ES2074969A6 - Metodo para depositar diamante sobre un sustrato. - Google Patents

Metodo para depositar diamante sobre un sustrato.

Info

Publication number
ES2074969A6
ES2074969A6 ES09150029A ES9150029A ES2074969A6 ES 2074969 A6 ES2074969 A6 ES 2074969A6 ES 09150029 A ES09150029 A ES 09150029A ES 9150029 A ES9150029 A ES 9150029A ES 2074969 A6 ES2074969 A6 ES 2074969A6
Authority
ES
Spain
Prior art keywords
diamond
halogen
vapor deposition
chemical vapor
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
ES09150029A
Other languages
English (en)
Inventor
Donald E Patterson
Robert H Hauge
C Judith Chu
John L Margrave
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Houston Advanced Research Center HARC
Original Assignee
Houston Advanced Research Center HARC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Houston Advanced Research Center HARC filed Critical Houston Advanced Research Center HARC
Publication of ES2074969A6 publication Critical patent/ES2074969A6/es
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/277—Diamond only using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S427/00—Coating processes
    • Y10S427/103—Diamond-like carbon coating, i.e. DLC

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

METODO PARA DEPOSITAR DIAMANTE SOBRE UN SUSTRATO, EN PARTICULAR PELICULAS Y PARTICULAS DE DIAMANTE SOBRE UNA DIVERSIDAD DE SUSTRATOS, HACIENDO FLUIR UN GAS O UNA MEZCLA DE GASES CAPAZ DE APORTAR (1) CARBONO, (2) HIDROGENO Y (3) UN HALOGENO A TRAVES DE UN REACTOR (56) SOBRE EL MATERIAL DEL SUSTRATO (72). LOS GASES REACCIONANTES SE PUEDEN MEZCLAR PREVIAMENTE CON UN GAS INERTE CON EL FIN DE MANTENER LA COMPOSICION GLOBAL DE LA MEZCLA DE GASES A UN BAJO PORCENTAJE EN VOLUMEN DE CARBONO Y A UN ALTO PORCENTAJE DE HIDROGENO. NO SE REQUIERE UN TRATAMIENTO PREVIO DE LOS GASES REACCIONANTES HASTA UN ESTADO DE ALTA ENERGIA COMO ES EL CASO EN LA MAYORIA DE LOS PROCEDIMIENTOS DE LA TECNICA ANTERIOR PARA LA DEPOSICION QUIMICA EN VAPOR DE DIAMANTE. DADO QUE EL TRATAMIENTO PREVIO NO SE REQUIERE, EL PROCEDIMIENTO SE PUEDE APLICAR A SUSTRATOS DE VIRTUALMENTE CUALQUIER TAMAÑO, FORMA O CONFIGURACION DESEADOS.
ES09150029A 1990-05-24 1991-05-16 Metodo para depositar diamante sobre un sustrato. Expired - Fee Related ES2074969A6 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/528,804 US5071677A (en) 1990-05-24 1990-05-24 Halogen-assisted chemical vapor deposition of diamond

Publications (1)

Publication Number Publication Date
ES2074969A6 true ES2074969A6 (es) 1995-09-16

Family

ID=24107255

Family Applications (1)

Application Number Title Priority Date Filing Date
ES09150029A Expired - Fee Related ES2074969A6 (es) 1990-05-24 1991-05-16 Metodo para depositar diamante sobre un sustrato.

Country Status (6)

Country Link
US (1) US5071677A (es)
EP (1) EP0557281A1 (es)
JP (1) JPH05506483A (es)
CA (1) CA2081778A1 (es)
ES (1) ES2074969A6 (es)
WO (1) WO1991018128A1 (es)

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CA2049673A1 (en) * 1990-11-26 1992-05-27 James F. Fleischer Cvd diamond by alternating chemical reactions
US5198263A (en) * 1991-03-15 1993-03-30 The United States Of America As Represented By The United States Department Of Energy High rate chemical vapor deposition of carbon films using fluorinated gases
JPH04305096A (ja) * 1991-04-01 1992-10-28 Sumitomo Electric Ind Ltd 高品質気相合成ダイヤモンドの低温形成法
US5374414A (en) * 1991-05-10 1994-12-20 The United States Of America As Represented By The Secretary Of The Navy Self-supporting diamond filaments
CA2072384A1 (en) * 1991-08-29 1993-03-01 Clifford L. Spiro Carbon fluoride compositions
US5527747A (en) * 1991-10-04 1996-06-18 Georgia Tech Research Corporation Rapid process for the preparation of diamond articles
US6592839B2 (en) * 1991-11-25 2003-07-15 The University Of Chicago Tailoring nanocrystalline diamond film properties
CA2091665C (en) * 1992-04-07 2003-01-07 Peter George Tsantrizos Process for the synthesis of fullerenes
US5439492A (en) * 1992-06-11 1995-08-08 General Electric Company Fine grain diamond workpieces
US6500488B1 (en) * 1992-08-04 2002-12-31 Northwestern Univ. Method of forming fluorine-bearing diamond layer on substrates, including tool substrates
US5300188A (en) * 1992-11-13 1994-04-05 Kobe Development Corp. Process for making substantially smooth diamond
US5249554A (en) * 1993-01-08 1993-10-05 Ford Motor Company Powertrain component with adherent film having a graded composition
AT399726B (de) * 1993-08-25 1995-07-25 Bertel Erminald Dr Einrichtung zur aufbringung diamantartiger kohlenstoffschichten auf ein substrat
US5397396A (en) * 1993-12-27 1995-03-14 General Electric Company Apparatus for chemical vapor deposition of diamond including thermal spreader
US5620754A (en) * 1994-01-21 1997-04-15 Qqc, Inc. Method of treating and coating substrates
US5554415A (en) * 1994-01-18 1996-09-10 Qqc, Inc. Substrate coating techniques, including fabricating materials on a surface of a substrate
US5731046A (en) * 1994-01-18 1998-03-24 Qqc, Inc. Fabrication of diamond and diamond-like carbon coatings
US5628882A (en) * 1995-02-17 1997-05-13 The United States Of America As Represented By The Secretary Of The Air Force Method for sputter deposition of a chromium, carbon and fluorine crystalline films
US5589231A (en) * 1995-04-04 1996-12-31 Rice University Halogen-activated chemical vapor deposition of diamond
PT3078667T (pt) * 2001-01-25 2018-12-28 The United States Of America Represented By The Sec Dep Of Health And Human Services Formulação de compostos de ácido borónico
US7687146B1 (en) 2004-02-11 2010-03-30 Zyvex Labs, Llc Simple tool for positional diamond mechanosynthesis, and its method of manufacture
US9469918B2 (en) 2014-01-24 2016-10-18 Ii-Vi Incorporated Substrate including a diamond layer and a composite layer of diamond and silicon carbide, and, optionally, silicon
US20220127721A1 (en) * 2020-10-23 2022-04-28 Applied Materials, Inc. Depositing Low Roughness Diamond Films
US12442104B2 (en) 2023-04-20 2025-10-14 Applied Materials, Inc. Nanocrystalline diamond with amorphous interfacial layer

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Also Published As

Publication number Publication date
WO1991018128A1 (en) 1991-11-28
JPH05506483A (ja) 1993-09-22
US5071677A (en) 1991-12-10
EP0557281A4 (en) 1993-05-18
CA2081778A1 (en) 1991-11-25
EP0557281A1 (en) 1993-09-01

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 20000201