EP3633074A4 - Plaque de cathode pour électrodéposition de métal et son procédé de fabrication - Google Patents

Plaque de cathode pour électrodéposition de métal et son procédé de fabrication Download PDF

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Publication number
EP3633074A4
EP3633074A4 EP18809926.1A EP18809926A EP3633074A4 EP 3633074 A4 EP3633074 A4 EP 3633074A4 EP 18809926 A EP18809926 A EP 18809926A EP 3633074 A4 EP3633074 A4 EP 3633074A4
Authority
EP
European Patent Office
Prior art keywords
manufacturing process
cathode plate
metal electrodeposition
electrodeposition
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP18809926.1A
Other languages
German (de)
English (en)
Other versions
EP3633074B1 (fr
EP3633074A1 (fr
Inventor
Hiroto Watanabe
Itsumi Matsuoka
Yusuke SENBA
Hiroshi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Publication of EP3633074A1 publication Critical patent/EP3633074A1/fr
Publication of EP3633074A4 publication Critical patent/EP3633074A4/fr
Application granted granted Critical
Publication of EP3633074B1 publication Critical patent/EP3633074B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16—Apparatus for electrolytic coating of small objects in bulk
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C23F1/04—Chemical milling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/06—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese
    • C25C1/08—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/003—3D structures, e.g. superposed patterned layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Milling Processes (AREA)
  • ing And Chemical Polishing (AREA)
EP18809926.1A 2017-05-29 2018-03-29 Plaque de cathode pour électrodéposition de métal et son procédé de fabrication Active EP3633074B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017105796A JP6500937B2 (ja) 2017-05-29 2017-05-29 金属電着用陰極板及びその製造方法
PCT/JP2018/013187 WO2018220979A1 (fr) 2017-05-29 2018-03-29 Plaque de cathode pour électrodéposition de métal et son procédé de fabrication

Publications (3)

Publication Number Publication Date
EP3633074A1 EP3633074A1 (fr) 2020-04-08
EP3633074A4 true EP3633074A4 (fr) 2021-03-10
EP3633074B1 EP3633074B1 (fr) 2022-10-05

Family

ID=64454726

Family Applications (1)

Application Number Title Priority Date Filing Date
EP18809926.1A Active EP3633074B1 (fr) 2017-05-29 2018-03-29 Plaque de cathode pour électrodéposition de métal et son procédé de fabrication

Country Status (5)

Country Link
EP (1) EP3633074B1 (fr)
JP (1) JP6500937B2 (fr)
CN (1) CN110546310B (fr)
CA (1) CA3064525C (fr)
WO (1) WO2018220979A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7188218B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板
JP7188217B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板の製造方法
JP7188219B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板
JP7188216B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板の製造方法
JP7238524B2 (ja) * 2019-03-25 2023-03-14 住友金属鉱山株式会社 金属電着用の陰極板
JP2021095594A (ja) * 2019-12-13 2021-06-24 住友金属鉱山株式会社 ボタン型電気ニッケルの製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4040915A (en) * 1976-06-15 1977-08-09 The International Nickel Company, Inc. Method for producing regular electronickel or S nickel rounds from electroplating baths giving highly stressed deposits
JPS57185762U (fr) * 1981-05-15 1982-11-25
US20110233055A1 (en) * 2008-09-09 2011-09-29 Steelmore Holdingd Pty Ltd cathode and a method of forming a cathode
US20150284870A1 (en) * 2014-04-02 2015-10-08 Oci Company Ltd. Electrode for electrolytic plating and electrolytic plating apparatus including the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3668081A (en) * 1971-03-17 1972-06-06 Int Nickel Co Production of electrolytic metal
GB1573449A (en) * 1976-04-01 1980-08-20 Falconbridge Nickel Mines Ltd Reusable electrolysis cathode
JPH10317197A (ja) * 1997-05-14 1998-12-02 Sumitomo Metal Mining Co Ltd メッキ用電気ニッケル、その製造用陰極板及び製造方法
JP2004502036A (ja) * 2000-06-30 2004-01-22 ハネウェル・インターナショナル・インコーポレーテッド 金属を加工処理するための方法及び装置、並びに加工処理して製造された金属
CN106661745B (zh) * 2014-07-15 2020-05-01 迪诺拉永久电极股份有限公司 电解用阴极和电解用阴极的制造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4040915A (en) * 1976-06-15 1977-08-09 The International Nickel Company, Inc. Method for producing regular electronickel or S nickel rounds from electroplating baths giving highly stressed deposits
JPS57185762U (fr) * 1981-05-15 1982-11-25
US20110233055A1 (en) * 2008-09-09 2011-09-29 Steelmore Holdingd Pty Ltd cathode and a method of forming a cathode
US20150284870A1 (en) * 2014-04-02 2015-10-08 Oci Company Ltd. Electrode for electrolytic plating and electrolytic plating apparatus including the same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2018220979A1 *

Also Published As

Publication number Publication date
WO2018220979A1 (fr) 2018-12-06
CA3064525C (fr) 2020-03-24
EP3633074B1 (fr) 2022-10-05
JP2018199857A (ja) 2018-12-20
JP6500937B2 (ja) 2019-04-17
EP3633074A1 (fr) 2020-04-08
CA3064525A1 (fr) 2018-12-06
CN110546310A (zh) 2019-12-06
CN110546310B (zh) 2020-09-15

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