ES2059890T3 - Agente y metodo para eliminar fundentes a base de colofonia para soldeo por estañado. - Google Patents

Agente y metodo para eliminar fundentes a base de colofonia para soldeo por estañado.

Info

Publication number
ES2059890T3
ES2059890T3 ES90111022T ES90111022T ES2059890T3 ES 2059890 T3 ES2059890 T3 ES 2059890T3 ES 90111022 T ES90111022 T ES 90111022T ES 90111022 T ES90111022 T ES 90111022T ES 2059890 T3 ES2059890 T3 ES 2059890T3
Authority
ES
Spain
Prior art keywords
agent
roses
eliminating
elevated
resin based
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES90111022T
Other languages
English (en)
Inventor
Machio Chihara
Jiro Mizuya
Tatsuya Okumura
Takashi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Arakawa Chemical Industries Ltd
Original Assignee
Arakawa Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arakawa Chemical Industries Ltd filed Critical Arakawa Chemical Industries Ltd
Application granted granted Critical
Publication of ES2059890T3 publication Critical patent/ES2059890T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2068—Ethers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • C11D1/72—Ethers of polyoxyalkylene glycols
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/032—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing oxygen-containing compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Detergent Compositions (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

LA INVENCION PROPORCIONA UN AGENTE LIMPIADOR PARA RETIRAR UN FLUJO CON BASE DE RESINA, Y EL AGENTE LIMPIADOR CONSISTE EN UNA MEZCLA DE (A) AL MENOS UN COMPUESTO DE ETER DE GLICOL REPRESENTADO POR LA FORMULA (1) DONDE R ELEVADO 1 ES UN ATOMO DE HIDROGENO O UN GRUPO ALQUILO TENIENDO DE 1 A 5 ATOMOS DE CARBONO, R ELEVADO 2 ES UN GRUPO ALQUILO TENIENDO DE 1 A 5 ATOMOS DE CARBONO, R ELEVADO 3 ES UN ATOMO DE HIDROGENO O UN GRUPO Y N ES UN ENTERO DE 2 A 4, Y (B) AL MENOS UN SURFACTANTE NO IONICO, Y TAMBIEN DESCUBRE UN METODO DE LIMPIEZA PARA RETIRAR UN FLUJO DE SOLDAR CON BASE DE RESINA, EL METODO COMPRENDE EL PONER EN CONTACTO EL AGENTE ARRIBA INDICADO CON EL FLUJO DE SOLDAR CON BASE DE RESINA.
ES90111022T 1989-11-08 1990-06-11 Agente y metodo para eliminar fundentes a base de colofonia para soldeo por estañado. Expired - Lifetime ES2059890T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29190589 1989-11-08

Publications (1)

Publication Number Publication Date
ES2059890T3 true ES2059890T3 (es) 1994-11-16

Family

ID=17774978

Family Applications (1)

Application Number Title Priority Date Filing Date
ES90111022T Expired - Lifetime ES2059890T3 (es) 1989-11-08 1990-06-11 Agente y metodo para eliminar fundentes a base de colofonia para soldeo por estañado.

Country Status (6)

Country Link
EP (1) EP0426943B1 (es)
JP (1) JPH0723479B2 (es)
KR (1) KR0160126B1 (es)
DE (1) DE69003350T2 (es)
ES (1) ES2059890T3 (es)
PT (1) PT94476A (es)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2126424A2 (es) * 1995-01-19 1999-03-16 Decap 93 S L Procedimiento para la preparacion de suspensiones a altas concentraciones de compuestos organicos e inorganicos.

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0768547B2 (ja) * 1989-11-21 1995-07-26 花王株式会社 洗浄剤組成物
JPH03198395A (ja) * 1989-12-27 1991-08-29 Toho Chem Ind Co Ltd 洗浄剤組成物
JPH0826350B2 (ja) * 1990-04-19 1996-03-13 三洋化成工業株式会社 超音波洗浄機用洗浄剤
JPH08917B2 (ja) * 1990-06-27 1996-01-10 花王株式会社 洗浄剤組成物
JPH0457898A (ja) * 1990-06-27 1992-02-25 Kao Corp 水系洗浄剤組成物
JPH0457899A (ja) * 1990-06-27 1992-02-25 Arakawa Chem Ind Co Ltd ロジン系ハンダフラックスの洗浄剤および該洗浄剤を用いてなるロジン系ハンダフラックスの洗浄方法
JPH0668118B2 (ja) * 1990-08-06 1994-08-31 第一工業製薬株式会社 洗浄剤組成物
JPH0756039B2 (ja) * 1991-07-04 1995-06-14 第一工業製薬株式会社 洗浄剤組成物
JPH05179294A (ja) * 1991-12-26 1993-07-20 Arakawa Chem Ind Co Ltd 汚染物の洗浄除去剤および汚染物の洗浄除去方法
JPH0624170A (ja) * 1992-03-25 1994-02-01 Sanyo Chem Ind Ltd スクリーン印刷版用洗浄剤
JPH06108097A (ja) * 1992-08-07 1994-04-19 Dr Ok Wack Chem Gmbh 洗浄剤
AU2494092A (en) * 1992-09-03 1994-03-29 Circuit Chemical Products Gmbh Cleaning-agent mixture for cleaning printed circuits and a method of cleaning such circuits
DE4325133A1 (de) * 1993-07-27 1995-02-02 Wack O K Chemie Gmbh Verfahren zum Reinigen von Gegenständen
US5414144A (en) * 1993-09-21 1995-05-09 Asahi Kasei Kogyo Kabushiki Kaisha Propylene glycol cyclohexyl ether derivatives, method of producing same and uses thereof
US5531939A (en) * 1994-03-23 1996-07-02 Amway Corporation Concentrated glass and window cleaning composition and method of use
DE4411677C1 (de) * 1994-04-05 1995-10-26 Mtu Muenchen Gmbh Verfahren zum Entfernen organischer Materialien von Triebwerkskomponenten
EP0724011A1 (en) * 1995-01-24 1996-07-31 The Dow Chemical Company Aqueous cleaning composition
CN113165027B (zh) * 2018-12-05 2023-07-07 花王株式会社 助焊剂残渣的清洗

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3886099A (en) * 1972-03-13 1975-05-27 Griffin Bros Inc Water soluble flux remover
DE2846088A1 (de) * 1978-10-23 1980-04-30 Ries Walter Reinigungsfluessigkeit und deren verwendung zur selbstaendigen oberflaechenreinigung von aeusseren verschmutzungen ausgesetzten koerpern
DE2847691C2 (de) * 1978-11-03 1986-05-22 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Waschflüssigkeit zur Reinigung von Oberflächen gedruckter Schaltungen
JPH0227398B2 (ja) * 1982-04-23 1990-06-15 Asahi Denka Kogyo Kk Senjozaisoseibutsu
FR2582546B2 (fr) * 1984-10-04 1990-04-27 Dow Chemical France Agent de rincage et nettoyage pour ensembles de pulverisation et atomisation, notamment a usage agricole, a base d'un ether de glycol derive du propylene glycol et d'un tensio-actif
JPS6369897A (ja) * 1986-09-11 1988-03-29 第一工業製薬株式会社 プリント基板洗浄用洗浄剤組成物
EP0261718B1 (en) * 1986-09-22 1991-03-06 The Procter & Gamble Company Creamy scouring compositions
JPS63234095A (ja) * 1987-01-20 1988-09-29 ザ　ダウ　ケミカル　カンパニー ガスタービン圧縮機清掃用組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2126424A2 (es) * 1995-01-19 1999-03-16 Decap 93 S L Procedimiento para la preparacion de suspensiones a altas concentraciones de compuestos organicos e inorganicos.

Also Published As

Publication number Publication date
DE69003350D1 (de) 1993-10-21
EP0426943A2 (en) 1991-05-15
EP0426943A3 (en) 1991-09-04
JPH03227400A (ja) 1991-10-08
KR910011101A (ko) 1991-06-29
DE69003350T2 (de) 1994-01-13
KR0160126B1 (ko) 1998-12-15
PT94476A (pt) 1991-07-05
EP0426943B1 (en) 1993-09-15
JPH0723479B2 (ja) 1995-03-15

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