JPH11319547A5 - - Google Patents
Info
- Publication number
- JPH11319547A5 JPH11319547A5 JP1999066264A JP6626499A JPH11319547A5 JP H11319547 A5 JPH11319547 A5 JP H11319547A5 JP 1999066264 A JP1999066264 A JP 1999066264A JP 6626499 A JP6626499 A JP 6626499A JP H11319547 A5 JPH11319547 A5 JP H11319547A5
- Authority
- JP
- Japan
- Prior art keywords
- sol
- substrate
- layer
- metal
- metal oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9803152 | 1998-03-13 | ||
| FR9803152A FR2775914B1 (fr) | 1998-03-13 | 1998-03-13 | Procede de depot de couches a base d'oxyde(s) metallique(s) |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11319547A JPH11319547A (ja) | 1999-11-24 |
| JPH11319547A5 true JPH11319547A5 (2) | 2006-03-30 |
| JP4750237B2 JP4750237B2 (ja) | 2011-08-17 |
Family
ID=9524051
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP06626499A Expired - Fee Related JP4750237B2 (ja) | 1998-03-13 | 1999-03-12 | 金属酸化物を主成分とする層の堆積方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6517901B1 (2) |
| EP (1) | EP0941773B1 (2) |
| JP (1) | JP4750237B2 (2) |
| KR (1) | KR100607595B1 (2) |
| DE (1) | DE69912334T2 (2) |
| ES (1) | ES2210996T3 (2) |
| FR (1) | FR2775914B1 (2) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FI20010523A0 (fi) * | 2001-03-16 | 2001-03-16 | Yli Urpo Antti | Soolien, geelien ja niiden seosten käsittely |
| US20030017371A1 (en) * | 2001-06-20 | 2003-01-23 | E.L. Specialists, Inc. | Method for increasing conductivity of conductive translucent layer |
| CN1235446C (zh) * | 2001-08-31 | 2006-01-04 | 三洋电机株式会社 | 电激发光元件的制造方法及蒸镀遮罩 |
| KR20030059872A (ko) * | 2002-01-03 | 2003-07-12 | 삼성전자주식회사 | 금속 또는 금속산화물 미세 패턴의 제조방법 |
| CN1639062A (zh) * | 2002-02-28 | 2005-07-13 | 独立行政法人科学技术振兴机构 | 二氧化钛纳米片层取向薄膜及其制造方法和具备二氧化钛纳米片层取向薄膜的物品 |
| WO2004043853A1 (ja) * | 2002-11-13 | 2004-05-27 | Nippon Soda Co., Ltd. | 金属−酸素結合を有する分散質、金属酸化物膜、及び単分子膜 |
| KR100974778B1 (ko) * | 2003-06-30 | 2010-08-06 | 삼성전자주식회사 | 유기금속 전구체 조성물 및 이를 이용한 금속 필름 또는패턴 형성방법 |
| US7381633B2 (en) * | 2005-01-27 | 2008-06-03 | Hewlett-Packard Development Company, L.P. | Method of making a patterned metal oxide film |
| US7695998B2 (en) * | 2005-07-02 | 2010-04-13 | Hewlett-Packard Development Company, L.P. | Methods for making and using high-mobility inorganic semiconductive films |
| KR100665263B1 (ko) * | 2005-07-22 | 2007-01-09 | 삼성전기주식회사 | 복합금속산화물 유전체막 제조방법 및 복합금속산화물유전체막 |
| DE102005036427A1 (de) * | 2005-08-03 | 2007-02-08 | Schott Ag | Substrat, umfassend zumindest eine voll- oder teilflächige makrostrukturierte Schicht, Verfahren zu deren Herstellung und deren Verwendung |
| CN100470735C (zh) * | 2006-03-03 | 2009-03-18 | 台湾薄膜电晶体液晶显示器产业协会 | 氧化铝绝缘层的制作方法 |
| DE102010021648A1 (de) | 2009-05-26 | 2011-01-05 | Auth, Matthias, Dr. | Verfahren zur Beschichtung von Glasfasern oder Halbzeugen für die optische Industrie |
| KR101043854B1 (ko) * | 2009-07-17 | 2011-06-24 | 연세대학교 산학협력단 | 투명 박막 트랜지스터 및 그 제조 방법 |
| US9252455B1 (en) * | 2010-04-14 | 2016-02-02 | Hrl Laboratories, Llc | Lithium battery structures employing composite layers, and fabrication methods to produce composite layers |
| US8329772B2 (en) * | 2010-05-20 | 2012-12-11 | E I Du Pont De Nemours And Company | UV-curable polymer thick film dielectric compositions with excellent adhesion to ITO |
| GB201108967D0 (en) | 2011-05-27 | 2011-07-13 | Element Six Ltd | Superhard structure, tool element and method of making same |
| KR101387963B1 (ko) * | 2012-08-23 | 2014-04-22 | 인제대학교 산학협력단 | 전자기파 보조 졸겔법에 의한 박막 제조 방법, 및 이에 의하여 제조된 박막 |
| CN103922609B (zh) * | 2014-03-27 | 2015-12-30 | 浙江大学 | 一种胶体ito纳米晶薄膜的制备方法及其产品 |
| CN107114006B (zh) * | 2017-03-29 | 2020-04-21 | 香港中文大学（深圳） | 完美吸收体的制造方法 |
| CN108118295A (zh) * | 2017-12-21 | 2018-06-05 | 上海银之川金银线有限公司 | 一种非连续真空镀金属薄膜、金属丝及其制作方法 |
| US11673903B2 (en) | 2018-04-11 | 2023-06-13 | Inpria Corporation | Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods |
| KR102556775B1 (ko) * | 2018-04-11 | 2023-07-17 | 인프리아 코포레이션 | 낮은 폴리알킬 오염물을 갖는 모노알킬 주석 화합물, 이의 조성물 및 방법 |
| US10787466B2 (en) | 2018-04-11 | 2020-09-29 | Inpria Corporation | Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods |
| WO2019246254A1 (en) | 2018-06-21 | 2019-12-26 | Inpria Corporation | Stable solutions of monoalkyl tin alkoxides and their hydrolysis and condensation products |
| US11498934B2 (en) | 2019-01-30 | 2022-11-15 | Inpria Corporation | Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with particulate contamination and corresponding methods |
| US11966158B2 (en) | 2019-01-30 | 2024-04-23 | Inpria Corporation | Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with low metal contamination and/or particulate contamination, and corresponding methods |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3791340A (en) | 1972-05-15 | 1974-02-12 | Western Electric Co | Method of depositing a metal pattern on a surface |
| FR2184653B1 (2) * | 1972-05-15 | 1976-05-28 | Western Electric Co | |
| US3949121A (en) * | 1973-12-12 | 1976-04-06 | Western Electric Company, Inc. | Method of forming a hydrophobic surface |
| US3964906A (en) | 1973-12-12 | 1976-06-22 | Western Electric Company, Inc. | Method of forming a hydrophobic surface by exposing a colloidal sol to UV radiation |
| US4505021A (en) * | 1981-10-22 | 1985-03-19 | Sharp Kabushiki Kaisha | Method for manufacturing an electrochromic display device |
| US4590117A (en) * | 1983-03-10 | 1986-05-20 | Toray Industries, Inc. | Transparent material having antireflective coating |
| US4946710A (en) * | 1987-06-02 | 1990-08-07 | National Semiconductor Corporation | Method for preparing PLZT, PZT and PLT sol-gels and fabricating ferroelectric thin films |
| US5156884A (en) * | 1987-10-23 | 1992-10-20 | Tokyo Ohka Kogyo Co., Ltd. | Method for forming a film of oxidized metal |
| JP2639537B2 (ja) * | 1987-10-23 | 1997-08-13 | 東京応化工業株式会社 | 絶縁性金属酸化膜の形成方法 |
| WO1990002157A1 (fr) * | 1988-08-24 | 1990-03-08 | Catalysts & Chemicals Industries Co., Ltd. | Fluide de revetement formant un revetement ceramique conducteur transparent, materiau de base revetu de ceramique conductrice transparente, production dudit materiau et applications de ce materiau de base revetu de ceramique conductrice transparente |
| JPH05114127A (ja) * | 1991-10-23 | 1993-05-07 | Hitachi Ltd | 磁気デイスク及びその製造方法並びに磁気デイスク装置 |
| JPH05166423A (ja) * | 1991-12-11 | 1993-07-02 | Asahi Glass Co Ltd | 導電膜及び低反射導電膜の製造方法 |
| JP3105340B2 (ja) * | 1992-03-05 | 2000-10-30 | 日本写真印刷株式会社 | 複合金属酸化物皮膜を有する基板の製造法 |
| US5900275A (en) * | 1992-07-15 | 1999-05-04 | Donnelly Corporation | Method for reducing haze in tin oxide transparent conductive coatings |
| JPH06202092A (ja) * | 1992-12-26 | 1994-07-22 | Canon Inc | 液晶装置及びそれに用いられる絶縁膜の製造方法 |
| US6013334A (en) * | 1993-05-27 | 2000-01-11 | Rohm Co. Ltd. | Method for forming a thin film of a complex compound |
| JP3544687B2 (ja) * | 1993-06-30 | 2004-07-21 | 旭硝子株式会社 | 塗布液、着色膜およびその製造方法 |
| JPH07307444A (ja) * | 1994-05-16 | 1995-11-21 | Mitsubishi Materials Corp | 不揮発性強誘電体薄膜メモリのパターン形成方法 |
| FR2727399B1 (fr) | 1994-10-13 | 1997-01-31 | Saint Gobain Vitrage | Compositions de verre silico-sodo-calciques et leurs applications |
| US5776425A (en) * | 1995-04-26 | 1998-07-07 | National Science Council | Method for preparing porous tin oxide monolith with high specific surface area and controlled degree of transparency |
| JPH0912305A (ja) * | 1995-06-26 | 1997-01-14 | Murata Mfg Co Ltd | ペロブスカイト構造を有する金属酸化物膜の製造方法、及び薄膜コンデンサの製造方法 |
| ATE198733T1 (de) * | 1995-09-15 | 2001-02-15 | Rhodia Chimie Sa | Substrat mit einer photokatalytischen beschichtung von titandioxyd und organische dispersionen mit titandioxyd |
| JPH09157855A (ja) * | 1995-12-06 | 1997-06-17 | Kansai Shin Gijutsu Kenkyusho:Kk | 金属酸化物薄膜の形成方法 |
| FR2758550B1 (fr) | 1997-01-17 | 1999-02-12 | Saint Gobain Vitrage | Compositions de verre silico-sodo-calcique et leurs applications |
| FR2759360B1 (fr) * | 1997-02-10 | 1999-03-05 | Commissariat Energie Atomique | Materiau polymerique inorganique a base d'oxyde de tantale notamment a indice de refraction eleve, mecaniquement resistant a l'abrasion, son procede de fabrication et materiau optique comprenant ce materiau |
| ES2181196T3 (es) | 1997-03-13 | 2003-02-16 | Saint Gobain | Composiciones de vidrio silico-sodo-calcicas y sus aplicaciones. |
-
1998
- 1998-03-13 FR FR9803152A patent/FR2775914B1/fr not_active Expired - Lifetime
-
1999
- 1999-03-11 ES ES99400595T patent/ES2210996T3/es not_active Expired - Lifetime
- 1999-03-11 DE DE69912334T patent/DE69912334T2/de not_active Expired - Lifetime
- 1999-03-11 EP EP99400595A patent/EP0941773B1/fr not_active Expired - Lifetime
- 1999-03-12 US US09/266,846 patent/US6517901B1/en not_active Expired - Lifetime
- 1999-03-12 KR KR1019990008233A patent/KR100607595B1/ko not_active Expired - Lifetime
- 1999-03-12 JP JP06626499A patent/JP4750237B2/ja not_active Expired - Fee Related
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