ES2053554T3 - Placa fotosensible revelable con agua y procedimiento de produccion. - Google Patents

Placa fotosensible revelable con agua y procedimiento de produccion.

Info

Publication number
ES2053554T3
ES2053554T3 ES87308332T ES87308332T ES2053554T3 ES 2053554 T3 ES2053554 T3 ES 2053554T3 ES 87308332 T ES87308332 T ES 87308332T ES 87308332 T ES87308332 T ES 87308332T ES 2053554 T3 ES2053554 T3 ES 2053554T3
Authority
ES
Spain
Prior art keywords
monomer
molar
approximately
water
beta
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES87308332T
Other languages
English (en)
Inventor
Katsukiyo Ishikawa
Katsuji Konishi
Hidefumi Kusuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Application granted granted Critical
Publication of ES2053554T3 publication Critical patent/ES2053554T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)

Abstract

UNA PLACA DE RESINA FOTOSENSIBLE DESARROLLABLE POR AGUA ADECUADA PARA LA FABRICACION DE UNA PLACA DE IMPRESION DE RELIEVE QUE TIENE ALTA RESISTENCIA A LAS TINTAS CON BASE DE AGUA, ELEVADA ELASTICIDAD Y EXCELENTE ESTABILIDAD DE FORMA, QUE COMPRENDE: (A) UN COPOLIMERO QUE TIENE UNIDADES DE (I) UN MONOMERO DE DIENO CONJUGADO ALIFATICO, (II) UN ACIDO CARBOXILICO (ALFA),(BETA)-ETILENICAMENTE NO SATURADO, Y (III) UN MONOMERO VINILICO POLIFUNCIONAL, OPCIONALMENTE CON (IV) UN MONOMERO DE VINILO MONOFUNCIONAL, SIENDO EL CONTENIDO DE MONOMERO DE DIENO CONJUGADO ALIFATICO (I), EL ACIDO CARBOXILICO (ALFA),(BETA)-ETILENICAMENTE INSATURADO (II), EL MONOMERO VINILICO POLIFUNCIONAL (III) Y EL MONOMERO VINILICO MONOFUNCIONAL (IV), RESPECTIVAMENTE DE 5 A 95 % MOLAR APROXIMADAMENTE, DE 1 A 30 % MOLAR APROXIMADAMENTE, DE 0,1 A 10 % MOLAR APROXIMADAMENTE Y 0 A 70 % MOLAR APROXIMADAMENTE REFERIDO A LA COMBINACION DE LOS COMPONENTES MONOMEROS; (B) UN COMPUESTO BASICO QUE CONTIENE UN ATOMO DE NITROGENO; (C) UN MONOMERO ETILENICAMENTE INSATURADO; Y (D) UN INICIADOR DE FOTOPOLIMERIZACION.
ES87308332T 1986-09-22 1987-09-21 Placa fotosensible revelable con agua y procedimiento de produccion. Expired - Lifetime ES2053554T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US91013486A 1986-09-22 1986-09-22

Publications (1)

Publication Number Publication Date
ES2053554T3 true ES2053554T3 (es) 1994-08-01

Family

ID=25428355

Family Applications (1)

Application Number Title Priority Date Filing Date
ES87308332T Expired - Lifetime ES2053554T3 (es) 1986-09-22 1987-09-21 Placa fotosensible revelable con agua y procedimiento de produccion.

Country Status (10)

Country Link
EP (1) EP0261910B1 (es)
JP (1) JP2891704B2 (es)
AT (1) ATE103719T1 (es)
AU (2) AU598032B2 (es)
CA (1) CA1330736C (es)
DE (1) DE3789480T2 (es)
ES (1) ES2053554T3 (es)
NZ (1) NZ221882A (es)
PT (1) PT85756A (es)
WO (1) WO1988002135A1 (es)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2195349B (en) * 1986-08-18 1990-07-11 Nippon Zeon Co Photosensitive elastomeric composition
JP2517281B2 (ja) * 1987-05-28 1996-07-24 富士写真フイルム株式会社 光重合性組成物
JPH01300246A (ja) * 1988-05-28 1989-12-04 Nippon Paint Co Ltd フレキソ印刷用感光性樹脂組成物
JP2683703B2 (ja) * 1988-08-24 1997-12-03 日本合成ゴム株式会社 感光性樹脂組成物
DE3837324A1 (de) * 1988-11-03 1990-05-10 Basf Ag Lichtempfindliches aufzeichnungsmaterial
DE3841853A1 (de) * 1988-12-13 1990-06-21 Hoechst Ag Photopolymerisierbares elastomeres gemisch und dieses enthaltendes aufzeichnungsmaterial fuer die herstellung von ozonresistenten flexodruckformen
GB2226564B (en) * 1988-12-16 1993-03-17 Sericol Group Ltd Photopolymerisable polyvinyl alcohols and compositions containing them
JPH02311847A (ja) * 1989-05-26 1990-12-27 Nippon Paint Co Ltd 水現像性感光性樹脂組成物
JPH0450845A (ja) * 1990-06-14 1992-02-19 Toyo Ink Mfg Co Ltd レリーフ樹脂印刷版
DE4023240A1 (de) * 1990-07-21 1992-01-23 Basf Ag Modifizierte emulsionspolymerisate insbesondere fuer in wasser und waessrigen loesungsmitteln entwickelbare photopolymerisierbare aufzeichnungsmaterialien
US5215859A (en) * 1990-07-26 1993-06-01 Minnesota Mining And Manufacturing Company Backside ionizing irradiation in a flexographic printing plate process
US5175072A (en) * 1990-07-26 1992-12-29 Minnesota Mining And Manufacturing Company Flexographic printing plate process
DE4032238A1 (de) * 1990-10-11 1992-04-23 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
US5143819A (en) * 1991-01-25 1992-09-01 W. R. Grace & Co.-Conn. Aqueous developing, photocurable composition, photosensitive articles having layers made therefrom and method of improving those articles
US5290663A (en) * 1991-03-01 1994-03-01 W. R. Grace & Co.-Conn. Photocurable polyurethane-acrylate ionomer compositions for aqueous developable printing plates
JP3040202B2 (ja) * 1991-07-12 2000-05-15 ダブリュー・アール・グレース・アンド・カンパニー−コーン 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法
US5462835A (en) * 1991-09-16 1995-10-31 P T Sub Inc. Photocurable composition, flexible, photosensitive articles made therefrom, and methods of improving solvent resistance and flexibility of those articles
DE4211390A1 (de) * 1992-04-04 1993-10-07 Hoechst Ag Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten
DE4211391A1 (de) 1992-04-04 1993-10-07 Hoechst Ag Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten
US5328805A (en) * 1992-08-28 1994-07-12 W. R. Grace & Co.-Conn. Aqueous developable photosensitive polyurethane-(meth)acrylate
US5350661A (en) * 1993-03-25 1994-09-27 Napp Systems, Inc. Water-developable photosensitive plates especially suited for commercial flexographic printing
US5362605A (en) * 1993-05-10 1994-11-08 W. R. Grace & Co.-Conn. Photosensitive polymer composition for flexographic printing plates processable in aqueous media
US5912106A (en) * 1996-09-10 1999-06-15 Ciba Specialty Chemicals Corporation Method for improving photoimage quality
US6127094A (en) * 1997-10-02 2000-10-03 Napp Systems Inc. Acrylate copolymer-containing water-developable photosensitive resins and printing plates prepared therefrom
US6197479B1 (en) 1998-06-26 2001-03-06 Toray Industries, Inc. Photosensitive resin composition, method for producing photosensitive resin composition, and printing plate material
JP2006342222A (ja) * 2005-06-08 2006-12-21 Mitsuyoshi Sato 光硬化性樹脂組成物

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2893868A (en) * 1955-08-22 1959-07-07 Du Pont Polymerizable compositions
US3764324A (en) * 1972-04-13 1973-10-09 Mc Call Corp Photographic polymer composition and process for crosslinking
JPS609249B2 (ja) * 1977-02-05 1985-03-08 ジェイエスアール株式会社 感光性樹脂組成物
DE2816774A1 (de) * 1977-04-22 1978-10-26 Du Pont Photopolymerisierbares material
JPS609250B2 (ja) * 1977-05-04 1985-03-08 ジェイエスアール株式会社 感光性樹脂組成物
EP0002321B1 (en) * 1977-11-29 1981-10-28 Bexford Limited Photopolymerisable elements and a process for the production of printing plates therefrom
US4239849A (en) * 1978-06-19 1980-12-16 Dynachem Corporation Polymers for aqueous processed photoresists
US4245031A (en) * 1979-09-18 1981-01-13 E. I. Du Pont De Nemours And Company Photopolymerizable compositions based on salt-forming polymers and polyhydroxy polyethers
US4485167A (en) * 1980-10-06 1984-11-27 E. I. Du Pont De Nemours And Company Aqueous developable photopolymerizable elements
US4415649A (en) * 1981-02-25 1983-11-15 E. I. Du Pont De Nemours & Co. Flexographic printing plates containing blended adhesives
DE3232620A1 (de) * 1982-09-02 1984-03-08 Hoechst Ag, 6230 Frankfurt 10-phenyl1-1,3,9-triazaanthracene und diese enthaltendes photopolymerisierbares gemisch
JPS5971048A (ja) * 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物
US4621043A (en) * 1983-01-31 1986-11-04 E. I. Du Pont De Nemours And Company Storage stable photopolymerizable composition
US4996134A (en) * 1984-04-13 1991-02-26 Japan Synthetic Rubber Co., Ltd. Conjugated diene copolymer, a process for producing the copolymer, and a photosensitive composition comprising the copolymer
JPS60219208A (ja) * 1984-04-13 1985-11-01 Japan Synthetic Rubber Co Ltd 共役ジエン系ゴム状共重合体およびその製造方法
JPH0239784B2 (ja) * 1984-10-17 1990-09-07 Japan Synthetic Rubber Co Ltd Kankoseijushisoseibutsu
NZ212161A (en) * 1984-06-08 1988-06-30 Ishikawa Katsukiyo Photo-polymerisable composition and printing plate prepared therefrom
JPS61181811A (ja) * 1985-02-08 1986-08-14 Japan Synthetic Rubber Co Ltd ランダム共役ジエン系共重合体およびその製造方法
EP0198392A1 (en) * 1985-04-10 1986-10-22 E.I. Du Pont De Nemours And Company Partial neutralization of aqueous developable photoresist
JPH0746224B2 (ja) * 1986-06-27 1995-05-17 日本ペイント株式会社 感光性フレキソ印刷版
JP2656231B2 (ja) 1996-02-20 1997-09-24 日本ペイント株式会社 感光性フレキソ印刷版用組成物

Also Published As

Publication number Publication date
ATE103719T1 (de) 1994-04-15
AU8023587A (en) 1988-04-07
EP0261910A2 (en) 1988-03-30
EP0261910A3 (en) 1989-07-26
CA1330736C (en) 1994-07-19
PT85756A (pt) 1988-10-14
NZ221882A (en) 1989-08-29
DE3789480D1 (de) 1994-05-05
JP2891704B2 (ja) 1999-05-17
EP0261910B1 (en) 1994-03-30
WO1988002135A1 (en) 1988-03-24
DE3789480T2 (de) 1994-07-14
AU7885187A (en) 1988-03-24
AU598032B2 (en) 1990-06-14
JPS63132234A (ja) 1988-06-04

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