ES2210996T3 - Procedimiento para depositar capas de oxido(s) metalico(s). - Google Patents

Procedimiento para depositar capas de oxido(s) metalico(s).

Info

Publication number: ES2210996T3
Authority: ES; Spain
Prior art keywords: layer; sun; substrate; irradiation; phase
Prior art date: 1998-03-13
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

ES99400595T

Other languages

English (en)

Spanish (es)

Inventor

Tsutomu Minami

Kiyoharu Tadanaga

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Saint Gobain Glass France SAS

Compagnie de Saint Gobain SA

Original Assignee

Saint Gobain Glass France SAS

Compagnie de Saint Gobain SA

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1998-03-13

Filing date

1999-03-11

Publication date

2004-07-01

1999-03-11 Application filed by Saint Gobain Glass France SAS, Compagnie de Saint Gobain SA filed Critical Saint Gobain Glass France SAS

2004-07-01 Application granted granted Critical

2004-07-01 Publication of ES2210996T3 publication Critical patent/ES2210996T3/es

2019-03-11 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

238000000034 method Methods 0.000 title claims abstract description 50
150000004706 metal oxides Chemical class 0.000 title claims abstract description 32
229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 15
238000000151 deposition Methods 0.000 title claims description 31
239000000758 substrate Substances 0.000 claims abstract description 57
239000002243 precursor Substances 0.000 claims abstract description 27
239000002184 metal Substances 0.000 claims abstract description 22
229910052751 metal Inorganic materials 0.000 claims abstract description 22
239000002904 solvent Substances 0.000 claims abstract description 10
230000005855 radiation Effects 0.000 claims abstract description 9
238000002360 preparation method Methods 0.000 claims abstract description 6
239000003381 stabilizer Substances 0.000 claims abstract description 6
XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 28
230000008021 deposition Effects 0.000 claims description 25
239000011521 glass Substances 0.000 claims description 19
238000010438 heat treatment Methods 0.000 claims description 17
YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 claims description 16
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 13
238000011282 treatment Methods 0.000 claims description 12
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 11
239000002738 chelating agent Substances 0.000 claims description 10
229910001887 tin oxide Inorganic materials 0.000 claims description 10
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 9
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 9
238000000576 coating method Methods 0.000 claims description 9
230000000694 effects Effects 0.000 claims description 7
238000004519 manufacturing process Methods 0.000 claims description 7
CVBUKMMMRLOKQR-UHFFFAOYSA-N 1-phenylbutane-1,3-dione Chemical compound CC(=O)CC(=O)C1=CC=CC=C1 CVBUKMMMRLOKQR-UHFFFAOYSA-N 0.000 claims description 6
QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 6
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
229910052710 silicon Inorganic materials 0.000 claims description 6
239000010703 silicon Substances 0.000 claims description 6
239000011248 coating agent Substances 0.000 claims description 5
229920000620 organic polymer Polymers 0.000 claims description 5
GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 4
MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 4
150000004703 alkoxides Chemical class 0.000 claims description 4
229910052787 antimony Inorganic materials 0.000 claims description 4
229910052736 halogen Inorganic materials 0.000 claims description 4
150000002367 halogens Chemical class 0.000 claims description 4
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
229910021529 ammonia Inorganic materials 0.000 claims description 3
WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 3
229910052785 arsenic Inorganic materials 0.000 claims description 3
239000000919 ceramic Substances 0.000 claims description 3
239000003989 dielectric material Substances 0.000 claims description 3
230000008030 elimination Effects 0.000 claims description 3
238000003379 elimination reaction Methods 0.000 claims description 3
229910003437 indium oxide Inorganic materials 0.000 claims description 3
PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 3
229910001507 metal halide Inorganic materials 0.000 claims description 3
238000000206 photolithography Methods 0.000 claims description 3
239000011347 resin Substances 0.000 claims description 3
229920005989 resin Polymers 0.000 claims description 3
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 2
125000003158 alcohol group Chemical group 0.000 claims description 2
RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 2
150000002148 esters Chemical group 0.000 claims description 2
XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 claims description 2
229940093858 ethyl acetoacetate Drugs 0.000 claims description 2
229910052731 fluorine Inorganic materials 0.000 claims description 2
239000011737 fluorine Substances 0.000 claims description 2
150000002576 ketones Chemical class 0.000 claims description 2
150000005309 metal halides Chemical class 0.000 claims description 2
150000007524 organic acids Chemical class 0.000 claims description 2
150000002902 organometallic compounds Chemical class 0.000 claims description 2
230000000737 periodic effect Effects 0.000 claims description 2
238000005507 spraying Methods 0.000 claims description 2
150000001723 carbon free-radicals Chemical class 0.000 claims 1
239000006112 glass ceramic composition Substances 0.000 claims 1
239000002241 glass-ceramic Substances 0.000 claims 1
150000004820 halides Chemical class 0.000 claims 1
150000004767 nitrides Chemical class 0.000 claims 1
235000005985 organic acids Nutrition 0.000 claims 1
238000010791 quenching Methods 0.000 claims 1
230000000171 quenching effect Effects 0.000 claims 1
150000003839 salts Chemical class 0.000 claims 1
239000002210 silicon-based material Substances 0.000 claims 1
238000007669 thermal treatment Methods 0.000 abstract description 2
BFYCFODZOFWWAA-UHFFFAOYSA-N 2,4,6-trimethylpyridine-3-carbaldehyde Chemical compound CC1=CC(C)=C(C=O)C(C)=N1 BFYCFODZOFWWAA-UHFFFAOYSA-N 0.000 abstract 1
239000000499 gel Substances 0.000 description 28
239000000203 mixture Substances 0.000 description 9
239000000126 substance Substances 0.000 description 8
239000002019 doping agent Substances 0.000 description 7
229910021626 Tin(II) chloride Inorganic materials 0.000 description 6
235000011150 stannous chloride Nutrition 0.000 description 6
AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 6
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
230000015572 biosynthetic process Effects 0.000 description 4
238000006243 chemical reaction Methods 0.000 description 3
238000004528 spin coating Methods 0.000 description 3
238000003786 synthesis reaction Methods 0.000 description 3
-1 SnCl 2 Chemical compound 0.000 description 2
238000010521 absorption reaction Methods 0.000 description 2
FAPDDOBMIUGHIN-UHFFFAOYSA-K antimony trichloride Chemical compound Cl[Sb](Cl)Cl FAPDDOBMIUGHIN-UHFFFAOYSA-K 0.000 description 2
239000013626 chemical specie Substances 0.000 description 2
229910052681 coesite Inorganic materials 0.000 description 2
238000009833 condensation Methods 0.000 description 2
230000005494 condensation Effects 0.000 description 2
229910052906 cristobalite Inorganic materials 0.000 description 2
230000007423 decrease Effects 0.000 description 2
238000000280 densification Methods 0.000 description 2
230000001687 destabilization Effects 0.000 description 2
238000001035 drying Methods 0.000 description 2
JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
239000000463 material Substances 0.000 description 2
230000004048 modification Effects 0.000 description 2
238000012986 modification Methods 0.000 description 2
238000006116 polymerization reaction Methods 0.000 description 2
230000008569 process Effects 0.000 description 2
230000000750 progressive effect Effects 0.000 description 2
239000000377 silicon dioxide Substances 0.000 description 2
235000012239 silicon dioxide Nutrition 0.000 description 2
229910052682 stishovite Inorganic materials 0.000 description 2
238000005496 tempering Methods 0.000 description 2
229910052905 tridymite Inorganic materials 0.000 description 2
KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
238000000862 absorption spectrum Methods 0.000 description 1
125000003545 alkoxy group Chemical group 0.000 description 1
125000000217 alkyl group Chemical group 0.000 description 1
VMPVEPPRYRXYNP-UHFFFAOYSA-I antimony(5+);pentachloride Chemical compound Cl[Sb](Cl)(Cl)(Cl)Cl VMPVEPPRYRXYNP-UHFFFAOYSA-I 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
230000004888 barrier function Effects 0.000 description 1
230000008901 benefit Effects 0.000 description 1
239000011575 calcium Substances 0.000 description 1
229910052791 calcium Inorganic materials 0.000 description 1
125000004432 carbon atom Chemical group C* 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
238000005253 cladding Methods 0.000 description 1
239000008139 complexing agent Substances 0.000 description 1
239000004020 conductor Substances 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
238000002425 crystallisation Methods 0.000 description 1
230000008025 crystallization Effects 0.000 description 1
238000005137 deposition process Methods 0.000 description 1
238000003618 dip coating Methods 0.000 description 1
238000007598 dipping method Methods 0.000 description 1
238000004090 dissolution Methods 0.000 description 1
230000005670 electromagnetic radiation Effects 0.000 description 1
238000005530 etching Methods 0.000 description 1
238000001914 filtration Methods 0.000 description 1
239000005329 float glass Substances 0.000 description 1
238000009472 formulation Methods 0.000 description 1
230000007062 hydrolysis Effects 0.000 description 1
238000006460 hydrolysis reaction Methods 0.000 description 1
238000011065 in-situ storage Methods 0.000 description 1
229910052500 inorganic mineral Inorganic materials 0.000 description 1
229910001867 inorganic solvent Inorganic materials 0.000 description 1
239000003049 inorganic solvent Substances 0.000 description 1
230000001678 irradiating effect Effects 0.000 description 1
230000005499 meniscus Effects 0.000 description 1
239000011707 mineral Substances 0.000 description 1
125000000896 monocarboxylic acid group Chemical group 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
238000006303 photolysis reaction Methods 0.000 description 1
230000015843 photosynthesis, light reaction Effects 0.000 description 1
229920000642 polymer Polymers 0.000 description 1
XOFYZVNMUHMLCC-ZPOLXVRWSA-N prednisone Chemical compound O=C1C=C[C@]2(C)[C@H]3C(=O)C[C@](C)([C@@](CC4)(O)C(=O)CO)[C@@H]4[C@@H]3CCC2=C1 XOFYZVNMUHMLCC-ZPOLXVRWSA-N 0.000 description 1
CCTFOFUMSKSGRK-UHFFFAOYSA-N propan-2-olate;tin(4+) Chemical compound [Sn+4].CC(C)[O-].CC(C)[O-].CC(C)[O-].CC(C)[O-] CCTFOFUMSKSGRK-UHFFFAOYSA-N 0.000 description 1
229940020549 rayos Drugs 0.000 description 1
238000007761 roller coating Methods 0.000 description 1
229910052814 silicon oxide Inorganic materials 0.000 description 1
229910052709 silver Inorganic materials 0.000 description 1
239000004332 silver Substances 0.000 description 1
239000007921 spray Substances 0.000 description 1
238000005478 sputtering type Methods 0.000 description 1
230000000087 stabilizing effect Effects 0.000 description 1
238000006467 substitution reaction Methods 0.000 description 1
230000009466 transformation Effects 0.000 description 1
230000007704 transition Effects 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
- C03C17/253—Coating containing SnO2
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
- C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/211—SnO2
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/24—Doped oxides
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/24—Doped oxides
- C03C2217/241—Doped oxides with halides
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/24—Doped oxides
- C03C2217/244—Doped oxides with Sb
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/328—Partly or completely removing a coating
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/328—Partly or completely removing a coating
- C03C2218/33—Partly or completely removing a coating by etching

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Life Sciences & Earth Sciences (AREA)
Organic Chemistry (AREA)
Chemical Kinetics & Catalysis (AREA)
General Chemical & Material Sciences (AREA)
Materials Engineering (AREA)
Geochemistry & Mineralogy (AREA)
Wood Science & Technology (AREA)
Toxicology (AREA)
Health & Medical Sciences (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Surface Treatment Of Glass (AREA)
Chemically Coating (AREA)
Physical Or Chemical Processes And Apparatus (AREA)
Application Of Or Painting With Fluid Materials (AREA)

ES99400595T 1998-03-13 1999-03-11 Procedimiento para depositar capas de oxido(s) metalico(s). Expired - Lifetime ES2210996T3 (es)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
FR9803152		1998-03-13
FR9803152A FR2775914B1 (fr)	1998-03-13	1998-03-13	Procede de depot de couches a base d'oxyde(s) metallique(s)

Publications (1)

Publication Number	Publication Date
ES2210996T3 true ES2210996T3 (es)	2004-07-01

Family

ID=9524051

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ES99400595T Expired - Lifetime ES2210996T3 (es)	1998-03-13	1999-03-11	Procedimiento para depositar capas de oxido(s) metalico(s).

Country Status (7)

Country	Link
US (1)	US6517901B1 (2)
EP (1)	EP0941773B1 (2)
JP (1)	JP4750237B2 (2)
KR (1)	KR100607595B1 (2)
DE (1)	DE69912334T2 (2)
ES (1)	ES2210996T3 (2)
FR (1)	FR2775914B1 (2)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
FI20010523A0 (fi) *	2001-03-16	2001-03-16	Yli Urpo Antti	Soolien, geelien ja niiden seosten käsittely
US20030017371A1 (en) *	2001-06-20	2003-01-23	E.L. Specialists, Inc.	Method for increasing conductivity of conductive translucent layer
CN1235446C (zh) *	2001-08-31	2006-01-04	三洋电机株式会社	电激发光元件的制造方法及蒸镀遮罩
KR20030059872A (ko) *	2002-01-03	2003-07-12	삼성전자주식회사	금속 또는 금속산화물 미세 패턴의 제조방법
CN1639062A (zh) *	2002-02-28	2005-07-13	独立行政法人科学技术振兴机构	二氧化钛纳米片层取向薄膜及其制造方法和具备二氧化钛纳米片层取向薄膜的物品
WO2004043853A1 (ja) *	2002-11-13	2004-05-27	Nippon Soda Co., Ltd.	金属−酸素結合を有する分散質、金属酸化物膜、及び単分子膜
KR100974778B1 (ko) *	2003-06-30	2010-08-06	삼성전자주식회사	유기금속 전구체 조성물 및 이를 이용한 금속 필름 또는패턴 형성방법
US7381633B2 (en) *	2005-01-27	2008-06-03	Hewlett-Packard Development Company, L.P.	Method of making a patterned metal oxide film
US7695998B2 (en) *	2005-07-02	2010-04-13	Hewlett-Packard Development Company, L.P.	Methods for making and using high-mobility inorganic semiconductive films
KR100665263B1 (ko) *	2005-07-22	2007-01-09	삼성전기주식회사	복합금속산화물 유전체막 제조방법 및 복합금속산화물유전체막
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1999
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- 1999-03-11 DE DE69912334T patent/DE69912334T2/de not_active Expired - Lifetime
- 1999-03-11 EP EP99400595A patent/EP0941773B1/fr not_active Expired - Lifetime
- 1999-03-12 US US09/266,846 patent/US6517901B1/en not_active Expired - Lifetime
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Also Published As

Publication number	Publication date
KR100607595B1 (ko)	2006-08-02
JPH11319547A (ja)	1999-11-24
US6517901B1 (en)	2003-02-11
JP4750237B2 (ja)	2011-08-17
DE69912334D1 (de)	2003-12-04
EP0941773A1 (fr)	1999-09-15
DE69912334T2 (de)	2004-07-29
FR2775914A1 (fr)	1999-09-17
KR19990077817A (ko)	1999-10-25
FR2775914B1 (fr)	2000-04-21
EP0941773B1 (fr)	2003-10-29

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JPH11319547A5 (2)	2006-03-30
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ES2202818T3 (es)	2004-04-01	Material polimero inorganico a base de oxido de tantalo, en particularcon alto indice de refraccion mecanicamente resistente a la abrasion, su proceso de fabricacion, y material optico que comprende dicho material.
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