EP3715329A4 - Appareil de fabrication de trichlorosilane et méthode de fabrication de trichlorosilane - Google Patents

Appareil de fabrication de trichlorosilane et méthode de fabrication de trichlorosilane Download PDF

Info

Publication number
EP3715329A4
EP3715329A4 EP18878799.8A EP18878799A EP3715329A4 EP 3715329 A4 EP3715329 A4 EP 3715329A4 EP 18878799 A EP18878799 A EP 18878799A EP 3715329 A4 EP3715329 A4 EP 3715329A4
Authority
EP
European Patent Office
Prior art keywords
producing trichlorosilane
trichlorosilane
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP18878799.8A
Other languages
German (de)
English (en)
Other versions
EP3715329A1 (fr
Inventor
Kenji Hirota
Katsuya OGIHARA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Publication of EP3715329A1 publication Critical patent/EP3715329A1/fr
Publication of EP3715329A4 publication Critical patent/EP3715329A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D39/00—Filtering material for liquid or gaseous fluids
    • B01D39/14—Other self-supporting filtering material ; Other filtering material
    • B01D39/20—Other self-supporting filtering material ; Other filtering material of inorganic material, e.g. asbestos paper, metallic filtering material of non-woven wires
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D39/00—Filtering material for liquid or gaseous fluids
    • B01D39/14—Other self-supporting filtering material ; Other filtering material
    • B01D39/20—Other self-supporting filtering material ; Other filtering material of inorganic material, e.g. asbestos paper, metallic filtering material of non-woven wires
    • B01D39/2027—Metallic material
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/10778—Purification

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
EP18878799.8A 2017-11-20 2018-11-16 Appareil de fabrication de trichlorosilane et méthode de fabrication de trichlorosilane Withdrawn EP3715329A4 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017223144 2017-11-20
PCT/JP2018/042557 WO2019098345A1 (fr) 2017-11-20 2018-11-16 Appareil de fabrication de trichlorosilane et méthode de fabrication de trichlorosilane

Publications (2)

Publication Number Publication Date
EP3715329A1 EP3715329A1 (fr) 2020-09-30
EP3715329A4 true EP3715329A4 (fr) 2021-07-28

Family

ID=66539052

Family Applications (1)

Application Number Title Priority Date Filing Date
EP18878799.8A Withdrawn EP3715329A4 (fr) 2017-11-20 2018-11-16 Appareil de fabrication de trichlorosilane et méthode de fabrication de trichlorosilane

Country Status (7)

Country Link
US (1) US20200277197A1 (fr)
EP (1) EP3715329A4 (fr)
JP (1) JPWO2019098345A1 (fr)
KR (1) KR20200088276A (fr)
CN (1) CN111108065A (fr)
TW (1) TWI752280B (fr)
WO (1) WO2019098345A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021100286A1 (fr) * 2019-11-21 2021-05-27 株式会社トクヤマ Filtre
JP7854026B1 (ja) 2024-11-06 2026-04-30 株式会社トクヤマ フィルタの洗浄方法及びフィルタの洗浄装置
JP7854025B1 (ja) 2024-11-06 2026-04-30 株式会社トクヤマ フィルタの洗浄装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102815706A (zh) * 2012-08-10 2012-12-12 中国恩菲工程技术有限公司 一种三氯氢硅合成系统
US20140234197A1 (en) * 2011-10-18 2014-08-21 Toagosei Co., Ltd. Method for producing chloropolysilane and fluidized-bed reactor

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4847500A (fr) * 1971-10-21 1973-07-05
JPH1072382A (ja) * 1996-08-28 1998-03-17 Asahi Glass Co Ltd １，１，１，３，３−ペンタフルオロプロパンの製造方法
JP4462839B2 (ja) * 2003-03-19 2010-05-12 株式会社キノテック・ソーラーエナジー シリコンの製造装置及び製造方法
JP2009292675A (ja) * 2008-06-04 2009-12-17 Sumitomo Chemical Co Ltd シリコン又はハロゲン化シランの製造方法及び製造装置
US8778292B2 (en) * 2009-05-12 2014-07-15 Procedyne Corporation Fluidized bed process for synthesizing trichlorosilane and a trichlorosilane synthesizer
CN201643908U (zh) 2009-12-01 2010-11-24 乐山乐电天威硅业科技有限责任公司 三氯氢硅合成气气固分离装置
JP5535679B2 (ja) * 2010-02-18 2014-07-02 株式会社トクヤマ トリクロロシランの製造方法
JP2011184242A (ja) 2010-03-09 2011-09-22 Jnc Corp クロロシランの製造装置
JP2013112589A (ja) * 2011-11-30 2013-06-10 Mitsubishi Materials Corp トリクロロシラン製造方法及び製造装置
JP6439322B2 (ja) 2014-08-27 2018-12-19 三菱自動車工業株式会社 ハイブリッド車両の回生制御装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140234197A1 (en) * 2011-10-18 2014-08-21 Toagosei Co., Ltd. Method for producing chloropolysilane and fluidized-bed reactor
CN102815706A (zh) * 2012-08-10 2012-12-12 中国恩菲工程技术有限公司 一种三氯氢硅合成系统

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2019098345A1 *

Also Published As

Publication number Publication date
CN111108065A (zh) 2020-05-05
KR20200088276A (ko) 2020-07-22
EP3715329A1 (fr) 2020-09-30
JPWO2019098345A1 (ja) 2020-10-01
TWI752280B (zh) 2022-01-11
TW201922335A (zh) 2019-06-16
US20200277197A1 (en) 2020-09-03
WO2019098345A1 (fr) 2019-05-23

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