EP2203033A3 - Dispositif de source lumineuse à ultraviolets extrême - Google Patents

Dispositif de source lumineuse à ultraviolets extrême Download PDF

Info

Publication number
EP2203033A3
EP2203033A3 EP09015807A EP09015807A EP2203033A3 EP 2203033 A3 EP2203033 A3 EP 2203033A3 EP 09015807 A EP09015807 A EP 09015807A EP 09015807 A EP09015807 A EP 09015807A EP 2203033 A3 EP2203033 A3 EP 2203033A3
Authority
EP
European Patent Office
Prior art keywords
raw material
discharge electrodes
energy beam
extreme ultraviolet
pulsed power
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP09015807A
Other languages
German (de)
English (en)
Other versions
EP2203033A2 (fr
EP2203033B1 (fr
Inventor
Takuma Yokoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of EP2203033A2 publication Critical patent/EP2203033A2/fr
Publication of EP2203033A3 publication Critical patent/EP2203033A3/fr
Application granted granted Critical
Publication of EP2203033B1 publication Critical patent/EP2203033B1/fr
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
EP09015807.2A 2008-12-25 2009-12-21 Dispositif de source lumineuse à rayonnement ultraviolet extrême Not-in-force EP2203033B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008329570A JP4893730B2 (ja) 2008-12-25 2008-12-25 極端紫外光光源装置

Publications (3)

Publication Number Publication Date
EP2203033A2 EP2203033A2 (fr) 2010-06-30
EP2203033A3 true EP2203033A3 (fr) 2010-09-08
EP2203033B1 EP2203033B1 (fr) 2014-09-10

Family

ID=42140034

Family Applications (1)

Application Number Title Priority Date Filing Date
EP09015807.2A Not-in-force EP2203033B1 (fr) 2008-12-25 2009-12-21 Dispositif de source lumineuse à rayonnement ultraviolet extrême

Country Status (2)

Country Link
EP (1) EP2203033B1 (fr)
JP (1) JP4893730B2 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010047419B4 (de) 2010-10-01 2013-09-05 Xtreme Technologies Gmbh Verfahren und Vorrichtung zur Erzeugung von EUV-Strahlung aus einem Gasentladungsplasma
JP5724986B2 (ja) * 2012-10-30 2015-05-27 ウシオ電機株式会社 放電電極
DE102013000407B4 (de) * 2013-01-11 2020-03-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Verbesserung der Benetzbarkeit einer rotierenden Elektrode in einer Gasentladungslampe
JP6089955B2 (ja) * 2013-05-20 2017-03-08 株式会社Ihi プラズマ光源
JP6663823B2 (ja) * 2016-08-15 2020-03-13 株式会社Ihi プラズマ光源
RU2670273C2 (ru) * 2017-11-24 2018-10-22 Общество с ограниченной ответственностью "РнД-ИСАН" Устройство и способ для генерации излучения из лазерной плазмы
JP2023149176A (ja) 2022-03-30 2023-10-13 ウシオ電機株式会社 光源装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005060321A2 (fr) * 2003-12-17 2005-06-30 Philips Intellectual Property & Standards Gmbh Procede et dispositif de generation, en particulier, d'un rayonnement ultraviolet extreme et/ou de rayons x mous
WO2005101924A1 (fr) * 2004-04-14 2005-10-27 Xtreme Technologies Gmbh Procede et dispositif permettant d'obtenir un rayonnement ultraviolet extreme d'un plasma a decharge gazeuse
EP1804555A1 (fr) * 2005-12-28 2007-07-04 Ushiodenki Kabushiki Kaisha Dispositif de source de rayonnement UV extrême
EP1976344A2 (fr) * 2007-03-28 2008-10-01 Tokyo Institute Of Technology Source lumineuse d'ultraviolets extrêmes et procédé pour générer un rayonnement UV extrême
EP2046100A1 (fr) * 2007-10-01 2009-04-08 Tokyo Institute of Technology Procédé de génération de rayonnement d'ultraviolets extrêmes et dispositif de source lumineuse d'ultraviolets extrêmes

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2897005B1 (ja) * 1998-02-27 1999-05-31 工業技術院長 レーザプラズマ光源及びこれを用いた輻射線発生方法
JP4052155B2 (ja) 2003-03-17 2008-02-27 ウシオ電機株式会社 極端紫外光放射源及び半導体露光装置
JP5149514B2 (ja) * 2007-02-20 2013-02-20 ギガフォトン株式会社 極端紫外光源装置
JP2008270149A (ja) * 2007-03-28 2008-11-06 Tokyo Institute Of Technology 極端紫外光光源装置および極端紫外光発生方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005060321A2 (fr) * 2003-12-17 2005-06-30 Philips Intellectual Property & Standards Gmbh Procede et dispositif de generation, en particulier, d'un rayonnement ultraviolet extreme et/ou de rayons x mous
WO2005101924A1 (fr) * 2004-04-14 2005-10-27 Xtreme Technologies Gmbh Procede et dispositif permettant d'obtenir un rayonnement ultraviolet extreme d'un plasma a decharge gazeuse
EP1804555A1 (fr) * 2005-12-28 2007-07-04 Ushiodenki Kabushiki Kaisha Dispositif de source de rayonnement UV extrême
EP1976344A2 (fr) * 2007-03-28 2008-10-01 Tokyo Institute Of Technology Source lumineuse d'ultraviolets extrêmes et procédé pour générer un rayonnement UV extrême
EP2046100A1 (fr) * 2007-10-01 2009-04-08 Tokyo Institute of Technology Procédé de génération de rayonnement d'ultraviolets extrêmes et dispositif de source lumineuse d'ultraviolets extrêmes

Also Published As

Publication number Publication date
EP2203033A2 (fr) 2010-06-30
JP2010153563A (ja) 2010-07-08
EP2203033B1 (fr) 2014-09-10
JP4893730B2 (ja) 2012-03-07

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