EP2242339A3 - Gasinjektionssystem und Verfahren zum Betrieb eines Gasinjektionssystems, insbesondere für eine Partikeltherapieanlage - Google Patents

Gasinjektionssystem und Verfahren zum Betrieb eines Gasinjektionssystems, insbesondere für eine Partikeltherapieanlage Download PDF

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Publication number
EP2242339A3
EP2242339A3 EP20100155350 EP10155350A EP2242339A3 EP 2242339 A3 EP2242339 A3 EP 2242339A3 EP 20100155350 EP20100155350 EP 20100155350 EP 10155350 A EP10155350 A EP 10155350A EP 2242339 A3 EP2242339 A3 EP 2242339A3
Authority
EP
European Patent Office
Prior art keywords
line
gas
injection system
conduit
particle therapy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP20100155350
Other languages
English (en)
French (fr)
Other versions
EP2242339A2 (de
EP2242339B1 (de
Inventor
Thomas Uhl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Healthcare GmbH
Original Assignee
Siemens AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG, Siemens Corp filed Critical Siemens AG
Publication of EP2242339A2 publication Critical patent/EP2242339A2/de
Publication of EP2242339A3 publication Critical patent/EP2242339A3/de
Application granted granted Critical
Publication of EP2242339B1 publication Critical patent/EP2242339B1/de
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/08—Arrangements for injecting particles into orbits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/08—Arrangements for injecting particles into orbits
    • H05H2007/081—Sources
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/86493—Multi-way valve unit

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
  • Radiation-Therapy Devices (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Ein Gasinjektionssystem (2), insbesondere für eine Partikeltherapieanlage, umfasst eine erste Leitung (8) zum Einleiten von Gas in eine Ionenquelle (4) sowie eine zweite und eine dritte Leitung (10,12) für zwei getrennte Gasströme, die in die Ionenquelle (4) eingeleitet werden können. Ein besonders schnelles Umschalten zwischen den Gasströmen erfolgt mit Hilfe eines Mehrweg-Umschaltventils (6). Dabei münden die zweite und die dritte Leitung (10,12) in jeweils einen Eingang (17a) des Mehrweg-Umschaltventils (6) und die erste Leitung (8) ist an einen Ausgang (17b) des Mehrweg-Umschaltventils (6) angeschlossen. Das Mehrweg-Umschaltventil (6) ist derart einstellbar, dass entweder der Gasstrom aus der zweiten Leitung (10) oder der Gasstrom aus der dritten Leitung (12) über die erste Leitung (8) in die Ionenquelle (4) eingeleitet wird.
EP10155350.1A 2009-04-16 2010-03-03 Gasinjektionssystem für eine Partikeltherapieanlage, Verfahren zum Betrieb eines solchen Gasinjektionssystems, und Partikeltherapieanlage umfassend das Gasinjektionssystem Not-in-force EP2242339B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE200910017648 DE102009017648A1 (de) 2009-04-16 2009-04-16 Gasinjektionssystem und Verfahren zum Betrieb eines Gasinjektionssystems, insbesondere für eine Partikeltherapieanlage

Publications (3)

Publication Number Publication Date
EP2242339A2 EP2242339A2 (de) 2010-10-20
EP2242339A3 true EP2242339A3 (de) 2014-04-09
EP2242339B1 EP2242339B1 (de) 2017-08-02

Family

ID=42335005

Family Applications (1)

Application Number Title Priority Date Filing Date
EP10155350.1A Not-in-force EP2242339B1 (de) 2009-04-16 2010-03-03 Gasinjektionssystem für eine Partikeltherapieanlage, Verfahren zum Betrieb eines solchen Gasinjektionssystems, und Partikeltherapieanlage umfassend das Gasinjektionssystem

Country Status (5)

Country Link
US (1) US20100263756A1 (de)
EP (1) EP2242339B1 (de)
JP (1) JP2010251324A (de)
CN (1) CN101868113B (de)
DE (1) DE102009017648A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102933019B (zh) * 2011-08-10 2016-01-13 上海原子科兴药业有限公司 一种回旋加速器靶室中模拟靶系统
JP6048829B2 (ja) * 2013-09-09 2016-12-21 日新イオン機器株式会社 イオン源
JP2015182351A (ja) * 2014-03-25 2015-10-22 富士フイルム株式会社 積層フィルムの製造方法
JP6879663B2 (ja) * 2014-12-25 2021-06-02 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
JP6736452B2 (ja) * 2016-10-31 2020-08-05 株式会社東芝 線形加速装置、中性子ビーム生成装置及び粒子線治療装置
KR102912411B1 (ko) * 2022-09-21 2026-01-13 재단법인 한국전자기계융합기술원 잔류가스 신속 배출 기능을 갖춘 집속이온빔 장치

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS599500U (ja) * 1982-07-09 1984-01-21 株式会社日本製鋼所 荷電粒子加速器のイオン源ガス供給装置
EP0185926A2 (de) * 1984-12-12 1986-07-02 The Perkin-Elmer Corporation Mehrwegventil für ein Gassammelsystem und seine Anwendungsweise
JPH0212748A (ja) * 1988-06-30 1990-01-17 Yokogawa Electric Corp 高周波誘導結合プラズマ質量分析装置
US20060093754A1 (en) * 2004-10-29 2006-05-04 Christian Krueger System and method for supplying precursor gases to an implantation tool
US20060192103A1 (en) * 2005-01-31 2006-08-31 Bruker Daltonik Gmbh Ion mobility spectrometer and its method of operation
JP2009054445A (ja) * 2007-08-28 2009-03-12 Jeol Ltd 質量分析装置の反応ガス導入装置

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US3100965A (en) * 1959-09-29 1963-08-20 Charles M Blackburn Hydraulic power supply
US4259573A (en) * 1979-11-05 1981-03-31 E. I. Du Pont De Nemours And Company Method of determining small concentrations of chemical compounds by plasma chromatography
US5065794A (en) * 1990-11-26 1991-11-19 Union Carbide Industrial Gases Technology Corporation Gas flow distribution system
US6757630B2 (en) * 1994-08-19 2004-06-29 Mediq/Prn Life Support Services, Inc. Integrated systems for testing and certifying the physical, functional, and electrical performance of IV pumps
US5703360A (en) * 1996-08-30 1997-12-30 Hewlett-Packard Company Automated calibrant system for use in a liquid separation/mass spectrometry apparatus
JPH10132787A (ja) * 1996-11-01 1998-05-22 Shimadzu Corp 液体クロマトグラフ／質量分析装置
GB9724168D0 (en) * 1997-11-14 1998-01-14 Air Prod & Chem Gas control device and method of supplying gas
JP2000331641A (ja) * 1999-05-19 2000-11-30 Jeol Ltd 大気圧イオン源
US7257987B2 (en) * 2000-01-25 2007-08-21 State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Portland State University Method and apparatus for sample analysis
US20020190204A1 (en) * 2001-06-04 2002-12-19 Bruker Daltonics, Inc. Systems and method of a gated electrospray interface with variable flow rate for high throughput mass spectrometric analysis
DE10207835C1 (de) * 2002-02-25 2003-06-12 Karlsruhe Forschzent Kanalfunkenquelle zur Erzeugung eines stabil gebündelten Elektronenstrahls
JP3818227B2 (ja) * 2002-07-04 2006-09-06 株式会社日立製作所 イオン源
GB0411679D0 (en) * 2004-05-25 2004-06-30 Boc Group Plc Gas supply system
EP1915214A4 (de) * 2005-08-11 2017-11-08 GlaxoSmithKline LLC Stromreaktor und verfahren
WO2007024798A2 (en) * 2005-08-22 2007-03-01 Applera Corporation Apparatus, system, and method using immiscible-fluid-discrete-volumes
JP5055011B2 (ja) * 2007-04-23 2012-10-24 株式会社日立ハイテクノロジーズ イオン源

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS599500U (ja) * 1982-07-09 1984-01-21 株式会社日本製鋼所 荷電粒子加速器のイオン源ガス供給装置
EP0185926A2 (de) * 1984-12-12 1986-07-02 The Perkin-Elmer Corporation Mehrwegventil für ein Gassammelsystem und seine Anwendungsweise
JPH0212748A (ja) * 1988-06-30 1990-01-17 Yokogawa Electric Corp 高周波誘導結合プラズマ質量分析装置
US20060093754A1 (en) * 2004-10-29 2006-05-04 Christian Krueger System and method for supplying precursor gases to an implantation tool
US20060192103A1 (en) * 2005-01-31 2006-08-31 Bruker Daltonik Gmbh Ion mobility spectrometer and its method of operation
JP2009054445A (ja) * 2007-08-28 2009-03-12 Jeol Ltd 質量分析装置の反応ガス導入装置

Also Published As

Publication number Publication date
US20100263756A1 (en) 2010-10-21
JP2010251324A (ja) 2010-11-04
CN101868113B (zh) 2016-06-01
DE102009017648A1 (de) 2010-10-21
EP2242339A2 (de) 2010-10-20
CN101868113A (zh) 2010-10-20
EP2242339B1 (de) 2017-08-02

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