EP1735788A2 - Aufzeichnungssystem mit speicherschicht und mikrospitzen-array - Google Patents

Aufzeichnungssystem mit speicherschicht und mikrospitzen-array

Info

Publication number
EP1735788A2
EP1735788A2 EP05753714A EP05753714A EP1735788A2 EP 1735788 A2 EP1735788 A2 EP 1735788A2 EP 05753714 A EP05753714 A EP 05753714A EP 05753714 A EP05753714 A EP 05753714A EP 1735788 A2 EP1735788 A2 EP 1735788A2
Authority
EP
European Patent Office
Prior art keywords
memory layer
micro
microtips
electrode
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP05753714A
Other languages
English (en)
French (fr)
Inventor
Serge Gidon
Olivier Lemonnier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of EP1735788A2 publication Critical patent/EP1735788A2/de
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C23/00Digital stores characterised by movement of mechanical parts to effect storage, e.g. using balls; Storage elements therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic

Definitions

  • the invention relates to a recording system comprising a recording medium comprising a memory layer capable of storing information and a device for reading and / or writing information comprising a network of microdots arranged in a common plane opposite the memory layer, the recording medium comprising at least a first electrode and the reading and / or writing device comprising at least a second electrode, the first electrode being arranged facing the second electrode, the system comprising control means the distance separating the recording medium from the reading and / or writing device by applying a potential difference between the first and second electrodes.
  • microtips In the field of ultra high density data recording by microtips, the information is written and read by means of microtips on memory areas of nanometric size, for example of 20 ⁇ 20 nm 2 .
  • a network of micro-tips is used in contact or quasi-contact with the surface of the media to locally modify the properties.
  • the difference between two tips is for example of the order of 100 micrometers.
  • the contact forces must be very low, of the order of nano-Newton, so as not to damage either the micro-tips or the surface of the medium, which is difficult to control.
  • the system generally includes an actuator for the relative lateral movement of the media with respect to the micro-tips, allowing the micro-tips to access the different memory areas.
  • the Millipede ® technique from IBM (“The Millipede - More than one thousand tips for future AFM data storage" by P. Vettiger et al. In IBM J. Res. Develop., Vol. 44, No. 3, May 2000 ) describes micro-tips arranged on a network of cantilevers making it possible to press the micro-tips with a pressing force linked to the bending of the cantilevers. This force then depends on the height of a micro-tip, cantilever included, which can vary from one micro-tip to another. The average value of the support force is related to the distance between the cantilever network and the media. In the event of temperature drift, the force cannot be adapted or controlled.
  • the document WO96 / 1 1472 describes a memory device comprising a memory substrate comprising a memory medium formed on its surface.
  • the memory device includes a probe device having a plurality of probes having conductive needles and probe drive circuits.
  • the circuits are formed, by a monolithic semiconductor type process, near the probes on the device for probing.
  • the device for probing is divided into cells each comprising a needle and one of the drive circuits.
  • the needles are arranged in a common plane opposite the memory substrate.
  • Each cell of the device for probing may include auxiliary electrodes, for example having fins parallel to the substrate.
  • the auxiliary electrodes are arranged opposite the substrate.
  • the substrate has an electrode formed on a face opposite the opposite face of the probe device.
  • An electrostatic attraction force is established between the auxiliary electrodes and the formed electrode on the substrate, via the probe drive circuits.
  • the probes are thus controlled by applying an appropriate voltage between the auxiliary electrodes and the electrode of the substrate.
  • the object of the invention is to remedy these drawbacks and, in particular, to avoid damage to the micro-tips and / or the recording medium.
  • the reading and / or writing device comprises contact elements disposed between the reading and / or writing device and the support for recording and cooperating with the memory layer so as to dampen the contact between the microdots and the memory layer.
  • FIG. 1 represents, in section, a particular embodiment of a recording system according to the invention.
  • Figures 2 and 3 show, respectively in section and along the axis AA, another particular embodiment of a recording system according to the invention.
  • FIG. 4 illustrates a particular embodiment of a recording system according to the invention comprising selective means of control by slaving.
  • FIG. 5 represents, in section, a particular embodiment of a recording system according to the invention.
  • FIG. 6 represents a particular embodiment of another variant of a recording system according to the invention.
  • a recording system comprises a recording medium 1 comprising a memory layer 2 capable of storing information.
  • the memory layer 2 can be rigid or flexible and deformable.
  • the recording system further comprises a device 4 for reading and / or writing information comprising a network of microtips 5 (5a, 5b, 5c) arranged in a common plane facing the memory layer 2.
  • the microdots 5 can be any kind of microdots, for example microdots comprising cantilevers, capable of allowing reading and / or writing of information, by field effect, by thermal effect, etc.
  • the recording medium 1 comprises a first electrode 6 and the device 4 for reading and / or writing comprises a second electrode 7.
  • the first electrode 6 is arranged opposite the second electrode 7.
  • the system comprises a control device C, for example a control circuit, of the distance d separating the recording medium 1 from the device 4 for reading and / or writing by applying a potential difference Vd between the first 6 and second 7 electrodes.
  • the first electrode 6 is constituted by a conductive layer arranged on a rear face 8 of the memory layer 2 opposite to a front face 9, arranged opposite the microtips 5.
  • the second electrode 7 can also be constituted by a conductive layer, incorporated in a support 10 of the network of microtips 5, possibly so that the second electrode 7 is flush with the surface on which the microtips 5 are arranged.
  • the application of the potential difference Vd between the first 6 and second 7 electrodes creates a force between the recording medium 1 and the device 4 for reading and / or writing.
  • the force per unit area is of the order of 50 nano-Newton per 100 ⁇ m 2 for a potential difference Vd of 1V and for a typical deviation of 100 nm between the microtips 5 and the memory layer 2.
  • the force can be increased by increasing the applied voltage.
  • the recording medium 1 can comprise a plurality of first electrodes 6 (6a, 6b, 6c) constituted by a plurality of conductive pads arranged on a rear face 8 of the memory layer 2 opposite the face front 9 disposed opposite the micro-tips 5.
  • the device 4 for reading and / or writing comprises a plurality of second electrodes 7 constituted by conductive pads buried in the support 10 of the network of micro-tips 5.
  • the first electrodes 6 are respectively arranged opposite the second electrodes 7.
  • the system preferably comprises a single first electrode 6 and a plurality of second electrodes 7.
  • An average pressing force can be defined by a single value of the potential difference Vd, by applying the same first potential to all the first electrodes 6 and the same second potential to all the second electrodes 7.
  • the forces support can also be controlled locally by applying specific potentials to the different electrodes 6 and 7, to control, for example, the deformation of the memory layer 2 and compensate, by a deformation of the memory layer 2, for a dispersion of the heights of the micro-tips 5, in particular by slaving the potential differences to a measurement quantity representative of the difference between the micro-tips 5 and the memory layer 2, such as for example an electric current passing through a micro-tip as described below. below.
  • the difference between the micro-tips 5 and the memory layer 2 can also be determined by detecting the temperature of the micro-tips during the writing and reading phases.
  • the device 4 for reading and / or writing comprises contact elements arranged between the device 4 for reading and / or writing and the recording medium 1.
  • the contact elements are preferably fixed on the support 10 of the micro-tip array 5.
  • the contact elements cooperate with the memory layer 2 so as to dampen the contact between the micro-tips 5 and the memory layer 2. This makes it possible to introduce restoring forces between the recording medium 1 and the device 4 for reading and / or writing, in order to separate the memory layer 2 from the microtips 5, whether during system rest phases or during read or write operation.
  • the height of the contact elements (11, 12, 17, 18, 19; described below) is preferably between 100 nanometers and 200 nanometers.
  • the device 4 for reading and / or writing comprises contact elements made of elastic flexible material, that is to say that is to say deformable and able to return to their initial shapes, intended to absorb the contact between the microtips 5 and the memory layer 2.
  • the recording medium 1 is rigid and has, for example, a thickness of around 5 micrometers.
  • the elastic flexible material can be an elastomer, for example Polydimethylsiloxane (PDMS), based on benzocyclobutene (BCB) or methacrylate, or an elastic composite material comprising a rigid material and a deformable elastic material.
  • PDMS Polydimethylsiloxane
  • BCB benzocyclobutene
  • methacrylate or an elastic composite material comprising a rigid material and a deformable elastic material.
  • an element made of elastic flexible material may comprise a flexible layer surrounding a hard core or a hard layer covering a flexible core. The spacing between the micro-tips 5, in the plane of the micro-tips
  • the elements of flexible elastic material may, for example, be constituted by micro-balls 11 randomly distributed in the plane of the micro-tips.
  • the micro-balls 11 are arranged on the support 10 of the network of micro-tips 5.
  • the micro-balls have a diameter slightly greater than the height of the micro-tips 5 and the desired distance between the memory layer 2 and the support 10, for example a diameter of 150 nm for a distance of 100 nm between the memory layer 2 and the support 10.
  • the micro-balls 11 are distributed with an average surface density such that, on average, several micro-balls 11 are arranged around a micro-tip 5.
  • the micro-beads for example latex beads, can be distributed in liquid solution which can be completely or partially evaporated.
  • the elements of flexible elastic material may, for example, be constituted by studs 12 arranged in staggered with respect to the micro-tips 5, in the plane of the micro-tips 5.
  • the studs 12 of flexible elastic material preferably have a frustoconical shape, the top surface 13 of which is substantially greater than the surface 14 of the micro-tips intended coming into contact with the memory layer 2.
  • the pads 12 preferably have a height greater than the height of the micro-tips and can be connected to the electrical ground.
  • the pads 12 and the microtips 5 are preferably produced in the same manufacturing step, for example by deposition of tungsten followed by planarization, for example mechanical polishing.
  • the studs 12 are wider than the microtips 5 and the microtips 5 are etched so as to obtain a pointed conical shape which automatically reduces, in a controlled manner, the height of the microtips 5.
  • the recording system may include detectors 15 (15a, 15b) measuring currents I (la and Ib) traversing the micro-tips 5a and 5b respectively. and the part of the associated memory layer 2, as shown in FIG. 4.
  • STM scanning tunneling microscope
  • the distance between a microtip 5 and the memory layer 2 can be controlled according to a measured tunnel current.
  • the current flowing from a micro-tip 5 to the memory layer 2 strongly depends on the distance between the micro-tip 5 and the memory layer 2.
  • a control device 16a (16b) by servo-control makes it possible to control the potential difference Vda (Vdb) between the first 6a (6b) and second 7a (7b) electrodes by current control la (Ib).
  • Vda potential difference between the first 6a (6b) and second 7a (7b) electrodes
  • Ib current control la
  • the servo control device 16 can comprise a circuit, for example of the proportional, integral and derivative (PID) type, which regulates the distance d on a sliding average value, for example, in order to allow rapid variations of the current I to be detected.
  • PID proportional, integral and derivative
  • the stiffness of the servo-control is associated with the flexibility of the memory layer 2, the amplitude of the restoring forces, the amplitude of the electrostatic force due to the potential difference Vd and the adjustment of the PID circuit.
  • the control device 16 by servo-control can comprise circuits associated with the micro-tips 5 and disposed respectively under the micro-tips 5.
  • the system comprises two second electrodes 7a and 7b, associated respectively with the first electrodes 6a and 6b.
  • the control devices 16 by slaving of the potential differences Vd are selective, that is to say they make it possible to control the potential differences Vda and Vdb independently according to the currents la and Ib which are measured independently.
  • the system may include a plurality of second electrodes 7, associated respectively with a plurality of first electrodes 6 and a plurality of servo control devices 16.
  • the number of micro-tips 5 is not necessarily identical to the number of first 6 and / or second 7 electrodes.
  • the system may include a single servo control device 16, making it possible to control the potential difference Vd between the first 6 and the second electrode 7 by servo control I, measured via a plurality of detectors 15.
  • a second electrode 7 can be associated with several first electrodes 6 or vice versa.
  • the second electrodes 7 are constituted by the microtips 5 which is, for example, an advantageous solution, when the principle of writing and / or reading does not require contact intimate between the memory layer and the micro-tips and / or when the memory layer 2 is, on the surface, made of a non-conductive material.
  • the elements made of elastic flexible material consist of a layer 17 of elastic flexible material arranged around the micro-tips, so that the micro-tips 5 protrude from the layer 17 of elastic flexible material.
  • Second micro-balls 18, hard or flexible are arranged on the layer 17.
  • all of the second micro-balls 18 and of the layer 17 make it possible to absorb the contact between the micro-tips 5 and the memory layer 2.
  • the different kinds of elements of flexible elastic material for example the studs 12 and the layer 17 of flexible elastic material, can be combined, for example by structuring a layer of flexible elastic material, so as to obtain a layer having protrusions.
  • the contact elements of the device 4 for reading and / or writing are constituted by elements rigid 19 and the memory layer 2 is made of a flexible elastic material.
  • the memory layer 2 deforms under the pressure exerted by the rigid elements 19, which creates a repulsion between the memory layer 2 and the device 4 for reading and / or writing.
  • the memory layer essentially cooperating with the rigid elements 19, the contact between the micro-tips 5 and the memory layer 2 is absorbed.
  • the recording medium 1 comprising the memory layer 2 is, for example, made of silicon and has a thickness of between 0.3 micrometer and 1 micrometer, preferably 0.5 micrometer. In this case, the memory layer 2 can, for example, be fixed on a frame.
  • the rigid elements 19 are, for example, metallic and preferably made of tungsten W.
  • the deformation of the memory layer 2 in the direction of the applied force is of the order of 10 nanometers.
  • the surfaces of the electrodes 6 and 7 are 50 ⁇ 50 ⁇ m 2 and the applied voltage is between 3 and 5V, which makes it possible to obtain an appropriate deformation of the memory layer 2. It is not always favorable to reduce the gap between the rigid elements 19 because this results in an excessive increase in the stiffness force, that is to say the repulsion force.
  • the distance between the rigid elements 19 or the distance between the microtips 5 is preferably 100 micrometers.
  • the electrostatic force and the repelling force must be close.
  • the first electrodes can be buried in the memory layer 2, arranged on the front face of the memory layer 2 or formed by it.
  • the second electrodes can be buried in the support 10 or be arranged on the front or rear face of the latter.
  • the electrodes can have any shape, for example round, square, rectangular, hexagonal or annular to be arranged around the microtips.
  • the shape of the electrodes can be optimized to serve as a screen for electric fields created by addressing circuits and interacting with the memory layer 2.
  • the electrodes can be produced by any conventional process, for example by depositing and etching a metal , for example copper, aluminum, tungsten or a nitride or a tungsten oxide.

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Micromachines (AREA)
  • Semiconductor Memories (AREA)
  • Optical Recording Or Reproduction (AREA)
EP05753714A 2004-04-15 2005-04-07 Aufzeichnungssystem mit speicherschicht und mikrospitzen-array Withdrawn EP1735788A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0403921A FR2869027B1 (fr) 2004-04-15 2004-04-15 Systeme d'enregistrement comportant une couche memoire et un reseau de micro-pointes
PCT/FR2005/000847 WO2005102908A2 (fr) 2004-04-15 2005-04-07 Systeme d'enregistrement comportant une couche memoire et un reseau de micro-pointes

Publications (1)

Publication Number Publication Date
EP1735788A2 true EP1735788A2 (de) 2006-12-27

Family

ID=34945418

Family Applications (1)

Application Number Title Priority Date Filing Date
EP05753714A Withdrawn EP1735788A2 (de) 2004-04-15 2005-04-07 Aufzeichnungssystem mit speicherschicht und mikrospitzen-array

Country Status (4)

Country Link
US (1) US7567497B2 (de)
EP (1) EP1735788A2 (de)
FR (1) FR2869027B1 (de)
WO (1) WO2005102908A2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4817465B2 (ja) * 2006-10-05 2011-11-16 パイオニア株式会社 記録再生装置
EP2218308B1 (de) * 2007-11-30 2013-06-19 Koninklijke Philips Electronics N.V. Lichtausgabevorrichtung

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3157868A (en) * 1960-01-06 1964-11-17 Ibm Wear resistant pressure pad
US5015850A (en) * 1989-06-20 1991-05-14 The Board Of Trustees Of The Leland Stanford Junior University Microfabricated microscope assembly
CA2022929C (en) * 1989-08-10 1995-02-07 Hisaaki Kawade Organic recording medium with electrodes
US5264876A (en) * 1989-08-10 1993-11-23 Canon Kabushiki Kaisha Recording medium, method for preparing the same, recording and reproducing device, and recording, reproducing and erasing method by use of such recording medium
JP2802828B2 (ja) * 1990-10-19 1998-09-24 キヤノン株式会社 情報記録担体及びこれを使用する情報処理装置
JP2744346B2 (ja) * 1990-10-19 1998-04-28 キヤノン株式会社 情報記録ユニットと情報記録及び/又は再生装置と情報記録及び/又は再生方法と情報記録媒体
US5216631A (en) * 1990-11-02 1993-06-01 Sliwa Jr John W Microvibratory memory device
EP0487003B1 (de) * 1990-11-20 1997-07-09 Canon Kabushiki Kaisha Neigungswinkelbestimmungsverfahren sowie Informationsbestimmungsschreibvorrichtung dafür
JP3184619B2 (ja) * 1991-09-24 2001-07-09 キヤノン株式会社 平行平面保持機構及びそれを用いたメモリ装置及びstm装置
JP3029916B2 (ja) * 1992-03-07 2000-04-10 キヤノン株式会社 情報処理装置
JP3412856B2 (ja) * 1992-04-01 2003-06-03 キヤノン株式会社 情報処理装置及びこれに用いるデバイス
JP3402661B2 (ja) * 1992-07-06 2003-05-06 キヤノン株式会社 カンチレバー型プローブ、及びこれを用いた情報処理装置
JPH06139629A (ja) 1992-10-28 1994-05-20 Canon Inc 情報記録坦体およびこれを使用する情報処理装置
US5418771A (en) * 1993-02-25 1995-05-23 Canon Kabushiki Kaisha Information processing apparatus provided with surface aligning mechanism between probe head substrate and recording medium substrate
JP3686109B2 (ja) * 1994-10-07 2005-08-24 ヒューレット・パッカード・カンパニー メモリ装置
JPH08129875A (ja) * 1994-10-28 1996-05-21 Hewlett Packard Co <Hp> 導電性針の位置ずれを低減したプローブ装置
US5724336A (en) * 1995-04-25 1998-03-03 Morton; Steven G. Tera-byte disk drive
US5886922A (en) * 1997-05-07 1999-03-23 Hewlett-Packard Company Probe device for memory device having multiple cantilever probes
JP3978818B2 (ja) * 1997-08-08 2007-09-19 ソニー株式会社 微小ヘッド素子の製造方法
JPH11265520A (ja) * 1998-03-17 1999-09-28 Hitachi Ltd 近接場光ヘッド、近接場光ヘッドの加工方法および光記録再生装置
US6411589B1 (en) * 1998-07-29 2002-06-25 Hewlett-Packard Company System and method for forming electrostatically actuated data storage mechanisms
JP3882456B2 (ja) * 2000-03-13 2007-02-14 株式会社日立製作所 近接場光プローブおよびそれを用いた近接場光学顕微鏡および光記録/再生装置
JP3624291B2 (ja) * 2002-04-09 2005-03-02 松下電器産業株式会社 不揮発性メモリおよびその製造方法
FR2845513B1 (fr) 2002-10-03 2006-08-11 Commissariat Energie Atomique Dispositif d'enregistrement de donnees comportant un support de memoire en forme de membrane

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2005102908A2 *

Also Published As

Publication number Publication date
FR2869027A1 (fr) 2005-10-21
WO2005102908A3 (fr) 2006-02-16
US20080037400A1 (en) 2008-02-14
FR2869027B1 (fr) 2006-07-14
WO2005102908A2 (fr) 2005-11-03
US7567497B2 (en) 2009-07-28

Similar Documents

Publication Publication Date Title
EP1968117B1 (de) Vorrichtung zur mehrstufigen Datenspeicherung auf Material mit Phasenumwandlung
EP2015358B1 (de) Nichtflüchtige SRAM-Speicherzelle mit Transistoren mit beweglichem Gate und piezoelektrischer Betätigung
EP1936691A1 (de) Speichervorrichtung mit mehrstufiger Struktur
FR3041274A1 (fr) Procede d&#39;orientation d&#39;objets allonges disposes en surface d&#39;un substrat
EP2014611B1 (de) MOS-Transistor mit frei hängendem Gate und nichtflüchtiger Funktionsweise mit piezoelektrische Aktivierung und Herstellungsverfahren desselben
FR2925748A1 (fr) Support de stockage de donnees et procede associe
EP1735788A2 (de) Aufzeichnungssystem mit speicherschicht und mikrospitzen-array
WO2015032855A1 (fr) Dispositif acoustique numerique a puissance sonore augmentee
EP1547072B1 (de) Datenaufzeichnungsvorrichtung mit einem membranförmigen speicherträger
EP1642279B1 (de) Verfahren zum aufzeichnen von daten und einrichtung zur ausführung des verfahrens mit deformierbarem speicherträger
FR2793937A1 (fr) Micro-actionneur deformable pour memoire a disques a moteur electrostatique
EP2058810B1 (de) Ferroelektrischer Speicherträger, sein Herstellungsverfahren und Mikropunkt-Speichersystem, das ihn enthält
FR2862802A1 (fr) Support de stockage d&#39;information et procede de fabrication
EP1756822B1 (de) Datenaufzeichnungssystem und verfahren zu dessen verwendung
EP2960955B1 (de) Elektrische verbindungsvorrichtung, die verbindungselemente mit einer steuerbaren position umfasst
EP2022049B1 (de) Datenaufzeichnungsmedien mit elektrischem effekt, einschliesslich einer lokalisierten elektrischen leitungsschicht
FR2845512A1 (fr) Dispositif d&#39;enregistrement de donnees comportant un support de memoire en forme de membrane
FR2876831A1 (fr) Dispositif d&#39;enregistrement de donnees comportant des nanotubes de carbone inclines et procede de fabrication
FR2862156A1 (fr) Dispositif d&#39;enregistrement de donnees a micro-pointes conductrices et procede de fabrication d&#39;un tel dispositif
FR3155608A1 (fr) Dispositif a structure de detection a blocage de coulomb superposee a une boite quantique
EP4015446A1 (de) Elektromechanisches mikrosystem
FR2880979A1 (fr) Dispositif d&#39;enregistrement de donnees comportant une membrane peripherique de support et procede de fabrication
WO2006075065A1 (fr) Dispositif d&#39;enregistrement de donnees comportant des micro-pointes dont l&#39;ensemble des extremites libres forme une surface convexe et procede de fabrication
EP1730738A1 (de) Flexible, gekerbte membran

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20061009

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

DAX Request for extension of the european patent (deleted)
RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN

18W Application withdrawn

Effective date: 20130405