ES2107786T3 - Procedimiento para la formacion de un revestimiento sobre un substrato por pulverizacion catodica reactiva. - Google Patents

Procedimiento para la formacion de un revestimiento sobre un substrato por pulverizacion catodica reactiva.

Info

Publication number
ES2107786T3
ES2107786T3 ES94870066T ES94870066T ES2107786T3 ES 2107786 T3 ES2107786 T3 ES 2107786T3 ES 94870066 T ES94870066 T ES 94870066T ES 94870066 T ES94870066 T ES 94870066T ES 2107786 T3 ES2107786 T3 ES 2107786T3
Authority
ES
Spain
Prior art keywords
substrate
coating
procedure
formation
reactive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES94870066T
Other languages
English (en)
Inventor
Rene Winand
Stephane Lucas
Brande Pierre Vanden
Alain Weymeersch
Lucien Renard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ArcelorMittal Liege Upstream SA
Original Assignee
Cockerill Sambre SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cockerill Sambre SA filed Critical Cockerill Sambre SA
Application granted granted Critical
Publication of ES2107786T3 publication Critical patent/ES2107786T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PROCESO PARA LA FORMACION DE UN REVESTIMIENTO (5) SOBRE UN SUSTRATO (3) POR PULVERIZACION CATODICA REACTIVA ("SPUTTERING" EN UN RECINTO CERRADO (1) EN PRESENCIA DE UN PLASMA DE UN GAS NO REACTIVO Y DE UN GAS REACTIVO QUE CONTIENE EL O LOS ELEMENTOS DE LOS QUE DEBE ESTAR FORMADO EL REVESTIMIENDO CITADO, SEGUN EL CUAL SE HACE USO DE UN BLANCO (2) QUE PRESENTA UNA CAPA SUPERFICIAL (4) ORIENTADA HACIA EL SUSTRATO Y QUE CONTIENE AL MENOS UNO DE LOS ELEMENTOS A DEPOSITAR, SEGUN EL CUAL SE CONTROLA EL ESPESOR DE ESTA CAPA SUPERFICIAL (4) A LO LARGO DE LA PULVERIZACION CATODICA POR UN AJUSTE DE LA CONCENTRACION DE LOS GASES EN EL RECINTO CERRADO CITADO.
ES94870066T 1993-04-16 1994-04-14 Procedimiento para la formacion de un revestimiento sobre un substrato por pulverizacion catodica reactiva. Expired - Lifetime ES2107786T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE9300378A BE1006967A3 (fr) 1993-04-16 1993-04-16 Procede pour la formation d'un revetement sur un substrat par pulverisation cathodique reactive.

Publications (1)

Publication Number Publication Date
ES2107786T3 true ES2107786T3 (es) 1997-12-01

Family

ID=3886980

Family Applications (1)

Application Number Title Priority Date Filing Date
ES94870066T Expired - Lifetime ES2107786T3 (es) 1993-04-16 1994-04-14 Procedimiento para la formacion de un revestimiento sobre un substrato por pulverizacion catodica reactiva.

Country Status (7)

Country Link
US (1) US6485615B1 (es)
EP (1) EP0620290B1 (es)
JP (1) JP3485960B2 (es)
AT (1) ATE155827T1 (es)
BE (1) BE1006967A3 (es)
DE (1) DE69404361T2 (es)
ES (1) ES2107786T3 (es)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3167761D1 (en) * 1980-01-16 1985-01-31 Nat Res Dev Method and apparatus for depositing coatings in a glow discharge
JPS60204626A (ja) * 1984-03-30 1985-10-16 Anelva Corp 酸化鉄薄膜の形成方法および装置
JPH0772349B2 (ja) * 1987-05-12 1995-08-02 住友電気工業株式会社 大面積化合物薄膜の作製方法および装置
JPH01108378A (ja) * 1987-10-21 1989-04-25 Mitsubishi Electric Corp スパツタ装置
US5064520A (en) * 1989-02-15 1991-11-12 Hitachi, Ltd. Method and apparatus for forming a film

Also Published As

Publication number Publication date
JPH07118843A (ja) 1995-05-09
DE69404361T2 (de) 1998-02-19
DE69404361D1 (de) 1997-09-04
US6485615B1 (en) 2002-11-26
BE1006967A3 (fr) 1995-02-07
EP0620290B1 (fr) 1997-07-23
JP3485960B2 (ja) 2004-01-13
ATE155827T1 (de) 1997-08-15
EP0620290A1 (fr) 1994-10-19

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