EP1478682A4 - Couches antireflets pour photolithographie et procedes de preparation associes - Google Patents

Couches antireflets pour photolithographie et procedes de preparation associes

Info

Publication number
EP1478682A4
EP1478682A4 EP02793921A EP02793921A EP1478682A4 EP 1478682 A4 EP1478682 A4 EP 1478682A4 EP 02793921 A EP02793921 A EP 02793921A EP 02793921 A EP02793921 A EP 02793921A EP 1478682 A4 EP1478682 A4 EP 1478682A4
Authority
EP
European Patent Office
Prior art keywords
photolithography
preparation
methods
reflective coatings
coatings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP02793921A
Other languages
German (de)
English (en)
Other versions
EP1478682A1 (fr
Inventor
Teresa Baldwin
Joseph Kennedy
Nancy Iwamoto
Tadashi Nakano
William Bedwell
Jason Stuck
Mello Hebert
Arlene Suedmeyer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/US2001/045306 external-priority patent/WO2003044600A1/fr
Priority claimed from US10/001,143 external-priority patent/US6824879B2/en
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Publication of EP1478682A1 publication Critical patent/EP1478682A1/fr
Publication of EP1478682A4 publication Critical patent/EP1478682A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Paints Or Removers (AREA)
EP02793921A 2001-11-15 2002-11-12 Couches antireflets pour photolithographie et procedes de preparation associes Withdrawn EP1478682A4 (fr)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
PCT/US2001/045306 WO2003044600A1 (fr) 2001-11-15 2001-11-15 Revetements antireflets conçus pour etre deposes par rotation pour la photolithographie
WOPCT/US01/45306 2001-11-15
US10/001,143 US6824879B2 (en) 1999-06-10 2001-11-15 Spin-on-glass anti-reflective coatings for photolithography
US1143 2001-11-15
PCT/US2002/036327 WO2003044078A1 (fr) 2001-11-15 2002-11-12 Couches antireflets pour photolithographie et procedes de preparation associes

Publications (2)

Publication Number Publication Date
EP1478682A1 EP1478682A1 (fr) 2004-11-24
EP1478682A4 true EP1478682A4 (fr) 2005-06-15

Family

ID=26668624

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02793921A Withdrawn EP1478682A4 (fr) 2001-11-15 2002-11-12 Couches antireflets pour photolithographie et procedes de preparation associes

Country Status (3)

Country Link
EP (1) EP1478682A4 (fr)
AU (1) AU2002359387A1 (fr)
WO (1) WO2003044078A1 (fr)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003502449A (ja) 1999-06-10 2003-01-21 ハネウエル・インターナシヨナル・インコーポレーテツド フォトリソグラフィ用スピンオンガラス反射防止コーティング
WO2004092840A1 (fr) * 2003-04-17 2004-10-28 Nissan Chemical Industries, Ltd. Film sous-jacent poreux et composition filmogene servant a former ledit film sous-jacent
US7060637B2 (en) 2003-05-12 2006-06-13 Micron Technology, Inc. Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials
ATE377036T1 (de) 2003-05-23 2007-11-15 Dow Corning Siloxan-harz basierte anti- reflektionsbeschichtung mit hoher nassätzgeschwindigkeit
TW200523298A (en) 2003-08-04 2005-07-16 Honeywell Int Inc Coating composition optimization for via fill and photolithography applications and methods of preparation thereof
US8101015B2 (en) * 2003-10-07 2012-01-24 Honeywell International Inc. Coatings and hard mask compositions for integrated circuit applications methods of production and uses thereof
KR20050040275A (ko) * 2003-10-28 2005-05-03 삼성전자주식회사 절연막 형성용 조성물 및 이를 이용한 절연막 또는 절연막패턴의 형성방법
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US8901268B2 (en) 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
DE602005008100D1 (de) 2004-12-17 2008-08-21 Dow Corning Verfahren zur ausbildung einer antireflexionsbeschichtung
ATE486098T1 (de) 2004-12-17 2010-11-15 Dow Corning Siloxanharzbeschichtung
US20060183055A1 (en) * 2005-02-15 2006-08-17 O'neill Mark L Method for defining a feature on a substrate
CN101371196B (zh) 2006-02-13 2012-07-04 陶氏康宁公司 抗反射涂料
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
WO2009088600A1 (fr) 2008-01-08 2009-07-16 Dow Corning Toray Co., Ltd. Résines de silsesquioxane
KR20100114075A (ko) 2008-01-15 2010-10-22 다우 코닝 코포레이션 실세스퀴옥산 수지
US8859673B2 (en) 2008-02-25 2014-10-14 Honeywell International, Inc. Processable inorganic and organic polymer formulations, methods of production and uses thereof
CN101990551B (zh) 2008-03-04 2012-10-03 陶氏康宁公司 倍半硅氧烷树脂
KR101541939B1 (ko) 2008-03-05 2015-08-04 다우 코닝 코포레이션 실세스퀴옥산 수지
US7955782B2 (en) 2008-09-22 2011-06-07 Honeywell International Inc. Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US9366964B2 (en) * 2011-09-21 2016-06-14 Dow Global Technologies Llc Compositions and antireflective coatings for photolithography
JP6196194B2 (ja) 2014-08-19 2017-09-13 信越化学工業株式会社 紫外線吸収剤、レジスト下層膜形成用組成物、及びパターン形成方法
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
FI128886B (en) 2019-02-25 2021-02-26 Pibond Oy Functional hydrogen silsesquioxane resins and the use thereof
CN116500863B (zh) * 2022-01-18 2026-02-27 上海艾深斯科技有限公司 组合的ARC和Si基硬掩模薄膜的组合物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000077575A1 (fr) * 1999-06-10 2000-12-21 Alliedsignal Inc. Enduit antireflet spin-on-glass pour photolithographie
WO2001064804A1 (fr) * 2000-02-28 2001-09-07 Adsil, Lc Compositions de revetement a base de silane articles a revetement obtenus avec ces compositions et utilisations de ceux-ci
WO2002006402A1 (fr) * 2000-07-17 2002-01-24 Honeywell International Inc. Composes absorbants pour couches antireflet sog de photolithographie
EP1197511A1 (fr) * 2000-10-10 2002-04-17 Shipley Company LLC Composition antireflet

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW354392B (en) * 1996-07-03 1999-03-11 Du Pont Photomask blanks

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000077575A1 (fr) * 1999-06-10 2000-12-21 Alliedsignal Inc. Enduit antireflet spin-on-glass pour photolithographie
WO2001064804A1 (fr) * 2000-02-28 2001-09-07 Adsil, Lc Compositions de revetement a base de silane articles a revetement obtenus avec ces compositions et utilisations de ceux-ci
WO2002006402A1 (fr) * 2000-07-17 2002-01-24 Honeywell International Inc. Composes absorbants pour couches antireflet sog de photolithographie
EP1197511A1 (fr) * 2000-10-10 2002-04-17 Shipley Company LLC Composition antireflet

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO03044078A1 *

Also Published As

Publication number Publication date
EP1478682A1 (fr) 2004-11-24
WO2003044078A1 (fr) 2003-05-30
AU2002359387A1 (en) 2003-06-10
WO2003044078A9 (fr) 2004-01-08

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