, for example, a SiO x , a Ti0 x or a Si0 x or a Si x N y coating, preferably with a thickness in the range from 10 to 10,000 nm.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Surface Treatment Of Glass (AREA)
  • Plasma Technology (AREA)
  • Eyeglasses (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Photovoltaic Devices (AREA)
  • Physical Vapour Deposition (AREA)
EP02026291A 2001-12-13 2002-11-27 Réacteur pour le revêtement simultané des deux faces de verres de lunettes Expired - Lifetime EP1320118B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10161469A DE10161469A1 (de) 2001-12-13 2001-12-13 Volumenoptimierter Reaktor zur beidseitig gleichzeitigen Beschichtung von Brillengläsern
DE10161469 2001-12-13

Publications (3)

Publication Number Publication Date
EP1320118A2 true EP1320118A2 (fr) 2003-06-18
EP1320118A3 EP1320118A3 (fr) 2005-03-30
EP1320118B1 EP1320118B1 (fr) 2006-12-27

Family

ID=7709199

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02026291A Expired - Lifetime EP1320118B1 (fr) 2001-12-13 2002-11-27 Réacteur pour le revêtement simultané des deux faces de verres de lunettes

Country Status (6)

Country Link
US (1) US7533628B2 (fr)
EP (1) EP1320118B1 (fr)
JP (1) JP3943010B2 (fr)
AT (1) ATE349771T1 (fr)
CA (1) CA2414390A1 (fr)
DE (2) DE10161469A1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004030344B4 (de) * 2004-06-18 2012-12-06 Carl Zeiss Vorrichtung zum Beschichten optischer Gläser mittels plasmaunterstützter chemischer Dampfabscheidung (CVD)
WO2007024134A1 (fr) * 2005-08-26 2007-03-01 Fujifilm Manufacturing Europe B.V. Procede et installation pour la production et le controle de plasma de decharge
JP2009538989A (ja) * 2006-05-30 2009-11-12 フジフィルム マニュファクチャリング ユーロプ ビー．ブイ． パルス化大気圧グロー放電を使用する堆積の方法及び装置
US20090324971A1 (en) * 2006-06-16 2009-12-31 Fujifilm Manufacturing Europe B.V. Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma
DE102006045704A1 (de) * 2006-09-27 2008-04-03 Osram Opto Semiconductors Gmbh Optisches Element und optoelektronisches Bauelement mit solch einem optischen Element
US8338307B2 (en) * 2007-02-13 2012-12-25 Fujifilm Manufacturing Europe B.V. Substrate plasma treatment using magnetic mask device
US20100255625A1 (en) * 2007-09-07 2010-10-07 Fujifilm Manufacturing Europe B.V. Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma
US20090159104A1 (en) * 2007-12-19 2009-06-25 Judy Huang Method and apparatus for chamber cleaning by in-situ plasma excitation
WO2009096785A1 (fr) * 2008-02-01 2009-08-06 Fujifilm Manufacturing Europe B.V. Procédé et appareil de traitement de surface par plasma sur un substrat mouvant
ATE523067T1 (de) * 2008-02-08 2011-09-15 Fujifilm Mfg Europe Bv Verfahren zur herstellung einer mehrschichtigen stapelstruktur mit verbesserter wvtr- grenzeigenschaft
FI20115073A0 (fi) 2011-01-26 2011-01-26 Beneq Oy Laitteisto, menetelmä ja reaktiokammio

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3830249A1 (de) * 1988-09-06 1990-03-15 Schott Glaswerke Plasmaverfahren zum beschichten ebener substrate
EP0753082B1 (fr) * 1994-03-29 1999-07-07 Schott Glas Procede plasma-cvd de revetement de substrats bombes
DE4414083C2 (de) * 1994-04-22 2000-01-20 Leybold Ag Vorrichtung zum Herstellen dünner Schichten auf Kunststoff-Substraten und zum Ätzen solcher Substrate
DE4438359C2 (de) * 1994-10-27 2001-10-04 Schott Glas Behälter aus Kunststoff mit einer Sperrbeschichtung
JP3225855B2 (ja) * 1996-06-06 2001-11-05 株式会社島津製作所 薄膜形成装置
JP3944946B2 (ja) * 1997-04-25 2007-07-18 株式会社島津製作所 薄膜形成装置

Also Published As

Publication number Publication date
EP1320118B1 (fr) 2006-12-27
HK1056645A1 (en) 2004-02-20
US20030148041A1 (en) 2003-08-07
DE10161469A1 (de) 2003-07-03
ATE349771T1 (de) 2007-01-15
US7533628B2 (en) 2009-05-19
JP2003239075A (ja) 2003-08-27
JP3943010B2 (ja) 2007-07-11
EP1320118A3 (fr) 2005-03-30
DE50209069D1 (de) 2007-02-08
CA2414390A1 (fr) 2003-06-13

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