ES2177798T3 - Proceso para fabricar articulos de aleacion de ito. - Google Patents

Proceso para fabricar articulos de aleacion de ito.

Info

Publication number
ES2177798T3
ES2177798T3 ES96930130T ES96930130T ES2177798T3 ES 2177798 T3 ES2177798 T3 ES 2177798T3 ES 96930130 T ES96930130 T ES 96930130T ES 96930130 T ES96930130 T ES 96930130T ES 2177798 T3 ES2177798 T3 ES 2177798T3
Authority
ES
Spain
Prior art keywords
dust
powder
article
manufacturing ito
ito alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES96930130T
Other languages
English (en)
Inventor
Paul Lippens
Ludo Froyen
Louis Buekenhout
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bekaert NV SA
Original Assignee
Bekaert NV SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bekaert NV SA filed Critical Bekaert NV SA
Application granted granted Critical
Publication of ES2177798T3 publication Critical patent/ES2177798T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/1208—Containers or coating used therefor
    • B22F3/1216—Container composition
    • B22F3/1241—Container composition layered
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00—Compounds of aluminium
    • C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/10—Alloys containing non-metals
    • C22C1/1084—Alloys containing non-metals by mechanical alloying (blending, milling)
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
    • C22C29/12—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on oxides
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Powder Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Conductive Materials (AREA)

Abstract

LA INVENCION SE REFIERE A UN PROCESO PARA LA FABRICACION DE UN ARTICULO EN POLVO LIBRE DE POROS DE ALEACION METALURGICA A PARTIR DE UNA PORCION MINORITARIA DE POLVO DE SN Y UNA PORCION PRINCIPAL DE POLVO DE IN 2 O 3 Y QUE INCLUYE LOS P ASOS DE: DISTRIBUIR DE FORMA SUSTANCIALMENTE UNIFORME Y FIJAR EL POLVO DE SN SOBRE LA SUPERFICIE DEL POLVO DE IN 2 O SUB,3 MEDIANTE MEZCLA Y MOLIENDA DE LOS DISTINTOS POLVOS EN PRESENCIA DE UN AGENTE DE CONTROL DEL PROCESO PARA FORMAR POLVOS ALEADOS; Y COMPACTAR A ALTA TEMPERATURA LOS POLVOS ASI ALEADOS PARA FORMAR EL ARTICULO. EL ARTICULO PRESENTA UNA BUENA CONDUCTIVIDAD ELECTRICA Y ES UTILIZABLE COMO BLANCO PARA COMPOSICIONES ITO DE PROYECCION DE PLASMA.
ES96930130T 1995-08-31 1996-08-29 Proceso para fabricar articulos de aleacion de ito. Expired - Lifetime ES2177798T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP95202356 1995-08-31

Publications (1)

Publication Number Publication Date
ES2177798T3 true ES2177798T3 (es) 2002-12-16

Family

ID=8220601

Family Applications (1)

Application Number Title Priority Date Filing Date
ES96930130T Expired - Lifetime ES2177798T3 (es) 1995-08-31 1996-08-29 Proceso para fabricar articulos de aleacion de ito.

Country Status (13)

Country Link
US (1) US6123787A (es)
EP (1) EP0871793B1 (es)
JP (1) JPH11511510A (es)
KR (1) KR100567472B1 (es)
AT (1) ATE218169T1 (es)
AU (1) AU707146B2 (es)
BR (1) BR9610397A (es)
CZ (1) CZ289688B6 (es)
DE (1) DE69621455T2 (es)
DK (1) DK0871793T3 (es)
ES (1) ES2177798T3 (es)
IL (1) IL122949A (es)
WO (1) WO1997008358A1 (es)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101024177B1 (ko) * 2001-08-02 2011-03-22 이데미쓰 고산 가부시키가이샤 스퍼터링 타겟, 투명 전도막 및 이들의 제조방법
DE102006026005A1 (de) * 2006-06-01 2007-12-06 W.C. Heraeus Gmbh Kaltgepresste Sputtertargets
FR2944293B1 (fr) * 2009-04-10 2012-05-18 Saint Gobain Coating Solutions Procede d'elaboration par projection thermique d'une cible
CN105378141B (zh) * 2013-07-05 2018-05-18 旭硝子工业陶瓷株式会社 溅射靶材及其制造方法
JP2015017297A (ja) * 2013-07-10 2015-01-29 三菱マテリアル株式会社 Ｉｎ系円筒形スパッタリングターゲットおよびその製造方法
KR20160080820A (ko) 2014-12-26 2016-07-08 충남대학교산학협력단 지퍼가 열리는 것을 방지하기 위한 장치
CN114394818B (zh) * 2022-02-10 2022-10-18 江苏东玖光电科技有限公司 一种大长径比ito管状靶材的制备方法及制作模具

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4482374A (en) * 1982-06-07 1984-11-13 Mpd Technology Corporation Production of electrically conductive metal flake
DE68924095T2 (de) * 1988-05-16 1996-04-04 Tosoh Corp Verfahren zur Herstellung eines Sputtertargets zur Erzeugung einer elektrisch leitenden, durchsichtigen Schicht.
JP2570832B2 (ja) * 1988-10-21 1997-01-16 三菱マテリアル株式会社 良導電性インジウムースズ酸化物焼結体の製造法
JPH03207858A (ja) * 1990-01-08 1991-09-11 Nippon Mining Co Ltd Ｉｔｏスパッタリングターゲットの製造方法
JPH0517201A (ja) * 1991-07-01 1993-01-26 Sumitomo Metal Mining Co Ltd Ｉｔｏ焼結体及びその製造方法
US5480531A (en) * 1991-07-24 1996-01-02 Degussa Aktiengesellschaft Target for cathode sputtering and method of its production
DE4124471C1 (en) * 1991-07-24 1992-06-11 Degussa Ag, 6000 Frankfurt, De Target for cathodic sputtering - produced from partially reduced mixtures of indium oxide and tin oxide by hot pressing in inert protective gas
FR2680799B1 (fr) * 1991-09-03 1993-10-29 Elf Aquitaine Ste Nale Element de cible pour pulverisation cathodique, procede de preparation dudit element et cibles, notamment de grande surface, realisees a partir de cet element.
JPH05156431A (ja) * 1991-11-29 1993-06-22 Asahi Glass Co Ltd 回転カソードターゲットの製造方法
JP3079724B2 (ja) * 1991-12-18 2000-08-21 東ソー株式会社 高密度ｉｔｏ焼結体の製造方法
JPH05222526A (ja) * 1992-02-07 1993-08-31 Asahi Glass Co Ltd Ｉｔｏ透明導電膜用スパッタリングターゲットとその製造方法
JPH05339721A (ja) * 1992-06-03 1993-12-21 Mitsubishi Materials Corp 酸化インジウム−酸化錫スパッタリングターゲットの製造法
JPH062124A (ja) * 1992-06-16 1994-01-11 Mitsubishi Materials Corp 酸化インジウム−酸化錫スパッタリングターゲットの製造法
JPH06293963A (ja) * 1993-04-07 1994-10-21 Mitsui Mining & Smelting Co Ltd Ｉｔｏスパッタリングターゲット用バッキングプレート
DE4407774C1 (de) * 1994-03-09 1995-04-20 Leybold Materials Gmbh Target für die Kathodenzerstäubung zur Herstellung transparenter, leitfähiger Schichten und Verfahren zu seiner Herstellung

Also Published As

Publication number Publication date
AU707146B2 (en) 1999-07-01
EP0871793A1 (en) 1998-10-21
BR9610397A (pt) 1999-12-21
US6123787A (en) 2000-09-26
AU6929896A (en) 1997-03-19
EP0871793B1 (en) 2002-05-29
WO1997008358A1 (en) 1997-03-06
ATE218169T1 (de) 2002-06-15
KR100567472B1 (ko) 2006-07-03
DE69621455D1 (de) 2002-07-04
CZ58798A3 (cs) 1998-08-12
KR19990036329A (ko) 1999-05-25
DE69621455T2 (de) 2002-09-12
JPH11511510A (ja) 1999-10-05
DK0871793T3 (da) 2002-09-23
CZ289688B6 (cs) 2002-03-13
IL122949A0 (en) 1998-08-16
IL122949A (en) 2000-08-13

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