ES2634088T3 - Dispositivo sistema y procedimiento para su utilización en máquinas para la replicación electroquímica de patrones - Google Patents

Dispositivo sistema y procedimiento para su utilización en máquinas para la replicación electroquímica de patrones Download PDF

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Publication number
ES2634088T3
ES2634088T3 ES11743802.8T ES11743802T ES2634088T3 ES 2634088 T3 ES2634088 T3 ES 2634088T3 ES 11743802 T ES11743802 T ES 11743802T ES 2634088 T3 ES2634088 T3 ES 2634088T3
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ES
Spain
Prior art keywords
substrate
master electrode
mandrel
machines
procedure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES11743802.8T
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English (en)
Inventor
Patrik MÖLLER
Mikael Fredenberg
Tomas UTTERBÄCK
Stefan Svensson
Antonio Santos
Jean-Michel Chauvet
Daniel ROSÉN
Peter Wiwen-Nilsson
Lennart Lindgren
Gilbert Cavazza
Nicolas Raynaud
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Luxembourg Institute of Science and Technology
Original Assignee
Luxembourg Institute of Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Luxembourg Institute of Science and Technology filed Critical Luxembourg Institute of Science and Technology
Application granted granted Critical
Publication of ES2634088T3 publication Critical patent/ES2634088T3/es
Active legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005—Contacting devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/008—Current shielding devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/12—Semiconductors
    • C25D7/123—Semiconductors first coated with a seed layer or a conductive layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Tests Of Electric Status Of Batteries (AREA)

Abstract

Dispositivo para la replicación electroquímica de patrones, ECPR, caracterizado porque comprende: una base (16, 210, 311); un mandril inferior en una platina X-Y-Zeta (15, 26), estando dicho mandril inferior configurado para sostener un electrodo maestro (14, 25, 38) o un sustrato (19, 24, 34); y una platina Z (111, 211, 310) con un mandril superior (110, 212, 312) fijado a la misma, estando dicho mandril superior configurado para sostener un electrodo maestro (14, 25, 38) cuando el mandril inferior está configurado para sostener un sustrato (19, 24, 34), o un sustrato (19, 24, 34) cuando el mandril inferior está configurado para sostener un electrodo maestro (14, 25, 38); un sistema de monitorización del desplazamiento para medir el desplazamiento del electrodo maestro (14, 25, 38) con respecto al sustrato (19, 24, 34), en el que dicho sistema de monitorización del desplazamiento comprende un sensor de posición (22, 28, 32, 36, 41, 43, 48, 410, 51, 54) y un marco de referencia (11, 18, 21, 29, 31, 37, 42, 49, 55), en el que el sensor de posición (22, 28, 32, 36, 41, 43, 48, 410, 51, 54) está fijado a un marco de medición (47, 53), estando dicho marco de medición (47, 53) fijado a la platina Z (11, 211, 310) o al mandril superior (110, 212, 312), y mide una distancia desde el electrodo maestro (14, 25, 38) o el sustrato (19, 24, 34) hasta el marco de referencia (11, 18, 21, 29, 31, 37, 42, 49, 55) en el plano x-y.

Description

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Claims (1)

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    imagen2
ES11743802.8T 2010-07-15 2011-07-13 Dispositivo sistema y procedimiento para su utilización en máquinas para la replicación electroquímica de patrones Active ES2634088T3 (es)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
SE1050802 2010-07-15
SE1050802 2010-07-15
US36498910P 2010-07-16 2010-07-16
US364989P 2010-07-16
PCT/EP2011/061996 WO2012007526A2 (en) 2010-07-15 2011-07-13 Device, system and method for use in machines for electrochemical pattern replication

Publications (1)

Publication Number Publication Date
ES2634088T3 true ES2634088T3 (es) 2017-09-26

Family

ID=44630289

Family Applications (1)

Application Number Title Priority Date Filing Date
ES11743802.8T Active ES2634088T3 (es) 2010-07-15 2011-07-13 Dispositivo sistema y procedimiento para su utilización en máquinas para la replicación electroquímica de patrones

Country Status (3)

Country Link
EP (1) EP2593584B1 (es)
ES (1) ES2634088T3 (es)
WO (1) WO2012007526A2 (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PT3034657T (pt) 2014-12-19 2019-05-31 Atotech Deutschland Gmbh Porta-substrato para deposição galvânica vertical de metal
CN109097801B (zh) * 2018-08-23 2020-04-21 江苏森蓝智能系统有限公司 一种半自动铜排镀锡刷镀机
CN109798941A (zh) * 2019-03-14 2019-05-24 上海交通大学 Cfrp模压成形及cfrp/金属复合板材单步共固化成形测试装置
CN114258437B (zh) * 2019-06-13 2025-02-07 善洁科技有限公司 电铸模具嵌件的加速生产方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE523309E (sv) 2001-06-15 2010-03-02 Replisaurus Technologies Ab Metod, elektrod och apparat för att skapa mikro- och nanostrukturer i ledande material genom mönstring med masterelektrod och elektrolyt
EP1491967A1 (en) * 2003-06-27 2004-12-29 ASML Netherlands B.V. Method and apparatus for positioning a substrate on a substrate table
JP4389780B2 (ja) * 2004-12-27 2009-12-24 セイコーエプソン株式会社 液晶装置の製造方法、液晶装置、及び電子機器
KR101281123B1 (ko) * 2006-08-21 2013-07-02 엘아이지에이디피 주식회사 평판 표시패널용 기판합착장치

Also Published As

Publication number Publication date
WO2012007526A3 (en) 2012-04-19
WO2012007526A2 (en) 2012-01-19
EP2593584A2 (en) 2013-05-22
EP2593584B1 (en) 2017-04-19

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