EP1986220A4 - Systeme optique de projection, dispositif et procede d'exposition, procede de fabrication d'affichage, masque et procede de fabrication de masque - Google Patents

Systeme optique de projection, dispositif et procede d'exposition, procede de fabrication d'affichage, masque et procede de fabrication de masque

Info

Publication number
EP1986220A4
EP1986220A4 EP07708092A EP07708092A EP1986220A4 EP 1986220 A4 EP1986220 A4 EP 1986220A4 EP 07708092 A EP07708092 A EP 07708092A EP 07708092 A EP07708092 A EP 07708092A EP 1986220 A4 EP1986220 A4 EP 1986220A4
Authority
EP
European Patent Office
Prior art keywords
mask
manufacturing
projection system
exposure device
optical projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP07708092A
Other languages
German (de)
English (en)
Other versions
EP1986220A1 (fr
Inventor
Masato Kumazawa
Tatsuo Fukui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of EP1986220A1 publication Critical patent/EP1986220A1/fr
Publication of EP1986220A4 publication Critical patent/EP1986220A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
EP07708092A 2006-02-16 2007-02-06 Systeme optique de projection, dispositif et procede d'exposition, procede de fabrication d'affichage, masque et procede de fabrication de masque Withdrawn EP1986220A4 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006039446 2006-02-16
JP2007014631 2007-01-25
PCT/JP2007/051974 WO2007094198A1 (fr) 2006-02-16 2007-02-06 Systeme optique de projection, dispositif et procede d'exposition, procede de fabrication d'affichage, masque et procede de fabrication de masque

Publications (2)

Publication Number Publication Date
EP1986220A1 EP1986220A1 (fr) 2008-10-29
EP1986220A4 true EP1986220A4 (fr) 2010-08-18

Family

ID=38371384

Family Applications (1)

Application Number Title Priority Date Filing Date
EP07708092A Withdrawn EP1986220A4 (fr) 2006-02-16 2007-02-06 Systeme optique de projection, dispositif et procede d'exposition, procede de fabrication d'affichage, masque et procede de fabrication de masque

Country Status (7)

Country Link
US (2) US8305556B2 (fr)
EP (1) EP1986220A4 (fr)
JP (2) JP5453806B2 (fr)
KR (1) KR101415411B1 (fr)
CN (2) CN101976018B (fr)
TW (1) TWI424287B (fr)
WO (1) WO2007094198A1 (fr)

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US8208198B2 (en) * 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101376931B1 (ko) 2004-05-17 2014-03-25 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US8917378B2 (en) 2007-12-20 2014-12-23 Nikon Corporation Exposure method, exposure apparatus, and method for producing device with plurality of projection optical systems and pattern having first partial pattern area and second partial area having overlaid area with first partial pattern area
JP5392549B2 (ja) * 2009-05-12 2014-01-22 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
TWI526787B (zh) * 2009-05-15 2016-03-21 尼康股份有限公司 A moving body device, a power transmission device, and an exposure device, and a device manufacturing method
DE102009045217B3 (de) * 2009-09-30 2011-04-07 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv
US8461556B2 (en) * 2010-09-08 2013-06-11 Varian Semiconductor Equipment Associates, Inc. Using beam blockers to perform a patterned implant of a workpiece
CN103246158B (zh) * 2012-02-14 2015-03-25 旺宏电子股份有限公司 掩模及其图案配置方法与曝光方法
DE102017105580B4 (de) * 2016-11-04 2025-10-02 Carl Zeiss Meditec Ag Operationsmikroskop
CN119036999B (zh) * 2024-07-25 2025-11-25 中国印钞造币集团有限公司 制版印刷的成像方法、系统、电子设备和可读存储介质

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JPS6442655A (en) * 1987-08-11 1989-02-14 Nec Corp Structure of reticle
JPH05161588A (ja) 1991-12-16 1993-06-29 Mitsubishi Electric Corp 食器洗浄機の水位検出装置
US6157497A (en) * 1993-06-30 2000-12-05 Nikon Corporation Exposure apparatus
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP3348467B2 (ja) 1993-06-30 2002-11-20 株式会社ニコン 露光装置及び方法
JPH0766113A (ja) * 1993-08-31 1995-03-10 Sanyo Electric Co Ltd レチクル及び位置合わせ用バーニアの形成方法
JP3477838B2 (ja) * 1993-11-11 2003-12-10 株式会社ニコン 走査型露光装置及び露光方法
JP4132095B2 (ja) * 1995-03-14 2008-08-13 株式会社ニコン 走査型露光装置
DE19757074A1 (de) * 1997-12-20 1999-06-24 Zeiss Carl Fa Projektionsbelichtungsanlage und Belichtungsverfahren
JP4110606B2 (ja) 1998-02-12 2008-07-02 株式会社ニコン 走査型露光装置および露光方法
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EP1107064A3 (fr) * 1999-12-06 2004-12-29 Olympus Optical Co., Ltd. Appareil d'exposition
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TWI232348B (en) * 2001-12-26 2005-05-11 Pentax Corp Projection aligner
JP2003248299A (ja) * 2002-02-26 2003-09-05 Toshiba Corp マスク基板およびその製造方法
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CN1954408B (zh) * 2004-06-04 2012-07-04 尼康股份有限公司 曝光装置、曝光方法及元件制造方法
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JP2007014631A (ja) 2005-07-08 2007-01-25 Sanyo Product Co Ltd 遊技機
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KR101387834B1 (ko) * 2006-03-20 2014-04-22 가부시키가이샤 니콘 반사굴절 투영광학계, 반사굴절 광학장치, 주사노광장치,마이크로 디바이스의 제조방법

Non-Patent Citations (1)

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No further relevant documents disclosed *

Also Published As

Publication number Publication date
CN101976018A (zh) 2011-02-16
JPWO2007094198A1 (ja) 2009-07-02
JP5453806B2 (ja) 2014-03-26
US8305556B2 (en) 2012-11-06
US20130021589A1 (en) 2013-01-24
EP1986220A1 (fr) 2008-10-29
CN101385123B (zh) 2010-12-15
TWI424287B (zh) 2014-01-21
JP2013178535A (ja) 2013-09-09
US8867019B2 (en) 2014-10-21
WO2007094198A1 (fr) 2007-08-23
TW200732868A (en) 2007-09-01
US20090021712A1 (en) 2009-01-22
CN101385123A (zh) 2009-03-11
HK1128061A1 (en) 2009-10-16
CN101976018B (zh) 2013-01-30
KR101415411B1 (ko) 2014-07-04
KR20080101867A (ko) 2008-11-21

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