EP3067444A3 - Abscheidung von dekorativen palladium-eisen-legierungsbeschichtungen auf metallischen substanzen - Google Patents
Abscheidung von dekorativen palladium-eisen-legierungsbeschichtungen auf metallischen substanzen Download PDFInfo
- Publication number
- EP3067444A3 EP3067444A3 EP16156476.0A EP16156476A EP3067444A3 EP 3067444 A3 EP3067444 A3 EP 3067444A3 EP 16156476 A EP16156476 A EP 16156476A EP 3067444 A3 EP3067444 A3 EP 3067444A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- palladium
- bath
- free
- decorative
- separation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 title abstract 5
- 229910000640 Fe alloy Inorganic materials 0.000 title abstract 2
- 238000000576 coating method Methods 0.000 title abstract 2
- 229910052763 palladium Inorganic materials 0.000 title abstract 2
- 239000007769 metal material Substances 0.000 title 1
- 238000000926 separation method Methods 0.000 title 1
- 239000002184 metal Substances 0.000 abstract 3
- 229910052751 metal Inorganic materials 0.000 abstract 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract 2
- 230000008021 deposition Effects 0.000 abstract 2
- PMVSDNDAUGGCCE-TYYBGVCCSA-L Ferrous fumarate Chemical compound [Fe+2].[O-]C(=O)\C=C\C([O-])=O PMVSDNDAUGGCCE-TYYBGVCCSA-L 0.000 abstract 1
- 229910001252 Pd alloy Inorganic materials 0.000 abstract 1
- 239000000654 additive Substances 0.000 abstract 1
- 239000012670 alkaline solution Substances 0.000 abstract 1
- 238000005275 alloying Methods 0.000 abstract 1
- 229910021529 ammonia Inorganic materials 0.000 abstract 1
- 150000003868 ammonium compounds Chemical class 0.000 abstract 1
- 239000002280 amphoteric surfactant Substances 0.000 abstract 1
- 229910002056 binary alloy Inorganic materials 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000003638 chemical reducing agent Substances 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 239000003792 electrolyte Substances 0.000 abstract 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract 1
- 150000002505 iron Chemical class 0.000 abstract 1
- 150000002736 metal compounds Chemical class 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 150000002940 palladium Chemical class 0.000 abstract 1
- 150000002941 palladium compounds Chemical class 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 239000003381 stabilizer Substances 0.000 abstract 1
- 239000000080 wetting agent Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/20—Electroplating: Baths therefor from solutions of iron
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/005—Jewels; Clockworks; Coins
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ATA50188/2015A AT516876B1 (de) | 2015-03-09 | 2015-03-09 | Abscheidung von dekorativen Palladium-Eisen-Legierungsbeschichtungen auf metallischen Substanzen |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP3067444A2 EP3067444A2 (de) | 2016-09-14 |
| EP3067444A3 true EP3067444A3 (de) | 2016-12-07 |
| EP3067444B1 EP3067444B1 (de) | 2019-03-27 |
Family
ID=60153001
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP16156476.0A Active EP3067444B1 (de) | 2015-03-09 | 2016-02-19 | Abscheidung von dekorativen palladium-eisen-legierungsbeschichtungen auf metallischen substanzen |
Country Status (2)
| Country | Link |
|---|---|
| EP (1) | EP3067444B1 (de) |
| AT (1) | AT516876B1 (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT522158B1 (de) * | 2019-05-03 | 2020-09-15 | Iwg Ing W Garhoefer Ges M B H | Beschichtungssystem zum Aufbringen durch galvanische Abscheidung auf einen Rohling |
| US10612149B1 (en) | 2019-09-05 | 2020-04-07 | Chow Sang Sang Jewellery Company Limited | Platinum electrodeposition bath and uses thereof |
| AT523922B1 (de) * | 2020-09-08 | 2022-01-15 | Iwg Ing W Garhoefer Ges M B H | Elektrolytbad für Palladium-Ruthenium-Beschichtungen |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2741347A1 (de) * | 1976-09-17 | 1978-03-23 | Parker Ste Continentale | Bad und verfahren zur elektrolytischen abscheidung von legierungen auf der basis von palladium |
| JP2001181887A (ja) * | 1999-12-24 | 2001-07-03 | Bikutoria:Kk | パラジウム/鉄合金メッキ液及びパラジウム合金メッキ基材 |
| EP1396559A1 (de) * | 1999-10-27 | 2004-03-10 | Kojima Chemicals Co., Ltd | Palladium-platierungslösung |
| EP2192210A1 (de) * | 2008-11-21 | 2010-06-02 | Umicore Galvanotechnik GmbH | Edelmetallhaltige Schichtfolge für dekorative Artikel |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2657925A1 (de) | 1976-12-21 | 1978-06-22 | Siemens Ag | Ammoniakfreies, waessriges bad zur galvanischen abscheidung von palladium bzw. palladiumlegierungen |
| DE2906783A1 (de) * | 1979-02-22 | 1980-10-16 | Degussa | Verfahren zur vorbehandlung von leichtmetallen vor dem galvanisieren |
| DE19512888A1 (de) * | 1995-04-06 | 1996-10-10 | Vacuumschmelze Gmbh | Verfahren zur elektrolytischen Beschichtung von Seltene Erden enthaltenden Dauermagneten mit minimaler Oberflächenschädigung |
| JPH1046384A (ja) | 1996-05-10 | 1998-02-17 | Lucent Technol Inc | パラジウム合金メッキ浴 |
| US6251249B1 (en) * | 1996-09-20 | 2001-06-26 | Atofina Chemicals, Inc. | Precious metal deposition composition and process |
| JP3601005B2 (ja) | 1999-10-27 | 2004-12-15 | 小島化学薬品株式会社 | パラジウムめっき液 |
| JP4811880B2 (ja) * | 2006-01-06 | 2011-11-09 | エントン インコーポレイテッド | 艶消し金属層を堆積するための電解液および工程 |
| ATE555235T1 (de) * | 2008-05-07 | 2012-05-15 | Umicore Galvanotechnik Gmbh | Pd- und pd-ni-elektrolytbäder |
| DE102009055828A1 (de) * | 2008-12-19 | 2010-07-01 | Merck Patent Gmbh | Verfahren zur Herstellung metallbeschichteter Partikel |
-
2015
- 2015-03-09 AT ATA50188/2015A patent/AT516876B1/de not_active IP Right Cessation
-
2016
- 2016-02-19 EP EP16156476.0A patent/EP3067444B1/de active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2741347A1 (de) * | 1976-09-17 | 1978-03-23 | Parker Ste Continentale | Bad und verfahren zur elektrolytischen abscheidung von legierungen auf der basis von palladium |
| EP1396559A1 (de) * | 1999-10-27 | 2004-03-10 | Kojima Chemicals Co., Ltd | Palladium-platierungslösung |
| JP2001181887A (ja) * | 1999-12-24 | 2001-07-03 | Bikutoria:Kk | パラジウム/鉄合金メッキ液及びパラジウム合金メッキ基材 |
| EP2192210A1 (de) * | 2008-11-21 | 2010-06-02 | Umicore Galvanotechnik GmbH | Edelmetallhaltige Schichtfolge für dekorative Artikel |
Non-Patent Citations (1)
| Title |
|---|
| HERNANDEZ S C ET AL: "Electrodeposition of iron-palladium thin films", ELECTROCHIMICA ACTA, ELSEVIER SCIENCE PUBLISHERS, BARKING, GB, vol. 53, no. 18, 20 July 2008 (2008-07-20), pages 5621 - 5627, XP022655646, ISSN: 0013-4686, [retrieved on 20080318], DOI: 10.1016/J.ELECTACTA.2008.03.001 * |
Also Published As
| Publication number | Publication date |
|---|---|
| EP3067444A2 (de) | 2016-09-14 |
| AT516876B1 (de) | 2016-11-15 |
| AT516876A1 (de) | 2016-09-15 |
| EP3067444B1 (de) | 2019-03-27 |
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