EP2075106A4 - Aufschlämmung zum schneiden von siliziumstäben und verfahren zum schneiden von siliziumstäben damit - Google Patents

Aufschlämmung zum schneiden von siliziumstäben und verfahren zum schneiden von siliziumstäben damit

Info

Publication number
EP2075106A4
EP2075106A4 EP06821988A EP06821988A EP2075106A4 EP 2075106 A4 EP2075106 A4 EP 2075106A4 EP 06821988 A EP06821988 A EP 06821988A EP 06821988 A EP06821988 A EP 06821988A EP 2075106 A4 EP2075106 A4 EP 2075106A4
Authority
EP
European Patent Office
Prior art keywords
cutting
silicon
same
thick suspension
ingots
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP06821988A
Other languages
English (en)
French (fr)
Other versions
EP2075106A1 (de
EP2075106B1 (de
Inventor
Takafumi Kawasaki
Seiichi Mimura
Hirokazu Nishida
Yasuhiro Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of EP2075106A1 publication Critical patent/EP2075106A1/de
Publication of EP2075106A4 publication Critical patent/EP2075106A4/de
Application granted granted Critical
Publication of EP2075106B1 publication Critical patent/EP2075106B1/de
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/007—Use, recovery or regeneration of abrasive mediums
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
    • B28D5/045—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
EP06821988.0A 2006-10-20 2006-10-20 Aufschlämmung zum schneiden von siliziumstäben und verfahren zum schneiden von siliziumstäben damit Not-in-force EP2075106B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2006/320927 WO2008047446A1 (en) 2006-10-20 2006-10-20 Slurry for silicon ingot cutting and method of cutting silicon ingot therewith

Publications (3)

Publication Number Publication Date
EP2075106A1 EP2075106A1 (de) 2009-07-01
EP2075106A4 true EP2075106A4 (de) 2012-04-11
EP2075106B1 EP2075106B1 (de) 2013-05-01

Family

ID=38935708

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06821988.0A Not-in-force EP2075106B1 (de) 2006-10-20 2006-10-20 Aufschlämmung zum schneiden von siliziumstäben und verfahren zum schneiden von siliziumstäben damit

Country Status (8)

Country Link
US (1) US8075647B2 (de)
EP (1) EP2075106B1 (de)
JP (1) JP4022569B1 (de)
KR (1) KR101011597B1 (de)
CN (1) CN101360592B (de)
NO (1) NO20083702L (de)
TW (1) TWI331950B (de)
WO (1) WO2008047446A1 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007044007A1 (de) * 2007-09-14 2009-03-19 Robert Bosch Gmbh Verfahren zur Herstellung eines Festkörper-Lasers mit passiver Güteschaltung
US20100126488A1 (en) * 2008-11-25 2010-05-27 Abhaya Kumar Bakshi Method and apparatus for cutting wafers by wire sawing
KR101580924B1 (ko) * 2009-08-25 2015-12-30 삼성전자주식회사 웨이퍼 분할 장치 및 웨이퍼 분할 방법
CN102069532A (zh) * 2009-11-20 2011-05-25 宁波科宁达工业有限公司 一种减少多线切割机中槽轮及导轮磨损的方法及装置
DE102010014551A1 (de) * 2010-03-23 2011-09-29 Schott Solar Ag Fluide Trennmedien und deren Verwendung
CN102398314B (zh) * 2010-09-17 2014-05-21 上海日进机床有限公司 金刚线切片机
CN102021656B (zh) * 2010-12-17 2012-11-14 上海超日(洛阳)太阳能有限公司 一种硅锭粘接方法
CN102139517A (zh) * 2010-12-23 2011-08-03 福建福晶科技股份有限公司 一种水氧敏感型稀土卤化物晶体的切割方法
CN107059135B (zh) 2011-06-02 2019-08-13 住友电气工业株式会社 碳化硅基板的制造方法
WO2013041140A1 (en) * 2011-09-22 2013-03-28 APPLIED MATERIALS SWITZERLAND SàRL Method and apparatus for cutting semiconductor workpieces
JP6102927B2 (ja) * 2012-09-03 2017-03-29 日立金属株式会社 高硬度材料のマルチワイヤーソーによる切断方法
US8860040B2 (en) 2012-09-11 2014-10-14 Dow Corning Corporation High voltage power semiconductor devices on SiC
JP5769681B2 (ja) * 2012-09-21 2015-08-26 京セラ株式会社 基板の製造方法
US9018639B2 (en) 2012-10-26 2015-04-28 Dow Corning Corporation Flat SiC semiconductor substrate
CN102990792B (zh) * 2012-11-28 2015-11-04 天津市环欧半导体材料技术有限公司 一种八英寸硅单晶硅片切割方法
US9738991B2 (en) 2013-02-05 2017-08-22 Dow Corning Corporation Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a supporting shelf which permits thermal expansion
US9797064B2 (en) 2013-02-05 2017-10-24 Dow Corning Corporation Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a support shelf which permits thermal expansion
US9017804B2 (en) 2013-02-05 2015-04-28 Dow Corning Corporation Method to reduce dislocations in SiC crystal growth
US8940614B2 (en) 2013-03-15 2015-01-27 Dow Corning Corporation SiC substrate with SiC epitaxial film
CN103586989B (zh) * 2013-11-25 2015-12-02 王金生 一种涂覆游离磨料的线锯切割机
US9279192B2 (en) 2014-07-29 2016-03-08 Dow Corning Corporation Method for manufacturing SiC wafer fit for integration with power device manufacturing technology
CN105666714B (zh) * 2016-02-26 2017-06-16 常州高特新材料有限公司 一种水性金刚线硅锭开方液及其应用
FR3048903B1 (fr) * 2016-03-15 2018-04-13 Saint-Gobain Placo Procede et dispositif de decoupe d'une plaque ou d'un panneau de materiau de construction poreux
JP6589735B2 (ja) * 2016-04-21 2019-10-16 信越半導体株式会社 ワイヤソー装置の製造方法
CN110871505B (zh) * 2018-08-30 2022-02-08 洛阳阿特斯光伏科技有限公司 一种晶体硅棒的复合切割方法
JP7003897B2 (ja) * 2018-11-16 2022-02-04 株式会社Sumco ウェーハの製造方法、ワイヤーソー用再利用スラリーの品質評価方法、及びワイヤーソー用使用済みスラリーの品質評価方法
CN111421688A (zh) * 2020-05-09 2020-07-17 西安奕斯伟硅片技术有限公司 多线切割装置及多线切割方法
CN113085040A (zh) * 2021-05-17 2021-07-09 成都青洋电子材料有限公司 一种单晶硅棒切割工艺
CN115338997B (zh) * 2022-09-13 2025-09-30 福建晶安光电有限公司 用于蓝宝石晶棒的多线切割机的切割方法及多线切割机
CN116160570A (zh) * 2023-01-18 2023-05-26 江苏润阳悦达光伏科技有限公司 降低Topcon电池片倒角处漏电的切割设备及方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD99599A1 (de) * 1972-10-23 1973-08-12 Komposition zum Polieren der Oberflächen von festen Körpern
US4242842A (en) * 1979-08-08 1981-01-06 La Pierre Synthetique Baikowski, S.A. Precision polishing suspension and method for making same
US4246003A (en) * 1977-05-20 1981-01-20 Wacker Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Lap cutting abrasive

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL104948C (de) * 1952-02-15
JPH02262955A (ja) 1988-12-15 1990-10-25 Nippon Steel Corp Ｓｉインゴットのワイヤソーによる切断法
JPH02298280A (ja) 1989-05-11 1990-12-10 Seiko Epson Corp ワイヤーエッチング法
JP3508970B2 (ja) * 1996-09-05 2004-03-22 東芝セラミックス株式会社 砥粒の水性分散媒組成物及びその切削液を用いるインゴットの切断方法
JP3314921B2 (ja) * 1999-06-08 2002-08-19 三菱住友シリコン株式会社 半導体材料の切断・加工方法
JP3481908B2 (ja) * 1999-09-30 2003-12-22 三洋化成工業株式会社 ワイヤーソー用水溶性切削液
JP2001164240A (ja) 1999-12-06 2001-06-19 Ishii Hyoki Corp 水性切削液
JP2005088394A (ja) 2003-09-18 2005-04-07 Mitsubishi Electric Corp シリコンインゴット切削用スラリーおよびそれを用いるシリコンインゴットの切断方法
CN1780901A (zh) * 2003-10-16 2006-05-31 三菱电机株式会社 硅锭切割用浆液及使用该浆液的硅锭切割方法
CN100503166C (zh) * 2003-10-27 2009-06-24 三菱电机株式会社 多钢线锯

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD99599A1 (de) * 1972-10-23 1973-08-12 Komposition zum Polieren der Oberflächen von festen Körpern
US4246003A (en) * 1977-05-20 1981-01-20 Wacker Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Lap cutting abrasive
US4242842A (en) * 1979-08-08 1981-01-06 La Pierre Synthetique Baikowski, S.A. Precision polishing suspension and method for making same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2008047446A1 *

Also Published As

Publication number Publication date
EP2075106A1 (de) 2009-07-01
JP4022569B1 (ja) 2007-12-19
TWI331950B (en) 2010-10-21
NO20083702L (no) 2008-12-10
KR101011597B1 (ko) 2011-01-27
US20100037880A1 (en) 2010-02-18
EP2075106B1 (de) 2013-05-01
WO2008047446A1 (en) 2008-04-24
US8075647B2 (en) 2011-12-13
CN101360592A (zh) 2009-02-04
KR20090025186A (ko) 2009-03-10
CN101360592B (zh) 2011-09-28
JPWO2008047446A1 (ja) 2010-02-18
TW200821091A (en) 2008-05-16

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