EP1717353B1 - Bain galvanique contenant une membrane de filtration - Google Patents
Bain galvanique contenant une membrane de filtration Download PDFInfo
- Publication number
- EP1717353B1 EP1717353B1 EP05009127A EP05009127A EP1717353B1 EP 1717353 B1 EP1717353 B1 EP 1717353B1 EP 05009127 A EP05009127 A EP 05009127A EP 05009127 A EP05009127 A EP 05009127A EP 1717353 B1 EP1717353 B1 EP 1717353B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- filtration membrane
- bath
- electroplating bath
- cathode
- zinc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/002—Cell separation, e.g. membranes, diaphragms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/06—Filtering particles other than ions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/22—Regeneration of process solutions by ion-exchange
Definitions
- the invention relates to an alkaline electroplating bath for applying zinc alloys to substrates, in which the anode space and the cathode space are separated from one another by a filtration membrane.
- zinc alloys can be deposited on substrates in a consistently high quality.
- the electroplating bath is operated with zinc alloy baths containing organic additives such as brighteners and wetting agents and complexing agents in addition to soluble zinc salts and optionally other metal salts selected from iron, nickel, cobalt and tin salts.
- Bath dilution reduces the concentration of impurities in proportion to the degree of dilution.
- a dilution is easy to carry out, but has the disadvantage that the amount of electrolyte removed from the bath has to be supplied to cost-intensive disposal.
- a complete new approach of the bath can be considered in this context as a special case of Badver Mednung.
- Activated carbon treatment by stirring 0.5-2 g / l of activated carbon into the bath followed by filtration reduces the concentration of impurities by adsorption on the coal. Disadvantage of this method is that it is laborious is and causes only a relatively small reduction.
- Alkaline Zn baths contain a factor of 5 to 10 lower proportion of organic additives as acidic baths. Accordingly, contamination by decomposition products is generally less critical. In the case of alkaline alloy baths, however, the addition of significant amounts of organic complexing agents is required to complex the alloying additive (Fe, Co, Ni, Sn). These are oxidatively degraded at the anode and the accumulated decomposition products have a negative effect on the production process.
- the EP 1 369 505 A2 discloses a method for purifying a zinc-nickel electrolyte in a galvanic process in which a portion of the process bath used in the process is evaporated until phase separation into a lower phase, at least one middle phase and an upper phase occurs, and the lower one and the upper phase are separated. This process requires several stages and is disadvantageous in terms of its energy requirements from a cost point of view.
- the WO 00/06807 and WO 01/96631 describe electroplating baths for applying zinc-nickel coatings. To avoid the undesirable decomposition of additives at the anode, it is proposed to separate the anode from the alkaline electrolyte through an ion exchange membrane.
- Baths have the disadvantage that in the anodic decomposition of the nitrogen-containing complexing agent cyanide is formed and accumulates in non-negligible concentration.
- the invention has for its object to provide an alkaline electroplating bath, which does not have the aforementioned disadvantages.
- the life of the bath is to be increased, the anodic decomposition of organic constituents of the bath to be minimized and, when it is used, a layer thickness of consistently high quality to be obtained on the coated substrate.
- the invention relates to an alkaline electroplating bath for applying zinc alloys on substrates having a cathode and an anode comprising a zinc alloy bath having a filtration membrane of polysulfones which separates the anode space and the cathode space of the bath from each other.
- filtration membranes are used.
- the size of the pores of these filtration membranes is generally in a range of 0.0001 to 1.0 and 0.001 to 1.0 ⁇ m, respectively, depending on the type of the membrane (nano- or ultrafiltration membrane).
- the pore size is in a range of 0.1 to 0.3 microns.
- the filtration membrane in the alkaline electroplating bath according to the invention is designed as a flat membrane.
- the alkaline electroplating bath according to the invention can also be realized with other membrane forms, examples being hoses, capillaries and hollow fibers.
- Such baths are for example in US 5,417,840 .
- US 4,421,611 US 4,877,496 or US 6,652,728 described.
- the alkaline electroplating bath according to the invention has the advantage that in it also baths for the deposition of zinc alloys can be used, which are suitable for use in the from WO 00/06807 and WO 01/96631 known alkaline zinc-nickel bath with an ion exchange membrane are not suitable.
- sold by the applicant bath "Protedur Ni-75" to call which is characterized by a particularly high efficiency.
- the previously used anodes can be used further. These are mostly nickel anodes.
- the use of these anodes is less expensive than that from the WO 00/06807 known electroplating bath, in which special platinum-plated titanium anodes must be used in addition.
- the anode space is preferably made smaller than the cathode space, since the essential processes take place there.
- Both baths were operated with and without filtration membrane in 5-liter tanks.
- the filtration membrane used was the Abwa-Tec polymer membrane P150F, which has a pore size of 0.12 ⁇ m.
- the membrane was placed in the anode to cathode bath with the anolyte and catholyte being identical, ie, no special anolyte was added.
- iron sheets (7 ⁇ 10 cm), which are usually used for Hull cell tests, were used as workpieces to be coated and coated at a current density of 2 A / dm 2 .
- the baths were operated in serial connection. The movement of the iron sheets was mechanical, at a speed of 1.4 m / min.
- Table 2 shows the Hull cell layer thickness in a new approach and old approach depending on the throughput with and without filtration membrane. The layer thickness measurements were made after adjustment of the baths.
- the dots lie on the Hullzellenblechen 3 cm from the bottom and 2.5 cm from the left and right lateral edge. On the left side is the high current density (point A) and on the right the low current density (point B).
- the average layer thickness is approximately 35% higher in a new batch in the high current density range and approximately 19% higher in the low current density range as if one had not used a filtration membrane. In the old batch, it is on average 17% and 12% higher than without filtration membrane.
- a filtration membrane is produced after a throughput of> 1000 Ah / l introduced after a short time comparable to a new approach current efficiency.
- Table 3 shows the average consumption (1 / 10,000 Ah) of the electrolyte in the bath for filtration membrane electroplating baths according to the invention and baths which do not have this membrane.
- the organic consumption was reduced between 12 and 29% depending on the additive.
- Complexing agent quadrol, polyethylenimine Brilliant addition: pyridine-N-propane-3-sulfonic acid
- composition of the aforementioned baths were analyzed according to the tests described above. Of particular interest was their cyanide content. This was much lower when using the baths according to the invention with a filtration membrane as baths without membrane. As shown in Table 4 below, a bath without the membrane had a cyanide content of 680 mg / L (new batch) and 790 mg / L (bath of> 1000 Ah / L), respectively, while the corresponding membrane baths contained a cyanide Content of 96 mg / L or 190 mg / L.
- the cyanide content of an old batch ie a bath with> 1000 Ah / l can be reduced when it is provided with a filtration membrane and operated.
- the cyanide content was reduced from 670 mg / l to 190 mg / l.
- the color of the baths was also evaluated. It was found that the color of a freshly prepared bath without membrane changed from initially violet-orange to brown within 15 Ah / l, whereby it remained violet or violet-orange over the entire time when using a filtration membrane. The old batch remained brown without using a membrane and the color changed to orange-brown after 15 Ah / l using a filtration membrane. Violet is also the color of freshly applied baths, which then turn to orange (after a few Ah / l) and at high throughput in brown.
- the voltage between anode and cathode was measured. It was about 3 V and was only about 50-100 mV higher in both approaches using a filtration membrane. Is used instead of the filtration membrane an ion exchange membrane, as in the WO 00/06807 described is, the voltage is higher by at least 500 mV. This again shows the advantage of using a filtration membrane instead of an ion exchange membrane.
- the use of filtration membranes over the use of ion exchange membranes offers many advantages.
- the coating process carried out therewith is more cost-effective, since no platinized anodes have to be used, catholyte and anolyte can have the same composition, and thus no circulation for the anolyte is required.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Claims (10)
- Un bain galvanique alcalin pour le dépôt d'alliages de zinc sur des substrats avec une anode et une cathode comprenant un bain d'alliage de zinc caractérisé en ce que le compartiment anodique et le compartiment cathodique sont séparés par une membrane de filtration en polysulfones.
- Le bain galvanique alcalin selon la revendication 1, caractérisé en ce que la taille des pores est dans la fourchette de 0,0001 à 1,0pm.
- Le bain galvanique alcalin selon la revendication 2, caractérisé en ce que la taille des pores de la membrane de filtration est de préférence dans la fourchette de 0,1 à 0,3µm.
- Le bain galvanique alcalin selon la revendication 1, caractérisé en ce que la membrane de filtration est sous la forme d'une membrane plane.
- Le bain galvanique alcalin selon la revendication 1, caractérisé en ce que l'anolyte contenu dans le compartiment anodique possède la même composition que le catholyte contenu dans le compartiment cathodique.
- Utilisation d'une membrane de filtration en polysulfone pour la subdivision d'un bain galvanique alcalin avec une anode et une cathode dans un compartiment anodique et un compartiment cathodique pour élever la durée de vie, pour éviter la décomposition anodique des composants organiques du bain et pour obtenir des couches de haute qualité constante.
- Un procédé pour le dépôt d'alliages de zinc sur des substrats caractérisé en ce qu'on introduit le substrat en tant que cathode dans un bain galvanique alcalin selon les revendications 1 à 6 et on revêtit galvaniquement le substrat avec l'alliage de zinc.
- Le procédé selon la revendication 7, caractérisé en ce qu'on utilise une solution en tant qu' électrolyte comprenant les composants suivants:• 80-250 g/l NaOH, respectivement KOH• 5-20 g/l de zinc sous la forme des sels solubles de zinc• 0,02-10 g/l de métal d'alliage Ni, Fe, Co, Sn sous la forme des sels solubles de métal• 2-200 g/l d'agent complexant choisi parmi les polyalkylène-amines, les alcanolamines, les polyhydroxycarboxylates• 0,1-5 g/l de lustrant aromatique ou hétéroaromatique.
- Le procédé selon la revendication 7, caractérisé en ce qu'on effectue le revêtement à une température de 10 à 60°C, de préférence de 20 à 30°C.
- Le procédé selon la revendication 7, caractérisé en ce qu'on fait fonctionner le bain avec une densité du courant de 0,25 à 10 A/dm2, de préférence de 1 à 3 A/dm2.
Priority Applications (15)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE502005007138T DE502005007138D1 (de) | 2005-04-26 | 2005-04-26 | Alkalisches Galvanikbad mit einer Filtrationsmembran |
| AT05009127T ATE429528T1 (de) | 2005-04-26 | 2005-04-26 | Alkalisches galvanikbad mit einer filtrationsmembran |
| EP05009127A EP1717353B1 (fr) | 2005-04-26 | 2005-04-26 | Bain galvanique contenant une membrane de filtration |
| ES05009127T ES2324169T3 (es) | 2005-04-26 | 2005-04-26 | Baño galvanico alcalino con una membrana de filtracion. |
| ES09152660.8T ES2574158T3 (es) | 2005-04-26 | 2005-04-26 | Baño galvánico alcalino con una membrana de filtración |
| EP09152660.8A EP2050841B1 (fr) | 2005-04-26 | 2005-04-26 | Bain galvanique alcalin doté d'une membrane de filtration |
| CA2600273A CA2600273C (fr) | 2005-04-26 | 2006-04-26 | Bain galvanoplastique alcalin a membrane de filtration |
| CNA2006800094924A CN101146934A (zh) | 2005-04-26 | 2006-04-26 | 具有滤过膜的碱性电镀浴 |
| CN201510173898.7A CN104911676B (zh) | 2005-04-26 | 2006-04-26 | 具有滤过膜的碱性电镀浴 |
| CN201510173915.7A CN104911651A (zh) | 2005-04-26 | 2006-04-26 | 具有滤过膜的碱性电镀浴 |
| JP2008508150A JP4955657B2 (ja) | 2005-04-26 | 2006-04-26 | ろ過膜を備えたアルカリ電気めっき浴 |
| PCT/EP2006/003883 WO2006114305A1 (fr) | 2005-04-26 | 2006-04-26 | Bain galvanoplastique alcalin a membrane de filtration |
| KR1020077019889A KR101301275B1 (ko) | 2005-04-26 | 2006-04-26 | 여과막을 가지는 알칼리 전기도금조 |
| BRPI0610765A BRPI0610765B1 (pt) | 2005-04-26 | 2006-04-26 | banho alcalino de eletrogalvanização tendo uma membrana de filtração |
| US11/912,591 US8293092B2 (en) | 2005-04-26 | 2006-04-26 | Alkaline electroplating bath having a filtration membrane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05009127A EP1717353B1 (fr) | 2005-04-26 | 2005-04-26 | Bain galvanique contenant une membrane de filtration |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP09152660.8A Division EP2050841B1 (fr) | 2005-04-26 | 2005-04-26 | Bain galvanique alcalin doté d'une membrane de filtration |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1717353A1 EP1717353A1 (fr) | 2006-11-02 |
| EP1717353B1 true EP1717353B1 (fr) | 2009-04-22 |
Family
ID=35530823
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP09152660.8A Revoked EP2050841B1 (fr) | 2005-04-26 | 2005-04-26 | Bain galvanique alcalin doté d'une membrane de filtration |
| EP05009127A Expired - Lifetime EP1717353B1 (fr) | 2005-04-26 | 2005-04-26 | Bain galvanique contenant une membrane de filtration |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP09152660.8A Revoked EP2050841B1 (fr) | 2005-04-26 | 2005-04-26 | Bain galvanique alcalin doté d'une membrane de filtration |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US8293092B2 (fr) |
| EP (2) | EP2050841B1 (fr) |
| JP (1) | JP4955657B2 (fr) |
| KR (1) | KR101301275B1 (fr) |
| CN (3) | CN104911676B (fr) |
| AT (1) | ATE429528T1 (fr) |
| BR (1) | BRPI0610765B1 (fr) |
| CA (1) | CA2600273C (fr) |
| DE (1) | DE502005007138D1 (fr) |
| ES (2) | ES2574158T3 (fr) |
| WO (1) | WO2006114305A1 (fr) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2384800A1 (fr) | 2010-05-07 | 2011-11-09 | Dr.Ing. Max Schlötter GmbH & Co. KG | Régénération d'électrolytes nickel-zinc alcalins par la suppression de cyanidiones |
| EP3358045A1 (fr) | 2017-02-07 | 2018-08-08 | Dr.Ing. Max Schlötter GmbH & Co. KG | Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques |
| EP3415665A1 (fr) | 2017-06-14 | 2018-12-19 | Dr.Ing. Max Schlötter GmbH & Co. KG | Procédé de dépôt galvanique de revêtements d'alliage zinc/nicel à partir d'un bain d'alliage nickel/zinc à élimination réduite des additifs |
| EP2978877B1 (fr) | 2013-03-28 | 2020-09-23 | Coventya SAS | Bain d'electroplacage pour des alliages zinc-fer, procede de depot d'alliage zinc-fer sur un dispositif et un tel dispositif |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090107545A1 (en) * | 2006-10-09 | 2009-04-30 | Soltaix, Inc. | Template for pyramidal three-dimensional thin-film solar cell manufacturing and methods of use |
| ITTO20070704A1 (it) * | 2007-10-05 | 2009-04-06 | Create New Technology S R L | Sistema e metodo di placcatura di leghe metalliche mediante tecnologia galvanica |
| US8177944B2 (en) | 2007-12-04 | 2012-05-15 | Ebara Corporation | Plating apparatus and plating method |
| DE102008056776A1 (de) | 2008-11-11 | 2010-05-12 | Enthone Inc., West Haven | Galvanisches Bad und Verfahren zur Abscheidung von zinkhaltigen Schichten |
| IT1405319B1 (it) * | 2010-12-27 | 2014-01-03 | Fontana R D S R L | Procedimento di rivestimento di pezzi metallici filettati |
| KR101420865B1 (ko) * | 2012-10-12 | 2014-07-18 | 주식회사 익스톨 | 금속 도금장치 |
| CN106715763B (zh) | 2015-03-13 | 2019-06-07 | 奥野制药工业株式会社 | 夹具用电解剥离剂 |
| JP5830202B1 (ja) | 2015-07-22 | 2015-12-09 | ディップソール株式会社 | 亜鉛合金めっき方法 |
| KR101622527B1 (ko) | 2015-07-22 | 2016-05-18 | 딥솔 가부시키가이샤 | 아연 합금 도금 방법 |
| EP3464684A4 (fr) * | 2016-05-24 | 2020-03-11 | Coventya Inc. | Alliages ternaires de zinc-nickel-fer et électrolytes alcalins pour le placage de ces alliages |
| WO2018018161A1 (fr) * | 2016-07-29 | 2018-02-01 | Simon Fraser University | Procédé de dépôt électrochimique |
| ES2757530T3 (es) * | 2017-09-28 | 2020-04-29 | Atotech Deutschland Gmbh | Método para depositar electrolíticamente una capa de aleación de zinc-níquel sobre al menos un sustrato a tratar |
| US11165091B2 (en) | 2018-01-23 | 2021-11-02 | City University Of Hong Kong | Battery system and a method of forming a battery |
| PL3914757T4 (pl) * | 2019-01-24 | 2023-08-21 | Atotech Deutschland GmbH & Co. KG | Sposób elektrolitycznego osadzania stopu cynkowo-niklowego z zastosowaniem membranowego systemu anodowego |
| WO2020166062A1 (fr) | 2019-02-15 | 2020-08-20 | ディップソール株式会社 | Procédé et système d'électrodéposition de zinc ou d'alliage de zinc |
| RU2712582C1 (ru) * | 2019-07-16 | 2020-01-29 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Ивановский государственный химико-технологический университет" | Электролит для электроосаждения цинк-железных покрытий |
| EP4273303A1 (fr) * | 2022-05-05 | 2023-11-08 | Atotech Deutschland GmbH & Co. KG | Procédé de dépôt d'un alliage zinc-nickel sur un substrat, bain de dépôt zinc-nickel aqueux, agent d'éclaircissement et son utilisation |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB381931A (en) * | 1931-07-11 | 1932-10-11 | Mond Nickel Co Ltd | Improvements relating to electro-plating and the electrodeposition of metals |
| US3945900A (en) | 1972-05-02 | 1976-03-23 | Dorr-Oliver Incorporated | Electro ultrafiltration process and apparatus |
| IE39814B1 (en) * | 1973-08-03 | 1979-01-03 | Parel Sa | Electrochemical process and apparatus |
| US4250002A (en) * | 1979-09-19 | 1981-02-10 | Hooker Chemicals & Plastics Corp. | Polymeric microporous separators for use in electrolytic processes and devices |
| US4421611A (en) | 1982-09-30 | 1983-12-20 | Mcgean-Rohco, Inc. | Acetylenic compositions and nickel plating baths containing same |
| JPS6353285A (ja) | 1986-08-22 | 1988-03-07 | Nippon Hyomen Kagaku Kk | 亜鉛−ニツケル合金めつき液 |
| JPH01116094A (ja) * | 1987-10-28 | 1989-05-09 | Eagle Ind Co Ltd | 隔膜鍍金法 |
| JPH02141596A (ja) * | 1988-11-21 | 1990-05-30 | Yuken Kogyo Kk | ジンケート型亜鉛合金メッキ浴 |
| JPH0444375A (ja) * | 1990-06-12 | 1992-02-14 | Zexel Corp | レーザ共振器のアライメント装置 |
| US5443727A (en) | 1990-10-30 | 1995-08-22 | Minnesota Mining And Manufacturing Company | Articles having a polymeric shell and method for preparing same |
| US5082538A (en) | 1991-01-09 | 1992-01-21 | Eltech Systems Corporation | Process for replenishing metals in aqueous electrolyte solutions |
| CN2175238Y (zh) * | 1993-09-29 | 1994-08-24 | 北京科技大学 | 锌-镍合金电镀用阳极 |
| US5417840A (en) | 1993-10-21 | 1995-05-23 | Mcgean-Rohco, Inc. | Alkaline zinc-nickel alloy plating baths |
| US5631102A (en) * | 1996-02-12 | 1997-05-20 | Wilson Greatbatch Ltd. | Separator insert for electrochemical cells |
| JPH11200099A (ja) * | 1998-01-08 | 1999-07-27 | Toyo Kohan Co Ltd | 不溶性陽極を用いるめっき方法およびめっき装置 |
| DE19834353C2 (de) * | 1998-07-30 | 2000-08-17 | Hillebrand Walter Gmbh & Co Kg | Alkalisches Zink-Nickelbad |
| DE19840019C1 (de) | 1998-09-02 | 2000-03-16 | Atotech Deutschland Gmbh | Wäßriges alkalisches cyanidfreies Bad zur galvanischen Abscheidung von Zink- oder Zinklegierungsüberzügen sowie Verfahren |
| JP2000087299A (ja) * | 1998-09-08 | 2000-03-28 | Ebara Corp | 基板メッキ装置 |
| US6383352B1 (en) | 1998-11-13 | 2002-05-07 | Mykrolis Corporation | Spiral anode for metal plating baths |
| JP4060012B2 (ja) * | 1999-07-19 | 2008-03-12 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | カップ式めっき装置 |
| ES2250166T5 (es) | 2000-06-15 | 2016-05-20 | Coventya Inc | Electrochapado de zinc-níquel |
| FR2839729B1 (fr) * | 2002-05-16 | 2005-02-11 | Univ Toulouse | Procede de protection d'un substrat en acier ou alliage d'aluminium contre la corrosion permettant de lui conferer des proprietes tribologiques, et substrat obtenu |
| DE10225203A1 (de) | 2002-06-06 | 2003-12-18 | Goema Ag | Verfahren und Vorrichtung zur Spülwasserrückführung und Reinigung eines Prozessbades |
| AU2003252677A1 (en) | 2002-07-25 | 2004-02-16 | Shinryo Electronics Co., Ltd. | Tin-silver-copper plating solution, plating film containing the same, and method for forming the plating film |
| AU2003239929A1 (en) | 2003-06-03 | 2005-01-04 | Coventya Sas | Zinc and zinc-alloy electroplating |
| JP4120497B2 (ja) * | 2003-06-27 | 2008-07-16 | Jfeスチール株式会社 | 電気亜鉛系めっき鋼板 |
| FR2864553B1 (fr) | 2003-12-31 | 2006-09-01 | Coventya | Installation de depot de zinc ou d'alliages de zinc |
| US7442286B2 (en) * | 2004-02-26 | 2008-10-28 | Atotech Deutschland Gmbh | Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys |
-
2005
- 2005-04-26 AT AT05009127T patent/ATE429528T1/de not_active IP Right Cessation
- 2005-04-26 DE DE502005007138T patent/DE502005007138D1/de not_active Expired - Lifetime
- 2005-04-26 ES ES09152660.8T patent/ES2574158T3/es not_active Expired - Lifetime
- 2005-04-26 EP EP09152660.8A patent/EP2050841B1/fr not_active Revoked
- 2005-04-26 EP EP05009127A patent/EP1717353B1/fr not_active Expired - Lifetime
- 2005-04-26 ES ES05009127T patent/ES2324169T3/es not_active Expired - Lifetime
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2006
- 2006-04-26 JP JP2008508150A patent/JP4955657B2/ja not_active Expired - Fee Related
- 2006-04-26 CA CA2600273A patent/CA2600273C/fr not_active Expired - Lifetime
- 2006-04-26 CN CN201510173898.7A patent/CN104911676B/zh not_active Expired - Fee Related
- 2006-04-26 BR BRPI0610765A patent/BRPI0610765B1/pt not_active IP Right Cessation
- 2006-04-26 WO PCT/EP2006/003883 patent/WO2006114305A1/fr not_active Ceased
- 2006-04-26 US US11/912,591 patent/US8293092B2/en active Active
- 2006-04-26 CN CNA2006800094924A patent/CN101146934A/zh active Pending
- 2006-04-26 KR KR1020077019889A patent/KR101301275B1/ko not_active Expired - Lifetime
- 2006-04-26 CN CN201510173915.7A patent/CN104911651A/zh active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2384800A1 (fr) | 2010-05-07 | 2011-11-09 | Dr.Ing. Max Schlötter GmbH & Co. KG | Régénération d'électrolytes nickel-zinc alcalins par la suppression de cyanidiones |
| EP2978877B1 (fr) | 2013-03-28 | 2020-09-23 | Coventya SAS | Bain d'electroplacage pour des alliages zinc-fer, procede de depot d'alliage zinc-fer sur un dispositif et un tel dispositif |
| EP3358045A1 (fr) | 2017-02-07 | 2018-08-08 | Dr.Ing. Max Schlötter GmbH & Co. KG | Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques |
| WO2018146041A1 (fr) | 2017-02-07 | 2018-08-16 | Dr.-Ing. Max Schlötter Gmbh & Co. Kg | Procédé pour le dépôt électrolytique de revêtements de zinc et d'alliage de zinc à partir d'un bain de revêtement alcalin, avec dégradation réduite des additifs organiques du bain |
| RU2724765C1 (ru) * | 2017-02-07 | 2020-06-25 | Др.-Инж. Макс Шлёттер Гмбх Унд Ко. Кг | Способ гальванического осаждения покрытий из цинка и цинкового сплава из щелочной ванны для нанесения покрытия с пониженным разложением органических добавок в ванне |
| US11339492B2 (en) | 2017-02-07 | 2022-05-24 | Dr.-Ing. Max Schlötter Gmbh & Co. Kg | Method for electrodepositing zinc and zinc alloy coatings from an alkaline coating bath with reduced depletion of organic bath additives |
| EP3415665A1 (fr) | 2017-06-14 | 2018-12-19 | Dr.Ing. Max Schlötter GmbH & Co. KG | Procédé de dépôt galvanique de revêtements d'alliage zinc/nicel à partir d'un bain d'alliage nickel/zinc à élimination réduite des additifs |
Also Published As
| Publication number | Publication date |
|---|---|
| ES2574158T3 (es) | 2016-06-15 |
| US8293092B2 (en) | 2012-10-23 |
| JP2008539329A (ja) | 2008-11-13 |
| CN101146934A (zh) | 2008-03-19 |
| WO2006114305A1 (fr) | 2006-11-02 |
| DE502005007138D1 (de) | 2009-06-04 |
| CN104911676A (zh) | 2015-09-16 |
| BRPI0610765B1 (pt) | 2017-04-04 |
| ATE429528T1 (de) | 2009-05-15 |
| EP2050841A1 (fr) | 2009-04-22 |
| CN104911676B (zh) | 2017-11-17 |
| KR20070122454A (ko) | 2007-12-31 |
| EP2050841B1 (fr) | 2016-05-11 |
| BRPI0610765A2 (pt) | 2010-07-20 |
| EP1717353A1 (fr) | 2006-11-02 |
| CA2600273A1 (fr) | 2006-11-02 |
| CA2600273C (fr) | 2014-08-12 |
| JP4955657B2 (ja) | 2012-06-20 |
| KR101301275B1 (ko) | 2013-08-29 |
| ES2324169T3 (es) | 2009-07-31 |
| CN104911651A (zh) | 2015-09-16 |
| US20090107845A1 (en) | 2009-04-30 |
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