ES2042382A2 - Estructura de test para la medida del desalineamiento entre niveles en tecnologias microelectronicas, basada en transistores mos con puerta triangular. - Google Patents
Estructura de test para la medida del desalineamiento entre niveles en tecnologias microelectronicas, basada en transistores mos con puerta triangular.Info
- Publication number
- ES2042382A2 ES2042382A2 ES919102409A ES9102409A ES2042382A2 ES 2042382 A2 ES2042382 A2 ES 2042382A2 ES 919102409 A ES919102409 A ES 919102409A ES 9102409 A ES9102409 A ES 9102409A ES 2042382 A2 ES2042382 A2 ES 2042382A2
- Authority
- ES
- Spain
- Prior art keywords
- misalignment
- levels
- mos transistors
- measuring
- test structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005516 engineering process Methods 0.000 title abstract 3
- 238000004377 microelectronic Methods 0.000 title abstract 3
- 238000005259 measurement Methods 0.000 abstract 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
LA ESTRUCTURA DE TEST PARA LA MEDIDA DEL DESALINEAMIENTO ENTRE NIVELES DE TECNOLOGIAS MICROELECTRICAS, BASADA EN TRANSISTORES MOS CON PUERTA TRIANGULAR, ES UN DISPOSITIVO MICROELECTRONICO COMPUESTO DE CUATRO TRANSISTORES MOS CON LA PUERTA TRIANGULAR, DISPUESTOS FORMANDO 90 ENTRE SI, CON LOS TERMINALES DE FUENTE UNIDOS, SENSIBLE AL DESALINEAMIENTO ENTRE LOS NIVELES DE PUERTA Y AREAS ACTIVAS EN TECNOLOGIAS AUTOALINEADAS. EL DESALINEAMIENTO SE OBTIENE A PARTIR DE LA MEDIDA DE LA CORRIENTE DE CANAL EN CADA UNO DE LOS TRANSISTORES, POLARIZANDO LOS MISMOS EN LA ZONA LINEAL O EN LA DE SATURACION.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ES09102409A ES2042382B1 (es) | 1991-10-30 | 1991-10-30 | Estructura de test para la medida del desalineamiento entre niveles en tecnologias microelectronicas, basada en transistores mos con puerta triangular |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ES09102409A ES2042382B1 (es) | 1991-10-30 | 1991-10-30 | Estructura de test para la medida del desalineamiento entre niveles en tecnologias microelectronicas, basada en transistores mos con puerta triangular |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| ES2042382A2 true ES2042382A2 (es) | 1993-12-01 |
| ES2042382R ES2042382R (es) | 1995-08-16 |
| ES2042382B1 ES2042382B1 (es) | 1996-04-01 |
Family
ID=8274001
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES09102409A Expired - Fee Related ES2042382B1 (es) | 1991-10-30 | 1991-10-30 | Estructura de test para la medida del desalineamiento entre niveles en tecnologias microelectronicas, basada en transistores mos con puerta triangular |
Country Status (1)
| Country | Link |
|---|---|
| ES (1) | ES2042382B1 (es) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4386459A (en) * | 1980-07-11 | 1983-06-07 | Bell Telephone Laboratories, Incorporated | Electrical measurement of level-to-level misalignment in integrated circuits |
| EP0080619A2 (en) * | 1981-11-30 | 1983-06-08 | International Business Machines Corporation | Method for determining photomask alignment |
| US4647850A (en) * | 1984-10-05 | 1987-03-03 | Burroughs Corporation | Integrated circuit for measuring mask misalignment |
| EP0370834A2 (en) * | 1988-11-25 | 1990-05-30 | Nec Corporation | Semiconductor device, and method of manufacture |
-
1991
- 1991-10-30 ES ES09102409A patent/ES2042382B1/es not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4386459A (en) * | 1980-07-11 | 1983-06-07 | Bell Telephone Laboratories, Incorporated | Electrical measurement of level-to-level misalignment in integrated circuits |
| EP0080619A2 (en) * | 1981-11-30 | 1983-06-08 | International Business Machines Corporation | Method for determining photomask alignment |
| US4647850A (en) * | 1984-10-05 | 1987-03-03 | Burroughs Corporation | Integrated circuit for measuring mask misalignment |
| EP0370834A2 (en) * | 1988-11-25 | 1990-05-30 | Nec Corporation | Semiconductor device, and method of manufacture |
Non-Patent Citations (1)
| Title |
|---|
| BASE DE DATOS WPIL en QUESTEL. Semana 7906. Londres: Derwent Publications Ltd. AN 79-B2303B. Class U12 RH6 SU-A1-598159 (UFA AVIATION INST), resumen * |
Also Published As
| Publication number | Publication date |
|---|---|
| ES2042382R (es) | 1995-08-16 |
| ES2042382B1 (es) | 1996-04-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FD1A | Patent lapsed |
Effective date: 20020425 |