EP3358045A1 - Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques - Google Patents
Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques Download PDFInfo
- Publication number
- EP3358045A1 EP3358045A1 EP17155082.5A EP17155082A EP3358045A1 EP 3358045 A1 EP3358045 A1 EP 3358045A1 EP 17155082 A EP17155082 A EP 17155082A EP 3358045 A1 EP3358045 A1 EP 3358045A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- manganese
- zinc
- metallic
- nickel
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 98
- 239000011248 coating agent Substances 0.000 title claims abstract description 85
- 239000011701 zinc Substances 0.000 title claims abstract description 80
- 238000000034 method Methods 0.000 title claims abstract description 74
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 title claims abstract description 72
- 229910052725 zinc Inorganic materials 0.000 title claims abstract description 71
- 239000000654 additive Substances 0.000 title claims abstract description 50
- 229910001297 Zn alloy Inorganic materials 0.000 title claims abstract description 37
- 230000008021 deposition Effects 0.000 title abstract description 22
- 230000015556 catabolic process Effects 0.000 title abstract description 8
- 238000006731 degradation reaction Methods 0.000 title abstract description 8
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims abstract description 162
- 239000011572 manganese Substances 0.000 claims abstract description 156
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 140
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 claims abstract description 116
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 claims abstract description 48
- 230000008569 process Effects 0.000 claims abstract description 37
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims abstract description 32
- 238000000151 deposition Methods 0.000 claims abstract description 25
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 24
- 239000000956 alloy Substances 0.000 claims abstract description 24
- 239000002131 composite material Substances 0.000 claims abstract description 16
- 238000004070 electrodeposition Methods 0.000 claims abstract description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 171
- 239000003792 electrolyte Substances 0.000 claims description 89
- 229910052759 nickel Inorganic materials 0.000 claims description 70
- 229910000831 Steel Inorganic materials 0.000 claims description 62
- 239000010959 steel Substances 0.000 claims description 62
- 239000008139 complexing agent Substances 0.000 claims description 34
- 239000000203 mixture Substances 0.000 claims description 34
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 27
- 238000007751 thermal spraying Methods 0.000 claims description 21
- 150000001412 amines Chemical class 0.000 claims description 19
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 17
- 229910052742 iron Inorganic materials 0.000 claims description 11
- 238000003466 welding Methods 0.000 claims description 9
- 238000005275 alloying Methods 0.000 claims description 8
- 239000004020 conductor Substances 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 229910002804 graphite Inorganic materials 0.000 claims description 4
- 239000010439 graphite Substances 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 238000007740 vapor deposition Methods 0.000 claims description 4
- 229910000851 Alloy steel Inorganic materials 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 21
- 150000002825 nitriles Chemical class 0.000 abstract description 21
- 239000000463 material Substances 0.000 description 56
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 49
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 44
- 239000010410 layer Substances 0.000 description 41
- 230000000052 comparative effect Effects 0.000 description 35
- 238000012360 testing method Methods 0.000 description 27
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 26
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 21
- 229910000914 Mn alloy Inorganic materials 0.000 description 21
- 239000010405 anode material Substances 0.000 description 19
- REEBJQTUIJTGAL-UHFFFAOYSA-N 3-pyridin-1-ium-1-ylpropane-1-sulfonate Chemical compound [O-]S(=O)(=O)CCC[N+]1=CC=CC=C1 REEBJQTUIJTGAL-UHFFFAOYSA-N 0.000 description 15
- -1 Zn (II) ions Chemical class 0.000 description 15
- 229910052751 metal Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 15
- 238000005507 spraying Methods 0.000 description 15
- 239000012528 membrane Substances 0.000 description 14
- 239000007789 gas Substances 0.000 description 13
- 239000000843 powder Substances 0.000 description 13
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 12
- 230000000996 additive effect Effects 0.000 description 12
- 230000003647 oxidation Effects 0.000 description 12
- 238000007254 oxidation reaction Methods 0.000 description 12
- 238000010285 flame spraying Methods 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000005240 physical vapour deposition Methods 0.000 description 10
- 238000007792 addition Methods 0.000 description 8
- 239000012298 atmosphere Substances 0.000 description 8
- 239000010406 cathode material Substances 0.000 description 8
- 229910052593 corundum Inorganic materials 0.000 description 8
- 239000010431 corundum Substances 0.000 description 8
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 8
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 8
- 230000005611 electricity Effects 0.000 description 7
- 238000002474 experimental method Methods 0.000 description 7
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 239000003014 ion exchange membrane Substances 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 239000000080 wetting agent Substances 0.000 description 6
- 239000011787 zinc oxide Substances 0.000 description 6
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 5
- 238000005422 blasting Methods 0.000 description 5
- 239000010960 cold rolled steel Substances 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 5
- 235000013980 iron oxide Nutrition 0.000 description 5
- PPNAOCWZXJOHFK-UHFFFAOYSA-N manganese(2+);oxygen(2-) Chemical class [O-2].[Mn+2] PPNAOCWZXJOHFK-UHFFFAOYSA-N 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 4
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 4
- 241000920033 Eugenes Species 0.000 description 4
- 241000080590 Niso Species 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical group [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000011247 coating layer Substances 0.000 description 4
- 239000007857 degradation product Substances 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 235000014666 liquid concentrate Nutrition 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000002351 wastewater Substances 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- 238000002479 acid--base titration Methods 0.000 description 3
- 230000001464 adherent effect Effects 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000005253 cladding Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 229960005191 ferric oxide Drugs 0.000 description 3
- 238000010348 incorporation Methods 0.000 description 3
- CUSDLVIPMHDAFT-UHFFFAOYSA-N iron(3+);manganese(2+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[Mn+2].[Fe+3].[Fe+3] CUSDLVIPMHDAFT-UHFFFAOYSA-N 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910000480 nickel oxide Inorganic materials 0.000 description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 3
- JEMDLNFQNCQAKN-UHFFFAOYSA-N nickel;oxomanganese Chemical compound [Ni].[Mn]=O JEMDLNFQNCQAKN-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 230000008092 positive effect Effects 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 238000004448 titration Methods 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- DPRMFUAMSRXGDE-UHFFFAOYSA-N ac1o530g Chemical compound NCCN.NCCN DPRMFUAMSRXGDE-UHFFFAOYSA-N 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000012876 carrier material Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 description 2
- 150000002815 nickel Chemical class 0.000 description 2
- 125000000369 oxido group Chemical group [*]=O 0.000 description 2
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical class [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- MNWBNISUBARLIT-UHFFFAOYSA-N sodium cyanide Chemical compound [Na+].N#[C-] MNWBNISUBARLIT-UHFFFAOYSA-N 0.000 description 2
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 229910000760 Hardened steel Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910001229 Pot metal Inorganic materials 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- GENLSXMKBFUFBU-UHFFFAOYSA-N benzyl pyridin-1-ium-1-carboxylate Chemical compound C=1C=CC=C[N+]=1C(=O)OCC1=CC=CC=C1 GENLSXMKBFUFBU-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010283 detonation spraying Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- JZBWUTVDIDNCMW-UHFFFAOYSA-L dipotassium;oxido sulfate Chemical compound [K+].[K+].[O-]OS([O-])(=O)=O JZBWUTVDIDNCMW-UHFFFAOYSA-L 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002390 heteroarenes Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- DALUDRGQOYMVLD-UHFFFAOYSA-N iron manganese Chemical compound [Mn].[Fe] DALUDRGQOYMVLD-UHFFFAOYSA-N 0.000 description 1
- ZAUUZASCMSWKGX-UHFFFAOYSA-N manganese nickel Chemical compound [Mn].[Ni] ZAUUZASCMSWKGX-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- CXIHYTLHIDQMGN-UHFFFAOYSA-L methanesulfonate;nickel(2+) Chemical compound [Ni+2].CS([O-])(=O)=O.CS([O-])(=O)=O CXIHYTLHIDQMGN-UHFFFAOYSA-L 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000006199 nebulizer Substances 0.000 description 1
- 150000002816 nickel compounds Chemical class 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- NLEUXPOVZGDKJI-UHFFFAOYSA-N nickel(2+);dicyanide Chemical compound [Ni+2].N#[C-].N#[C-] NLEUXPOVZGDKJI-UHFFFAOYSA-N 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- BYMZQQLCZDLNKW-UHFFFAOYSA-N nickel(2+);tetracyanide Chemical compound [Ni+2].N#[C-].N#[C-].N#[C-].N#[C-] BYMZQQLCZDLNKW-UHFFFAOYSA-N 0.000 description 1
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000012476 oxidizable substance Substances 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000009418 renovation Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 230000000153 supplemental effect Effects 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
- C23C28/3225—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only with at least one zinc-based layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
- C23C4/08—Metallic material containing only metal elements
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/18—After-treatment
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/22—Electroplating: Baths therefor from solutions of zinc
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
Definitions
- the present invention relates to a process for the electrodeposition of zinc and zinc alloy coatings from an alkaline coating bath with zinc and zinc alloying electrolytes and organic bath additives, e.g. Complexing agents, brighteners and wetting agents.
- the invention further relates to the use of materials as an anode for the electrodeposition of a zinc and zinc alloy coating from an alkaline coating bath with zinc and zinc alloying electrolytes and organic bath additives, and to a corresponding galvanic apparatus for the deposition of zinc and zinc alloy coatings.
- Alkaline zinc and zinc alloy baths are typically not operated with soluble zinc anodes.
- soluble zinc anodes the zinc is electrochemically oxidized to Zn (II) during anodic operation.
- the Zn (II) ions formed enter into the soluble zincate complex, the Zn [(OH) 4 ] 2- , with the surrounding hydroxide ions.
- Zinc in addition to electrochemical dissolution, is oxidized by the alkaline environment to Zn (II) to form hydrogen. This means that the zinc anode additionally dissolves chemically by the abovementioned redox reaction, which leads to an uncontrolled increase in the Zn (II) concentration in the zinc alloy electrolyte.
- alkaline zinc and zinc alloy baths are usually operated with insoluble anodes, and zinc is often dissolved in a separate zinc dissolving tank to form Zn (II) and added to the bath.
- anode material therefore come materials that are electrically conductive and chemically inert to at least bases, are used. These include metals such as nickel, iron, stainless steel, cobalt or alloys of the metals mentioned.
- metals such as nickel, iron, stainless steel, cobalt or alloys of the metals mentioned.
- organic bath additives such as complexing agents, brighteners and wetting agents are usually used in addition to the zinc or zinc alloy electrolyte.
- the anodic oxidation of the organic bath additives also undesirable by-products, such as oxalates, carbonates, etc., can be formed, which can interfere with the galvanic coating process.
- Amine-containing complexing agents are used, for example, in coating baths for the electrodeposition of a zinc nickel alloy coating.
- the nickel is used in the form of Ni (II), which forms a sparingly soluble nickel hydroxide complex in an alkaline medium with the surrounding hydroxide ions.
- Alkaline zinc nickel electrolytes must therefore contain special complexing agents with which Ni (II) is more preferably complexed than with the hydroxide ions in order to bring the nickel into solution in the form of Ni (II).
- a commonly required limit for cyanide contamination in wastewater is 1 mg / l. Due to national or regional legislation, the permitted limits for cyanide contamination in wastewater may still be below this level.
- the cyanides formed must therefore be detoxified consuming. This is done in practice by oxidation, e.g. with sodium hypochlorite, hydrogen peroxide, sodium peroxodisulfate, potassium peroxomonosulfate or similar compounds.
- the removed electrolyte contains other oxidizable substances in addition to the cyanide, so much more oxidizing agent is consumed for complete oxidation than theoretically could be determined from the cyanide content.
- increased cyanide formation further causes the problem that unwanted complexes with the bath additives can be formed.
- the cyanide content is very disadvantageous when using a zinc nickel electrolyte, since nickel with the cyanide ions formed forms the stable tetracyanonickelate complex, Ni [(CN) 4] 2- , as a result of which the nickel bound in this complex is no longer available for deposition Available. Since it is not possible to differentiate between the complexed by cyanide and the complexed by the amines nickel in the current electrolyte analysis, the increase of the cyanide content in the electrolyte means a reduction in process safety.
- the nickel concentration In order to meet the required alloy composition of 10-16 wt.% Nickel over the entire current density range, the nickel concentration must be adjusted in the course of operation according to the cyanide concentration in the electrolyte, since the complexed by cyanide nickel content is not available for deposition stands. With the increase in the cyanide content in the electrolyte, the nickel content must therefore be adjusted accordingly in order to keep the nickel content in the layer constant. In order to maintain the required alloy composition, unscheduled additions of nickel salts to the electrolyte must be made. Suitable supplemental solutions are nickel salts which have a high water solubility. Nickel sulfate solutions in combination with various amine compounds are preferably used for this purpose.
- cyanide in a zinc nickel alloy electrolyte can also adversely affect the optical appearance of the deposit. It can come in the high current density range to a milky veiled deposition. This can be partially corrected by higher dosage of brighteners again. However, this measure is associated with an increased consumption of brighteners and thereby additional costs in the deposition.
- Both processes reduce the formation of cyanides.
- a disadvantage of both methods is that very high investment costs arise from the incorporation of the ion exchange membranes.
- a device for separate circulation of the anolyte must be installed.
- the incorporation of ion exchange membranes is also not generally feasible in zinc nickel deposition processes.
- auxiliary anodes are often used to seal the frames when the hangers are tightly sealed To optimize layer thickness distribution. For technical reasons, it is not possible here to separate these auxiliary anodes by ion exchange membranes. Therefore, cyanide formation can not be completely avoided in this application.
- EP 1 702 090 B1 claims a method which provides for the separation of the cathode and anode compartments through an open cell material.
- the separator is made of polytetrafluoroethylene or polyolefin, such as polypropylene or polyethylene.
- the pore diameters have a dimension between 10 nm and 50 ⁇ m.
- ion exchange membranes where the charge transport through the membrane is carried out by the exchange of cations or anions, it can be carried out with the use of open-cell separators only by the electrolyte transport through the separator. Complete separation of the catholyte from the anolyte is not possible. It can therefore not be completely prevented that amines reach the anode and are oxidized there. Cyanide formation is therefore not completely ruled out in this process.
- a disadvantage of this method also that when using separators with a very small pore diameter (eg 10 nm) of the electrolyte exchange and thus the current transport is very much hindered, which leads to an overvoltage.
- the overvoltage is claimed to be less than 5 volts, a bath voltage of at most 5 volts overvoltage would still be nearly doubled compared to a process which operates without separation of the cathode and anode compartments. This results in a much higher energy consumption during the deposition of the zinc nickel layers.
- the up to 5 volts higher bath voltage also causes a strong heating of the electrolyte.
- the separator may also have a pore diameter of 50 microns, which may prevent the formation of overvoltage, but the relatively large pore diameter again allows a virtually unhindered exchange of electrolyte between the cathode and anode space and thus can not prevent the formation of cyanides.
- the anode and cathode space is separated there by a filtration membrane.
- the size of the pores of the filtration membrane is in the range of 0.1 to 300 nm.
- a certain transfer of electrolyte from the cathode to the anode space is deliberately accepted.
- DE 103 45 594 A1 describes a cell for the anodic oxidation of cyanides in aqueous solutions, comprising a fixed bed anode and a cathode, which is characterized in that the particle bed of the anode consists of particles of manganese or the oxides of titanium or mixtures of these particles.
- the published patent application describes that this process is suitable for reducing cyanometallate complexes in wastewaters. Accordingly, it is in the treatment of in DE 103 45 594 A1 described cyanide-containing aqueous solutions aim to remove existing cyanides and cyanometalate complexes from the wastewater. This is in contrast to the object of the present invention, in which only the formation of cyanides is to be prevented.
- the object of the present invention is to provide a process for the electrodeposition of zinc and zinc alloy coatings from an alkaline coating bath with zinc and zinc alloying electrolytes and organic bath additives, which has a reduced anodic oxidation and a concomitant reduced degradation of the organic bath additives, such as complexing agents, brighteners, wetting agents, etc., as well as a reduced formation of undesirable degradation products, such as cyanides causes.
- the method according to the invention should make it possible to be integrated into existing alkaline zinc and zinc alloy baths without additional effort, and to allow a significantly more economical operation of the method.
- electrodes made of metallic manganese or a manganese-containing alloy and suitable for use as an insoluble anode in an alkaline zinc and zinc alloy bath are suitable.
- the manganese-containing alloy is preferably selected from a manganese-containing steel alloy or a manganese-containing nickel alloy. In the process according to the invention, the use of a manganese-containing steel alloy is particularly preferred.
- the alloy content of the manganese-containing alloy has a manganese content of at least 5% by weight of manganese, preferably 10 to 90% by weight of manganese, particularly preferably 50 to 90% by weight of manganese.
- Commercially available steel electrodes have, for example, a manganese content of 12% by weight of manganese (X120Mn12 with the material number: 1.3401) or 50% by weight of manganese (mirror iron).
- the above-mentioned solid electrodes made of metallic manganese or a manganese-containing alloy there are also electrodes made of an electrically conductive substrate suitable for use as an insoluble anode in an alkaline zinc and zinc alloy bath with metallic manganese deposited thereon and / or manganese oxide-containing coating in question.
- the support material is preferably selected from steel, titanium, nickel or graphite. In the process according to the invention, the use of steel as carrier material is particularly preferred.
- the metallic manganese and / or manganese oxide-containing coating has a manganese content of at least 5% by weight of manganese, preferably 10-100% by weight of manganese, particularly preferably 50-100% by weight of manganese, and particularly preferably 80-100% by weight. Manganese, based on the total amount of manganese, which results from metallic manganese and manganese oxide, on.
- the metallic manganese and / or manganese oxide-containing coating can be applied to the support, therefore, by several methods, including by thermal spraying, cladding, or chemical vapor deposition such as physical vapor deposition (PVD of Engl. Physical vapor deposition).
- the layer thickness of the metallic manganese and / or manganese oxide-containing coating is not decisive, and depending on the method can be a few nanometers (eg by PVD method) up to several millimeters (eg by thermal spraying method).
- the coating containing metallic manganese and / or manganese oxide can be applied to the carrier by thermal spraying.
- the manganese-containing coating material used for thermal spraying can consist of both metallic manganese and of a mixture which contains iron and / or nickel in addition to metallic manganese.
- the manganese-containing coating material used for thermal spraying preferably has a manganese content of 80% by weight manganese or more, preferably 90% by weight manganese or more, particularly preferably 100% by weight manganese.
- the manganese-containing coating material is preferably used in a form suitable for thermal spraying, for example as powder or wire.
- atomizing gas e.g., compressed air or inert gas such as nitrogen and argon
- spun onto the surface of the carrier to be coated e.g., a good connection to the carrier surface and a firm metallic manganese and / or manganese oxide layer is formed, mainly by mechanical clamping.
- the carrier to be coated can be roughened by corundum blasting prior to the thermal spraying process (blasting material in this case is zirconium corundum).
- blasting material in this case is zirconium corundum.
- Another possibility is to place an additional primer between the support and the metallic manganese and / or manganese oxide-containing coating.
- the primer may for example consist of nickel.
- the primer may be produced by the same thermal spraying method as the metallic manganese and / or manganese oxide-containing coating, for example flame spraying or arc spraying.
- the primer is usually produced with a layer thickness of 50-100 ⁇ m.
- the manganese-containing coating material is usually thermally sprayed directly onto the primer.
- the manganese-containing coating material is usually thermally sprayed directly onto the substrate to be coated.
- the manganese-containing coating material can be thermally sprayed onto the carrier by means of conventional spraying methods. These include: Arc Wire Spraying, Thermo Spray Powder Spraying, Flame Spraying, High Speed Flame Spraying, Plasma Spraying, Autogenous Bar Spraying, Autogenous Wire Spraying, Laser Spraying, Cold Gas Spraying, Detonation Spraying, and Plasma Transferred Wire Arc (PTWA) Spraying. These methods are known per se to the person skilled in the art.
- the manganese-containing coating material can be applied to the carrier, in particular by means of flame spraying or electric arc spraying. For the use of a powdered manganese-containing coating material is particularly suitable flame spraying.
- the self-fluxing powders usually additionally require a thermal aftertreatment, whereby the adhesion of the sprayed layer on the carrier is considerably increased.
- the thermal aftertreatment is usually carried out with acetylene-oxygen burners.
- the sprayed layer becomes both gas-tight and liquid-tight, for which reason the manganese-containing coating material is preferably applied to the carrier by means of powder flame spraying.
- layer thicknesses of 50 ⁇ m up to several millimeters can be applied to the carrier by means of the abovementioned method.
- the thermal spraying can be carried out both under an air atmosphere and under an inert gas atmosphere.
- This can usually be regulated by the type of nebulizer gas.
- an inert gas such as nitrogen or argon
- oxidation of the manganese-containing coating material is largely prevented.
- a manganese layer of metallic manganese or a manganese alloy can be applied to the carrier.
- manganese oxides would then form in the course of the electrodeposition process on the carrier anode with the metallic manganese or manganese alloy layer applied thereon, which constitute the active surface.
- these can also be applied in advance on the carrier.
- a positive effect ie suppression of the anodic oxidation of the organic bath additives.
- the manganese-containing coating material sprayed under air atmosphere then contains, in addition to metallic, a layer applied to the carrier Manganese and optionally iron and / or nickel and manganese oxides, and optionally iron oxides and / or nickel oxides or combinations thereof.
- the coating containing metallic manganese and / or manganese oxide can also be applied by build-up welding, also known as weld-cladding.
- the manganese-containing coating material used for build-up welding can consist of both metallic manganese and a mixture which contains iron and / or nickel in addition to metallic manganese.
- the manganese-containing coating material preferably has a manganese content of 80% by weight manganese or more, preferably 90% by weight manganese or more, particularly preferably 100% by weight manganese.
- the manganese-containing coating material is preferably used in a form suitable for build-up welding, for example as a powder, wire, rod, tape, paste or flux-cored wire.
- both the coating material and a thin surface layer of the carrier to be coated are melted by suitable energy sources and metallurgically bonded together.
- an adherent and non-porous layer is produced.
- Overlay welding differs essentially from thermal spraying in that the surface of the carrier is melted during build-up welding.
- the manganese-containing coating material can be applied to the support by means of conventional build-up welding methods be applied.
- Suitable sources of energy include: arc, flame, Joule heat, plasma jet, laser beam and electron beam. These energy sources are known per se to the person skilled in the art.
- relatively high layer thicknesses of 1 mm or more can be applied to the carrier by means of the abovementioned methods.
- the energy source is guided in pendulum movements over the carrier, whereby the manganese-containing coating material is then applied in individual layers.
- the build-up welding can also be carried out both under an air atmosphere and under an inert gas atmosphere, such as nitrogen or argon.
- an inert gas atmosphere for example, a manganese layer of metallic manganese or a manganese alloy can be applied to the carrier.
- oxidation products are formed by the high temperatures from the manganese-containing coating material used.
- the layer formed under air atmosphere then contains, in addition to metallic manganese and optionally iron and / or nickel, manganese oxides, and optionally iron oxides and / or nickel oxides or combinations thereof.
- the metallic manganese and / or manganese oxide-containing coating can also be applied to the support by vapor deposition, such as physical vapor deposition (PVD).
- PVD physical vapor deposition
- the manganese-containing coating material used for the physical vapor deposition is usually metallic manganese, but others for this Process suitable manganese-containing solids, such as manganese oxide, are used.
- the manganese-containing coating material may be applied to the support by conventional vapor deposition techniques.
- the processes of physical vapor deposition include the processes: evaporation, such as thermal evaporation, electron beam evaporation, laser beam evaporation and arc evaporation, sputtering, and ion plating, as well as reactive variants of these methods.
- the manganese-containing coating material is atomized by bombardment with laser beams, magnetically deflected ions, electrons or by arc discharge (eg during sputtering) or brought into the gas phase (eg during evaporation) and subsequently as a manganese-containing solid to deposit on the surface of the carrier to be coated.
- the process In order for the gaseous manganese-containing coating material to reach the support to be coated, the process must be carried out under reduced pressure of about 10 -4 - 10 Pa.
- layer thicknesses of 100 nm-2 mm can be applied to the substrate by means of PVD methods.
- electrodes consisting of a composite material comprising metallic manganese and / or manganese oxide and a conductive material are also suitable.
- a conductive Material can be used for example carbon, preferably graphite.
- the metallic manganese and / or manganese oxide-containing composite material has a manganese content of at least 5 wt.% Manganese, preferably at least 10 wt.% Manganese, more preferably at least 50 wt.% Manganese, based on the total amount of manganese, which consists of metallic Manganese and manganese oxide yields.
- the manner of preparation of such a manganese-containing composite electrode is not particularly limited. Therefore, common methods such as sintering or pressing with binder are suitable. Furthermore, the manganese-containing composite electrode can also be produced by incorporating metallic manganese or manganese oxide in foam metal. These methods are known per se to the person skilled in the art.
- the zinc and zinc alloy baths are not particularly limited as long as they are alkaline and contain organic bath additives such as complexing agents, brighteners, wetting agents, etc.
- a typical zinc and zinc alloy bath for the process according to the invention is, for example, an alkaline zinc nickel alloy bath.
- a zinc nickel alloying bath is used for depositing a zinc nickel alloy plating from an alkaline zinc nickel electrolyte on a cathode connected substrate.
- This contains in the new batch typically a zinc ion concentration in the range of 5 to 15 g / l, preferably 6 to 10 g / l calculated as zinc, and a nickel ion concentration in the range of 0.5 to 3 g / l, preferably 0.6 to 1, 5 g / l, calculated as Nickel.
- the zinc and nickel compounds used for the production of the zinc nickel electrolyte are not particularly limited. Usable are, for example, nickel sulfate, nickel chloride, nickel sulfamate or nickel methanesulfonate. Particularly preferred is the use of nickel sulfate.
- alkaline zinc and zinc alloy baths contain organic bath additives such as complexing agents, brighteners, wetting agents, etc.
- Alkaline zinc nickel electrolytes therefore contain special complexing agents for nickel.
- the complexing agents are not particularly limited, and any known complexing agents can be used. Preferred are amine compounds such as triethanolamine, ethylenediamine, tetrahydroxopropylethylenediamine (Lutron Q 75), diethylenetetramine, or homologous compounds of ethylenediamine, e.g. Diethylenetriamine, tetraethylenepentamine, etc., used.
- the complexing agent and / or mixtures of these complexing agents is / are usually used in a concentration in the range of 5 to 100 g / l, preferably 10 to 70 g / l, more preferably 15 to 60 g / l.
- brighteners are commonly used in zinc and zinc alloy baths. These are not particularly limited, and any known brighteners may be used.
- Aromatic or heteroaromatic compounds such as benzylpyridiniumcarboxylate or pyridinium-N-propane-3-sulphonic acid (PPS), are preferably used as brighteners.
- the electrolyte used in the process according to the invention is basic.
- sodium hydroxide and / or potassium hydroxide can be used.
- Particularly preferred is sodium hydroxide.
- the pH of the aqueous alkaline solution is usually 10 or more, preferably 12 or more, more preferably 13 or more.
- a zinc nickel bath usually contains 80-160 g / l of sodium hydroxide. This corresponds to an approximately 2-4 molar solution.
- the substrate connected as a cathode is not particularly limited, and any known materials suitable for use as a cathode in a galvanic coating process for depositing a zinc or zinc alloy coating from an alkaline electrolyte may be used. In the method according to the invention, therefore, substrates of steel, hardened steel, forged or die-cast zinc can therefore be used as the cathode.
- a galvanic device for depositing zinc and zinc alloy coatings from an alkaline coating bath with zinc and zinc alloying electrolytes and organic bath additives is provided which contains as the anode an insoluble, metallic manganese and / or manganese oxide-containing electrode as described above.
- the device according to the invention does not require that the anode and cathode compartments are separated from one another by membranes and / or separators.
- the base bath batch (2 liters of SLOTOLOY ZN 80) had the following composition: Zn: 7.5 g / l as ZnO Ni: 0.6 g / l as NiSO 4 x 6 H 2 O.
- NaOH 120 g / l
- SLOTOLOY ZN 81 40 ml / l (complexing agent mixture)
- SLOTOLOY ZN 82 75 ml / l (complexing agent mixture)
- SLOTOLOY ZN 87 2.5 ml / l (base gloss additive)
- SLOTOLOY ZN 86 1.0 ml / l (top gloss)
- the above base bath mixture contains: 10.0 g / l DETA (diethylenetriamine), 9.4 g / l TEA (85% by weight triethanolamine), 40.0 g / l Lutron Q 75 (BASF; 75% by weight tetrahydroxopropylethylenediamine) and 370 mg / l PPS (1- (3-sulfopropyl) pyridinium betaine).
- the bath temperature was adjusted to 35 ° C.
- the agitation during the power pulp coating was 250 to 300 rpm.
- the stirring movement during the load plate coating was 0 rpm.
- the current densities at the anode and at the cathode were kept constant.
- Anode 1 steel (material number 1.0330) with a manganese oxide layer applied thereto by thermal spraying (hereinafter defined as "Mn oxide anode”); Production: A 2 mm thick steel sheet (material number 1.0330) was degreased, roughened with corundum (blasting material is zirconium corundum) and then freed of adhering residues with compressed air. The steel sheet was then sprayed with nickel to improve the primer by arc spraying first with nickel. A nickel wire in the arc (temperature at the burner head 3000 to 4000 ° C) was melted and sprayed with compressed air (6 bar) as atomizing gas at a distance of 15 to 18 cm on the steel sheet.
- Mn oxide anode thermal spraying
- the manganese oxide layer was thermally sprayed by means of powder flame spraying.
- metallic manganese powder (-325 mesh, ⁇ 99% from Sigma Aldrich) in an acetylene-oxygen flame (temperature of the burner flame was 3160 ° C) melted and with compressed air (maximum 3 bar) as atomizing gas at a distance of 15 to 20 cm sprayed onto the steel sheet.
- compressed air maximum 3 bar
- the deposited zinc nickel alloy amount present on the deposition plate was weighed by weight determined.
- the total amount of metal missing from deposition in the zinc nickel electrolyte was converted to 85% by weight of zinc and 15% by weight of nickel (for example, 850 mg of zinc and 150 mg of nickel were metered in for a total deposited metal amount of 1.0 g of zinc nickel alloy layer).
- SLOTOLOY ZN 85 contains nickel sulphate and the amines triethanolamine, diethylenetriamine and Lutron Q 75 (1 ml SLOTOLOY ZN 85 contains 63 mg nickel).
- the NaOH content was determined after each 10 Ah / l by acid-base titration and in each case adjusted to 120 g / l.
- the determination of the cyanide was carried out with the cuvette test LCK 319 for easily releasable cyanides from Dr. Ing. Long (today company Hach). Easily releasable cyanides are converted by a reaction into gaseous HCN and transferred through a membrane into an indicator cuvette. The color change of the indicator is then evaluated photometrically.
- Test Example 1.2 was carried out under the same conditions as described in Test Example 1.1.
- Table 7 shows that with an approximately equal nickel alloy content, depending on the applied cathodic current density, a 3 to 8% higher current efficiency could be achieved by using the Mn oxide anode according to the invention after 100 Ah / l load compared to the comparative anode commonly used as a standard anode 2 (bright nickel-plated steel, see Table 5).
- the predefined layer thickness on components can thus be achieved in practice in a shorter time. This leads to a significant reduction in process costs.
- Test Example 1.3 was carried out under the same conditions as described in Test Example 1.1.
- Scheme 1 shows the result of the test panels coated in a bath operated with Comparative Anodes 1 to 3.
- Scheme 2 shows the result of the test panel which was coated in a bath operated with the Mn oxido anode of the present invention.
- the Hull cell plate which was operated with the Mn Oxidanode invention (see Scheme 2), shows after 100 Ah / l over the entire current density range uniform semi-glossy to shiny appearance, which is a measure of the remaining and undamaged bath additives.
- the Hullzellenbleche from the zinc nickel electrolyte of the comparative anodes 1 to 3 show only in the range ⁇ 2 A / dm 2 (corresponding to a distance of 4 cm from the right sheet metal edge to the right sheet metal edge) a semi-glossy to shiny appearance.
- the remaining sheet metal area is semi-glossy to matt.
- the alkaline zinc nickel electrolyte SLOTOLOY ZN 210 (Schlötter) was subjected to load tests using different anode materials. Here, the deposition behavior was analyzed over a longer period of time with a constant cathodic and anodic current density. Depending on the amount of current applied, the zinc-nickel electrolyte has been treated with respect to the degradation products forming at the anode, e.g. Cyanide, studied. In addition, an analysis of the organic complexing agents and brighteners was carried out.
- the base bath batch (2 liters of SLOTOLOY ZN 210) had the following composition: Zn: 7.5 g / l as ZnO Ni: 1.0 g / l as NiSO 4 x 6 H 2 O.
- NaOH 120 g / l
- SLOTOLOY ZN 211 100 ml / l (complexing agent mixture)
- SLOTOLOY ZN 212 30 ml / l (complexing agent mixture)
- SLOTOLOY ZN 215 14 ml / l (nickel solution)
- SLOTOLOY ZN 213 5 ml / l (basic gloss additive)
- SLOTOLOY ZN 216 0.2 ml / l (top gloss)
- the above base bath mixture contains: 22.4 g / l TEPA (tetraethylene pentamine), 10.2 g / l TEA (85 wt%) and 5.4 g / l Lutron Q 75 (BASF; 75 wt% tetrahydroxopropylethylenediamine) and 75 mg / l PPS (1- (3-sulfopropyl) pyridinium betaine).
- the bath temperature was adjusted to 28 ° C.
- the stirring during the load plate coating was 0 rpm.
- the current densities at the anode, as well as at the cathode were kept constant.
- the deposited zinc nickel alloy amount present on the deposition plate was weighed by weight determined.
- the total amount of metal missing from deposition in the zinc nickel electrolyte was converted to 85% by weight of zinc and 15% by weight of nickel (for example, 850 mg of zinc and 150 mg of nickel were metered in for a total deposited metal amount of 1.0 g of zinc nickel alloy layer).
- the nickel consumed in the electrolyte was supplemented by the nickel-containing liquid concentrate SLOTOLOY ZN 215.
- the SLOTOLOY ZN 215 contains nickel sulphate and the amines triethanolamine, tetraethylenepentamine and Lutron Q 75 (1 ml SLOTOLOY ZN 215 contains 70 mg nickel).
- the NaOH content was determined after each 10 Ah / l by acid-base titration and in each case adjusted to 120 g / l.
- zinc pellets were introduced into the electrolyte in a manner corresponding to zero current. This leads to zinc dissolution due to the alkalinity of the electrolyte.
- the zinc content was also analyzed analytically by means of titration in the laboratory.
- the determination of the cyanide was carried out with the cuvette test LCK 319 for easily releasable cyanides from Dr. Ing. Lange (today Hach company). Easily releasable cyanides are converted by a reaction into gaseous HCN and transferred through a membrane into an indicator cuvette. The color change of the indicator is then evaluated photometrically.
- the manganese alloy anode according to the invention was also compared with the comparison anode 2 made of high-gloss nickel-plated steel in the pilot plant.
- a newly prepared SLOTOLOY ZN 80 (Schlötter) electrolyte was initially operated for about 6 months with four standard anodes of high-gloss nickel-plated steel (comparative anode 2), thereby achieving a cyanide content of 372 mg / l in the zinc nickel electrolyte.
- the standard anodes of high gloss nickel-plated steel were replaced by manganese alloy anodes according to the invention.
- the zinc nickel electrolyte was then subjected to another 4 months under the same conditions.
- the base bath batch (200 liters of SLOTOLOY ZN 80) had the following composition: Zn: 7.5 g / l as ZnO Ni: 0.6 g / l as NiSO 4 x 6 H 2 O.
- NaOH 110 g / l
- SLOTOLOY ZN 81 40 ml / l (complexing agent mixture)
- SLOTOLOY ZN 82 75 ml / l (complexing agent mixture)
- SLOTOLOY ZN 87 2.5 ml / l (base gloss additive)
- SLOTOLOY ZN 83 2.5 ml / l (base gloss additive)
- SLOTOLOY ZN 86 1.0 ml / l (top gloss)
- the above base bath mixture contains: 10.0 g / l DETA (diethylenetriamine), 9.4 g / l TEA (85% by weight triethanolamine), 40.0 g / l Lutron Q 75 (BASF; 75% by weight tetrahydroxopropylethylenediamine) and 370 mg / l PPS (1- (3-sulfopropyl) pyridinium betaine).
- the bath volume was 200 liters.
- the bath temperature was set at 33 ° C.
- the current densities at the anode and at the cathode were kept constant.
- the monthly bath load was 25000 Ah.
- the stress in the pilot plant was carried out under practical conditions, i. that the bath additives, metals and the sodium hydroxide solution were continuously added.
- the metered amount of additive SLOTOLOY ZN 86 was deliberately reduced here, since the additional degradation of the manganese alloy anodes according to the invention is lower.
- the nickel consumed in the electrolyte was supplemented by the nickel-containing liquid concentrate SLOTOLOY ZN 85.
- the SLOTOLOY ZN 85 are nickel sulphate and the amines are triethanolamine, diethylenetriamine and Lutron Q 75 (1 ml of SLOTOLOY ZN 85 contains 63 mg of nickel).
- the necessary amount of nickel was determined by means of suitable analytical methods (eg ICP, AAS).
- zinc pellets were introduced into the electrolyte in a manner corresponding to zero current. This leads to zinc dissolution due to the alkalinity of the electrolyte.
- the zinc content was also analyzed analytically by means of titration in the laboratory.
- the content of sodium hydroxide in the electrolyte was analytically analyzed by titration in the laboratory (after every 5 Ah / l load) and supplemented accordingly.
- the newly prepared SLOTOLOY ZN 80 electrolyte which was operated with four standard anodes made of high-gloss nickel-plated steel (comparative anode 2), had a cyanide content of 372 mg / l after about 6 months.
- the standard anodes of high gloss nickel-plated steel were replaced by manganese alloy anodes according to the invention (in Table 10 defined as "Start").
- the zinc nickel electrolyte was then subjected to another 4 months under the same conditions. At a distance of one month each, the influence of the manganese alloy anodes according to the invention on the cyanide content and the organic bath additives was investigated.
- the determination of the cyanide was carried out with the cuvette test LCK 319 for easily releasable cyanides from Dr. Ing. Lange (today Hach company). Easily releasable cyanides are converted by a reaction into gaseous HCN and transferred through a membrane into an indicator cuvette. The color change of the indicator is then evaluated photometrically.
- the degree of gloss of the deposited layer increased as the cyanide content decreased.
- the additive SLOTOLOY ZN 86 containing PPS could be reduced from an addition amount of 100 ml during operation with Comparative Anodes 2 to 60 ml by using the manganese alloy anodes of the present invention.
- the base bath batch (2 liters of SLOTOLOY ZN 80) had the following composition: Zn: 7.5 g / l as ZnO Ni: 0.6 g / l as NiSO 4 x 6 H 2 O.
- NaOH 120 g / l
- SLOTOLOY ZN 81 40 ml / l (complexing agent mixture)
- SLOTOLOY ZN 82 75 ml / l (complexing agent mixture)
- SLOTOLOY ZN 87 2.5 ml / l (base gloss additive)
- SLOTOLOY ZN 86 1.0 ml / l (top gloss)
- the above base bath mixture contains: 10.0 g / l DETA (diethylenetriamine), 9.4 g / l TEA (85% by weight triethanolamine), 40.0 g / l Lutron Q 75 (BASF; 75% by weight tetrahydroxopropylethylenediamine) and 370 mg / l PPS (1- (3-sulfopropyl) pyridinium betaine).
- the bath temperature was adjusted to 35 ° C.
- the agitation during the power pulp coating was 250 to 300 rpm.
- the stirring movement during the load plate coating was 0 rpm.
- the current densities at the anode and at the cathode were kept constant.
- Comparative Anode 2 Bright nickel-plated steel; Steel (material number 1.0330) with a coating layer of 30 ⁇ m bright nickel (coated with SLOTONIK 20 electrolyte from Schlötter); Production: See JN balance, Tables Galvanotechnik, 7th edition, EUGEN G. LEUZE Verlag, Bad Saulgau, p.515)
- Anode 3 steel (material number 1.0330) with a manganese iron oxide layer applied thereto by thermal spraying (hereinafter defined as "Mn-Fe oxide anode”); Production: A 2 mm thick steel sheet (material number 1.0330) was degreased, roughened with corundum (blasting material is zirconium corundum) and then freed of adhering residues with compressed air. The steel sheet was then sprayed with nickel to improve the primer by arc spraying first with nickel. A nickel wire in the arc (temperature at the burner head 3000 to 4000 ° C) was melted and sprayed with compressed air (6 bar) as atomizing gas at a distance of 15 to 18 cm on the steel sheet.
- Mn-Fe oxide anode thermal spraying
- the manganese-iron-oxide layer was thermally sprayed by means of powder flame spraying.
- the coating material used was a mixture of 90% by weight metallic manganese powder (-325 mesh, ⁇ 99% from Sigma Aldrich) and 10% by weight metallic iron powder (-325 mesh, 97% from Sigma Aldrich). Care was taken to mix the two powders homogeneously before the thermal spraying process.
- the metallic manganese-iron mixture in an acetylene-oxygen flame temperature of the burner flame was 3160 ° C
- compressed air maximum 3 bar
- Anode 4 steel (material number 1.0330) with a manganese-nickel-oxide layer (hereinafter defined as "Mn-Ni-oxidanode") applied thereto by thermal spraying;
- Production A 2 mm thick steel sheet (material number 1.0330) was degreased, roughened with corundum (blasting material is zirconium corundum) and then freed of adhering residues with compressed air.
- the steel sheet was then sprayed with nickel to improve the primer by arc spraying first with nickel.
- a nickel wire in the arc temperature at the burner head 3000 to 4000 ° C
- the manganese-nickel oxide layer was thermally sprayed by means of powder flame spraying.
- a mixture of 80 wt% metallic manganese powder (-325 mesh, ⁇ 99% from Sigma Aldrich) and 20 wt% metallic nickel powder (-325 mesh, ⁇ 99% from Alfa Aesar) was used. Care was taken to mix the two powders homogeneously before the thermal spraying process.
- the metallic manganese-nickel mixture in an acetylene-oxygen flame temperature of the burner flame was 3160 ° C
- the metallic manganese-nickel mixture in an acetylene-oxygen flame melted and sprayed with compressed air (maximum 3 bar) as atomizing gas at a distance of 15 to 20 cm on the steel sheet.
- compressed air maximum 3 bar
- SLOTOLOY ZN 85 contains nickel sulphate and the amines triethanolamine, diethylenetriamine and Lutron Q 75 (1 ml SLOTOLOY ZN 85 contains 63 mg nickel).
- the NaOH content was determined after each 10 Ah / l by acid-base titration and in each case adjusted to 120 g / l.
- the determination of the cyanide was carried out with the cuvette test LCK 319 for easily releasable cyanides from Dr. Ing. Lange (today Hach company). Easily releasable cyanides are converted by a reaction into gaseous HCN and transferred through a membrane into an indicator cuvette. The color change of the indicator is then evaluated photometrically.
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Priority Applications (19)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP17155082.5A EP3358045A1 (fr) | 2017-02-07 | 2017-02-07 | Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques |
| TW107103169A TWI763777B (zh) | 2017-02-07 | 2018-01-30 | 自具有降低之有機浴添加劑劣化的鹼性塗覆浴電流沉積鋅及鋅合金塗層的方法 |
| US16/325,374 US11339492B2 (en) | 2017-02-07 | 2018-02-05 | Method for electrodepositing zinc and zinc alloy coatings from an alkaline coating bath with reduced depletion of organic bath additives |
| MX2019002586A MX374901B (es) | 2017-02-07 | 2018-02-05 | Metodo para la deposicion galvanica de revestimientos de zinc y aleaciones de zinc a partir de un ba?o de revestimiento alcalino con degradacion reducida de aditivos organicos del ba?o |
| ES18702306T ES2790584T3 (es) | 2017-02-07 | 2018-02-05 | Procedimiento para la deposición galvánica de revestimientos de cinc y de aleación de cinc a partir de un baño de recubrimiento alcalino con degradación reducida de aditivos de baño orgánicos |
| HUE18702306A HUE049752T2 (hu) | 2017-02-07 | 2018-02-05 | Eljárás galvánbevonat készítésére cink és cinkötvözet rétegekkel lúgos bevonó fürdõbõl, a szerves fürdõ-adalékanyagok csökkentett elbomlásával |
| PL18702306T PL3481976T3 (pl) | 2017-02-07 | 2018-02-05 | Sposób galwanicznego osadzania powłok cynkowych i ze stopów cynku z alkalicznej kąpieli powlekającej o zmniejszonej degradacji organicznych dodatków do kąpieli |
| CN201880003894.6A CN110325669B (zh) | 2017-02-07 | 2018-02-05 | 由有机浴添加剂的降解减少的碱性镀浴电沉积锌和锌合金涂层的方法 |
| HRP20200760TT HRP20200760T1 (hr) | 2017-02-07 | 2018-02-05 | Postupak za galvansku depoziciju cinka i slojeva legure cinka i z alkalne obložne kupke sa smanjenom razgradnjom aditiva organske kupke |
| BR112019004029-3A BR112019004029B1 (pt) | 2017-02-07 | 2018-02-05 | processo para deposição galvânica de revestimentos de zinco e liga de zinco a partir de um banho de revestimento alcalino com degradação reduzida de aditivos orgânicos de banho |
| SI201830052T SI3481976T1 (sl) | 2017-02-07 | 2018-02-05 | Postopek za galvansko nanašanje prevlek iz cinka in cinkovih zlitin iz alkalijske nanašalne kopeli z zmanjšano razgradnjo organskih dodatkov v kopeli |
| PCT/EP2018/052779 WO2018146041A1 (fr) | 2017-02-07 | 2018-02-05 | Procédé pour le dépôt électrolytique de revêtements de zinc et d'alliage de zinc à partir d'un bain de revêtement alcalin, avec dégradation réduite des additifs organiques du bain |
| KR1020197006596A KR102086616B1 (ko) | 2017-02-07 | 2018-02-05 | 유기 욕 첨가제의 열화를 감소시킨 알칼리성 코팅욕으로부터 아연 및 아연합금 코팅의 갈바니 퇴적 방법 |
| RU2019115883A RU2724765C1 (ru) | 2017-02-07 | 2018-02-05 | Способ гальванического осаждения покрытий из цинка и цинкового сплава из щелочной ванны для нанесения покрытия с пониженным разложением органических добавок в ванне |
| DK18702306.4T DK3481976T3 (da) | 2017-02-07 | 2018-02-05 | Fremgangsmåde til galvanisk pådampning af zink og zinklegeringslag fra et alkalisk coatingbad med reduceret neddbrydning af organiske badtilsætningsstoffer |
| PT187023064T PT3481976T (pt) | 2017-02-07 | 2018-02-05 | Método para a deposição galvânica de camadas de zinco e de ligas de zinco a partir de um banho de revestimento alcalino com degradação reduzida de aditivos orgânicos do banho |
| JP2019514818A JP6644952B2 (ja) | 2017-02-07 | 2018-02-05 | 有機浴添加物の分解が低減されたアルカリ性コーティング浴から亜鉛及び亜鉛合金被膜をガルバニック堆積するための方法 |
| EP18702306.4A EP3481976B1 (fr) | 2017-02-07 | 2018-02-05 | Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques |
| PH12019500424A PH12019500424B1 (en) | 2017-02-07 | 2019-02-27 | Method for electrodepositing zinc and zinc alloy coatings from an alkaline coating bath with reduced depletion of organic bath additives |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP17155082.5A EP3358045A1 (fr) | 2017-02-07 | 2017-02-07 | Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP3358045A1 true EP3358045A1 (fr) | 2018-08-08 |
Family
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Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP17155082.5A Withdrawn EP3358045A1 (fr) | 2017-02-07 | 2017-02-07 | Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques |
| EP18702306.4A Active EP3481976B1 (fr) | 2017-02-07 | 2018-02-05 | Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP18702306.4A Active EP3481976B1 (fr) | 2017-02-07 | 2018-02-05 | Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques |
Country Status (18)
| Country | Link |
|---|---|
| US (1) | US11339492B2 (fr) |
| EP (2) | EP3358045A1 (fr) |
| JP (1) | JP6644952B2 (fr) |
| KR (1) | KR102086616B1 (fr) |
| CN (1) | CN110325669B (fr) |
| BR (1) | BR112019004029B1 (fr) |
| DK (1) | DK3481976T3 (fr) |
| ES (1) | ES2790584T3 (fr) |
| HR (1) | HRP20200760T1 (fr) |
| HU (1) | HUE049752T2 (fr) |
| MX (1) | MX374901B (fr) |
| PH (1) | PH12019500424B1 (fr) |
| PL (1) | PL3481976T3 (fr) |
| PT (1) | PT3481976T (fr) |
| RU (1) | RU2724765C1 (fr) |
| SI (1) | SI3481976T1 (fr) |
| TW (1) | TWI763777B (fr) |
| WO (1) | WO2018146041A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3715506A4 (fr) * | 2019-02-15 | 2021-04-14 | Dipsol Chemicals Co., Ltd. | Procédé et système d'électrodéposition de zinc ou d'alliage de zinc |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021131340A1 (fr) * | 2019-12-23 | 2021-07-01 | ディップソール株式会社 | Bain galvanoplastique au zinc nickel et procédé de placage faisant appel à celui-ci |
| CN116670334A (zh) | 2020-12-28 | 2023-08-29 | 迪普索股份公司 | 用金属对物品进行电镀的方法和系统 |
| US12428745B2 (en) | 2021-12-02 | 2025-09-30 | Dipsol Chemicals Co., Ltd. | Method and system for electroplating parts with metal |
| JP7442866B1 (ja) | 2022-11-25 | 2024-03-05 | ディップソール株式会社 | 電気めっき用陽極並びに金属で物品を電気めっきする方法及びシステム |
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| EP0090435A1 (fr) * | 1982-02-18 | 1983-10-05 | Eltech Systems Corporation | Procédé d'électrodéposition |
| EP1292724A1 (fr) | 2000-06-15 | 2003-03-19 | Taskem Inc. | Electrodeposition zinc-nickel |
| EP1344850A1 (fr) | 1998-07-30 | 2003-09-17 | Walter Hillebrand GmbH & Co. Galvanotechnik | Bain Zinc-Nickel alcalin |
| DE10306823A1 (de) * | 2003-02-19 | 2004-09-02 | Enthone Inc., West Haven | Verfahren zur Hochgeschwindigkeitsabscheidung von Zink-Mangan-Legierungen |
| DE10345594A1 (de) | 2003-09-29 | 2005-05-04 | Niederrhein Hochschule | Verfahren und Zelle zur elektrochemischen Oxidation von Cyaniden |
| EP1717353A1 (fr) | 2005-04-26 | 2006-11-02 | ATOTECH Deutschland GmbH | Bain galvanique contenant une membrane de filtration |
| EP1702090B1 (fr) | 2003-12-31 | 2007-09-26 | Coventya SAS | Installation de depot de zinc ou d'alliages de zinc |
| EP2184384A1 (fr) * | 2008-11-11 | 2010-05-12 | Enthone, Inc. | Bain galvanique et procédé pour la déposition de couches contenant du zinc |
| EP2384800A1 (fr) * | 2010-05-07 | 2011-11-09 | Dr.Ing. Max Schlötter GmbH & Co. KG | Régénération d'électrolytes nickel-zinc alcalins par la suppression de cyanidiones |
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| US2243696A (en) * | 1937-02-01 | 1941-05-27 | Du Pont | Process for electrodeposition of zinc and anode therefor |
| JPS5135190B2 (fr) * | 1972-04-29 | 1976-09-30 | ||
| JPS534931B2 (fr) | 1973-12-20 | 1978-02-22 | ||
| US4814048A (en) * | 1987-06-24 | 1989-03-21 | Sumitomo Metal Industries, Ltd. | Pb alloy insoluble anode and continuous electroplating of zinc using it |
| US7247229B2 (en) * | 1999-06-28 | 2007-07-24 | Eltech Systems Corporation | Coatings for the inhibition of undesirable oxidation in an electrochemical cell |
| US20020009638A1 (en) * | 2000-06-23 | 2002-01-24 | Marion Dattilo | Composite coated electrode and method of fabricating the same |
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| WO2004108995A1 (fr) | 2003-06-03 | 2004-12-16 | Taskem Inc. | Electrodeposition de zinc et d'alliage de zinc |
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| DE102008058086B4 (de) | 2008-11-18 | 2013-05-23 | Atotech Deutschland Gmbh | Verfahren und Vorrichtung zur Reinigung von galvanischen Bädern zur Abscheidung von Metallen |
| ATE554190T1 (de) | 2009-08-25 | 2012-05-15 | Thyssenkrupp Steel Europe Ag | Verfahren zum herstellen eines mit einem metallischen, vor korrosion schützenden überzug versehenen stahlbauteils und stahlbauteil |
| EP2292679B1 (fr) | 2009-09-08 | 2020-03-11 | ATOTECH Deutschland GmbH | Polymères dotés de groupes terminaux aminés et leur utilisation comme additifs pour bains galvaniques de zinc et d'alliages de zinc |
| KR20150132574A (ko) * | 2013-03-21 | 2015-11-25 | 아토테크더치랜드게엠베하 | 가공물에 금속층을 전해 전착하기 위한 장치와 방법 |
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-
2017
- 2017-02-07 EP EP17155082.5A patent/EP3358045A1/fr not_active Withdrawn
-
2018
- 2018-01-30 TW TW107103169A patent/TWI763777B/zh active
- 2018-02-05 CN CN201880003894.6A patent/CN110325669B/zh active Active
- 2018-02-05 HR HRP20200760TT patent/HRP20200760T1/hr unknown
- 2018-02-05 HU HUE18702306A patent/HUE049752T2/hu unknown
- 2018-02-05 RU RU2019115883A patent/RU2724765C1/ru active
- 2018-02-05 PL PL18702306T patent/PL3481976T3/pl unknown
- 2018-02-05 EP EP18702306.4A patent/EP3481976B1/fr active Active
- 2018-02-05 PT PT187023064T patent/PT3481976T/pt unknown
- 2018-02-05 MX MX2019002586A patent/MX374901B/es active IP Right Grant
- 2018-02-05 US US16/325,374 patent/US11339492B2/en active Active
- 2018-02-05 WO PCT/EP2018/052779 patent/WO2018146041A1/fr not_active Ceased
- 2018-02-05 KR KR1020197006596A patent/KR102086616B1/ko active Active
- 2018-02-05 JP JP2019514818A patent/JP6644952B2/ja active Active
- 2018-02-05 BR BR112019004029-3A patent/BR112019004029B1/pt active IP Right Grant
- 2018-02-05 ES ES18702306T patent/ES2790584T3/es active Active
- 2018-02-05 SI SI201830052T patent/SI3481976T1/sl unknown
- 2018-02-05 DK DK18702306.4T patent/DK3481976T3/da active
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2019
- 2019-02-27 PH PH12019500424A patent/PH12019500424B1/en unknown
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0090435A1 (fr) * | 1982-02-18 | 1983-10-05 | Eltech Systems Corporation | Procédé d'électrodéposition |
| EP1344850A1 (fr) | 1998-07-30 | 2003-09-17 | Walter Hillebrand GmbH & Co. Galvanotechnik | Bain Zinc-Nickel alcalin |
| EP1344850B1 (fr) | 1998-07-30 | 2006-11-22 | Walter Hillebrand GmbH & Co. Galvanotechnik | Bain Zinc-Nickel alcalin |
| EP1292724A1 (fr) | 2000-06-15 | 2003-03-19 | Taskem Inc. | Electrodeposition zinc-nickel |
| EP1292724B1 (fr) | 2000-06-15 | 2005-10-12 | Taskem Inc. | Electrodeposition zinc-nickel |
| DE10306823A1 (de) * | 2003-02-19 | 2004-09-02 | Enthone Inc., West Haven | Verfahren zur Hochgeschwindigkeitsabscheidung von Zink-Mangan-Legierungen |
| DE10345594A1 (de) | 2003-09-29 | 2005-05-04 | Niederrhein Hochschule | Verfahren und Zelle zur elektrochemischen Oxidation von Cyaniden |
| EP1702090B1 (fr) | 2003-12-31 | 2007-09-26 | Coventya SAS | Installation de depot de zinc ou d'alliages de zinc |
| EP1717353A1 (fr) | 2005-04-26 | 2006-11-02 | ATOTECH Deutschland GmbH | Bain galvanique contenant une membrane de filtration |
| EP1717353B1 (fr) | 2005-04-26 | 2009-04-22 | ATOTECH Deutschland GmbH | Bain galvanique contenant une membrane de filtration |
| EP2184384A1 (fr) * | 2008-11-11 | 2010-05-12 | Enthone, Inc. | Bain galvanique et procédé pour la déposition de couches contenant du zinc |
| EP2384800A1 (fr) * | 2010-05-07 | 2011-11-09 | Dr.Ing. Max Schlötter GmbH & Co. KG | Régénération d'électrolytes nickel-zinc alcalins par la suppression de cyanidiones |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3715506A4 (fr) * | 2019-02-15 | 2021-04-14 | Dipsol Chemicals Co., Ltd. | Procédé et système d'électrodéposition de zinc ou d'alliage de zinc |
Also Published As
| Publication number | Publication date |
|---|---|
| SI3481976T1 (sl) | 2020-08-31 |
| DK3481976T3 (da) | 2020-05-18 |
| KR102086616B1 (ko) | 2020-03-09 |
| CN110325669A (zh) | 2019-10-11 |
| KR20190099388A (ko) | 2019-08-27 |
| JP2019530800A (ja) | 2019-10-24 |
| BR112019004029B1 (pt) | 2020-10-27 |
| PL3481976T3 (pl) | 2020-11-02 |
| BR112019004029A2 (pt) | 2019-08-20 |
| US20190376200A1 (en) | 2019-12-12 |
| PH12019500424B1 (en) | 2022-04-06 |
| TWI763777B (zh) | 2022-05-11 |
| US11339492B2 (en) | 2022-05-24 |
| CN110325669B (zh) | 2020-11-03 |
| EP3481976A1 (fr) | 2019-05-15 |
| EP3481976B1 (fr) | 2020-04-15 |
| RU2724765C1 (ru) | 2020-06-25 |
| PT3481976T (pt) | 2020-05-18 |
| MX2019002586A (es) | 2019-09-18 |
| JP6644952B2 (ja) | 2020-02-12 |
| HUE049752T2 (hu) | 2020-10-28 |
| WO2018146041A1 (fr) | 2018-08-16 |
| PH12019500424A1 (en) | 2019-05-27 |
| TW201842211A (zh) | 2018-12-01 |
| MX374901B (es) | 2025-03-06 |
| ES2790584T3 (es) | 2020-10-28 |
| HRP20200760T1 (hr) | 2020-10-16 |
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