ES2159819T3 - Nitruro de titanio dopado con boro, revestimiento de sustrato a base de este nuevo compuesto, y piezas que contienen dicho revestimiento. - Google Patents

Nitruro de titanio dopado con boro, revestimiento de sustrato a base de este nuevo compuesto, y piezas que contienen dicho revestimiento.

Info

Publication number
ES2159819T3
ES2159819T3 ES97400217T ES97400217T ES2159819T3 ES 2159819 T3 ES2159819 T3 ES 2159819T3 ES 97400217 T ES97400217 T ES 97400217T ES 97400217 T ES97400217 T ES 97400217T ES 2159819 T3 ES2159819 T3 ES 2159819T3
Authority
ES
Spain
Prior art keywords
titanium nitride
boro
covering
new compound
substrate coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES97400217T
Other languages
English (en)
Inventor
Christophe Heau
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tecmachine SA
Original Assignee
Tecmachine SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tecmachine SA filed Critical Tecmachine SA
Application granted granted Critical
Publication of ES2159819T3 publication Critical patent/ES2159819T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/0602—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with two or more other elements chosen from metals, silicon or boron
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/076—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with titanium or zirconium or hafnium
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5053—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials non-oxide ceramics
    • C04B41/5062—Borides, Nitrides or Silicides
    • C04B41/5068—Titanium nitride
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials
    • C04B41/87—Ceramics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/50—Solid solutions
    • C01P2002/52—Solid solutions containing elements as dopants
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/50—Solid solutions
    • C01P2002/52—Solid solutions containing elements as dopants
    • C01P2002/54—Solid solutions containing elements as dopants one element only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Ceramic Products (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

NITRURO DE TITANIO DOPADO POR BORO, QUE CRISTALIZA EN LA MISMA ESTRUCTURA QUE EL NITRURO DE TITANIO TIN, Y QUE TIENE UNA MICRODUREZA VICKERS SUPERIOR A APROXIMADAMENTE 50 GPA. REVESTIMIENTO ANTIDESGASTE CONSTITUIDO POR TAL NITRURO DE TITANIO DOPADO POR BORO. PIEZAS, POR EJEMPLO PIEZAS METALICAS, PIEZAS DE CARBURO DE TUNGSTENO Y CERMETOS, QUE COMPRENDE TAL REVESTIMIENTO.
ES97400217T 1996-02-01 1997-01-30 Nitruro de titanio dopado con boro, revestimiento de sustrato a base de este nuevo compuesto, y piezas que contienen dicho revestimiento. Expired - Lifetime ES2159819T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9601229A FR2744461B1 (fr) 1996-02-01 1996-02-01 Nitrure de titane dope par du bore, revetement de substrat a base de ce nouveau compose, possedant une durete elevee et permettant une tres bonne resistance a l'usure, et pieces comportant un tel revetement

Publications (1)

Publication Number Publication Date
ES2159819T3 true ES2159819T3 (es) 2001-10-16

Family

ID=9488733

Family Applications (1)

Application Number Title Priority Date Filing Date
ES97400217T Expired - Lifetime ES2159819T3 (es) 1996-02-01 1997-01-30 Nitruro de titanio dopado con boro, revestimiento de sustrato a base de este nuevo compuesto, y piezas que contienen dicho revestimiento.

Country Status (11)

Country Link
US (1) US5851680A (es)
EP (1) EP0787683B1 (es)
JP (1) JP3135513B2 (es)
KR (1) KR100262179B1 (es)
BR (1) BR9700843A (es)
CA (1) CA2196589C (es)
CH (1) CH692042A5 (es)
DE (1) DE69706335T2 (es)
ES (1) ES2159819T3 (es)
FR (1) FR2744461B1 (es)
TW (1) TW502068B (es)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
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US6331811B2 (en) * 1998-06-12 2001-12-18 Nec Corporation Thin-film resistor, wiring substrate, and method for manufacturing the same
JP3696406B2 (ja) * 1998-06-18 2005-09-21 日本ピストンリング株式会社 摺動部材
JP3824199B2 (ja) * 1998-08-24 2006-09-20 日本ピストンリング株式会社 摺動部材
US6802457B1 (en) 1998-09-21 2004-10-12 Caterpillar Inc Coatings for use in fuel system components
US6329670B1 (en) 1999-04-06 2001-12-11 Micron Technology, Inc. Conductive material for integrated circuit fabrication
JP3473485B2 (ja) * 1999-04-08 2003-12-02 日本電気株式会社 薄膜抵抗体およびその製造方法
US6635939B2 (en) * 1999-08-24 2003-10-21 Micron Technology, Inc. Boron incorporated diffusion barrier material
US6420275B1 (en) 1999-08-30 2002-07-16 Micron Technology, Inc. System and method for analyzing a semiconductor surface
US6274257B1 (en) * 1999-10-29 2001-08-14 Ionbond Inc. Forming members for shaping a reactive metal and methods for their fabrication
US6715693B1 (en) * 2000-02-15 2004-04-06 Caterpillar Inc Thin film coating for fuel injector components
US6696368B2 (en) * 2001-07-31 2004-02-24 Micron Technology, Inc. Titanium boronitride layer for high aspect ratio semiconductor devices
US6746952B2 (en) * 2001-08-29 2004-06-08 Micron Technology, Inc. Diffusion barrier layer for semiconductor wafer fabrication
US7067416B2 (en) 2001-08-29 2006-06-27 Micron Technology, Inc. Method of forming a conductive contact
CN1282766C (zh) * 2001-11-07 2006-11-01 日立工具股份有限公司 涂覆硬质被膜工具
JP4251990B2 (ja) * 2002-01-18 2009-04-08 住友電工ハードメタル株式会社 表面被覆切削工具
US6753618B2 (en) * 2002-03-11 2004-06-22 Micron Technology, Inc. MIM capacitor with metal nitride electrode materials and method of formation
DE10222347C2 (de) * 2002-05-21 2003-11-27 Walter Ag TiBN-Beschichtung für einen Schneideinsatz oder ein Schneidwerkzeug
JP4982840B2 (ja) * 2005-07-27 2012-07-25 国立大学法人横浜国立大学 ＴｉＮ系硬質被膜、及びそれを含む表面硬化材
US7851052B2 (en) * 2005-08-23 2010-12-14 Awi Licensing Company Coating system for sag resistant formaldehyde-free fibrous panels
JP5076601B2 (ja) * 2006-06-02 2012-11-21 株式会社豊田中央研究所 導電性耐食材料の製造方法
AT9748U1 (de) * 2007-04-02 2008-03-15 Ceratizit Austria Gmbh Mehrlagige cvd-schicht
US9385034B2 (en) * 2007-04-11 2016-07-05 Taiwan Semiconductor Manufacturing Company, Ltd. Carbonization of metal caps
JP5496205B2 (ja) * 2008-08-28 2014-05-21 コーニング インコーポレイテッド 工具ダイ用の耐摩耗性被覆
US20110262233A1 (en) * 2008-10-30 2011-10-27 Sandvik Intellectual Property Ab Coated tool and a method of making thereof
CN102453861B (zh) * 2010-10-28 2015-03-25 比亚迪股份有限公司 一种压铸用模具制备方法
DE102013011075A1 (de) 2013-07-03 2015-01-08 Oerlikon Trading Ag TiB2 Schichten und ihre Herstellung
CN106191771A (zh) * 2016-07-01 2016-12-07 江苏科技大学 NbBN复合涂层及其制备方法
CN109678168B (zh) * 2018-11-28 2020-12-25 焦国豪 一种钛-硼-氮化合物粉末制备装置及方法
CN113149658B (zh) * 2021-04-28 2023-02-07 武汉理工大学 一种氮化钛基复合陶瓷材料及其制备方法
TWI909718B (zh) * 2024-09-27 2025-12-21 華東科技股份有限公司 一種改進的吸嘴裝置

Family Cites Families (9)

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EP0149044B1 (en) * 1983-11-11 1987-05-13 Research Development Corporation of Japan Boron nitride containing titanium nitride, method of producing the same and composite ceramics produced therefrom
US4920071A (en) * 1985-03-15 1990-04-24 Fairchild Camera And Instrument Corporation High temperature interconnect system for an integrated circuit
JPH081950B2 (ja) * 1986-11-21 1996-01-10 株式会社東芝 半導体装置の製造方法
JPS6428358A (en) * 1987-07-22 1989-01-30 Kobe Steel Ltd Hard coated member
AT387988B (de) * 1987-08-31 1989-04-10 Plansee Tizit Gmbh Verfahren zur herstellung mehrlagig beschichteter hartmetallteile
FR2653452B1 (fr) * 1989-10-20 1992-01-24 Stephanois Rech Mec Revetement de substrat, pour conferer a celui-ci de bonnes proprietes tribologiques, en alliage chrome-azote, et procede d'obtention.
JP2793696B2 (ja) * 1990-05-17 1998-09-03 神鋼コベルコツール株式会社 耐摩耗性皮膜
LU87988A1 (de) * 1991-08-08 1993-03-15 Europ Communities Verfahren zur herstellung einer ti-b-n-beschichtung auf einem substrat mittels sputtern
DE4419393A1 (de) * 1994-05-30 1995-12-07 Fraunhofer Ges Forschung Werkzeug für Umform- und Zerspanungsvorrichtungen und Verfahren zum Herstellen eines beschichteten Werkzeugs

Also Published As

Publication number Publication date
KR970062064A (ko) 1997-09-12
CA2196589A1 (fr) 1997-08-02
CA2196589C (fr) 2001-04-03
CH692042A5 (fr) 2002-01-15
DE69706335D1 (de) 2001-10-04
EP0787683B1 (fr) 2001-08-29
DE69706335T2 (de) 2002-06-13
FR2744461A1 (fr) 1997-08-08
BR9700843A (pt) 1998-09-01
TW502068B (en) 2002-09-11
US5851680A (en) 1998-12-22
EP0787683A1 (fr) 1997-08-06
FR2744461B1 (fr) 1998-05-22
JPH101769A (ja) 1998-01-06
KR100262179B1 (ko) 2000-07-15
JP3135513B2 (ja) 2001-02-19

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