CA3064525C - Plaque de cathode pour electrodeposition de metal et son procede de fabrication - Google Patents

Plaque de cathode pour electrodeposition de metal et son procede de fabrication Download PDF

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Publication number
CA3064525C
CA3064525C CA3064525A CA3064525A CA3064525C CA 3064525 C CA3064525 C CA 3064525C CA 3064525 A CA3064525 A CA 3064525A CA 3064525 A CA3064525 A CA 3064525A CA 3064525 C CA3064525 C CA 3064525C
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Canada
Prior art keywords
conductive film
cathode plate
protrusion
section
metal plate
Prior art date
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CA3064525A
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English (en)
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CA3064525A1 (fr
Inventor
Hiroto Watanabe
Itsumi Matsuoka
Yusuke Senba
Hiroshi Kobayashi
Original Assignee
Sumitomo Metal Mining Co Ltd
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Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Publication of CA3064525A1 publication Critical patent/CA3064525A1/fr
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16—Apparatus for electrolytic coating of small objects in bulk
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C23F1/04—Chemical milling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/06—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese
    • C25C1/08—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/003—3D structures, e.g. superposed patterned layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Milling Processes (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

L'invention concerne : une plaque de cathode pour électrodéposition de métal rendant moins susceptible de perdre un film non conducteur sur une plaque métallique, pouvant être utilisée de manière répétée, et pour laquelle une maintenance est facile même si un film non conducteur est perdu ; et un procédé de fabrication pour une telle plaque de cathode. Cette plaque de cathode 1 comprend une plaque métallique 2 sur laquelle sont disposées une pluralité de saillies en forme de disque 2a, et un film non conducteur 3 formé dans des sections plates 2b qui sont des sections de la plaque métallique 2 autres que les saillies 2a. Les saillies 2a ont chacune une face latérale qui a une forme formée d'une section sensiblement verticale 2d et d'une section inclinée 2e. Une hauteur L1 de chaque saillie 2a est de 50 µm à 1000 µm, et lorsqu'une intersection de la face latérale de la saillie et d'une ligne verticale qui est abaissée verticalement à partir d'une position X qui est de 20 µm vers l'extérieur depuis le bord périphérique externe de la saillie est définie comme Y, alors une longueur L2 de X à Y est d'au moins 40 µm mais inférieure ou égale à 0,8 × L1 µm.
CA3064525A 2017-05-29 2018-03-29 Plaque de cathode pour electrodeposition de metal et son procede de fabrication Active CA3064525C (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017105796A JP6500937B2 (ja) 2017-05-29 2017-05-29 金属電着用陰極板及びその製造方法
JP2017-105796 2017-05-29
PCT/JP2018/013187 WO2018220979A1 (fr) 2017-05-29 2018-03-29 Plaque de cathode pour électrodéposition de métal et son procédé de fabrication

Publications (2)

Publication Number Publication Date
CA3064525A1 CA3064525A1 (fr) 2018-12-06
CA3064525C true CA3064525C (fr) 2020-03-24

Family

ID=64454726

Family Applications (1)

Application Number Title Priority Date Filing Date
CA3064525A Active CA3064525C (fr) 2017-05-29 2018-03-29 Plaque de cathode pour electrodeposition de metal et son procede de fabrication

Country Status (5)

Country Link
EP (1) EP3633074B1 (fr)
JP (1) JP6500937B2 (fr)
CN (1) CN110546310B (fr)
CA (1) CA3064525C (fr)
WO (1) WO2018220979A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7188218B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板
JP7188216B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板の製造方法
JP7188217B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板の製造方法
JP7238524B2 (ja) * 2019-03-25 2023-03-14 住友金属鉱山株式会社 金属電着用の陰極板
JP7188219B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板
JP2021095594A (ja) * 2019-12-13 2021-06-24 住友金属鉱山株式会社 ボタン型電気ニッケルの製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3668081A (en) * 1971-03-17 1972-06-06 Int Nickel Co Production of electrolytic metal
GB1573449A (en) * 1976-04-01 1980-08-20 Falconbridge Nickel Mines Ltd Reusable electrolysis cathode
US4040915A (en) * 1976-06-15 1977-08-09 The International Nickel Company, Inc. Method for producing regular electronickel or S nickel rounds from electroplating baths giving highly stressed deposits
JPS6038678Y2 (ja) * 1981-05-15 1985-11-19 住友金属鉱山株式会社 金属電着用母板
JPH10317197A (ja) * 1997-05-14 1998-12-02 Sumitomo Metal Mining Co Ltd メッキ用電気ニッケル、その製造用陰極板及び製造方法
EP1305455A2 (fr) * 2000-06-30 2003-05-02 Honeywell International, Inc. Procede et appareil de traitement de metaux et metaux ainsi produits
AU2009291494B2 (en) * 2008-09-09 2015-05-07 Glencore Technology Pty Limited A cathode and a method of forming a cathode
KR101664540B1 (ko) * 2014-04-02 2016-10-25 오씨아이 주식회사 전해 도금용 전극 및 이를 포함하는 전해 도금 장치
US10676831B2 (en) * 2014-07-15 2020-06-09 De Nora Permelec Ltd Electrolysis cathode and method for producing electrolysis cathode

Also Published As

Publication number Publication date
EP3633074A4 (fr) 2021-03-10
CN110546310B (zh) 2020-09-15
EP3633074A1 (fr) 2020-04-08
JP6500937B2 (ja) 2019-04-17
WO2018220979A1 (fr) 2018-12-06
CN110546310A (zh) 2019-12-06
JP2018199857A (ja) 2018-12-20
CA3064525A1 (fr) 2018-12-06
EP3633074B1 (fr) 2022-10-05

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